Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
06/2006
06/07/2006CN1783533A Method for forming display device
06/07/2006CN1783431A Plasma processing apparatus
06/07/2006CN1783430A Capacitive coupling plasma processing apparatus
06/07/2006CN1783429A Plasma control method and plasma control apparatus
06/07/2006CN1782122A Tube-shaped sputtering target
06/07/2006CN1782121A Sputtering target, method for producing sputtering target, sputtering apparatus, and liquid-jet head
06/07/2006CN1782120A Evaporation source and steam plating device with evaporation source
06/07/2006CN1782119A Method of coating a component inside an apparatus
06/07/2006CN1258616C Sputter device and sputter film forming method
06/06/2006US7057244 Dielectric materials
06/06/2006US7056827 Methods of filling trenches using high-density plasma deposition (HDP)
06/06/2006US7056620 Thin film battery and method of manufacture
06/06/2006US7056602 Precipitation hardened wear resistant coating
06/06/2006US7056416 Atmospheric pressure plasma processing method and apparatus
06/06/2006US7056197 Dry surface treating apparatus and dry surface treating method using the same apparatus
06/06/2006CA2156301C Safety document and process for producing the same
06/01/2006WO2006057959A1 High resolution substrate holder leveling device and method
06/01/2006WO2006057829A2 Scratch resistant coated article and method of making
06/01/2006WO2006057618A2 Product coated with a composite max-material and method of its production
06/01/2006WO2006057353A1 Method for forming thin film, deposition source substrate and method for producing the same
06/01/2006WO2006057312A1 Wiring/electrode and sputtering target
06/01/2006WO2006057021A1 Dispensing system for alkali metals capable of releasing a high quantity of metals
06/01/2006WO2006024808A3 Method for transferring a functional organic molecule onto a transparent substrate
06/01/2006WO2006005217A3 Highly oxidation resistant hard coating for cutting tools
06/01/2006WO2006003322A3 Ion implanter operating in pulsed plasma mode
06/01/2006WO2005106072A3 Thermal vacuum deposition method and device
06/01/2006US20060115686 Magnetic recording medium and manufacturing method thereof
06/01/2006US20060115672 Method of manufacturing a laminated structure
06/01/2006US20060115243 Resistance-heated boat and manufacturing method thereof
06/01/2006US20060113916 Method of manufacturing a rotation-magnetron-in-magnetron (RMIM) electrode
06/01/2006US20060113182 Driving frequency modulation system and method for plasma accelerator
06/01/2006US20060112730 Core insert for a glass molding machine, and an apparatus for making the same
06/01/2006DE202006004791U1 Stromversorgungseinrichtung A power supply device
06/01/2006DE10316379B4 Verfahren zur Herstellung von Metall-Polymer-Nanokompositen A process for preparing metal-polymer nanocomposites
06/01/2006DE102004057956A1 Increasing the wear resistance of hard material layers, comprises irradiating the precipitated material in situ with an additional laser
06/01/2006DE102004054193A1 Hard coating on any, preferably flexible substrate, comprising at least two morphologically different layers useful in applications involving friction pairs has outer layer comprising hard layer of amorphous, diamond-like carbon (DLC)
05/2006
05/31/2006EP1662514A1 Process for producing oxide superconductive wire
05/31/2006EP1662197A2 Metal reflector and method of producing the same
05/31/2006EP1662019A1 Method of producing defect free deposited titanium alloys
05/31/2006EP1662018A2 Carbon containing sputter target alloy compositions
05/31/2006EP1662017A1 Apparatus for evaporation of materials
05/31/2006EP1661867A1 Article with photocatalytic film
05/31/2006EP1660848A1 Substrate comprising a fabry-perot filter and method for application of the filter to the substrate
05/31/2006EP1660696A2 Titanium foil metallization product and process
05/31/2006EP1660695A1 Method for depositing an amorphous layer primarily containing fluorine and carbon, and device suited for carrying out this method
05/31/2006EP1660694A2 Coated bore cutting tools
05/31/2006EP1660618A2 Lubricated part having partial hard coating allowing reduced amounts of antiwear additive
05/31/2006EP1660316A2 Silver alloys for optical data storages and optical media containing same
05/31/2006EP1322799A4 Surface treatment for improved hardness and corrosion resistance
05/31/2006CN1781036A Component comprising submicron hollow spaces
05/31/2006CN1780933A Method of manufacturing crystalline film, method of manufacturing crystalline-film-layered substrate, method of manufacturing thermoelectric conversion element, and thermoelectric conversion element
05/31/2006CN1780932A Contacting of an electrode with a substance in vacuum
05/31/2006CN1780931A Pre-plating surface treatments for enhanced galvanic-corrosion resistance
05/31/2006CN1780798A Method of making coated articles and coated articles made thereby.
