Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2006
03/16/2006US20060057014 Iron silicide sputtering target and method for production thereof
03/16/2006US20060055322 Alkali metal generating agent, alkali metal generator, photoelectric surface, secondary electron emission surface, electron tube, method for manufacturing photoelectric surface, method for manufacturing secondary electron emission surface, and method for manufacturing electron tube
03/16/2006US20060054888 Semiconductor device and method for manufacturing semiconductor device
03/16/2006US20060054497 Especially for measuring characteristics of a metallic target and other interior surfaces of a sputtering chamber; a sensor that emits a energy beam to an evaluation surface, detects another energy beam and provides an output signal from which a characteristic can be determined; arm provides transport
03/16/2006US20060054496 Biased pulse DC reactive sputtering of oxide films
03/16/2006US20060054495 Substrate processing system
03/16/2006US20060054494 Physical vapor deposition apparatus for depositing thin multilayer films and methods of depositing such films
03/16/2006US20060054493 Method for the production of a substrate and unit for the same
03/16/2006US20060054492 Coated article with improved barrier layer structure and method of making the same
03/16/2006US20060054250 High-tensile, malleable molded bodies of titanium alloys
03/16/2006US20060054089 Source for thermal physical vapor deposition of organic electroluminescent layers
03/16/2006US20060054082 Substrate holding and rotating apparatus
03/16/2006DE102004045049A1 Protection layer application, involves applying undercoating with heat insulating layer, and subjecting diffusion layer to abrasive treatment, so that outer structure layer of diffusion layer is removed by abrasive treatment
03/16/2006CA2579634A1 Fuel cell separator and method for manufacturing the same
03/16/2006CA2556573A1 Coater having interrupted conveyor system
03/15/2006EP1634978A1 Wear resistant coating and process of its manufacture
03/15/2006EP1634977A1 Process for inhibiting the formation of a secondary reaction zone (SRZ) and coating system therefor
03/15/2006EP1634686A1 Method of forming film on molded body, method of producing molded body with film formed thereon, mold for producing molded body with film formed thereon
03/15/2006EP1634317A2 Deposition apparatus and method
03/15/2006EP1633902A2 Physical vapor deposition of titanium-based films
03/15/2006EP1507723B1 Method and device for handling workpieces
03/15/2006CN2765321Y Crazing-proof reinforcing hoop for magnetic control sputtering medium target
03/15/2006CN1748264A Ferroelectric film, semiconductor device, ferroelectric film manufacturing method, and ferroelectric film manufacturing apparatus
03/15/2006CN1747217A Device and method for preparing solid thin-membrane lithium battery by in-situ deposition
03/15/2006CN1747139A Improvement of atomic layer deposition and apparatus thereof
03/15/2006CN1746332A Sputtering target and production method therefor
03/15/2006CN1746331A Cleaning apparatus
03/15/2006CN1746330A Cleaning apparatus
03/15/2006CN1746329A Polymorphic indium tin oxide thin-membrane and production of polymorphic indium tin oxide electrode
03/15/2006CN1746015A Method and structure for metallizing rubber surface
03/15/2006CN1245747C Substrate support member for use in FPP manufacturing apparatus
03/15/2006CN1245534C Non-magentic shielding type ferromagnetic target as sputter cathode and its sputtering method
03/15/2006CN1245533C Composite element and method for preparation thereof
03/15/2006CN1245347C Method for imparting hydrophilicity to substrate
03/14/2006US7011894 Method of making a protective coating forming a thermal barrier with a bonding underlayer on a superalloy substrate, and a part obtained thereby
03/14/2006US7011734 Method of manufacturing semiconductor device having silicide layer
03/14/2006US7011733 Method and apparatus for depositing films
03/14/2006US7011732 Sputtering an alloy in oxygen to form a spinel oxides of two different transition metals; stoichiometry; infrared transmission, electroconductivity, stability; optical coatings for light emitting diode, transistor, solar cells, flat panel displays
03/14/2006US7011691 Sputtering target; radiation transparent; electroconductivity; indium, tungsten oxide
03/14/2006US7010837 Method for manufacturing an electronic component
03/09/2006WO2006026621A2 Molybdenum tubular sputtering targets with uniform grain size and texture
03/09/2006WO2006025821A1 System for and method of manufacturing a large-area backplane by use of a small-area shadow mask
03/09/2006WO2006025558A1 Write-onece-read-many optical recording medium and sputtering target thereof
03/09/2006WO2006025242A1 Double-layered flexible board and method for manufacturing same
03/09/2006WO2006025240A1 Double layer flexible board and method for manufacturing the same
03/09/2006WO2006025195A1 SiO DEPOSITION MATERIAL, RAW MATERIAL Si POWDER, AND METHOD FOR PRODUCING SiO DEPOSITION MATERIAL
03/09/2006WO2006025194A1 SiO DEPOSITION MATERIAL, Si POWDER FOR SiO RAW MATERIAL, AND METHOD FOR PRODUCING SiO
