Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2009
11/18/2009CN100560785C Sputtering target material
11/18/2009CN100560784C System and method of detecting life of consumed material thick plate used for processing machine
11/18/2009CN100560783C Method of manufacturing permalloy iron core film
11/18/2009CN100560782C Novel mask system of organic electroluminescent device and method for manufacturing the same
11/18/2009CN100560780C Electrically exploding and electromagnetically accelerated superhigh speed spraying process
11/18/2009CN100560362C Molybdenum base nitride composite hard thin film and preparation thereof
11/17/2009US7618769 Textured chamber surface
11/17/2009US7618521 Split magnet ring on a magnetron sputter chamber
11/17/2009US7618520 Physical vapor deposition target constructions
11/17/2009US7618505 Target of high-purity nickel or nickel alloy and its producing method
11/17/2009US7618494 Substrate holding structure and substrate processing device
11/17/2009US7618131 Structure of piezoelectric element and liquid discharge recording head, and method of manufacture therefor
11/17/2009CA2377828C An improved antiglare optical device
11/12/2009WO2009137513A2 Microwave rotatable sputtering deposition
11/12/2009WO2009136670A1 Heater for vacuum thermal deposition
11/12/2009WO2009117262A3 Method and system for depositing silicon carbide film using a gas cluster ion beam
11/12/2009WO2009117229A3 Coaxial microwave assisted deposition and etch systems
11/12/2009US20090280600 Amorphous oxide and thin film transistor
11/12/2009US20090280266 Barrier film and laminated material, container for wrapping and image display medium using the same, and manufacturing method for barrier film
11/12/2009US20090280235 Tools and methods for processing microelectronic workpieces using process chamber designs that easily transition between open and closed modes of operation
11/12/2009US20090280025 High-Purity Ru Alloy Target, Process for Producing the Same, and Sputtered Film
11/12/2009US20090279227 Multi Layer Chip Capacitor, and Method and Apparatus for Manufacturing the Same
11/12/2009US20090279179 Deposition donor substrate and deposition method using the same
11/12/2009US20090279173 Apparatus and methods for providing a static interferometric display device
11/12/2009US20090278320 Piston ring with chromium nitride coating for internal combustion engines
11/12/2009US20090278211 Composite dielectric thin film, capacitor and field effect transistor using the same, and each fabrication method thereof
11/12/2009US20090277873 Dry etching method
11/12/2009US20090277788 Sputtering Target/Backing Plate Bonded Body
11/12/2009US20090277787 Rotatable sputter target comprising an end-block with a liquid coolant supply system
11/12/2009US20090277782 Silicon Oxynitride Coating Compositions
11/12/2009US20090277781 Magnetron sputtering apparatus and method for manufacturing thin film
11/12/2009US20090277780 Sputtering device
11/12/2009US20090277779 Magnetic field generating apparatus, magnetic field generating method, sputtering apparatus, and method of manufacturing device
11/12/2009US20090277778 Microwave rotatable sputtering deposition
11/12/2009US20090277777 Cold-pressed sputter targets
11/12/2009US20090277490 Thermoelectric module device with thin film elements and fabrication thereof
11/12/2009US20090277390 Source, an Arrangement for Installing a Source, and a Method for Installing and Removing a Source
11/12/2009DE10312641B4 Verfahren und Vorrichtung zum Herstellen einer OLED-Anzeige Method and apparatus for manufacturing an OLED display
11/12/2009DE102008039211A1 Rohrtarget mit Endblock zur Kühlmittelversorgung Tube target with end block to the coolant supply
11/12/2009DE102008023025A1 Crucible arrangement for thermal coating process, comprises a ceramic crucible and a crucible box surrounding an external side of the crucible, where a covering element is arranged between the crucible and the crucible box
11/11/2009EP2116631A1 Sputter target
11/11/2009EP2116630A1 Arc evaporation source
11/11/2009EP2116629A1 Deposition source, deposition apparatus and method for forming organic thin film
11/11/2009EP2116628A1 Hard coating film and target for formation thereof
11/11/2009EP2115185A1 Conductive laminated body and method for preparing the same
11/11/2009EP2115183A2 Apparatus for gas handling in vacuum processes
11/11/2009EP2115182A1 Bright coatings for aluminium or steel motor vehicle wheels and their production
11/11/2009EP2115181A2 Method for assembling at least two plates and use of said method for making an ionic sputtering assembly
11/11/2009EP1620047B1 Metallic implantable grafts and method of making same
11/11/2009CN201345096Y Patterned transparent conducting film for transparent substrate and touch panel
11/11/2009CN201345094Y Improved circuit for transparent current-conducting plate
11/11/2009CN201344668Y Selective solar photo-thermal absorbing composite coat
