Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2009
10/08/2009WO2009103034A3 System, method and apparatus for an amorphous iridium oxide film ph sensor
10/08/2009US20090252973 Coated body
10/08/2009US20090252895 Actinic ray curable composition, actinic ray curable ink and image formation method employing the ink
10/08/2009US20090252889 Nanopin manufacturing method and nanometer sized tip array by utilizing the method
10/08/2009US20090252888 Fine Particle-containing Body, Fine Particle-containing Body Manufacturing Method, Storage Element, Semiconductor Device and Electronic Equipment
10/08/2009US20090252887 System and method for growing nanotubes with a specified isotope composition via ion implantation using a catalytic transmembrane
10/08/2009US20090252886 System and method for nanotube growth via ion implantation using a catalytic transmembrane
10/08/2009US20090252862 Method for producing optical element having multi-layered film
10/08/2009US20090252591 In-line apparatus
10/08/2009US20090251758 Glass type electrochemical/ electrically controllable device with variable optical and/or energetic characteristic
10/08/2009US20090250669 Gallium Oxide/Zinc Oxide Sputtering Target, Method of Forming Transparent Conductive Film and Transparent Conductive Film
10/08/2009US20090250668 Amorphous transparent conductive film, target and production method for amorphous conductive film
10/08/2009US20090250341 Anode for sputter coating
10/08/2009US20090250340 Ion source and plasma processing apparatus
10/08/2009US20090250339 Information recording medium and method for producing the same
10/08/2009US20090250338 Diamondlike carbon hard multilayer film formed body and method for producing the same
10/08/2009US20090250337 Tubular target having a connecting layer arranged between the target tube and the carrier tube
10/08/2009US20090250000 Vacuum processing apparatus
10/08/2009DE112007002881T5 Verfahren zur Herstellung einer Dünnschicht und durch das Verfahren hergestellte hexagonale piezoelektrische Dünnschicht A process for producing a thin film and thin-film piezoelectric hexagonal produced by the process
10/08/2009DE10297560B4 Vorrichtung zur Ausbildung eines Films und Verfahren zum Herstellen eines optischen Elements An apparatus for forming a film and method for manufacturing an optical element
10/08/2009DE102009014067A1 Plasmabearbeitungsvorrichtung The plasma processing apparatus
10/08/2009DE102008017492A1 Method for transporting band-shaped substrate through treatment regions of a vacuum coating plant, comprises moving the substrate through a treatment region and air-lock region lying before or behind the treatment region
10/08/2009DE102006040576B4 Verfahren zur Herstellung eines Dünnschicht-Thermogenerators A method for producing a thin-film thermal generator
10/08/2009CA2769596A1 Method for depositing of barrier layers on a plastic substrate as well as coating device therefor and a layer system
10/07/2009EP2107593A2 Apparatus for depositing silicon-based thin film and method for depositing silicon-based thin film
10/07/2009EP2107134A1 Hard coating film, method of formation thereof, and material coated with hard coating film
10/07/2009EP2107133A1 Method for treating a metal oxide layer
10/07/2009EP2107132A1 Winding vacuum film forming process and apparatus
10/07/2009EP2106458A1 Coating installation comprising a radio device and method for controlling an actuator or a heater
10/07/2009EP2106457A1 Method for the production of a directional layer by means of cathode sputtering, and a device for carrying out the method
10/07/2009EP2084752A9 Substrate provided with transparent conductive film for photoelectric conversion device, method for manufacturing the substrate, and photoelectric conversion device using the substrate
10/07/2009EP1874977B8 Process and device for coating substrates
10/07/2009EP1673488B1 Modular device for surface coating
10/07/2009EP1433207B8 A process for large-scale production of cdte/cds thin film solar cells
10/07/2009EP1359236B1 Sputter film forming method
10/07/2009CN201321489Y Vertical sputtering equipment with semicircular door panel
10/07/2009CN201321488Y Baffle of vacuum film plating machine capable of adjusting sedimentation rate
10/07/2009CN101553753A Liquid crystal optical device manufacturing process
10/07/2009CN101553594A Magnet assembly capable of generating magnetic field whose direction is uniform and changeable and sputtering device using same
10/07/2009CN101553593A Method and device for coating substrates
10/07/2009CN101552048A Transparent yttrium-doped zinc oxide (ZnO:Y) electroconductive film and preparation method thereof.
