| Patents for C09G 1 - Polishing compositions (7,846) |
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| 02/27/2001 | US6193908 Electroluminescent phosphor powders, methods for making phosphor powders and devices incorporating same |
| 02/27/2001 | US6193791 Polish composition and method of use |
| 02/27/2001 | US6193790 Polishing composition |
| 02/22/2001 | WO2001013417A1 Polishing compound for chemimechanical polishing and method for polishing substrate |
| 02/22/2001 | WO2001012741A1 Polishing system with stopping compound and method of its use |
| 02/22/2001 | WO2001012740A1 Polishing system and method of its use |
| 02/22/2001 | WO2001012739A1 Chemical mechanical polishing systems and methods for their use |
| 02/22/2001 | CA2378793A1 Polishing system with stopping compound and method of its use |
| 02/22/2001 | CA2378790A1 Polishing system and method of its use |
| 02/22/2001 | CA2378771A1 Chemical mechanical polishing systems and methods for their use |
| 02/21/2001 | EP1077241A2 Composition for use in a chemical-mechanical planarization process |
| 02/21/2001 | EP1077240A1 Aqueous dispersion for chemical mechanical polishing |
| 02/21/2001 | CN1062289C Anti-wash type glazing agent |
| 02/20/2001 | US6191039 Method of CMP of polysilicon |
| 02/20/2001 | US6190572 Polishing composition for leather |
| 02/20/2001 | US6190443 Polishing composition |
| 02/20/2001 | US6190237 pH-buffered slurry and use thereof for polishing |
| 02/20/2001 | US6189546 Polishing process for manufacturing dopant-striation-free polished silicon wafers |
| 02/15/2001 | WO2001010974A1 Abrasive grain with improved projectability |
| 02/13/2001 | US6186868 Chilled temperature polishing method for soft acrylic articles |
| 02/07/2001 | CN1282775A Chemicomechanically grinding composition and method |
| 02/06/2001 | US6183719 High surface area alumina solid |
| 02/01/2001 | WO2001007529A1 Aqueous floor polishing composition |
| 02/01/2001 | CA2389861A1 Aqueous floor polishing composition |
| 01/31/2001 | EP1072665A2 Colloidal silica polishing abrasive |
| 01/31/2001 | EP1072662A1 Chemical-mechanical abrasive composition and method |
| 01/30/2001 | US6180029 Oxygen-containing phosphor powders, methods for making phosphor powders and devices incorporating same |
| 01/30/2001 | US6178585 Slurries for chemical mechanical polishing |
| 01/25/2001 | WO2001006553A1 Polishing mixture and process for reducing the incorporation of copper into silicon wafers |
| 01/24/2001 | EP1071121A1 Process for the formation of a collar oxide in a trench in a semiconductor substrate |
| 01/24/2001 | CN1281023A Composition for chemical and mechanical grinding on semiconductor |
| 01/23/2001 | US6177026 CMP slurry containing a solid catalyst |
| 01/18/2001 | WO2001004231A1 Polishing liquid composition |
| 01/18/2001 | WO2001004226A2 Cmp composition containing silane modified abrasive particles |
| 01/18/2001 | DE19927286A1 Schleiflösung und Verfahren zum chemisch-mechanischen Polieren einer Edelmetall-Oberfläche Grinding solution and method for chemical mechanical polishing a noble metal surface |
| 01/18/2001 | CA2378492A1 Cmp composition containing silane modified abrasive particles |
| 01/17/2001 | EP1069168A1 Chemical mechanical abrasive composition for use in semiconductor processing |
| 01/17/2001 | CN1280224A Dyeing spray coating agent for leather proucts and its producing method |
| 01/17/2001 | CN1280154A Brightening wax |
| 01/11/2001 | WO2001002134A1 Improved chemical mechanical polishing slurries for metal |
| 01/11/2001 | WO2000060917A3 Bi-modal abrasive slurries for planarization |
| 01/11/2001 | DE19929845A1 Surface-modified pyrogenic titanium dioxide, used in cosmetics e.g. sun-protection agents, is treated with ammonium-functional silane |
| 01/09/2001 | US6171352 Comprising 70-95% by weight aqueous medium, 1-25% by weight abrasive, 0.1-20% by weight abrasion accelerator, wherein abrasion accelerator comprises monocarboxy group- or an amido group-containing compound |
| 01/04/2001 | WO2001000745A1 Composition for polishing substrate for magnetic disk and method for producing substrate for magnetic disk |
| 01/04/2001 | WO2001000744A1 Abrasive compound for glass hard disk platter |
| 01/03/2001 | EP1065251A1 Polishing composition |
| 01/03/2001 | EP1064338A1 Chemical mechanical polishing slurry useful for copper substrates |
| 01/02/2001 | US6169064 A liquid concentrate reaction product of at least one acid and at least one amine; useful in many different applications roof coatings, laundry detergents, inks, paints, hard surface cleaners and spray wax compositions |
| 01/02/2001 | US6169034 Chemically removable Cu CMP slurry abrasive |
| 01/02/2001 | US6168640 Chemical-mechanical polishing slurry that reduces wafer defects |
| 12/29/2000 | CA2312606A1 Surface-modified titanium dioxide |
| 12/28/2000 | WO2000079577A1 Abrasive compound for cmp, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for cmp abrasive compound |
| 12/26/2000 | US6165247 Methods for producing platinum powders |
| 12/21/2000 | WO2000077107A1 Abrasive solution and method for chemically-mechanically polishing a precious metal surface |
| 12/21/2000 | WO2000076918A1 Cerium phosphate and/or lanthanum sol, preparation method and use for polishing |
