Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
05/2006
05/24/2006EP1659194A1 Ag base sputtering target and process for producing the same
05/24/2006EP1659193A1 Cooled backing plate for a sputter target and sputter target made with several backing plates
05/24/2006EP1659192A1 Alloy deposition by PVD
05/24/2006EP1658625A1 Superconducting film and method of manufacturing the same
05/24/2006EP1658391A2 Process for the production of strongly adherent coatings
05/24/2006EP1592822A4 Disk coating system
05/24/2006EP1547124B1 Device for the treatment of a web-type material in a plasma-assisted process
05/24/2006EP1516073B1 Metal dusting corrosion resistant alloys with oxides
05/24/2006EP0830218B1 Structures having enhanced biaxial texture and method of fabricating same
05/24/2006DE102005052027A1 Abschirmvorrichtung für rückseitige Metallablagerung Screening for rear metal deposition
05/24/2006CN1777703A Homogenous solid solution alloys for sputter-deposited thin films
05/24/2006CN1777690A Substrates coated with mixtures of titanium and aluminum materials,methods for making the substrates,and cathode targets of titanium and aluminum metal
05/24/2006CN1777689A Method for producing silicon oxide film and method for producing optical multilayer film
05/24/2006CN1777567A Building material and its prcparing method
05/24/2006CN1776525A Mask assembly and mask frame assemble using same
05/24/2006CN1776524A Method of descaling a mask
05/24/2006CN1776016A Photocatalytic film formed article
05/24/2006CN1776015A Nano superhard composite film tool with high adhesion and its deposition method
05/24/2006CN1776008A Vacuum chamber for vacuum processing device
05/24/2006CN1776007A Apparatus for evaporation of materials
05/24/2006CN1776006A Method of producing flat panels for display of film transistor or plasma
05/24/2006CN1776005A Method for preparing nano crystal iron-germanium particle thin-film magnetic-sensitive material
05/24/2006CN1776004A Method for biological ceramic composite intermediate coating on titanium alloy substrate
05/24/2006CN1776003A Ceramic-substrate sputtered copper foil production method
05/24/2006CN1776002A Cooled backing plate for a sputter target and sputter target made with several backing plates
05/24/2006CN1776001A Vapor deposition of dissimilar materials
05/24/2006CN1776000A Defect healing of deposited titanium alloys
05/24/2006CN1775999A Gd3Al5O12:Ce, Dy luminous film and preparing method
05/24/2006CN1775998A MGd(1x)SiO4:Ax luminous film and preparing method
05/24/2006CN1775997A Apparatus for reinforcing arc-glow percolation plated ceating by microwave plasma and process thereof
05/24/2006CN1775907A M2(1-x)B5 O9Cl:A2Xluminous film and its preparing method
05/24/2006CN1257560C Method for preparing selenide or sulfide semiconductor film material of copper-indium-gallium
05/24/2006CN1257307C Double scanning thin film processing system
05/24/2006CN1257053C Stacked body and capacitor
05/24/2006CN1256929C Method for processing needles
05/23/2006US7050253 Magnetic recording media and magnetic storage apparatus using the same
05/23/2006US7049009 Silver selenide film stoichiometry and morphology control in sputter deposition
05/23/2006US7049002 Glass substrates, including glass sheet and continuous float glass ribbon
05/23/2006US7048973 Metal film vapor phase deposition method and vapor phase deposition apparatus
05/23/2006US7048837 generating a plasma, sputtering metal material from a target, etching a portiton of the metal from the substrate, monitoring the emitted radiation through a folded radiation path in chamber, and terminating etching in response to monitored radiation
05/23/2006US7048836 Ln3+M2+1+xQx4+Al11-2x O19, whereby Ln means a lanthanoide, M means a divalent metal element, Q means a tetravalent metal element, provided that 0 less-double-equals x less-double-equals 1.
