Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/1996
10/16/1996EP0738002A2 Stabilization of sheet resistance of electrical conductors
10/16/1996EP0737999A1 A magnetron sputtering system
10/16/1996EP0737998A2 Device for depositing thin layers on a substrate
10/16/1996EP0737758A1 Devices and method for processing a substrate
10/16/1996EP0737255A1 Flexible, corrosion-resistant coated aluminium-based strip-------
10/16/1996EP0685003B1 Method of stabilizing plasma generation by an electron-beam evaporator
10/16/1996EP0560941B1 Process for depositing high temperature superconducting oxide thin films
10/16/1996EP0538363B1 Device for magnetron sputtering having slotted cylindrical hollow cathode
10/16/1996CN1133350A Magnetic tube sputtering device
10/15/1996US5565708 Semiconductor device comprising composite barrier layer
10/15/1996US5565414 Shows superconductivity at boiling point of liquid helium
10/15/1996US5565248 Placing vaporizer containing inert inorganic material inside container, forming plasma of the material, coating interior
10/15/1996US5565071 Integrated sputtering target assembly
10/15/1996US5565058 Lid and door for a vacuum chamber and pretreatment therefor
10/15/1996US5565036 Apparatus and method for igniting plasma in a process module
10/15/1996US5565035 Fixture for masking a portion of an airfoil during application of a coating
10/15/1996US5565031 Method for low temperature selective growth of silicon or silicon alloys
10/12/1996CA2173891A1 Device for applying thin layers to a substrate
10/10/1996WO1996031899A1 Adjustable energy quantum thin film plasma processing system
10/10/1996WO1996031636A1 Erosion/corrosion protective coating for high-temperature components
10/10/1996WO1996031635A1 Diffusion barrier for protective coatings
10/10/1996DE19613669A1 Highly integrated semiconductor device e.g. DRAM prodn. process
10/10/1996DE19513097A1 Adding water in plasma-aided coating process
10/09/1996EP0736881A2 Electrical resistance device with CrSi resistance layer
10/09/1996EP0736612A2 Process for coating solar collectors
10/09/1996EP0736611A1 Heater for evaporation and evaporation equipment
10/09/1996EP0736109A1 Material of chemical compounds with a metal in group iv a of the periodic system, nitrogen and oxygen and process for producing it
10/09/1996EP0637400B1 Ultra-thin low moisture content polyester film and its applications
10/09/1996CN1132803A Film forming method and device
10/08/1996US5563852 Readout layer has varying composition so that the curie temperature on a reproducing light incident side is higher than curie temperature on a recording layer side
10/08/1996US5563331 Comprising at least two layers with differing temperature correlations of electrical resistance
10/08/1996US5562998 Durable thermal barrier coating
10/08/1996US5562776 Apparatus for microwave plasma enhanced physical/chemical vapor deposition
10/03/1996WO1996030925A1 Boron nitride cold cathode
10/02/1996EP0735577A2 Deposition process and apparatus therefor
10/02/1996EP0735386A2 Optical layers with intermediate refractive index
10/02/1996EP0735159A1 Sputtering target
10/02/1996EP0735158A2 Sputtering target and its use in the production of an optical recording medium
10/02/1996EP0735157A2 Formation of magnesium vapor with high evaporation speed
10/02/1996EP0735152A1 Molybdenum-tungsten material for wiring, molybdenum-tungsten target for wiring, process for producing the same, and molybdenum-tungsten wiring thin film
10/02/1996EP0734805A1 Method and apparatus for making wire electrodes for electric discharge machining, and the wire electrodes thus obtained
10/02/1996EP0734460A1 Process for producing a layer of mechanically resistant material
10/02/1996EP0734459A1 Plasma-activated vapour-deposition process and device
10/02/1996EP0680522B1 Metallized poly(lactic acid) films
10/02/1996DE19611949A1 Producing composite material
10/02/1996DE19600946A1 Verfahren zur Verbesserung der Qualität einer Titannitridschicht, die Kohlenstoff und Sauerstoff enthält Includes methods for improving the quality of a titanium nitride layer, the carbon and oxygen
10/02/1996DE19512323A1 Operating element for welding unit, esp. electrode holder or nozzle
10/02/1996DE19511946A1 Cathodic sputtering appts. for coating esp. plastic substrates esp. of PMMA
10/02/1996CN2236500Y Semi-circular column magnetic control sputtering cathode
10/02/1996CN1132530A Metal membrane and its products
10/02/1996CN1132407A Surface treatment method and system
10/01/1996US5561833 Chromium oxide crystal particles dispersed in metallic chromium
10/01/1996US5561326 Large scale integrated circuit device
10/01/1996US5560786 Magnetic thin film material for magnetic recording
09/1996
09/26/1996WO1996029635A2 Apparatus and method for controlling high throughput sputtering
09/26/1996WO1996029444A1 Photoionic microhead device
09/26/1996WO1996029375A1 Method of photocatalytically making the surface of base material ultrahydrophilic, base material having ultrahydrophilic and photocatalytic surface, and process for producing said material
09/26/1996WO1996029101A1 Novel biocompatible prosthetic material, prostheses or prosthetic systems consisting of said material, and method for preparing same by dual calcium and phosphorus ion implantation
09/26/1996DE19540379C1 Target for cathodic sputtering, used in LCD mfr.
