Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
07/2006
07/06/2006US20060144703 Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry
07/06/2006US20060144697 Method of making coated article by sputtering cast target to form zinc oxide inclusive layer(s)
07/06/2006US20060144696 Magnetron sputtering process
07/06/2006US20060144695 Sputtering process for depositing indium tin oxide and method for forming indium tin oxide layer
07/06/2006US20060144694 using ion beam sputtering; lamination on light emitting diodes
07/06/2006US20060144584 Cooling device for vacuum treatment device
07/06/2006DE102004063703A1 Vakuumbeschichtungssystem Vacuum Coating System
07/06/2006DE102004062552A1 Vorrichtung zum Verdampfen von kondensierten Stoffen Device for the vaporization of condensed substances
07/06/2006DE102004058260B3 Collimator for vacuum deposition installations comprises a lance tube arranged on the side of a collimator tube facing away from the plasma for closing the opening of the collimator tube
07/06/2006CA2593063A1 Oscillating shielded cylindrical target assemblies and their methods of use
07/06/2006CA2592421A1 Prosthetic joint with articulating surface layers comprising adlc
07/05/2006EP1676331A1 Increasing the lateral resolution of organic vapor jet deposition by using a confining guard flow
07/05/2006EP1675972A2 Method for plasma treating a surface
07/05/2006EP1340106A4 Protective overcoat for replicated diffraction gratings
07/05/2006EP1042541A4 Method for producing abrasive tips for gas turbine blades
07/05/2006EP1027172A4 Protective overcoat for replicated diffraction gratings
07/05/2006CN1798880A Process for producing extremely flat microcrystalline diamond thin film by laser ablation method
07/05/2006CN1798876A Fabricated titanium article having improved corrosion resistance
07/05/2006CN1798867A Deposition chamber surface enhancement and resulting deposition chambers
07/05/2006CN1798863A Adaptable processing element for a processing system and a method of making the same
07/05/2006CN1798862A Disk coating system
07/05/2006CN1798617A Ion beam-assisted high-temperature superconductor (HTS) deposition for thick film tape
07/05/2006CN1797847A Film antenna, and manufacturing method
07/05/2006CN1796596A Method for preparing thin film material of metal zirconium
07/05/2006CN1796595A Method for preparing thin film material of binary rare earth compounds
07/05/2006CN1796594A Ion implantation process method for surface of metal material embedded to human body
07/05/2006CN1796593A Method for preparing film material of metal hafnium
07/05/2006CN1796592A Method for hard coating thin film of generic diamond
07/05/2006CN1796008A Substrate treatment equipment and treatment method thereof
07/05/2006CN1262872C Improving stability of ion beam generated alignment layers by surface modification
07/05/2006CN1262682C Sputtering target and manufacture thereof
07/05/2006CN1262391C Coated blade with nm crystal CVD coating having cutter edge tenacity increased and reducing friction
07/04/2006US7071563 Efficiency
07/04/2006US7071102 Method of forming a metal silicide layer on non-planar-topography polysilicon
07/04/2006US7071087 Technique to grow high quality ZnSe epitaxy layer on Si substrate
07/04/2006US7070916 Radiation image conversion panel and production method thereof
07/04/2006US7070857 low-density and/or high thermal-resilience structural materials coated with doped semiconductor oxides
07/04/2006US7070855 Porous material and production process thereof
07/04/2006US7070658 Vapor deposition apparatus
06/2006
06/29/2006WO2006067937A1 Sb-Te ALLOY SINTERING PRODUCT TARGET AND PROCESS FOR PRODUCING THE SAME
06/29/2006WO2006067836A1 Film forming mask and mask assembly jig
06/29/2006WO2006067301A1 Method for making a solid oxide fuel cell in the form of thin films
06/29/2006WO2005086567A3 Silicide formed from ternary metal alloy films
06/29/2006US20060141272 A stack of multilayer overcoatings reflective in the low reflectance gap range (300-400 nm) of silver; a high absorbing metal underlayer to prevent a galvanic cell forming while increasing reflectance ; improved environmental durability; chemical/corrosion resistances; protective coatings; telescopes
06/29/2006US20060141267 Metal film and metal film-coated member, metal oxide film and metal oxide film-coated member, thin film forming apparatus and thin film forming method for producing metal film and metal oxide film
06/29/2006US20060141266 Cadmium tin oxide multi-layer laminate and producing method thereof
06/29/2006US20060141168 Metal film and metal film-coated member, metal oxide film and metal oxide film-coated member, thin film forming apparatus and thin film forming method for producing metal film and metal oxide film
