Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2006
04/06/2006WO2006005067A3 Protective coating on a substrate and method of making thereof
04/06/2006WO2006002138A3 Etch and deposition control for plasma implantation
04/06/2006WO2005024965A8 A method and apparatus for making a layer of coating material on a tape substrate, in particular for making superconductive tapes
04/06/2006US20060073978 Method and apparatus for making continuous films of a single crystal material
04/06/2006US20060071592 Dielectric barrier layer films
04/06/2006US20060071197 Electroconductive oxide sintered compact, sputtering target comprising the sintered compact and methods for producing them
04/06/2006US20060070877 Magnetron sputtering device
04/06/2006US20060070876 Physical vapor deposition target constructions
04/06/2006US20060070875 Coils for generating a plasma and for sputtering
04/06/2006US20060070870 Flexible extruded plastic profile, especially plastic tube and method for producing the same
04/06/2006US20060070869 Thin film coating and temporary protection technology, insulating glazing units, and associated methods
04/06/2006US20060070576 Source for thermal physical vapor deposition of organic electroluminescent layers
04/06/2006DE102005042762A1 Continuous film forming apparatus includes stationary and movable chambers which are divided by division plane that divides wall of vacuum chamber, at which movable chambers are separated/joined with respect to stationary chamber
04/06/2006DE102004047135A1 Temperfähiges Schichtsystem und Verfahren zu seiner Herstellung Annealable layer system and method for its preparation
04/06/2006DE102004046390A1 Verfahren zum Vakuumbeschichten mit einer photohalbleitenden Schicht und Anwendung des Verfahrens A method for vacuum coating with a photo semiconducting layer and application of the method
04/06/2006DE102004046279A1 Dampfquelle und Beschichtungsteil einer Anlage zur Herstellung dünner Schichten unter Vakuumbedingungen aus mindestens zwei sich hinsichtlich ihres Dampfdruckes unterscheidenden Beschichtungskomponenten Steam source and coating part of a plant for the production of thin films under vacuum conditions of at least two that differ with regard to their vapor pressure coating components
04/05/2006EP1643568A1 Method of forming a layer of a doped semiconductor material and apparatus
04/05/2006EP1643020A1 Catalyst used to form carbon fiber, method of making the same and uses
04/05/2006EP1643011A1 Erosion and wear resistant protective structures for turbine components
04/05/2006EP1642999A1 Multinary deposition film production stabilizing device and method, and tool with multinary deposition film
04/05/2006EP1642998A1 Production device for multiple-system film and coating tool for multiple-system film
04/05/2006EP1642997A1 Copper oxide thin film low-friction material and film-forming method therefor
04/05/2006EP1642996A2 Hard coating excellent in wear resistance and in oxidation resistance and target for forming the same
04/05/2006EP1642653A2 Coated biomedical device and associated method
04/05/2006EP1642328A1 Traps for particle entrapment in deposition chambers
04/05/2006EP1641956A1 Rotating tubular sputter target assembly
04/05/2006EP1641955A2 Biological laser printing via indirect photon-biomaterial interactions
04/05/2006EP1641723A1 Concentration-modulated coatings
04/05/2006EP1641721A2 Dielectric-layer-coated substrate and installation for production thereof
04/05/2006EP1641720A2 Dielectric-layer-coated substrate and installation for production thereof
04/05/2006EP1641571A2 Biological laser printing for tissue microdissection via indirect photon-biomaterial interactions
04/05/2006EP1419542B1 Method for dispensing cesium and its use in the manufacture of oled screens
04/05/2006EP1105245A4 Bonding of dissimilar metals
04/05/2006CN1757266A Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions
04/05/2006CN1757091A Vacuum sputtering cathode
04/05/2006CN1756859A Tubular workpiece internal surface modifying method and its special-purpose device
04/05/2006CN1756858A Sputtering target and process for producing the same, thin film for optical information recording medium and process for producing the same
04/05/2006CN1756857A Sputtering target, thin film for optical information recording medium and process for producing the same
04/05/2006CN1756856A Dielectric barrier layer films
04/05/2006CN1755914A Barrier layer and fabrication method thereof
04/05/2006CN1755840A First wall part or low activation steel heat sink material coated with thick tungsten coating and making method thereof
04/05/2006CN1755398A Plastic optical devices having antireflection film and mechanism for equalizing thickness of antireflection film
04/05/2006CN1754981A Non-bonded rotatable targets for sputtering
04/05/2006CN1754980A Metal corrosion-resistant processing method by use of plasma
04/05/2006CN1754979A Metal corrosion-resistant processing method by use of plasma
