C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2011
11/03/2011	WO2011135667A1 Process for production of semiconductor light-emitting element substrate
11/03/2011	WO2011135152A1 Method for providing a thermal absorber
11/03/2011	WO2011134631A1 Method and apparatus for coating rate measurement
11/03/2011	WO2011062450A3 Sputtering target of multi-component single body and method for preparation thereof, and method for producing multi-component alloy-based nanostructured thin films using same
11/03/2011	US20110269619 Controlled Deposition of Metal and Metal Cluster Ions by Surface Field Patterning in Soft-Landing Devices
11/03/2011	US20110269020 Electrochemical element electrode producing method, electrochemical element electrode, and electrochemical element
11/03/2011	US20110268941 Process for manufacturing substrates provided with a multilayer having thermal properties,in particular for producing heated glazing units
11/03/2011	US20110268893 Thin film manufacturing device and thin film manufacturing method
11/03/2011	US20110268889 Preparation of Mist, Process and Apparatus for Forming New Materials by Mist Gas Discharge
11/03/2011	US20110267685 PLASMA ION ASSISTED DEPOSITION OF Mo/Si MULTILAYER EUV COATINGS
11/03/2011	US20110267684 Light blocking plate, lens module having same, and method for making same
11/03/2011	US20110267618 Passive reflective tracking media compositions and methods for covertly tracking objects
11/03/2011	US20110266449 Optical sensor and device therewith, and method for the production thereof
11/03/2011	US20110266148 Target base and sputtering apparatus using same
11/03/2011	US20110266147 Sputtering device with rotatable targets
11/03/2011	US20110266146 Sputtering apparatus
11/03/2011	US20110266145 Tantalum Sputtering Target
11/03/2011	US20110266144 Sputtering apparatus
11/03/2011	US20110266143 Sputtering system
11/03/2011	US20110266141 System and methods for high-rate co-sputtering of thin film layers on photovoltaic module substrates
11/03/2011	US20110266140 Process for producing reflective mask blank for euv lithography
11/03/2011	US20110266139 Film forming apparatus and method of producing substrate using same
11/03/2011	US20110266138 Electrochromic devices
11/03/2011	US20110266137 Electrochromic devices
11/03/2011	US20110265874 Cadmium sulfide layers for use in cadmium telluride based thin film photovoltaic devices and methods of their manufacture
11/03/2011	US20110265868 Cadmium sulfide layers for use in cadmium telluride based thin film photovoltaic devices and methods of their manufacture
11/03/2011	US20110265711 Vacuum chamber for coating installations and method for producing a vacuum chamber for coating installations
11/03/2011	DE102010018748A1 Vorrichtung zur differenzierten Schichtratenmessung von Neutralteilchen und Ionen, Verfahren sowie Verwendung der Vorrichtung Apparatus for differentiated layer rate measurement of neutral and ions, procedures and use of the device
11/02/2011	EP2383752A1 Transparent electroconductive laminate and transparent touch panel
11/02/2011	EP2383751A1 Transparent conductive laminate and transparent touch panel comprising same
11/02/2011	EP2383365A1 Vapor deposition apparatus and process for continuous indirect deposition of a thin film layer on a substrate
11/02/2011	EP2383364A1 Radio wave-transmitting decorative member and method for producing same
11/02/2011	EP2383363A1 Cadmium sulfide layers for use in cadmium telluride based thin film photovoltaic devices and methods of their manufacture
11/02/2011	EP2383362A1 Devices and methods of protecting a cadmium sulfide layer for further processing
11/02/2011	EP2383354A1 Method for manufacturing high-purity erbium, high-purity erbium, sputtering target composed of high-purity erbium, and metal gate film having high-purity erbium as main component
11/02/2011	EP2383049A1 Apparatus for cleaning deposition chamber parts using selective spray etch
11/02/2011	EP2382653A1 Method for preparing cds film
11/02/2011	CN202023647U Piston ring of multi-solitary ion plating layer with excircle being superhard after nitridation
11/02/2011	CN202022975U Vacuum film coating mechanism for optical communication optical filters
11/02/2011	CN202022974U Cathode arc ion plating device with filtering screen
11/02/2011	CN202022973U Adjustable manufacture procedure cavity structure
11/02/2011	CN202022972U Substrate film coating processing equipment
11/02/2011	CN202022971U Graphite boat adopting bottom electrode contact
11/02/2011	CN202021403U Composite coating layer screw tap
11/02/2011	CN1978698B Magnetron sputter electrode and sputtering apparutus using the magnetron sputter electrode
11/02/2011	CN1900359B Hybrid PVD-CVD system
11/02/2011	CN102232043A Method and device for reversing the feeding of sputter coating systems in clean rooms
