Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
05/2006
05/03/2006CN1254844C Method and device for separating ion mass, and ion doping device
05/02/2006US7037827 Semiconductor device with epitaxial C49-titanium silicide (TiSi2) layer and method for fabricating the same
05/02/2006US7037589 Thin film coating having niobium-titanium layer
05/02/2006US7037577 Glass substrates coated with a stack of thin layers having reflective properties in the infra-red and/or solar ranges
05/02/2006US7037446 Radiation image storage panel
05/02/2006US7037413 has barrier layer between protective layer and recording layer, barrier layer including germanium nitride or oxynitride and element belonging to Groups IIIa, IVa, Va, VIa, VIIa, VIII, Ib and IIb and carbon; excellent weather resistance and repeating characteristics
05/02/2006US7037380 Method for cleaning chamber of deposition apparatus for organic EL device production
04/2006
04/27/2006WO2006044166A2 Method of making coated article having ir reflecting layer with predetermined target-substrate distance
04/27/2006WO2006044002A2 System and apparatus for magnetron sputter deposition
04/27/2006WO2006043723A1 Evaporation source
04/27/2006WO2006043711A1 Method of manufacturing perpendicular magnetic recording medium and perpendicular magnetic recording medium
04/27/2006WO2006043704A1 Printer, and printer control method
04/27/2006WO2006043554A1 Plasma sputtering film deposition method and equipment
04/27/2006WO2006043551A1 Plasma sputtering film deposition method and equipment
04/27/2006WO2006043464A1 Method for producing film, and, film
04/27/2006WO2006042575A1 Device and method for cooling strip substrates
04/27/2006WO2005109472A3 Mobile pvd/cvd coating center
04/27/2006WO2005107392A3 System for vaporizing materials onto substrate surface
04/27/2006WO2005085151A3 Coated article with low-e coating including ir reflecting layer(s) and corresponding method
04/27/2006US20060088737 Perpendicular magnetic recording medium with granular structured magnetic recording layer, method for producing the same, and magnetic recording apparatus
04/27/2006US20060088736 Perpendicular magnetic recording medium and manufacturing of the same
04/27/2006US20060088718 Electro-optical device, method of manufacturing the same, and electronic apparatus
04/27/2006US20060088655 provides methods and apparatus for controlling ion dosage in real time during plasma processes. In one embodiment, ion dosages may be controlled using in-situ measurement of the plasma from a mass distribution sensor combined with in-situ measurement from an RF probe.
04/27/2006US20060088436 Copper alloy sputtering target process for producing the same and semiconductor element wiring
04/27/2006US20060087211 Plasma processing apparatus
04/27/2006US20060086691 Porous material and production process thereof
04/27/2006US20060086610 Ge-cr alloy sputtering target and process for producing the same
04/27/2006US20060086606 Method for manufacturing perpendicular magnetic recording medium
04/27/2006US20060086605 Method for magnetron sputtering
04/27/2006US20060086438 Fine grain niobium sheet via ingot metallurgy
04/27/2006US20060086320 Method and device for plasma treating workpieces
04/27/2006DE4405747B4 Magnetfeldunterstützte Zerstäubungsanordnung und hiermit ausgerüstete Vakuumbehandlungsanlage Magnetic field-assisted atomization system and hereby equipped vacuum treatment plant
04/27/2006DE102004051684A1 Bearbeitungsvorrichtung mit Hoch- oder Unterdruckkammer Processing apparatus having high or low pressure chamber
04/27/2006DE102004051578A1 Method for coating a foil for coating gas turbine blades comprises preparing a foil to be coated, preparing a holder for the foil, arranging the foil on the holder, welding the foil with the holder under vacuum and coating the foil
04/27/2006DE102004051496A1 Verfahren und eine Vorrichtung zur Herstellung einer Topcoatschicht A method and an apparatus for preparing a top coat layer
04/27/2006CA2524430A1 Fine grain niobium sheet via ingot metallurgy
04/26/2006EP1650792A1 Apparatus and method for cooling of platelike substrates
04/26/2006EP1650324A2 Sputter coating system and method of sputter coating
04/26/2006EP1650323A1 Assembly for sputtering aluminium-neodymium alloys
04/26/2006EP1650322A1 Backing plates for sputtering targets
04/26/2006EP1650321A2 A sputtering system
04/26/2006EP1650051A2 Method for surface treatment of plates made of synthetic material
04/26/2006EP1649937A1 Coating medical device using air suspension
04/26/2006EP1649484A1 Sliding anode for a magnetron sputtering source
04/26/2006EP1649074A1 Wear-resistant layer and component comprising a wear-resistant layer
04/26/2006EP1493175B1 Gas driven planetary rotation apparatus and methods for forming silicon carbide layers
04/26/2006EP1303449B1 Dual degas/cool loadlock cluster tool
04/26/2006EP1012865A4 Method and apparatus for controlling a workpiece in a vacuum chamber
04/26/2006CN2775070Y Material surface ion injection and deposit composite biasing device
04/26/2006CN2775069Y Novel plane sputtering cathode
