Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
09/2011
09/14/2011CN102181828A Method for preparing ZnFe2O4 ferrite film
09/14/2011CN102181827A Method for preparing nano vanadium dioxide film with phase change property on metal substrate
09/14/2011CN102181826A Gallium-molybdenum-codoped indium tin oxide ceramic target, gallium-molybdenum-codoped indium tin oxide transparent conductive film and preparation method
09/14/2011CN102181825A Seed layer-assisted high performance TiO2-based transparent conductive film and preparation method thereof
09/14/2011CN102181824A Process and structure of patterned substrate and light emitting diode chip
09/14/2011CN102180131A Environmental-friendly vehicle logo manufacturing method
09/14/2011CN102179970A Heat conducting material, preparation process thereof and LED (light-emitting diode) circuit board using heat conducting material
09/14/2011CN102178426A Nano silver antibacterial vacuum cup and processing technology thereof
09/14/2011CN101764042B Air sucking device and semiconductor processing device
09/14/2011CN101675183B Multilayer nitride-containing coatings
09/14/2011CN101661861B Hollow anode ion source used for ultra high vacuum system
09/14/2011CN101603171B Chamber system of equipment for preparing transparent conductive film and process thereof
09/14/2011CN101538698B Method and apparatus for fabricating vertical deposition mask
09/14/2011CN101513672B Molding die
09/14/2011CN101501813B Process and apparatus for the modification of surfaces
09/14/2011CN101501240B Oxide target containing gadolinium oxide
09/14/2011CN101444985B Amorphous carbon coating and preparation method and application thereof
09/14/2011CN101333645B Process for preparing copper-indium-selenium sputtering target
09/14/2011CN101319387B Preparation method of high-temperature superconductor nano-structured array
09/14/2011CN101184864B Sputtering apparatus
09/13/2011US8017922 Ion implantation method and apparatus
09/13/2011US8017269 Anode active material, method of preparing the same, and anode and lithium battery containing the anode active material
09/13/2011US8017197 Plasma processing method and plasma processing apparatus
09/13/2011US8017195 Method for vibrational damping of gas turbine engine airfoils
09/13/2011US8016985 Magnetron sputtering apparatus and method for manufacturing semiconductor device
09/13/2011US8016982 Sputtering apparatus and sputtering method
09/09/2011WO2011108694A1 Processed high-purity copper material having uniform and fine crystalline structure, and process for production thereof
09/09/2011WO2011108609A1 Layered product and process for producing same
09/09/2011WO2011108552A1 Laminate, method for producing same, and functional element using same
09/09/2011WO2011108536A1 Aluminum oxide-zinc oxide sputtering target
09/09/2011WO2011108535A1 Gallium oxide-zinc oxide sputtering target
09/09/2011WO2011108489A1 Sputtering device
09/09/2011WO2011108438A1 Functional laminated sheet, and transparent electrically conductive laminated sheet for touch panel and touch panel produced using same
09/09/2011WO2011107701A1 Photovoltaic cell having a novel tco layer built therein
09/09/2011WO2011107373A1 Device and method for substrate processing
09/09/2011WO2011107035A1 Method for preparing copper-indium-gallium-selenium film for solar cell photo-absorption layer by magnetron sputtering process
09/09/2011WO2011056581A3 Rotary magnetron magnet bar and apparatus containing the same for high target utilization
09/08/2011US20110217802 Fabrication System and Manufacturing Method of Light Emitting Device
09/08/2011US20110217467 Vacuum processing apparatus and vacuum processing method
09/08/2011US20110216643 Recording layer for optical information recording medium, optical information recording medium, and sputtering target
09/08/2011US20110215679 Piezoelectric film, piezoelectric device, liquid ejection apparatus, and method of producing piezoelectric film
09/08/2011US20110215072 Plasma apparatus having a controller for controlling a plasma chamber and methods for controlling the plasma apparatus
09/08/2011US20110214987 Method of making a sputter target and sputter targets made thereby
09/08/2011DE102010030126A1 Evaporator useful in a coating device for coating substrates, comprises a primary evaporator for receiving and evaporating a coating material, and a vapor distributor having steam vents, connected to the primary evaporator
09/07/2011EP2363510A1 Surface coatings for medical implants
09/07/2011EP2363509A1 Synthesis of metal oxides by reactive cathodic arc evaporation
09/07/2011EP2043781B1 Arrangement comprising nanoparticles, and method for the production thereof
09/07/2011CN201962349U 高界面强度类金刚石薄膜材料的常温沉积设备 High interfacial strength at room temperature deposition equipment DLC thin films
09/07/2011CN201962348U 手机外壳横插式挂具 Mobile phone shell cross-linked to a plug-in
09/07/2011CN201962347U 长寿命溅射靶材组件 Sputtering targets long-life components
09/07/2011CN201962346U 真空溅镀的防着板结构 Vacuum sputtering anti-structure of the board
