Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2011
11/23/2011CN102251212A High-power semiconductor laser array mask device
11/23/2011CN102248278A Magnesium alloy and aluminum alloy interlayer diffusion welding method
11/23/2011CN102248187A Hard alloy cutter with diamond coating and preparation method thereof
11/23/2011CN101871093B Method for preparing selective absorbing coating for steel core of solar collection tube
11/23/2011CN101792898B Carbon film for improving abrasion resistance of magnesium alloy and preparation method thereof
11/23/2011CN101598468B High-performance multilayer composite solar selective absorption coating and preparation method thereof
11/23/2011CN101544473B Method for plating glasses to a large area without pollution
11/23/2011CN101542011B Target formed of sintering-resistant material of high-melting point metal alloy, high-melting point metal silicide, high-melting point metal carbide, high-melting point metal nitride, or high-melting
11/23/2011CN101533770B MBE epitaxial method for positioning and growing low-intensity InAs quantum dot by strain engineering theory and pattern-underlay combining technology
11/23/2011CN101501247B Method for quenching of steel member, quenched steel member, and agent for protecting quenched surface
11/23/2011CN101469403B Process for manufacturing plasma display panel and substrate holder
11/23/2011CN101413107B Method for repairing noble metal target material
11/23/2011CN101363115B Arc source of rotary magnetron arc ion plating
11/23/2011CN101103136B 真空处理装置 The vacuum processing apparatus
11/22/2011US8062795 Separator and electrochemical device comprising the same
11/22/2011US8062695 Method for manufacturing display and display
11/22/2011US8062487 Wafer supporting device of a sputtering apparatus
11/22/2011US8062486 Lithium-containing transition metal oxide target, process for producing the same and lithium ion thin film secondary battery
11/22/2011US8062484 Method for plasma-enhanced physical vapor deposition of copper with RF source power applied to the target
11/22/2011US8062440 Hafnium alloy target and process for producing the same
11/22/2011US8061299 Formation of photoconductive and photovoltaic films
11/22/2011DE202011104768U1 Befestigung für ein längs geteiltes Rohrtarget Attachment for a longitudinally split tube target
11/17/2011WO2011143527A2 Process kit shield for improved particle reduction
11/17/2011WO2011142454A1 Transparent conductive film, manufacturing method therefor, and electronic device using a transparent conductive film
11/17/2011WO2011142392A1 Transparent conductive substrate
11/17/2011WO2011142382A1 Zinc oxide-based conductive multilayer structure, process for producing same, and electronic device
11/17/2011WO2011142338A1 Method of manufacturing aluminum structure, and aluminum structure
11/17/2011WO2011141513A1 Chamber for physical vapor deposition
11/17/2011WO2011141035A1 Device and method for gas flow sputtering
11/17/2011WO2010109505A8 Process for coating parts made of aluminium alloy and parts obtained therefrom
11/17/2011US20110281134 Sputtering target for forming wiring film of flat panel display
11/17/2011US20110281107 Layered thermal barrier coating with blended transition and method of application
11/17/2011US20110281106 Gas barrier sheet and manufacturing method thereof
11/17/2011US20110281038 Production Apparatus and Method of producing a Light-Emitting Device by Using the Same Apparatus
11/17/2011US20110281023 Self-aligned bevels for write poles
11/17/2011US20110280796 Zinc Oxide Nanorod Thin Film and Method for Making Same
11/17/2011US20110279824 Electrically tunable fabry-perot interferometer, an intermediate product an electrode arrangement and a method for producing an electrically tunable fabry-perot interferometer
11/17/2011US20110279781 Projection screen, projection system and method for making the projection screen
11/17/2011US20110278531 Forming Electrodes for Chalcogenide Containing Devices
11/17/2011US20110278511 Thin Film Comprising Titanium Oxide as Main Component and Sintered Compact Sputternig Target Comprising Titanium Oxide as Main Component
11/17/2011US20110278510 Tin-Doped Indium Oxide Thin Films And Method For Making Same
11/17/2011US20110278166 Chamber for physical vapour deposition and door for a physical vapour deposition chamber
11/17/2011US20110278165 Process kit shield for improved particle reduction
11/17/2011US20110278164 Sputtering device
11/17/2011US20110278163 Gas supply system and sputtering apparatus having same
11/17/2011US20110278157 Method for pretreating substrates for pvd methods
11/17/2011US20110278156 Multiple anode ion source
11/17/2011US20110277812 Photovoltaic device conducting layer
11/17/2011DE102011007625A1 Trübe Zinkoxid-Schicht für geformte CIGS/CIS-Solarzellen Cloudy zinc oxide layer formed CIGS / CIS solar cells