05/23/2006US7048767 Nano-crystalline, homo-metallic, protective coatings
05/23/2006US7048360 Piezoelectric body, manufacturing method thereof, piezoelectric element having the piezoelectric body, inject head, and inject type recording device
05/23/2006US7048248 Fixture and loading method for PVD coating of cutting tool inserts
05/23/2006CA2383744C Soil-resistant coating for glass surfaces
05/18/2006WO2006053017A1 Method and apparatus for controlling the vaporization of organic material
05/18/2006WO2006052931A2 Physical vapor deposition chamber having a rotatable substrate pedestal
05/18/2006WO2006052873A2 Physical vapor deposition chamber having an adjustable target
05/18/2006WO2006052467A2 Controlling the application of vaporized organic material
05/18/2006WO2006051952A1 Composite material
05/18/2006WO2006051737A1 Sputtering target for production of metallic glass film and process for producing the same
05/18/2006WO2006051736A1 Hydrogen separation membrane, sputtering target for forming of hydrogen separation membrane, and process for producing the same
05/18/2006WO2006051416A1 Continuous process for surface modification of filter materials
05/18/2006WO2006050847A1 Device for the vapour deposition of a coating material
05/18/2006WO2006050846A1 Device for the vapour deposition of a coating material
05/18/2006WO2006027814A3 Mixtures for evaporation of lithium and lithium dispensers
05/18/2006WO2006024386A3 Layered composite comprising cubic boron nitride
05/18/2006WO2005124829A3 In-line heater for use in semiconductor wet chemical processing and method of manufacturing the same
05/18/2006WO2005098077A3 Metalization method and plant
05/18/2006US20060105912 Microstructured catalyst body and method for production thereof
05/18/2006US20060105911 Photocatalyst material and process for producing the same
05/18/2006US20060105203 Head disc interface design
05/18/2006US20060105196 Coating on substrate, wherein the coating is a homogeneous mixture of silicon and germanium in proportions selected to combine desirable properties of both materials, and wherein the coating provides blanket selected emittive characteristics for infrared energy and reflective characteristics, spacecraft
05/18/2006US20060105180 System of layers for transparent substrates and coated substrate
05/18/2006US20060104853 Containing bismuth and one or more rare earth metal elements; high thermal conductivity, reflectance and durability; optical recording media
05/18/2006US20060104850 has a seal function layer in a surface layer; formed by a nitrogen ion implantation; excellent in elasticity, sealing, peelability and abrasion resistance; use in pipe joints and seal valves; environmentally friendly
05/18/2006US20060103289 Mask frame assembly
05/18/2006US20060102466 Ion beam assisted sputtering deposition apparatus
05/18/2006US20060102465 Contacting of an electrode with a substance in vacuum
05/18/2006US20060102194 Method of descaling a mask
05/18/2006US20060102077 Vacuum treatment system
05/18/2006DE202005015618U1 Vaporization screen for use in high-vacuum apparatus is made as a one-piece plate free of hollow zones liable to allow dirt accumulation
05/18/2006DE10346368B4 Verfahren und Herstellungsanlage zum Herstellen eines schichtartigen Bauteils Processes and manufacturing plant for the production of a layer-like part
05/18/2006CA2586970A1 Vertical production of photovoltaic devices
05/18/2006CA2584566A1 Sputtering target for producing metallic glass membrane and manufacturing method thereof
05/17/2006EP1657782A1 Molded article located in the beam path of radar device, and method of manufacturing the same
05/17/2006EP1657323A1 Sliding member with excellent wear resistance in water-based environments
05/17/2006EP1656473A2 Metal nano-objects, formed on semiconductor surfaces, and methods for making said nano-objects
05/17/2006EP1656468A1 Carrier device for magnetizable substrate
05/17/2006EP1656467A2 Copper-containing pvd targets and methods for their manufacture
05/17/2006EP1656466A1 New metal strip product
05/17/2006EP1614199A4 Coated optics to improve durability
05/17/2006EP1193751B1 Electrode and method of manufacturing an electrode
05/17/2006EP0946965B1 Device and method for cathodic sputtering
05/17/2006EP0816466B1 Use of material having ultrahydrophilic and photocatalytic surface
05/17/2006CN2781609Y Strip fitting device for cavity surface of seminconductor laser
05/17/2006CN1772946A Method of producing ceramic spray-coated member, program for conducting the method, storage medium and ceramic spray-coated member
05/17/2006CN1772841A Luminescent ZnS:Zn, Pb film and its prepn
05/17/2006CN1772834A Paste composition with self orienting thermally-conductive characteristic and forming method
05/17/2006CN1256756C High dielectric coefficient gate dielectric material hafnium nitrogen aluminate film and preparing method thereof
05/17/2006CN1256752C Method for controlling electrostatic lens and ion implantation device
05/17/2006CN1256620C Method for forming pattern thin film electric conduction structure on base plate
05/17/2006CN1256461C Ag base alloy thin film and sputtering target for forming Ag base alloy film
05/16/2006US7045399 Electronic circuit
05/16/2006US7045208 Synthetic resin molded material and method for its production
05/16/2006US7045039 Depositing by electroplating electroplated layer on article, subjecting said article to pulse blow drying, removing liquid spots, depositing by physical vapor deposition at least one layer on electroplated article
05/11/2006WO2006049575A1 Coated product and method of production thereof
05/11/2006WO2006049328A1 Method and apparatus for generating plasma, and method and apparatus for low-pressure magnetron sputtering using such method and apparatus for generating plasma
05/11/2006WO2006049153A1 Fluorocarbon film and process for producing the same
05/11/2006WO2006049022A1 Ion beam sputtering equipment and method for forming multilayer film for reflective mask blank for euv lithography