03/09/2006WO2006024808A2 Method for transferring a functional organic molecule onto a transparent substrate
03/09/2006WO2006024386A2 Layered composite comprising cubic boron nitride
03/09/2006WO2005118908A3 Producing repetitive coatings on a flexible substrate
03/09/2006WO2005098082A3 Device for coating both sides of a substrate with a hydrophobic layer
03/09/2006WO2005074640A3 Physical vapor deposition target constructions
03/09/2006US20060051826 Method and device for the incorporating a compound in the pores of a porous material and uses thereof
03/09/2006US20060051623 Substrate with silica between grains; sputtering under vacuum
03/09/2006US20060051622 High density magnetic recording medium using FePtC thin film and manufacturing method thereof
03/09/2006US20060051618 PVD coated ruthenium featured cutting tools
03/09/2006US20060051601 Ceramic film and method of manufacturing the same, ferroelectric capacitor, semiconductor device, and other element
03/09/2006US20060051597 Article coated with titanium compound film, process for producing the article and sputtering target for use in coating the film
03/09/2006US20060051584 Process for producing a product having a structured surface
03/09/2006US20060051572 Packaging material
03/09/2006US20060051522 Method of pulsed laser assisted surface modification
03/09/2006US20060051495 Device and method for the evaporative deposition of a coating material
03/09/2006US20060050371 Antireflection coating for ultraviolet light at large angles of incidence
03/09/2006US20060049755 Alkali metal generating agent, alkali metal generator, photoelectric surface, secondary electron emission surface, electron tube, method for manufacturing photoelectric surface, method for manufacturing secondary electron emission surface, and method for manufacturing electron tube
03/09/2006US20060049547 Method for producing nanoparticles
03/09/2006US20060049044 Substrate holder for a vapour deposition system
03/09/2006US20060049043 Magnetron assembly
03/09/2006US20060049042 Cathode for sputter coating
03/09/2006US20060049041 Anode for sputter coating
03/09/2006US20060049040 Apparatus and method for two dimensional magnetron scanning for sputtering onto flat panels
03/09/2006US20060049036 Method and apparatus for real-time control and monitor of deposition processes
03/09/2006US20060049035 Surfaces of machine or engine parts, in particular for internal combustion engines, which are exposed to frictional wear, comprising at least one nanocrystalline functional layer made up of at least two chromium nitride phases for reducing friction
03/09/2006US20060049034 Laser ablation apparatus and method of preparing nanoparticles using the same
03/09/2006US20060048708 Coater having interrupted conveyor system
03/08/2006EP1632586A2 Film formation source, vacuum film formation apparatus, and method of manufacturing organic EL panel
03/08/2006EP1632585A2 Material and method to prevent low temperature degradation of zirconia in biomedical implants
03/08/2006EP1397260A4 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
03/08/2006CN1745453A Method and apparatus for plasma treatment of surface in vacuum
03/08/2006CN1745197A Composite barrier films and method
03/08/2006CN1745192A Coating plant with a charging lock and device therefor
03/08/2006CN1745191A Ge-cr alloy sputtering target and manufacturing method thereof
03/08/2006CN1745158A Controlled sulfur species deposition process
03/08/2006CN1743503A Diamond film containing chronium and its preparing method
03/08/2006CN1743498A Rotary magnetic field planar target magnetic-controlled sputtering apparatus
03/08/2006CN1743497A Sputtering target material for improved magnetic layer
03/08/2006CN1743496A Sputtering device with gas injection assembly
03/08/2006CN1743495A Organic matter vaporization plating device
03/08/2006CN1244713C Sputtering device utilizing magnetic field to form metal film
03/08/2006CN1244712C Coating process for Ti-Ni inner support rack
03/07/2006US7009487 Fabrication of nano-scale temperature sensors and heaters
03/07/2006US7008688 Hard multilayer coating, hard multilayer coated tool including the hard multilayer coating, and method of forming the hard multilayer coating
03/07/2006US7008669 Ceramic and method of manufacturing the same, dielectric capacitor, semiconductor device, and element
03/07/2006US7008520 Sputtering device
03/07/2006US7008519 Sputtering target for forming high-resistance transparent conductive film, and method for producing the film
03/07/2006US7008518 sputter coating system of a coating station and a monitoring station;a sputtering target with a detector positioned for measuring the beams reflected during thin film is deposition
03/07/2006US7008517 Shutter disk and blade for physical vapor deposition chamber
03/07/2006US7007373 GMR sensor for sensing magnetically recorded information on a data storage medium including a ferromagnetic free layer and a ferromagnetic pinned layer sandwiching an electrically conductive spacer layer.
03/06/2006CA2577162A1 Molybdenum sputtering targets
03/02/2006WO2006023650A1 Method of enhancing fuel cell water management
03/02/2006WO2006023321A2 Slotted thin-film sputter deposition targets for ferromagnetic materials