C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2009
10/20/2009	US7604717 Nickel alloy target of carthodic sputtering device
10/20/2009	US7604716 Methods and apparatus for generating high-density plasma
10/20/2009	US7604708 Cleaning of native oxide with hydrogen-containing radicals
10/20/2009	US7604701 Method and apparatus for removing external components from a process chamber without compromising process vacuum
10/15/2009	WO2009125802A1 Evaporation source and film-forming device
10/15/2009	WO2009125497A1 Heat equalizer and organic film forming apparatus
10/15/2009	WO2009125496A1 Heat equalizer
10/15/2009	WO2009003755A3 Tool with multilayered metal oxide coating and method for producing the coated tool
10/15/2009	WO2008049392A3 Vapour-deposited coating and thermally stressable component having such a coating, and also a process and apparatus for producing such a coating
10/15/2009	US20090258238 Silicide formation utilizing ni-doped cobalt deposition source
10/15/2009	US20090258234 Housing and method for making the same
10/15/2009	US20090258178 Information recording medium, its manufacturing method, and sputtering target for forming information recording medium
10/15/2009	US20090258167 Film Deposition Method and Method for Manufacturing Light-Emitting Element
10/15/2009	US20090258166 Device and method for patterning structures on a substrate
10/15/2009	US20090258164 Carbon structure manufacturing device and manufacturing method
10/15/2009	US20090258163 Method for manufacturing nickel silicide nano-wires
10/15/2009	US20090257947 Method of manufacturing zinc aluminate nano-material
10/15/2009	US20090257151 Thin seeded Co/Ni multilayer film with perpendicular anisotropy for spintronic device applications
10/15/2009	US20090257056 Surface enhanced raman detection on metalized nanostructured polymer films
10/15/2009	US20090256175 Method of doping transistor comprising carbon nanotube, method of controlling position of doping ion, and transistors using the same
10/15/2009	US20090255808 Target for efficient use of precious deposition material
10/15/2009	US20090255807 Quantum dot manipulating method and quantum dot production/manipulation apparatus
10/15/2009	US20090255804 Piezoelectric film forming method
10/15/2009	US20090255803 Plasma generating apparatus, deposition apparatus, and deposition method
10/15/2009	US20090255802 Cluster generator
10/15/2009	US20090255471 Method of depositing materials on a non-planar surface
10/15/2009	US20090255469 Apparatus and methods for manufacturing thin-film solar cells
10/15/2009	US20090255467 Apparatus and methods for manufacturing thin-film solar cells
10/15/2009	DE102008018396A1 System for continuously vacuum-coating a band-shaped film, comprises vacuum chamber with a bottom side wall, covering wall, front wall, back wall, side walls and inner partition wall, stationary winding unit, and stationary coating roller
10/14/2009	EP2109142A1 Method for forming chalcogenide film and method for manufacturing recording element
10/14/2009	EP2108713A1 Substrate structure and method of forming the same
10/14/2009	EP2108195A1 Electronic field effect devices and methods for their manufacture
10/14/2009	EP2108053A1 Surface treating method for cutting tools
10/14/2009	EP2108052A1 Reactive magnetron sputtering for the large-scale deposition of chalcopyrite absorber layers for thin layer solar cells
10/14/2009	EP1670967B1 Extended life sputter target
10/14/2009	EP1579908B1 The combinatorial synthesis of novel materials
10/14/2009	CN201326013Y A modular solar selective film continuous coating equipment
10/14/2009	CN201326012Y A continuous winding-type magnetron sputtering vacuum plating equipment
10/14/2009	CN201326011Y Vacuum magnetic control coating chamber for coating glass
10/14/2009	CN201326010Y Sheltering device in vacuum magnetic control film coating cavity
10/14/2009	CN201326009Y Magnetic control film coating vacuum cavity for film coated glass
10/14/2009	CN201326008Y Magnetron sputtering device with uniform air intake
10/14/2009	CN201326007Y Rotary sputtering cathode device used for film coating
10/14/2009	CN101558185A Sensor fixing structure and vacuum film deposition apparatus
10/14/2009	CN101558184A 溅射靶及氧化物半导体膜 Sputtering target and the oxide semiconductor film
10/14/2009	CN101558183A Plasma immersed ion implantation process
10/14/2009	CN101557897A Surface film member, process for rpoducing the surface covering member, cutting tool, and machine tool
10/14/2009	CN101557896A Surface-coated tool and method of working cutting object
10/14/2009	CN101556986A Multi-state resistive switching material, thin film prepared therewith, multi-sate resistive switching memory element and application of memory element in memory device
10/14/2009	CN101556926A Method for forming titanium nitride layer on semiconductor substrate
10/14/2009	CN101556428A Process for manufacturing developing film with color pattern and product thereof