04/05/2006CN1754978A Methods and apparatus for reducing arcing during plasma processing
04/05/2006CN1754977A Method and apparatus for manufacturing display
04/05/2006CN1754855A Substrate with photocatalytic coating
04/05/2006CN1754854A Substrate with photocatalytic coating
04/05/2006CN1754640A Surface-coated cermet cutting tool
04/05/2006CN1250051C Organic EL face-board and making method thereof
04/05/2006CN1249814C Strong dielectric capacitor and mfg. method and semiconductor storage device
04/05/2006CN1249793C Forming method and device for barrier layer of semiconductor element
04/05/2006CN1249786C Method and apparatus for plasma cleaning of workpieces
04/05/2006CN1249779C Method for mfg. crystal semiconductor material and method for mfg. semiconductor
04/05/2006CN1249737C Thin permanent-magnet film and process for producing same
04/05/2006CN1249521C Mask and method for mfg. same, and method for manufacturing electric light emitting apparatus
04/05/2006CN1249506C 电子电路 Electronic circuit
04/05/2006CN1249264C Ion beam density measurer
04/05/2006CN1248957C Unidimensional aluminium nitride nanometer structure array and its preparation method
04/04/2006US7023137 Magnetron
04/04/2006US7022628 Method for forming quantum dots using metal thin film or metal powder
04/04/2006US7022598 Method of producing multilayer interconnection structure
04/04/2006US7022591 Method of fabricating a polysilicon thin film
04/04/2006US7022535 Thin film forming device, method of forming a thin film, and self-light-emitting device
04/04/2006US7022209 PVD method and PVD apparatus
04/04/2006US7021238 Molecular beam epitaxy equipment
04/04/2006US7021042 Geartrain coupling for a turbofan engine
03/2006
03/30/2006WO2006034050A2 Thin film medical devices manufactured on application specific core shapes
03/30/2006WO2006034028A2 Delivering particulate material to a vaporization source
03/30/2006WO2006034019A2 Delivering particulate material to a vaporization zone
03/30/2006WO2006033166A1 Organic el light emitting element, manufacturing method thereof and display
03/30/2006WO2006032925A1 Material deposition apparatus and method
03/30/2006WO2005089272A3 Pulsed cathodic arc plasma source
03/30/2006WO2005089142A3 Coated piston pin
03/30/2006US20060068611 Heat transfer device and system and method incorporating same
03/30/2006US20060068227 Ag-based reflection film and method for preparing the same
03/30/2006US20060068226 ND filter, manufacturing method thereof, and aperture device
03/30/2006US20060068225 Hard coating excellent in wear resistance and in oxidation resistance and target for forming the same
03/30/2006US20060068108 Masking device and coating method
03/30/2006US20060068084 Method for manufacturing plasma display panels
03/30/2006US20060065525 Method for manufacturing magnetron coated substrates and magnetron sputter source
03/30/2006US20060065524 Non-bonded rotatable targets for sputtering
03/30/2006US20060065523 Corrosion resistant apparatus for control of a multi-zone nozzle in a plasma processing system
03/30/2006US20060065517 Target and method of diffusion bonding target to backing plate
03/30/2006US20060065194 Diffuser and semiconductor device manufacturing equipment having the same
03/30/2006US20060065190 Application device
03/30/2006US20060065189 Method and system for homogenization of supercritical fluid in a high pressure processing system
03/30/2006DE4117257B4 Optisch wirkendes Schichtsystem mit hoher Antireflexwirkung für transparente Substrate Optically acting layer system with high anti-reflection effect for transparent substrates
03/30/2006DE102004046287A1 Automotive headlamp installation frame has multi-layered structure incorporating metalized intermediate layer on plastic
03/30/2006DE102004045206A1 Herrichten und Betreiben eines Verdampferkörpers für eine PVD-Metallisierungsanlage Mr layers and operating an evaporator body for a PVD metallisation
03/30/2006DE102004044357A1 Component surface treatment executing device, has process chamber attached to one of openings, vacuum pump attached to chamber, and connection supplying electrical energy into receiving chambers for treatment of component
03/30/2006DE102004044346A1 Textile for shading or for controlling light transmission, for use e.g. in sunshades, awnings and blinds, comprises knitted fabric in which the see-through angle is fixed by the mesh configuration
03/30/2006DE102004043550A1 Verschleißfeste Beschichtung und Verfahren zur Herstellung derselben Wear-resistant coating and method of producing same
03/29/2006EP1640482A1 Process for producing extremely flat microcrystalline diamond thin film by laser ablation method
03/29/2006EP1640481A1 rotatable substrate holder
03/29/2006EP1640474A1 Thin film forming device and thin film forming method
03/29/2006EP1640473A1 Thermal barrier coating with modulated grain structure and method therefor
03/29/2006EP1640472A2 Method for reactive sputter deposition of a magnesium oxide film on an iron-containing film
03/29/2006EP1640471A2 Vapor source for coating apparatus.