11/02/2011	CN102231477A Nitride semiconductor light emitting device and method of fabricating nitride semiconductor laser device
11/02/2011	CN102231363A Manufacturing method for ohmic contact with low specific contact resistance and low roughness
11/02/2011	CN102230164A Metal strip continuous winding vacuum film plating equipment with building block type structure
11/02/2011	CN102230163A Film plating device
11/02/2011	CN102230162A Jig for plated film loading of large prism
11/02/2011	CN102230161A Hydroelectric end connecting device for rotating target
11/02/2011	CN102230160A Overvoltage pulse-enhanced magnetic control sputtering film plating method
11/02/2011	CN102230159A Preparation method of surface hard protective film for guide wire/tunnel needle used in peritoneal dialysis catheter insertion
11/02/2011	CN102230158A Sputtering target, sputtering target backing plate assembly and film deposition system
11/02/2011	CN102230157A Resistance evaporation film plating machine containing filtering structure
11/02/2011	CN102230156A Method for preparing composite hard coating on min-cutter and min-cutter
11/02/2011	CN102230155A Decoupled chamber body
11/02/2011	CN102230154A Technological process of physical vapor deposition coating
11/02/2011	CN102230153A Method for self-lubricating steel balls for precision bearing by ion-plating GLC (graphite-like carbon) coating
11/02/2011	CN102230152A Horizontal film plating machine of flat plate heat collecting strip
11/02/2011	CN101956168B Method for manufacturing tungsten titanium alloy target structure
11/02/2011	CN101691656B Al-ni-la-cu alloy sputtering target and manufacturing method thereof
11/02/2011	CN101606217B Ion implanting apparatus
11/02/2011	CN101604624B Gas ring, apparatus for processing semiconductor substrate, and method of processing semiconductor substrate by using the apparatus
11/02/2011	CN101512036B Vacuum evaporation processing equipment
11/02/2011	CN101481790B ZAO semiconductor nano conductive film and preparation thereof
11/02/2011	CN101463462B Invisible fastness anti-tarnishing layer for silver coin surface and preparation method
11/01/2011	US8048492 Magnetoresistive effect element and manufacturing method thereof
11/01/2011	US8048481 Method of manufacturing a coating or doctoring blade
11/01/2011	US8048277 Magnet unit and magnetron sputtering apparatus
11/01/2011	US8048260 Magnetic neutral line discharge plasma processing system
11/01/2011	US8048259 Vacuum processing apparatus
11/01/2011	US8048228 Masking apparatus and method of fabricating electronic component
11/01/2011	US8047636 Film depositing apparatus, a film depositing method, a piezoelectric film, and a liquid ejecting apparatus
11/01/2011	US8047231 Valve element unit and gate valve apparatus
11/01/2011	CA2487611C Sub-micron electrolyte thin film on nano-porous substrate by oxidation of metal film
10/2011
10/27/2011	WO2011132867A2 Sputter target having stepped structure and sputtering device using same
10/27/2011	WO2011132700A1 Method for producing plasma flow, method for plasma processing, apparatus for producing plasma, and apparatus for plasma processing
10/27/2011	WO2011132649A1 Wire-grid polarizer manufacturing method and liquid-crystal display device
10/27/2011	WO2011132556A1 Method for manufacturing semiconductor device
10/27/2011	WO2011132418A1 Deposition method
10/27/2011	WO2011132325A1 Mask
10/27/2011	WO2011131756A1 Pvd coating for metal machining
10/27/2011	WO2011131172A2 Apparatus and method for coating substrates using the eb/pvd process
10/27/2011	WO2011131171A1 Apparatus for coating substrates using the eb/pvd method
10/27/2011	WO2011131137A1 Magnetron sputtering apparatus
10/27/2011	WO2011130923A1 Preparation method for copper oxide nanowires
10/27/2011	WO2011081368A3 Vaporization apparatus and method for controlling the same
10/27/2011	US20110263065 Modular system for high-rate deposition of thin film layers on photovoltaic module substrates
10/27/2011	US20110262769 Surface hardened substrate and method making same
10/27/2011	US20110262767 Surface hardened substrate and method making same
10/27/2011	US20110262700 Surface-covered cubic boron nitride sintered body tool and method of manufacturing the same
10/27/2011	US20110262624 Method and Apparatus for Depositing LED Organic Film
10/27/2011	US20110261487 Material for use in a tmr read gap without adversely affecting the tmr effect
10/27/2011	US20110261479 Method of manufacturing magnetic recording medium, and magnetic recording/reproducing device
10/27/2011	US20110260121 Composite oxide sintered body and sputtering target comprising same
10/27/2011	US20110260118 In-ga-zn-sn type oxide sinter and target for physical film deposition
10/27/2011	US20110259740 Sputtering apparatus

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