C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2011
10/19/2011	CN102224276A Sputtering target and process for producing same
10/19/2011	CN102224275A Deposition head and film forming apparatus
10/19/2011	CN102224274A Process for the preparation of organic electronic devices
10/19/2011	CN102224273A Wear protection layer and method for the manufacture thereof
10/19/2011	CN102223956A Cleaning method for coating systems
10/19/2011	CN102222727A Method for etching alkaline solution of textured ZnO base film
10/19/2011	CN102221949A Capacitance touch screen and manufacture method thereof
10/19/2011	CN102220691A Method for manufacturing colored conductive fabrics
10/19/2011	CN102220614A Preparation method for coiled omnibearing electroconductive sponge
10/19/2011	CN102220581A Weatherproof surface treatment combinational optimization technology for power transmission type slip ring of high-power wind driven generator
10/19/2011	CN102220564A Film coating support and film coating device
10/19/2011	CN102220563A Partial pressure control large-area magnetron sputtering coating system and method thereof
10/19/2011	CN102220562A Preparation method of zinc oxide transparent conductive film with sueded structure
10/19/2011	CN102220561A Ring cathode for use in a magnetron sputtering device
10/19/2011	CN102220560A Preparation method of LaNi5 film and application thereof
10/19/2011	CN102220559A Production method and production device of flat solar-energy heat-absorbing film-coated plate
10/19/2011	CN102220558A Method for plating the surface of iron and stainless steel with titanium film
10/19/2011	CN102220557A Coating bracket and coating machine
10/19/2011	CN102220556A Bearing fixture and bearing device
10/19/2011	CN102220555A Coating device
10/19/2011	CN102220130A Luminescent film, preparation method and application thereof
10/19/2011	CN102218533A Silver-coated nickel alloy powder
10/19/2011	CN102218393A Method for coating double-layer composite film on surface of metal by adopting fully drying method
10/19/2011	CN101831613B Method for growing nonpolar InN film by utilizing nonpolar ZnO buffer layer
10/19/2011	CN101509121B Hard films, multilayer hard films, and production methods thereof
10/19/2011	CN101321892B Member for cavitation erosion resistance and method for manufacturing same
10/19/2011	CN101313080B Layered system comprising a gadolinium mixed crystal pyrochlore phase
10/18/2011	US8039133 Magnetic recording medium and method for manufacturing the same
10/18/2011	US8039108 Member for cavitation erosion resistance and method for manufacturing same
10/18/2011	US8039096 Friction- and wear-reducing coating
10/18/2011	US8038858 Coaxial plasma arc vapor deposition apparatus and method
10/18/2011	US8038857 Thin film transistor, thin film transistor substrate, processes for producing the same, liquid crystal display using the same, and related devices and processes; and sputtering target, transparent electroconductive film formed by use of this, transparent electrode, and related devices and processes
10/18/2011	US8038850 Sputter deposition method for forming integrated circuit
10/18/2011	US8038835 Processing device, electrode, electrode plate, and processing method
10/18/2011	US8038833 Plasma processing apparatus
10/18/2011	US8038797 Apparatus and method for manufacturing magnetic recording medium
10/18/2011	US8038796 Apparatus for spatial and temporal control of temperature on a substrate
10/18/2011	US8037727 Non-planar sputter targets having crystallographic orientations promoting uniform deposition
10/13/2011	WO2011127370A1 Particle detector
10/13/2011	WO2011126709A2 Doped buffer layer
10/13/2011	WO2011126092A1 Method for producing cu-ga alloy powder, cu-ga alloy powder, method for producing cu-ga alloy sputtering target, and cu-ga alloy sputtering target
10/13/2011	WO2011126074A1 Transparent conductive zinc oxide film, process for production thereof, and use thereof
10/13/2011	WO2011125657A1 Process for production of coated article having excellent corrosion resistance, and coated article
10/13/2011	WO2011125602A1 Molded object, process for producing same, member for electronic device, and electronic device
10/13/2011	WO2011125375A1 Sliding member
10/13/2011	WO2011125337A1 Phase shift mask blank, manufacturing method thereof, and phase shift mask
10/13/2011	WO2011125292A1 Sputtering apparatus and sputtering method
10/13/2011	WO2011124467A1 A device for sealing a chamber inlet or a chamber outlet for a flexible substrate, substrate processing apparatus, and method for assembling such a device
10/13/2011	WO2011063310A3 Physical vapor deposition (pvd) and cold anodization metal coloring
10/13/2011	WO2011049816A3 Processes for passivating dielectric films