05/31/2006CN1779938A Method and apparatus for controlling temperature of a substrate
05/31/2006CN1779925A Production of triple high K grid medium materials
05/31/2006CN1779923A Production of thin-film ferroelectric materials with lead zirconate-titanate with reading circuit integration
05/31/2006CN1779566A Mask for depositing thin film of flat panel display and method of fabricating the mask
05/31/2006CN1778990A Surface treatment for improving metal welding performance and work pieces therefrom
05/31/2006CN1778986A Methods and apparatus for sealing a chamber
05/31/2006CN1778985A Production of hafnium nitride thin-membrane materials from ion beam epitaxial growth apparatus
05/31/2006CN1778984A Production of zirconium nitride thin-membrane materials from ion beam epitaxial growth apparatus
05/31/2006CN1778983A Multi-layer nanometer film coater for reinforcing mould surface
05/31/2006CN1778731A Moulded glass mould core, its production and producer thereof
05/31/2006CN1258211C Hafnium silicide target for forming gate oxide film and method for preparation thereof
05/31/2006CN1258209C Conductive thin film for semiconductor device, semiconductor device and methods for producing them
05/31/2006CN1257998C Tantalum and niobium billets and methods of producing the same
05/31/2006CN1257997C Composite evaporation deposition coating production method, and composite evaporation deposition materials and method for producing same
05/31/2006CN1257996C Decorative article having white film and production method therefor
05/31/2006CN1257995C Method of depositing IO or ITO thin film on polymer substrate
05/31/2006CN1257861C Method for preparing titanium dioxide photo catalytic film by wet hot oxidation
05/30/2006US7053455 Semiconductor device and method of manufacturing semiconductor device
05/30/2006US7053019 Composition with high dielectric constant and low dielectric loss, which includes a quaternary metallic oxide having a pervoskite structure and represented by a general formula, Ba1-xM1xTi1-yM2yOm. It is suitable for Gbit memory devices,
05/30/2006US7053002 Plasma preclean with argon, helium, and hydrogen gases
05/30/2006US7052801 Anode thin film for lithium secondary battery and preparation method thereof
05/30/2006US7052736 Method for depositing coatings on the interior surfaces of tubular structures
05/30/2006US7052731 Plasma processing apparatus, protecting layer therefor and installation of protecting layer
05/30/2006US7052585 Overcoating glass substrate; sputtering titanium oxide; bombardment with carbon ion
05/30/2006US7052584 Method of forming a capacitor
05/30/2006US7052583 Magnetron cathode and magnetron sputtering apparatus comprising the same
05/30/2006US7052019 Piston ring and method of manufacturing the same
05/30/2006CA2227612C Electrically erasable, directly overwritable, multibit single cell memory elements and arrays fabricated therefrom
05/26/2006WO2006055375A1 Organic materials for an evaporation source
05/26/2006WO2006055323A2 Scratch resistant coated glass article including carbide layer(s) resistant to fluoride-based etchant(s)
05/26/2006WO2006054663A1 Substrate holding apparatus, substrate processing apparatus and liquid crystal display device
05/26/2006WO2006054409A1 Sputtering target, sputtering target backing plate assembly and film deposition system
05/26/2006WO2006053889A1 Method for preparing flexible mechanically compensated transparent layered material
05/26/2006WO2006053678A1 Device for machining workpieces in a vacuum
05/26/2006WO2005106066A3 Vaporizing device and method for vaporizing coating material
05/26/2006CA2585636A1 Method of forming coated article using sputtering target(s) and ion source(s) and corresponding apparatus
05/25/2006US20060111805 Fabrication system and fabrication method
05/25/2006US20060111802 Fabrication system and fabrication method
05/25/2006US20060110663 Mask for depositing thin film of flat panel display and method of fabricating the mask
05/25/2006US20060110629 Magnetic recording medium and manufacturing method thereof, magnetic storage apparatus, substrate and texture forming apparatus
05/25/2006US20060110626 Carbon containing sputter target alloy compositions
05/25/2006US20060110620 Process chamber component with layered coating and method
05/25/2006US20060110578 Photocatalytic film formed article
05/25/2006US20060108233 Method of manufacturing form factor disk
05/25/2006US20060108217 Cooled backing plate for a sputtering target, and sputtering target comprising a plurality of backing plates
05/24/2006EP1659575A1 Magnetic recording medium and manufacturing method thereof, magnetic storage apparatus, substrate and texture forming apparatus