| 12/20/2000 | EP1060221A1 Optical polishing formulation |
| 12/12/2000 | US6159858 Slurry containing manganese oxide and a fabrication process of a semiconductor device using such a slurry |
| 12/12/2000 | US6159551 Wax and method of wax application |
| 12/12/2000 | US6159077 Colloidal silica polishing abrasive |
| 12/12/2000 | US6159076 A slurry for polishing a surface comprising a liquid phase, an abrasive comprising silica and a ligand of an element contained in the surface which is bonded with ion or atom of the element to form chelate compound |
| 12/07/2000 | WO2000073396A1 Slurry composition and method of chemical mechanical polishing using same |
| 12/06/2000 | EP1056816A1 Cerium oxide slurry for polishing, process for preparing the slurry, and process for polishing with the slurry |
| 12/05/2000 | US6156108 Emulsion-containing surface polishes |
| 11/29/2000 | EP0868450B1 Room temperature coalescable aqueous fluoropolymer dispersions and method for their manufacture |
| 11/28/2000 | US6153123 For flat panel display devices such as liquid crystal displays, plasma displays, thick film and thin film electroluminescent displays and field emission displays; narrow particle size distribution, spherical morphology |
| 11/28/2000 | US6152976 Abrasive composition for disc substrate, and process for polishing disc substrate |
| 11/28/2000 | CA2012127C One step polishing wiper |
| 11/23/2000 | DE19923477A1 Surface cleaner-conditioner, useful for treating hard or soft, compact or porous surface or as antifoam, cosmetic conditioner or textile finish, contains aminoorganopolysiloxanes with aggregate state varying with temperature |
| 11/22/2000 | CN1273993A Process for preparing multifunctional cleaning-polishing agent for car and its application method |
| 11/21/2000 | US6149830 Composition and method for reducing dishing in patterned metal during CMP process |
| 11/21/2000 | US6149696 Abrasive blasting with colloidal silica |
| 11/16/2000 | WO2000068333A1 Polish composition and method of use |
| 11/16/2000 | WO2000068332A1 Magnetic polishing fluids |
| 11/16/2000 | DE19916155A1 Suspension zur Behandlung natürlichen Hartgewebes Suspension for the treatment of natural hard tissue |
| 11/16/2000 | CA2372466A1 Polish composition and method of use |
| 11/14/2000 | US6146251 Polishing method, method of manufacturing an optical device, and a liquid suspension used for polishing |
| 11/09/2000 | DE19920967A1 Verfahren zur Hydrophobierung und Zubereitungen zur Durchführung des Verfahrens A method for imparting water repellency and compositions for carrying out the method |
| 11/08/2000 | EP1050565A2 Method of hydrophobisation and preparations for carrying out said method |
| 11/08/2000 | CN1272519A Composite for mechanochemical polishing polymer insulating material layer with low dielectric constant |
| 11/07/2000 | US6143192 Contacting at least a region of a surface of the ruthenium metal structure or a layer of ruthenium oxide layer with a solution comprising ceric ammonium nitrate |
| 11/01/2000 | CN1272221A Polishing composition including inhibitor of tungsten etching |
| 11/01/2000 | CN1271754A Multi-purpose antistatic conditioning agent for removing dirt, brightening, polishing and renewing and its preparing process |
| 11/01/2000 | CN1058042C Cleaning and lustre agent for floor tile |
| 10/31/2000 | US6140408 For high temperature thermoplastic coatings, polishes, room temperature formable paints and coatings, extrudable or injection moldable resins, and adhesives |
| 10/31/2000 | US6139763 A mechanical chemical polishing agent consists of an abrasive, an oxidizer to oxidize tatalum, an oxalic acid reducing agent to reduce tantalum oxide to tantalum, and water |
| 10/25/2000 | EP1046690A1 Composition for mechanical chemical polishing of layers in an insulating material based on a polymer with a low dielectric constant |
| 10/25/2000 | CN1057786C Process for producing multifunction super thin film brightener |
| 10/24/2000 | US6136711 Polishing composition including an inhibitor of tungsten etching |
| 10/24/2000 | US6136218 Used to reduce amount of metal ion contaminants left on wafer after chemical mechanical polishing completed |
| 10/19/2000 | WO2000060917A2 Bi-modal abrasive slurries for planarization |
| 10/18/2000 | EP1044671A2 Suspension for treatment of hard tissue and of prosthetic materials |
| 10/18/2000 | EP1044163A1 Alumina powder, process for producing the same and polishing composition |
| 10/18/2000 | CN1270194A Chemical polishing agent and its application method |
| 10/17/2000 | US6132017 Reinforced article of furniture |
| 10/11/2000 | CN1057317C Anticorrosive rust preventer |
| 10/04/2000 | EP1041129A1 Polishing slurry and polishing method |
| 10/04/2000 | CN1268967A Method for preparing metallic oxides sludge for chemical mechanical polishing for semiconductor |
| 10/03/2000 | US6126853 Comprising a film forming agent, urea hydrogen peroxide, a complexing agent, an abrasive, and an optional surfactant for removing copper alloy, titanium, and titanium nitride containing layers from substrate |
| 10/03/2000 | US6126518 Chemical mechanical polishing process for layers of semiconductor or isolating materials |
| 10/03/2000 | US6126514 Polishing slurry and polishing method using the same |