04/26/2006CN1764990A Minute high-performance rare earth magnet for micromini product and process for producing the same
04/26/2006CN1764736A Apparatus and methods for ionized deposition of a film or thin layer
04/26/2006CN1764735A Al composite material being crumbled with water, al film and al powder comprising the material and methods for preparation thereof, constitutional member for film-forming chamber method for recovering
04/26/2006CN1763915A Method of cleaning thin film deposition system, thin film deposition system and program
04/26/2006CN1763246A Dispersion strengthened rare earth stabilized zirconia
04/26/2006CN1763243A Method for controlling growth of carbon nanotube by ion Injection surface modification
04/26/2006CN1763241A Backing plates for sputtering targets
04/26/2006CN1763240A Assembly for sputtering aluminum-neodymium alloys
04/26/2006CN1763239A Vapor deposition mask
04/26/2006CN1763238A Method for manufacturing front substrate of plasma display, vapor deposition process and apparatus therefor
04/26/2006CN1253728C Process and equipment for forming film
04/26/2006CN1253598C Preparation of carbon supported film
04/25/2006US7034091 Parallel deposition, synthesis and screening of an array of diverse materials at known locations on a single substrate surface
04/25/2006US7033931 Temperature optimization of a physical vapor deposition process to prevent extrusion into openings
04/25/2006US7033679 Metal film and metal film-coated member, metal oxide film and metal oxide film-coated member, thin film forming apparatus and thin film forming method for producing metal film and metal oxide film
04/25/2006US7033665 Precision mask for deposition and a method for manufacturing the same, an electroluminescence display and a method for manufacturing the same, and electronic equipment
04/25/2006US7033643 Process of manufacturing a coated body
04/25/2006US7033514 Method and apparatus for micromachining using a magnetic field and plasma etching
04/25/2006US7033471 Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers
04/25/2006US7033462 Generation and control of a magnetic field by a magnetic filter.
04/25/2006US7033461 Thin film forming apparatus and method
04/25/2006US7033435 Process for preparing p-n junctions having a p-type ZnO film
04/20/2006WO2006041367A1 Pvd-coated cutting tool insert
04/20/2006WO2006041366A1 Cutting tool with wear resistant coating and method of making the same
04/20/2006WO2006041160A1 Physical deposition system
04/20/2006WO2006010451A3 Vacuum-coating installation and method
04/20/2006WO2005066384A8 Wear-resistant layer and component comprising a wear-resistant layer
04/20/2006WO2005048284A3 Rotating sputtering magnetron
04/20/2006WO2005000759A3 Dielectric-layer-coated substrate and installation for production thereof
04/20/2006US20060084335 Contamination resistant fiber sheet
04/20/2006US20060083952 Magnetic recording medium with diamond-like carbon protective film, and manufacturing method thereof
04/20/2006US20060083949 Vaporizing material for producing highly refractive optical layers
04/20/2006US20060083948 Electromagnetic noise suppressor, article with electromagnetic noise suppressing function, and their manufacturing methods
04/20/2006US20060083934 Method of making coated article with IR reflecting layer(s) using krypton gas
04/20/2006US20060083932 Glass coating
04/20/2006US20060083856 Evaporating a material attached to a 2nd electrode by causing an arc discharge between the material and the 1st electrode having sub-electrodes, generating ultrafine particles, and colliding the particles against a substrate; sub-electrodes are in radial alignment to the same portion of the material.
04/20/2006US20060081468 Magnetic latch for a vapour deposition system
04/20/2006US20060081467 Systems and methods for magnetron deposition
04/20/2006US20060081466 High uniformity 1-D multiple magnet magnetron source
04/20/2006US20060081465 Assembly for sputtering aluminum-neodymium alloys
04/20/2006US20060081464 Backing plates for sputtering targets
04/20/2006US20060081463 Sputtering device
04/20/2006US20060081459 In-situ monitoring of target erosion
04/20/2006US20060081458 Methods and apparatus for sputtering
04/20/2006US20060081457 Method of making coated article having IR reflecting layer with predetermined target-substrate distance
04/20/2006US20060081337 Capacitive coupling plasma processing apparatus
04/20/2006US20060081334 Substrate processing method
04/20/2006DE202005020544U1 Vaporiser unit comprises a crucible with a melt zone, a vaporiser zone, a connection between the two zones, and a heating unit
04/20/2006DE19853943B4 Katode zur Zerstäubung oder Bogenaufdampfung sowie Vorrichtung zur Beschichtung oder Ionenimplantation mit einer solchen Katode Cathode atomization or Bogenaufdampfung and apparatus for coating or ion implantation with such a cathode
04/20/2006DE10348734B4 Verfahren zum selektiven Galvanisieren von Metalloberflächen und Selektiv-Galvanisierungssystem für Metalloberflächen A method for selective electroplating of metal surfaces and selective electroplating system for metal surfaces