09/07/2011CN201962345U 真空镀铝防溅铝装置 Vacuum aluminum splash aluminum device
09/07/2011CN201962344U 一种emi镀膜机自动装卸治具 One kind emi coater automatic handling fixtures
09/07/2011CN1926259B Reactive metal sources and deposition method for thioaluminate phosphors
09/07/2011CN102177273A Sputtering target for forming wiring film of flat panel display
09/07/2011CN102177272A Evaporator
09/07/2011CN102177271A Evaporation material and method for producing evaporation material
09/07/2011CN102177270A Organic thin film deposition device, organic EL element manufacturing device, and organic thin film deposition method
09/07/2011CN102177015A Metal foil with electric resistance film and method for manufacturing the metal foil
09/07/2011CN102176494A Preparation method of hydrogenated IMO (molybdenum dopted indium oxide) thin film or IWO (wolfram dopted indium oxide) transparent conductive thin film
09/07/2011CN102176471A Textured structural ZnO:B (BZO)/ZnO:Ga/H (HGZO) composite thin film and application
09/07/2011CN102176169A Electric eye tracking device of EMI (electron-magnetic interference) film plating machine
09/07/2011CN102175619A Multi-layer composite sensitive film optical fiber hydrogen sensing probe and manufacturing method thereof
09/07/2011CN102175363A Pressure strain device manufactured by sputtering silicon film with ion beams and method thereof
09/07/2011CN102174689A FZO/metal/FZO transparent conductive film and preparation method thereof
09/07/2011CN102174688A Mask and container and manufacturing apparatus
09/07/2011CN102173274A Application process for non-conducting decorative membranes
09/07/2011CN101775588B Rectangular target with high target utilization ratio
09/07/2011CN101752023B Nanocable production method taking alumina as wrapping layer
09/07/2011CN101622371B Method for coating a substrate, equipment for implementing said method and metal supply device for such equipment
09/07/2011CN101569898B Manufacture method of target material
09/07/2011CN101558185B Sensor fixing structure and vacuum film deposition apparatus
09/07/2011CN101557897B Surface film member, process for rpoducing the surface covering member, cutting tool, and machine tool
09/06/2011US8012610 Visible-light-responsive photoactive coating, coated article, and method of making same
09/06/2011US8012532 Methods of making crystalline tantalum pentoxide
09/06/2011US8012430 Methods for producing microchannel chips, microchannel chips, methods for separating biomolecules using the microchannel chips, and electrophoretic apparatus having the microchannel chips
09/06/2011US8012317 Conformal transparent conductive coating single or multi-layered; sputter-deposited on a textured surface of a patterned glass substrate; increase light absorption by active semiconductor, light intensity through the front glass substrate, front electrode, light path in photovoltaic conversion layer
09/06/2011US8012316 FCC-like trilayer AP2 structure for CPP GMR EM improvement
09/06/2011US8012315 Co-sputtering in vacuum enclosure from two separate targets; forming lanthium aluminum oxide and aluminum oxide; improved dielectrics; miniaturized semiconductor transistors
09/06/2011US8012314 Manufacturing method and apparatus of phase shift mask blank
09/06/2011US8012260 Apparatus and method for coating an areal substrate
09/06/2011US8011315 Thin film forming apparatus
09/06/2011CA2667411C Belt discharger
09/01/2011WO2011106624A1 Hot wire chemical vapor deposition (hwcvd) with carbide filaments
09/01/2011WO2011106304A1 Chromium -free passivation process of vapor deposited aluminum surfaces
09/01/2011WO2011106235A2 Methods and apparatus for deposition processes
09/01/2011WO2011105957A1 Plasma sputtering process for producing particles
09/01/2011WO2011105583A1 Sputtering target composed of aluminum-base alloy
09/01/2011WO2011105280A1 Magnetic circuit and magnetron sputtering apparatus
09/01/2011WO2011105183A1 Method for manufacturing semiconductor element and deposition apparatus
09/01/2011WO2011105047A1 In-Ga-Sn OXIDE SINTER, TARGET, OXIDE SEMICONDUCTOR FILM, AND SEMICONDUCTOR ELEMENT
09/01/2011WO2011104384A1 Surface coatings for medical implants
09/01/2011WO2011104235A1 Devices and method for precipitating a layer on a substrate
09/01/2011WO2011104232A1 Method and device for rapidly heating and cooling a substrate and immediately subsequently coating the same under vacuum
09/01/2011WO2011104145A1 A method and system for the controlled dispensing of mercury and devices manufactured through this method
09/01/2011WO2011103955A1 Synthesis of metal oxides by reactive cathodic arc evaporation
09/01/2011WO2011103693A1 Target shaping
09/01/2011US20110212605 Method for manufacturing semiconductor element and deposition apparatus
09/01/2011US20110212347 Patterned-media perpendicular magnetic recording disk with servo regions having magnetized servo pillars and oppositely-magnetized servo trenches
09/01/2011US20110212336 Electroconductive laminate and protective plate for plasma display