11/17/2011DE102010028958A1 Substrate treatment system comprises system chamber comprising inlet lock before output lock and transportation device for transportation of substrates from inlet lock to output lock within system chamber, and heating device
11/17/2011DE102010020737A1 Target für Funkenverdampfung mit räumlicher Begrenzung der Ausbreitung des Funkens Target for spark evaporation with spatial control the spread of the spark
11/17/2011DE102010016908A1 Verfahren zum silikatischen Bonden von beschichteten und unbeschichteten optischen Körpern A method of silicate bonding of coated and uncoated optical bodies
11/17/2011DE102010003661A1 Electron beam evaporation of dielectric materials in evaporation chamber for coating substrates, comprises evaporating a dielectric material deposited in an evaporation well, in an open crucible using an electron beam to form vapor source
11/17/2011CA2784182A1 Method for producing aluminum structural body and aluminum stuctural body
11/16/2011EP2386668A1 Product with an anti-microbial surface layer and method for producing same
11/16/2011CN202039125U Integrated tooling plate used for vacuum sputtering coating
11/16/2011CN202039124U Winding device capable of reducing scratching of aluminum coating
11/16/2011CN202039123U Integrated umbrella stand of film plating machine
11/16/2011CN202039122U Aligning machine of evaporation machine and sputtering machine
11/16/2011CN202039121U Device capable of quickly achieving high vacuum
11/16/2011CN202039120U Taking and releasing mould for glass sputter coating
11/16/2011CN202039119U Magnesium oxide evaporation device
11/16/2011CN202038767U Tensioning shaft of film coating machine
11/16/2011CN1950165B Tool of surface-coated cubic boron nitride sintered compact
11/16/2011CN1867522B Transparent substrate incorporating an anti-glare coating
11/16/2011CN1826423B Transparent conductive oxides
11/16/2011CN102246268A System for processing of substrate, method of processing of substrate, and storage medium that stores program
11/16/2011CN102245934A Rack and pinion system, vacuum processing device, drive control method for rack and pinion system, drive control program, and recording medium
11/16/2011CN102245801A Method of making cutting tool inserts with high demands on dimensional accuracy
11/16/2011CN102245800A Method for forming thin film
11/16/2011CN102245799A Apparatus for treating and/or coating the surface of a substrate component
11/16/2011CN102245798A Sputtering device and sputtering method
11/16/2011CN102245797A Material for manufacturing targets for physical vapour deposition of p-type transparent conductive films
11/16/2011CN102245796A Method for manufacturing a powder for the production of p-type transparent conductive films
11/16/2011CN102245795A Circular groove pressing mechanism and method for sputtering target manufacturing
11/16/2011CN102245533A Indium oxide sintered compact and sputtering target
11/16/2011CN102245532A Sintered complex oxide and sputtering target comprising same
11/16/2011CN102245531A Composite oxide sintered body and sputtering target comprising same
11/16/2011CN102242346A Device and process for growing TiAlN film on surface of aluminum alloy in situ
11/16/2011CN102242345A Direct preparation method of textured zinc oxide transparent electroconductive film
11/16/2011CN102242344A Sputtering apparatus
11/16/2011CN102242343A Evaporation shade
11/16/2011CN102242342A Coating method and apparatus, a permanent magnet, and manufacturing method thereof
11/16/2011CN102242341A High-temperature-resistant titanium film super-hard composite material and production process thereof
11/16/2011CN102242340A Coating and damp-proofing method of surface of wood material
11/16/2011CN102242339A Preparation method of oxygen-stabilized yttrium fluoride film
11/16/2011CN102242338A Composite coated cutting tool containing periodic coating and preparation method thereof
11/16/2011CN102242337A AlN film with high piezoelectric constant
11/16/2011CN102242336A Film preparation method for reducing stress of hard film
11/16/2011CN102242333A Process for manufacturing coated glass by utilizing rotary ceramic target
11/16/2011CN101928850B Method for preparing W-Ti alloy target material
11/16/2011CN101806928B Hard resin lens and organic glass lens surface ultra-hard coat coating method
11/16/2011CN101748372B Preparation method of Cu/Ta nanometer multilayer film with crystal particle dimension difference
11/16/2011CN101736309B Horizontal revolution and rotation mechanism for vacuum coating
11/16/2011CN101736303B Preparation method of chromium-doped titanium nitride magnetic semiconductor polycrystal film
11/16/2011CN101691670B Method for growing P-type zinc oxide film by using target doped with zinc phosphate
11/16/2011CN101641272B Conveyor, and film-forming apparatus and maintenance method thereof
11/16/2011CN101631891B Film-forming apparatus and film-forming method
11/16/2011CN101597750B Arc ion plating method for inner walls of deep holes
11/16/2011CN101460653B Sputtering target for forming high strength optical recording medium protection film