10/07/2009CN101551569A Nonlinear optical material based on metal nanometer cluster array and preparation method thereof
10/07/2009CN101551541A Substrate for display and manufacturing method thereof and display device
10/07/2009CN101550543A Heat treating method for pulse laser settled hydroxylapatite-bioglass composite film
10/07/2009CN101550542A Multifunctional magnetron sputtering continuous film plating machine
10/07/2009CN101550541A Linear ion beam source apparatus and method for depositing diamond like carbon (DLC) film by the apparatus
10/07/2009CN101550540A Method and device for vertical production of double-sided plasma surface metallurgic sheet metal
10/07/2009CN101550539A Method for depositing protection film on the ceramics valve core surface
10/07/2009CN101550538A Magnetron sputtering target used for ultra high vacuum and process for preparing magnet in the target
10/07/2009CN101550537A P-shaped cooper tin oxide film and preparation method thereof
10/07/2009CN101550536A High-purity nickel target for magnetron sputtering
10/07/2009CN101550535A Method for preparing compound metal sulfide diamond composite membrane
10/07/2009CN101550534A Method for increasing HfO* film heat endurance and controlling silicon bulk interface growth
10/07/2009CN101550533A Antistatic optical substrate preparation method
10/07/2009CN101550532A Heating device used for vacuum plating equipment
10/07/2009CN101550531A Method for preparing silicon nano structures
10/07/2009CN101550530A Prepare iron doped carbon membrane material with white light photoconductive effect by pulse laser deposition method
10/07/2009CN101550529A A workpiece provided with aluminum and chromium hard material layer and a preparation method thereof
10/07/2009CN101550528A Preparing method of plating patterns without prejudice to the line-of-sight on optical substrate
10/07/2009CN101550025A Lead zirconate-based antiferroelectric film with high-effective electrostrain characteristic and preparing method
10/07/2009CN101549172A Hydroxylapatite-bioglass film and preparation technology thereof
10/07/2009CN100547696C Transparent conductive film, sintered target for production of transparent conductive film, transparent conductive base material and display device utilizing the same
10/07/2009CN100547108C Method for controlling crystal granularity of FeS2 film
10/06/2009US7598204 Metallic reagent
10/06/2009US7598177 Methods of filling trenches using high-density plasma deposition (HDP)
10/06/2009US7598004 Film-depositing target and preparation of phase shift mask blank
10/06/2009US7597971 Cerium/zirconium oxide based; improved shock resistance
10/01/2009WO2009120340A1 Improved junctions in substrate solar cells
10/01/2009WO2009119812A1 Sputtering target of nonmagnetic-in-ferromagnetic dispersion type material
10/01/2009WO2009119804A1 Thin film interconnect for electronic component, and sputtering target material for formation of thin film interconnect
10/01/2009WO2009119682A1 Cutting tool
10/01/2009WO2009119660A1 Method for cutting cu-ga alloy
10/01/2009WO2009119655A1 Plasma generating apparatus and plasma processing apparatus
10/01/2009WO2009119365A1 Film deposition apparatus and method of film deposition
10/01/2009WO2009119343A1 Apparatus for treating surface and method of treating surface
10/01/2009WO2009119273A1 Conductor and manufacturing method therefor
10/01/2009WO2009119269A1 Process for producing surface covered component having excellent film adhesion
10/01/2009WO2009119196A1 Platinum powder for magnetic material target, method for producing the powder, method for producing magnetic material target composed of platinum sintered compact, and the sintered magnetic material target
10/01/2009WO2009119159A1 Substrate for optical device and method for manufacturing the substrate
10/01/2009WO2009118888A1 Vacuum treatment device, method for manufacturing image display device using the vacuum treatment device, and electronic device manufactured by use of vacuum treatment device
10/01/2009WO2009118514A1 Method of depositing an amorphus aluminium oxynitride layer by reactive sputtering of an aluminium target in a nitrogen / oxygen atmosphere
10/01/2009WO2009118466A1 Method for coating a metal strip and equipment for implementing said method
10/01/2009WO2009118034A1 Method for producing a multicomponent, polymer- and metal-containing layer system, device and coated article
10/01/2009WO2009117983A1 Method and device for fixing and transporting impact-sensitive sheets in sputter feed systems
10/01/2009WO2009086023A3 Methods for cleaning process kits and chambers, and for ruthenium recovery
10/01/2009US20090246962 Substrate processing method
10/01/2009US20090246941 Deposition apparatus, deposition system and deposition method
10/01/2009US20090246905 Electro-optic integrated circuits and methods for the production thereof
10/01/2009US20090246558 Information recording medium and method for manufacturing the same
10/01/2009US20090246553 Reflective film and method for manufacturing the same
10/01/2009US20090246530 Method For Fabricating Thin Films
10/01/2009US20090246515 Neuroelectrode Coating and Associated Methods
10/01/2009US20090246474 Electronic component mounted structure and method of manufacturing the same
10/01/2009US20090246463 Electrode for discharge surface treatment, discharge surface treatment method, film, and film forming method
10/01/2009US20090246413 Method for fabricating thin films
10/01/2009US20090246410 Manufacturing process of electrodes for electrolysis
10/01/2009US20090246402 Layer forming method and layer forming apparatus, and method of manufacturing radiation detector
10/01/2009US20090246400 Ion flux is directed to a carbon nanotube to permanently shape, straighten and/or bend the carbon nanotube into a desired configuration; use as a probe in an atomic force microscope; Ion Flux Molding
10/01/2009US20090246385 Control of crystal orientation and stress in sputter deposited thin films
10/01/2009US20090246370 Coating an atomically mixed thin film of a color-causing reagent and a toner on the surface of colorless gemstones or transparent crystals; heat treatment to produce colors of chemically-bonded coating shades on the crystals; radiation-free, environmentally friendly; decoration; jewelry; gemstones