Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/1982
06/23/1982EP0054189A1 Improved photochemical vapor deposition method
06/22/1982US4336304 Chemical vapor deposition of sialon
06/22/1982US4336280 Method for continuous production of niobium-germanium layers on a substrate
06/15/1982US4335160 Chemical process
06/15/1982CA1125896A1 Amorphous semiconductors equivalent to crystalline semiconductors
06/15/1982CA1125700A1 Vacuum deposition method
06/09/1982EP0053150A1 Method for manufacturing a thin layer with orientated structure, device for implementing such method and products obtained thereby
06/08/1982US4333989 Sapphire single crystal substrate consisting essentially of Ga2 O.sub.3
06/08/1982CA1125028A1 Method of obtaining polycrystalline silicon and workpiece useful therein
06/02/1982EP0052979A1 Improvements in the manufacture of group IIIB-VB compounds
06/01/1982US4332751 Vapor deposition on a substrate, coating with a polymeric resin and thermally shrinking the resin
05/1982
05/25/1982US4331737 Oxynitride film and its manufacturing method
05/25/1982US4331698 Method for making a very pure silicon
05/25/1982US4331462 Optical fiber fabrication by a plasma generator
05/19/1982EP0051677A1 Process and apparatus for chemical vapor deposition of films on silicon wafers
05/19/1982EP0051628A1 High pressure plasma deposition of silicon
05/18/1982US4330570 Selective photoinduced condensation technique for producing semiconducting compounds
05/18/1982US4330182 Method of forming semiconducting materials and barriers
05/12/1982EP0051449A1 Method of manufacturing amorphous silicon films
05/11/1982US4329418 Organometallic semiconductor devices
05/11/1982US4329379 Vapor deposition, floating
05/11/1982US4328646 Method for preparing an abrasive coating
05/05/1982EP0050815A1 Apparatus for emptying a fluidised-bed oven for coating cores of combustible or breeder material
05/04/1982US4328261 Metallizing semiconductor devices
05/04/1982US4328258 Method of forming semiconducting materials and barriers
04/1982
04/29/1982WO1982001441A1 Thin silicon film and process for preparing same
04/20/1982US4325987 Process for the production of an electrically conducting article
04/14/1982EP0049380A1 Apparatus for a plasma-enhanced chemical deposition
04/13/1982US4324854 Deposition of metal films and clusters by reactions of compounds with low energy electrons on surfaces
04/13/1982CA1121666A1 Tin oxide coatings
04/07/1982EP0049032A1 Coating insulating materials by glow discharge
04/07/1982EP0048742A1 Vapor delivery control system and method
03/1982
03/31/1982EP0048542A2 Coating infra red transparent semiconductor material
03/30/1982US4322149 Electric driving device of a camera
03/30/1982CA1120887A1 Method for producing uniform parallel alignment in liquid crystal cells
03/23/1982US4321073 Method and apparatus for forming metal coating on glass fiber
03/23/1982US4320716 Ultra-high frequency device for depositing thin films on solids
03/17/1982EP0047688A1 Method for the opalisation of lamps in a gaseous way
03/10/1982EP0047112A2 Method of forming phosphosilicate glass films
03/09/1982US4318767 Apparatus for the treatment of semiconductor wafers by plasma reaction
03/02/1982US4317844 Semiconductor device having a body of amorphous silicon and method of making the same
02/1982
02/23/1982US4316430 Vapor phase deposition apparatus
02/17/1982EP0046059A2 Method of plasma enhanced chemical vapour deposition of films
02/16/1982US4315968 Silicon coated silicon carbide filaments and method
02/09/1982US4314837 Oxidation
02/09/1982US4314525 Fluidized bed silicon deposition from silane
02/03/1982EP0045291A1 Method of making a coated cemented carbide body and body produced in such a manner
02/02/1982US4313783 Computer controlled system for processing semiconductor wafers
01/1982
01/27/1982EP0044526A1 Process for making a glass coating on the internal surface of a hollow object
01/26/1982US4312924 Super hard highly pure silicon nitrides
01/26/1982US4312923 Super hard-highly pure silicon nitrides, and a process and apparatus for producing the same
01/26/1982US4312921 Hexagonal crystal structure, high density, high strength