10/13/2011	US20110251590 Balloon catheters with fibers for delivery of therapeutic agent and methods of making the same
10/13/2011	US20110250414 Tco coating with a surface plasma resonance effect and manufacturing method thereof
10/13/2011	US20110250030 Oxide coated cutting insert
10/13/2011	US20110249326 Selective solar absorbent coating and manufacturing method
10/13/2011	US20110248323 Ion implantation apparatus, ion implantation method, and semiconductor device
10/13/2011	US20110248272 Organic el display device reflective anode and method for manufacturing the same
10/13/2011	US20110247931 Sputtering bracket and sputtering apparatus having same
10/13/2011	US20110247930 Nonmagnetic Material Particle-Dispersed Ferromagnetic Material Sputtering Target
10/13/2011	US20110247928 Sputtering apparatus and sputtering method
10/12/2011	EP2374914A1 A device for sealing a chamber inlet or a chamber outlet for a flexible substrate; substrate processing apparatus, and method for assembling such a device
10/12/2011	EP2374913A1 Deposition apparatus with preheating chamber having thermal hood
10/12/2011	EP2374808A1 Single-source precursor and methods therefor
10/12/2011	EP2374568A1 Billet or bar for a sputtering target with Molybdenum; Corresponding sputtering target
10/12/2011	EP2373828A1 Apparatus for treating and/or coating the surface of a substrate component
10/12/2011	EP2373827A1 Method for manufacturing a powder for the production of p-type transparent conductive films
10/12/2011	EP2373826A1 Material for manufacturing targets for physical vapour deposition of p-type transparent conductive films
10/12/2011	EP2373825A1 Linear deposition source
10/12/2011	EP2108052B1 Reactive magnetron sputtering for the large-scale deposition of chalcopyrite absorber layers for thin layer solar cells
10/12/2011	EP1797213B8 Method of making vapour deposited oxygen-scavenging particles
10/12/2011	EP1579471B1 Vacuum sputtering cathode
10/12/2011	EP1392200B1 Method for improving the effectiveness of artificial joints by the application of gas cluster ion beam technology
10/12/2011	EP1346085B1 Method for producing group iii metal nitride based materials
10/12/2011	CN202007269U Window plated with membrane
10/12/2011	CN1756856B Dielectric barrier layer films
10/12/2011	CN102217055A Substrate processing method and substrate processing apparatus
10/12/2011	CN102217054A Wafer heating apparatus, electrostatic chuck, and method for manufacturing wafer heating apparatus
10/12/2011	CN102217008A Tape base for superconducting wire, and superconducting wire
10/12/2011	CN102216489A Multilayer film sputtering device and multilayer film formation method
10/12/2011	CN102216488A Deposition material supply apparatus and substrate treatment apparatus having the same
10/12/2011	CN102216487A Hard multilayer film formed body and method for manufacturing same
10/12/2011	CN102216486A Method for pretreating substrates for pvd methods
10/12/2011	CN102216237A Zno-sno2-in2o3 based sintered oxide and amorphous transparent conductive film
10/12/2011	CN102214745A Manufacturing method of gallium nitride based semiconductor luminescent device
10/12/2011	CN102214735A Method for preparing absorbed layer of CIGS (copper indium gallium selenide)/sulfur solar cell
10/12/2011	CN102214730A Deposition evaporation source
10/12/2011	CN102213778A Method for forming high-hardness and low-friction optical thin film on surface of optical material
10/12/2011	CN102212794A Copper plating substrate-based method for preparing large-area graphene film
10/12/2011	CN102212793A Method for low temperature ion implantation
10/12/2011	CN102212792A Method for preparing nitrogen-doped P-type zinc oxide film in one step by using nitrogen as doping source
10/12/2011	CN102212791A Equipment and method for performing magnetron-controlled sputter coating on polyester type polyurethane foam matrix
10/12/2011	CN102212790A Preparation method of noble metal/submicron spherical shell arrays
10/12/2011	CN102212789A Magnetron sputtering preparation method of tin titanium film cathode of lithium ion battery
10/12/2011	CN102212788A Method for preparing boron nitride film containing nano-silver particles
10/12/2011	CN102212787A 溅射靶及氧化物半导体膜 Sputtering target and the oxide semiconductor film
10/12/2011	CN102212786A Method for preparing thermal barrier coating
10/12/2011	CN102212785A Evaporation device
10/12/2011	CN102212784A Deposition evaporation source
10/12/2011	CN102212783A Coating support and coating machine
10/12/2011	CN102212782A Quick thermal treatment method for preparing vanadium dioxide film
10/12/2011	CN102212781A Method for manufacturing high-density and low-cost zinc oxide aluminum sputtering target

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