11/11/2009CN201344667Y Selective solar photo-thermal absorbing coat
11/11/2009CN201343569Y Continuous plane magnetron sputtering filming device
11/11/2009CN201343498Y Substrate holder preventing thermal deformation of cross rod
11/11/2009CN201343497Y Adjustable glass substrate frame
11/11/2009CN201343496Y Glass substrate clip part
11/11/2009CN101578728A Alloy coating film for metal separator of fuel cell, method for producing the same, sputtering target material, metal separator and fuel cell
11/11/2009CN101578715A III nitride compound semiconductor element and method for manufacturing the same, III nitride compound semiconductor light emitting element and method for manufacturing the same, and lamp
11/11/2009CN101578396A Multilayered coated cutting tool
11/11/2009CN101578394A Plated material having metal thin film formed by electroless plating, and method for production thereof
11/11/2009CN101578393A Plated material having metal thin film formed by electroless plating, and method for production thereof
11/11/2009CN101578389A Highly corrosion-resistant members and processes for production thereof
11/11/2009CN101578387A Sputtering target
11/11/2009CN101578386A Method and apparatus for converting precursor layers into photovoltaic absorbers
11/11/2009CN101578245A ITO sintered body and ITO sputtering target
11/11/2009CN101576793A Capacitance touch screen and preparation method thereof
11/11/2009CN101575699A Film plating bracket
11/11/2009CN101575698A Magnetron sputtering apparatus and method for manufacturing thin film
11/11/2009CN101575697A ZnO-based transparent conductive film co-doped with Al-F and preparation method thereof
11/11/2009CN101575696A Preparation method of chromium-aluminum-nitrogen film by closed field unbalanced magnetron sputtering
11/11/2009CN101575695A Laser coating device and method based on transparent material
11/11/2009CN101575207A Ge-doped AZO target and preparation method thereof
11/11/2009CN101575203A Preparation method of ITO sputtering target material
11/11/2009CN101574654A Method for preparing supported nanometer gold catalyst by laser deposition
11/11/2009CN100558939C Low temperature preparation method for alcohol heat assistant ferro-electricity film
11/11/2009CN100558938C Method for processing three-dimensional metal bead
11/11/2009CN100558931C Ion implantation method and ion implantation device
11/11/2009CN100558930C Sputtering target, optical information recording medium and process for producing the same
11/11/2009CN100558929C Evaporator, vapor deposition apparatus, and method of switching evaporator in vapor deposition apparatus
11/11/2009CN100558928C Hard film and method for preparing the same
11/11/2009CN100558552C Hard film and hard film-coated material
11/10/2009US7615287 Thermoplastics; formed via solution of alkali metal ions, alkaline earth metal ions, and ammonium ions and originating from low-molecular-weight electrolyte; wrapping
11/05/2009WO2009135114A2 Transparent conductive materials including cadmium stannate
11/05/2009WO2009134810A2 Vanadium oxide thin films
11/05/2009WO2009134211A1 Inorganic graded barrier film and methods for their manufacture
11/05/2009WO2009134041A2 Evaporator and vacuum deposition apparatus having the same
11/05/2009WO2009133921A1 Sputtering target material for producing intermediate layer film of perpendicular magnetic recording medium and thin film produced by using the same
11/05/2009WO2009133841A1 METHOD FOR PRODUCTION OF WATER-REACTIVE Al FILM, AND STRUCTURAL MEMBER FOR FILM-FORMING CHAMBER
11/05/2009WO2009133840A1 WATER-REACTIVE Al COMPOSITE MATERIAL, WATER-REACTIVE Al FILM, METHOD FOR PRODUCTION OF THE AL FILM, AND STRUCTURAL MEMBER FOR FILM-FORMING CHAMBER
11/05/2009WO2009133839A1 Water-reactive al composite material, water-reactive al film, method for production of the al film, and structural member for film-forming chamber
11/05/2009WO2009133838A1 WATER-REACTIVE Al COMPOSITE MATERIAL, WATER-REACTIVE Al FILM, PROCESS FOR PRODUCTION OF THE Al FILM, AND CONSTITUENT MEMBER FOR FILM DEPOSTION CHAMBER
11/05/2009WO2009133837A1 WATER-REACTIVE Al COMPOSITE MATERIAL, WATER-REACTIVE Al FILM, PROCESS FOR PRODUCTION OF THE Al FILM, AND CONSTITUENT MEMBER FOR FILM DEPOSITION CHAMBER
11/05/2009WO2009133836A1 PROCESS FOR PRODUCTION OF WATER-REACTIVE Al FILM AND CONSTITUENT MEMBERS FOR FILM DEPOSITION CHAMBERS
11/05/2009WO2009133814A1 Surface coated cutting tool
11/05/2009WO2009133500A1 Method of forming a nanocluster-comprising dielectric layer and device comprising such a layer
11/05/2009WO2009133076A2 Sputter target, method for manufacturing a layer, particularly a tco (transparent conductive oxide) layer, and method for manufacturing a thin layer solar cell
11/05/2009WO2009132822A2 Device and method for pretreating and coating bodies
11/05/2009WO2009132769A1 Evaporation system
11/05/2009WO2009112780A3 Textured substrate including a stack with thermal properties