06/29/2006US20060141139 Magnetic laminated structure and method of making
06/29/2006US20060141136 System and methods for manufacturing an organic electroluminescent element
06/29/2006US20060137978 Arc evaporation device
06/29/2006US20060137971 Method for coating cutting implements
06/29/2006US20060137970 Shield unit for TiN sputtering apparatus, method of coating the same, and sputtering method
06/29/2006US20060137969 Method of manufacturing alloy sputtering targets
06/29/2006US20060137968 Oscillating shielded cylindrical target assemblies and their methods of use
06/29/2006US20060137782 Target of high-purity nickel or nickel alloy and its producing method
06/29/2006US20060137614 Metal film and metal film-coated member, metal oxide film and metal oxide film-coated member, thin film forming apparatus and thin film forming method for producing metal film and metal oxide film
06/29/2006DE202006006403U1 Screw connection element for application in coating, wetting, or sputtering installations has top part of dielectric material, e.g. ceramics, and threaded part of metal or dielectric material
06/29/2006DE102004060670A1 Production of dielectric high temperature resistant scratch resistant layers comprises applying a working point of a reactive sputtering process close to a material-specific pulsed working point by controlling the reactive gas flow
06/29/2006DE102004060423A1 Rohrtarget Tube target
06/28/2006EP1674890A2 Multilayer material and method of preparing same
06/28/2006EP1674597A1 Cutting tool insert
06/28/2006EP1674591A1 apparatus and method for cooling substrates
06/28/2006EP1674179A1 Tool holders for chip removing machining
06/28/2006EP1673488A2 Modular device for surface coating
06/28/2006EP1673487A1 Layer with intra-crystalline inclusions
06/28/2006EP1673313A2 Coated article with silicon nitride inclusive layer adjacent glass
06/28/2006EP1627096B1 Sealing lock for an in-line vaccum deposition apparatus
06/28/2006CN1795531A Magnetron sputter cathode
06/28/2006CN1795288A Sealing lock for an in-line vaccum deposition apparatus
06/28/2006CN1795287A Thin film forming device and thin film forming method
06/28/2006CN1795286A Thin film forming method and forming device therefor
06/28/2006CN1795285A A method for forming a superhard amorphous carbon coating in vacuum
06/28/2006CN1795284A Ultra low residual reflection, low stress lens coating
06/28/2006CN1795283A Mask-retaining device
06/28/2006CN1794495A Lithium battery electrode material Li2S/Co nanometer compound film and its preparation method
06/28/2006CN1794488A Film lithium ion battery using stannous selenide film as anode material and its preparation method
06/28/2006CN1794429A Method of in-situ depositing high dielectric constant ferric oxide and metal film on indium phosphide material
06/28/2006CN1794428A Method of in-situ depositing high dielectric constant Al2O3 and metal film on GaN base compound material
06/28/2006CN1794427A Method of in-situ depositing high dielectric constant Al2O3 and metal film on GaAs substrate
06/28/2006CN1794422A Opening/closing mechanism for vacuum processing apparatus and vacuum processing apparatus using the same
06/28/2006CN1794411A Ion implanting apparatus and ion implanting method
06/28/2006CN1794377A Sputtering film electrode paster inducer and its production method
06/28/2006CN1794376A Inductance framework having sputtering film electrode and its production method
06/28/2006CN1794113A Timepiece dial and processes for manufacturing this dial
06/28/2006CN1793420A Process for applying optical coatings
06/28/2006CN1793419A Process for preparing composite thin plate with ceramic particle spreading strengthening intermetallic compound base
06/28/2006CN1793418A Process for preparing film material by unbalanced normal positional mixing
06/28/2006CN1793417A Apparatus for mfg. amorphous silicon or microcrystal silicon solar battery and series system thereof
06/28/2006CN1793416A Apparatus and tech., for composite preparing metal film
06/28/2006CN1793415A Process for preparing ZrN/Al2 (O1-xNx)3 hard nano multi-layer coating
06/28/2006CN1792523A Tool holders for chip removing machining
06/28/2006CN1792522A Cutting tool insert
06/28/2006CN1261616C Film plating device and film plating method
06/28/2006CN1261615C Covering plate in film plating apparatus
06/27/2006USRE39145 Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source
06/27/2006USRE39143 Method for making a wafer-pair having sealed chambers
06/27/2006US7067917 Gradient barrier layer for copper back-end-of-line technology
06/27/2006US7067843 Transparent oxide semiconductor thin film transistors
06/27/2006US7067828 Method of and apparatus for measurement and control of a gas cluster ion beam
06/27/2006US7067203 Wear resistant coating with enhanced toughness