01/26/1982US4312294 Apparatus for thermal treatment of semiconductors
01/19/1982US4311545 Method for the deposition of pure semiconductor material
01/13/1982EP0043789A2 Method for the chemical-discharge treatment of sensitive workpieces by means of a glow discharge
01/12/1982US4310567 High speed stream of gas containing an organometallic compound, a metal halide and a reactive gas
01/12/1982US4310474 Method and apparatus for generating a vapor stream
01/12/1982US4309961 Apparatus for thermal treatment of semiconductors
01/05/1982US4309240 Process for chemical vapor deposition of films on silicon wafers
12/1981
12/30/1981EP0042773A1 Method of manufacturing a silicon-containing layer and its application to photoelectric conversion devices
12/24/1981WO1981003669A1 Method for manufacturing a thin layer with orientated structure,device for implementing such method and products obtained thereby
12/16/1981EP0041773A1 Solar cell production
12/09/1981EP0041259A1 Fluidised furnace and process for emptying it
12/08/1981CA1113686A1 Method of manufacturing silicium for photovoltaic conversion
12/02/1981EP0040939A1 Manufacture of cadmium mercury telluride
11/1981
11/26/1981WO1981003348A1 Process and apparatus for chemical vapor deposition of films on silicon wafers
11/25/1981EP0040540A2 Chemical vapor delivery system and method for controlling the flow of vapor in a chemical vapor delivery system
11/12/1981WO1981003133A1 High pressure plasma deposition of silicon
11/11/1981EP0039417A1 Process for producing silicon
11/04/1981EP0038982A2 Optical fiber fabrication
11/03/1981US4297971 Apparatus for vaporizing solid coating reactants
10/1981
10/27/1981US4297150 Protective metal oxide films on metal or alloy substrate surfaces susceptible to coking, corrosion or catalytic activity
10/20/1981US4295870 Interior of glass tubes by vapor deposition
10/15/1981WO1981002848A1 Vapor delivery control system and method
10/13/1981US4294871 Vapor deposition
10/13/1981US4294868 Process for continuously depositing a layer of a solid material on the surface of a substrate heated to a high temperature
10/13/1981US4294193 Apparatus for vapor coating a moving glass substrate
10/06/1981US4293755 Method of cooling induction-heated vapor deposition apparatus and cooling apparatus therefor
10/06/1981US4293594 Method for forming conductive, transparent coating on a substrate
10/06/1981US4293326 Glass coating
09/1981
09/30/1981EP0036780A2 Method of producing photoelectric transducers
09/30/1981EP0036721A1 Fluidising fine powder
09/29/1981US4292374 Sapphire single crystal substrate for semiconductor devices
09/29/1981US4292373 Layer having a more homogeneous crystal structure with that of dielectric; stress releiving
09/29/1981US4292343 Method of manufacturing semiconductor bodies composed of amorphous silicon
09/29/1981US4292342 Using the interior walls of a heated structure as substrate
09/29/1981US4292341 Measurement of the intensity of the ultraviolet radiation illuminating the gaseous reactants; accuracy
09/29/1981US4292153 Method for processing substrate materials by means of plasma treatment
09/29/1981US4292063 Manufacture of an optical fiber preform with micro-wave plasma activated deposition in a tube
09/23/1981EP0036191A1 Plasma coating the insides of tubular glass blanks
09/23/1981EP0036061A1 Process and tubular reactor for vapour-phase deposition and for plasma etching
09/22/1981US4290385 Vertical type vapor-phase growth apparatus
09/15/1981US4289801 From ammonia and silicon halide in methane
09/15/1981US4289797 First forming porous film of silicon hydride before oxidation or nitriding to form silicon oxide or silicon nitride
09/15/1981US4289598 For conditioning multilayer printed circuits
09/15/1981US4289539 Heat and chemical resistance, coating of silicon for diffusion of phosphorus
09/09/1981EP0035146A2 Semiconductor photoelectric device
09/08/1981US4287851 Mounting and excitation system for reaction in the plasma state
09/03/1981WO1981002419A1 Methods of controlling the index profile of optical fiber preforms
09/02/1981EP0034706A2 Process and apparatus for ion etching or for plasma C.V.D.