10/14/2009	CN101555597A Preparation method for preparing titanium oxide bioactive coating on the surface of nitinol alloy
10/14/2009	CN101555596A Vacuum plating process and complete equipment
10/14/2009	CN101555589A Continuous winding magnetron sputtering double-surface ceramics high barrier film device
10/14/2009	CN101555588A Low-temperature plasma system based on atmosphere pressure glow discharge
10/14/2009	CN101555587A Magnetron sputtering preparation method of MgZn1*O thin film of silicon substrate with AlO* buffer layer
10/14/2009	CN101555586A Method for preparing carbonitride modified film on surface of medical titanium alloy implant material
10/14/2009	CN101555585A 溅射靶 Sputtering target
10/14/2009	CN101555584A Preparation method for ternary composite lubricating film
10/14/2009	CN101555583A Method for controlling film orientation in vacuum evaporation film making process
10/14/2009	CN101555582A Coating method and fixed tool
10/14/2009	CN101554790A Ultra-hard carbon film and preparation method thereof
10/14/2009	CN101554543A Distributed exhaust device for exhausting gas of microfluid device and preparation method thereof
10/14/2009	CN100550489C Separator for fuel cell and method for manufacturing same
10/14/2009	CN100550469C Evaporating method, evaporating device and method for producing light-emitting device
10/14/2009	CN100550460C Integrated circuit device and fabrication using metal-doped chalcogenide materials
10/14/2009	CN100550338C Polluting device for anti-slipping sheet
10/14/2009	CN100550283C Apparatus for manufacturing flat-panel display
10/14/2009	CN100550274C Control of plasma transitions in sputter processing systems
10/14/2009	CN100549471C Piston ring and method for producing the same
10/14/2009	CN100549235C Method for reinforcing-depositing composite modified titanium alloy surface using electric spark with ion beam
10/14/2009	CN100549223C Cleaning of chamber components
10/14/2009	CN100549220C Magnetron sputtering device
10/14/2009	CN100549219C Gallium oxide-zinc oxide sputtering target, method for forming transparent conductive film, and transparent conductive film
10/14/2009	CN100549218C Vaporizing temperature sensitive materials
10/14/2009	CN100549217C Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
10/14/2009	CN100549216C Process for producing vitrification SiO2-Al2O3 mix oxide evaporation material
10/14/2009	CN100549215C Calibration device for vacuum evaporation plating
10/14/2009	CN100549202C Molybdenum sputtering targets
10/13/2009	US7603194 Fabrication system and fabrication method
10/13/2009	US7602111 Plasma accelerating apparatus and plasma processing system including secondary electron amplification coating layer formed at inner wall of channel
10/13/2009	US7601661 Indium oxide-tin oxide powder and sputtering target using the same
10/13/2009	US7601468 Providing a target containing a metal and silicon, and carrying out reactive sputtering in an atmosphere containing a reactive gas ( nitrogen, oxygen, fluorine) to form half-tone film on said transparent substrate
10/13/2009	US7601405 DLC coating system and process and apparatus for making coating system
10/13/2009	US7601393 Method that allows one part of an atomic layer deposition (ALD) process sequence to occur at a first temperature while allowing another part of the ALD process sequence to occur at a second temperature; can switch between these two thermal states in rapid succession
10/13/2009	US7601296 Powder metallurgy sputtering targets and methods of producing same
10/13/2009	US7601246 Methods of sputtering a protective coating on a semiconductor substrate
10/13/2009	US7601240 Disturbance-free, recipe-controlled plasma processing system and method
10/13/2009	US7601224 Method of supporting a substrate in a gas cushion susceptor system
10/13/2009	CA2473958C High wear resistant hard film
10/08/2009	WO2009123459A1 Method for treating a metal oxide layer
10/08/2009	WO2009123055A1 Low particulate-generating sputtering target
10/08/2009	WO2009122964A1 Ion implanter, ion implantation method and program
10/08/2009	WO2009122938A1 Substrate for thin film solar cell, manufacturing method thereof, and thin film solar cell using thereof
10/08/2009	WO2009122846A1 Target exchange type plasma generator
10/08/2009	WO2009122809A1 Manufacturing equipment for radiographic image conversion panel and manufacturing method for radiographic image conversion panel
10/08/2009	WO2009122378A1 Apparatus for sputtering and a method of fabricating a metallization structure
10/08/2009	WO2009122233A1 Droplet-free coating systems manufactured by arc-evaporation method
10/08/2009	WO2009121700A1 Evaporator body
10/08/2009	WO2009121685A1 Method for depositing of barrier layers on a plastic substrate as well as coating device therefor and a layer system

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