09/26/1996DE19510736A1 Appts. for preventing arcing in hf sputter installations
09/26/1996CA2215487A1 Photoionic microhead device
09/25/1996EP0734057A2 Apparatus for preventing the need to clean outer edges of a support platen
09/25/1996EP0734048A1 Procedure and device for coating or cleaning a substrate
09/25/1996EP0733931A2 Multilayered conductive film, and transparent electrode substrate and liquid crystal device using the same
09/25/1996EP0733723A1 Thermal barrier coating system
09/25/1996EP0733271A1 HIGH Tc SUPERCONDUCTORS MADE BY METAL HETEROSTRUCTURES AT THE ATOMIC LIMIT
09/25/1996EP0733026A1 A tool for use in glass manufacture
09/25/1996EP0602233B1 Protective coating for titanium components and process for producing it
09/25/1996CN1131749A Reflection-preventing layer for display device
09/25/1996CN1131703A Sputtering silicon dielectric film with noble gas mixtures
09/24/1996US5558922 Thick thermal barrier coating having grooves for enhanced strain tolerance
09/24/1996US5558909 Apparatus and method for vacuum-metallizing articles with significant deposition onto three-dimensional surfaces
09/24/1996US5558903 Method for coating fullerene materials for tribology
09/24/1996US5558788 Dual beam optical system for pulsed laser ablation film deposition
09/24/1996US5558751 Dual cathode sputter coating apparatus
09/24/1996US5558750 Rotatable target carrier projects into sputtering chamber; continuous processing
09/24/1996US5558749 Magnetron sputtering apparatus and method
09/24/1996US5558720 Rapid response vapor source
09/24/1996US5558718 Pulsed source ion implantation apparatus and method
09/24/1996US5557927 Blanching resistant coating for copper alloy rocket engine main chamber lining
09/19/1996WO1996028587A1 Plasma chamber
09/19/1996WO1996028584A1 Target assembly having inner and outer targets
09/19/1996WO1996028583A1 Sputtering titanium target and method for producing the same
09/19/1996DE19609439A1 Prodn. of pure cobalt@ for sputtering targets for electronics use
09/19/1996DE19608182A1 Dielectric thin film for use in semiconductor memory device capacitor
09/18/1996EP0732752A2 Method and apparatus for manufacturing chalcopyrite semiconductor thin films
09/18/1996EP0732732A2 Method of removing native silicon oxide by sputtering
09/18/1996EP0732727A2 Use and method for treatment of surfaces by means of a barrier discharge device producing plasma particles and/or UV-radiation
09/18/1996EP0732690A1 Phase change mode optical disk and method of manufacturing the same
09/18/1996EP0732420A2 Method for supplying transparent support plate with regularly thin metal film
09/18/1996EP0731751A1 Diamond-coated tools and process for making
09/17/1996US5557471 Lens for depositing target material on a substrate
09/17/1996US5556812 Connection and build-up technique for multichip modules
09/17/1996US5556807 Advance multilayer molded plastic package using mesic technology
09/17/1996US5556713 Diffusion barrier for protective coatings
09/17/1996US5556706 Conductive layered product and method of manufacturing the same
09/17/1996US5556525 PVD sputter system having nonplanar target configuration and methods for operating same
09/17/1996US5556520 Method for controlling a reactive sputtering process
09/17/1996US5556519 Electricity, holders, magnetism and magnetrons
09/17/1996US5556477 Transport device for substrates to be coated in a vacuum coating system
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