| Patents for C09G 1 - Polishing compositions (7,846) |
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| 03/28/2000 | US6043314 Divalent copper ion crosslinking agent, polymer being prepared from more than one ethylenically unsaturated monomer and acid containingfunctional residues, |
| 03/28/2000 | US6043159 Chemical mechanical polishing process for layers of isolating materials based on silicon derivatives or silicon |
| 03/28/2000 | US6043155 Polishing agent and polishing method |
| 03/22/2000 | EP0987307A2 Composition and method for reducing dishing in patterned metal during CMP process |
| 03/22/2000 | CN1050624C Deducting polishing coloring care agent for leather |
| 03/21/2000 | US6040409 Polymer compositions |
| 03/21/2000 | US6040383 Organosilicon compounds containing oligoisobutylene or polyisobutylene groups |
| 03/21/2000 | US6039891 Polishing composition of urea, alumina, ammonium persulfate and succinic acid |
| 03/16/2000 | DE19748600C1 Wasserverdünnbare Holzdecorlasur für den Innenbereich und Verfahren zur Herstellung Water-dilutable Holzdecorlasur for indoor use and methods for preparing |
| 03/15/2000 | EP0985717A2 Polishing agent for treating polyethylene terephthalate surfaces |
| 03/15/2000 | EP0985059A1 Composition and method for polishing a composite comprising titanium |
| 03/15/2000 | EP0985007A1 Oxygen-containing phosphor powders, methods for making phosphor powders and devices incorporating same |
| 03/15/2000 | EP0868491B1 Wax-free furniture polish with silicone components |
| 03/14/2000 | US6037260 An aqueous acidic solution comprising boehmite, a hydroxide of aluminum, pseudoboehmite, alumina |
| 03/09/2000 | WO2000013217A1 Abrasive liquid for metal and method for polishing |
| 03/09/2000 | WO2000012641A1 Composition for abradable and/or scratchable surfaces |
| 03/09/2000 | WO2000012437A1 Glass powders, methods for producing glass powders and devices fabricated from same |
| 03/09/2000 | WO1999061244A8 Silicon oxide particles |
| 03/09/2000 | CA2342332A1 Abrasive liquid for metal and method for polishing |
| 03/08/2000 | EP0984049A1 Chemical mechanical abrasive composition for use in semiconductor processing |
| 03/08/2000 | CN1246725A Composition for chemical and mechanical grinding in manufacture of semiconductor |
| 03/08/2000 | CN1246506A Conditioning agent for leather clothes |
| 03/08/2000 | CN1246505A Polishing composite |
| 03/07/2000 | US6033596 Multi-oxidizer slurry for chemical mechanical polishing |
| 03/02/2000 | WO2000010920A1 Aluminum oxide particles |
| 03/01/2000 | EP0982766A1 Process for chemo-mechanical polishing of a copper-based material layer |
| 02/29/2000 | US6030425 Slurry for chemical-mechanical polishing comprising high ph solution with particles of catalyst for accelerating polishing rate; catalyst is metal selected from platinum, silver, palladium, copper, rhodium, nickel, and iron |
| 02/24/2000 | DE19903405A1 Polishes for polyethylene terephthalate surface(s) |
| 02/24/2000 | DE19836831A1 Production of agent for polishing semiconductor wafers has a specific pH before use |
| 02/23/2000 | CN1245193A Glazing agent and its preparing process |
| 02/22/2000 | US6027669 Polishing composition |
| 02/22/2000 | US6027554 Polishing composition |
| 02/17/2000 | WO2000008678A1 Abrasive composition for polishing lsi device |
| 02/16/2000 | CN1244885A Dispersions of blended polycarboxypolyamide resins and alkali dispersible resins, their preparation and their use |
| 02/09/2000 | CN1244033A Method for polishing surface of copper boased material mechanically and chemically |
| 02/09/2000 | CN1243857A Composition for polishing and planing and method therefor |
| 02/09/2000 | CN1243856A Chemicomechanical grinding composition for manufacturing semiconductor |
| 02/02/2000 | EP0975705A1 Buffer solutions for suspensions used in chemical-mechanical polishing |
| 02/01/2000 | US6020413 Floor polish vehicle compositions employing sulfate- and sulfonate-containing copolymers |
| 02/01/2000 | US6019806 High selectivity slurry for shallow trench isolation processing |
| 01/26/2000 | CN1242729A Composition and slurry useful for metal CMP |
| 01/26/2000 | CN1242402A Vehicle washing and polishing agent |
| 01/26/2000 | CN1048750C 固体抛光剂 Solid polishing agent |
| 01/20/2000 | WO2000003007A1 Method and agent containing enzymes for treating the surfaces of items of everyday use |
| 01/20/2000 | WO2000002934A1 Continuous bulk polymerization and esterification process and compositions including the polymeric product |
| 01/19/2000 | EP0971993A1 Planarization composition for removing metal films |
| 01/19/2000 | EP0725815B1 Car care emulsion for automatic car washing installations |
| 01/18/2000 | US6015506 Polishing computer disks by bringing surface of disk into contact with polishing pad and applying a dispersion to the rigid disk |
| 01/13/2000 | DE19830848A1 Verfahren und Mittel zur Behandlung der Oberflächen von Gebrauchsgegenständen Methods and means for treating the surfaces of commodities |
| 01/12/2000 | EP0970156A1 Chemical-mechanical polishing slurry formulation and method for tungsten and titanium thin films |
| 01/11/2000 | US6013712 Perfluoropolymer dispersions |
| 01/11/2000 | US6013323 Silicone gel wax for protecting surface finishes comprising from 0.01% to 15%, of an amino-functional silicone, from 0.05% to 3% of an acrylate thickener, water, silicone fluid, humectant, surfactant, fluoropolymer |
| 01/06/2000 | WO2000000567A1 Chemical mechanical polishing slurry useful for copper/tantalum substrate |
| 01/06/2000 | WO2000000561A1 Chemical mechanical polishing slurry useful for copper/tantalum substrates |
| 01/06/2000 | WO2000000560A2 Chemical mechanical polishing slurry and method for using same |
| 01/06/2000 | CA2335035A1 Chemical mechanical polishing slurry and method for using same |
| 01/06/2000 | CA2335034A1 Chemical mechanical polishing slurry useful for copper/tantalum substrates |
| 01/06/2000 | CA2335033A1 Chemical mechanical polishing slurry useful for copper/tantalum substrate |
| 01/05/2000 | EP0969057A1 Dual-valent rare earth additives to polishing slurries |
| 01/05/2000 | EP0697937B1 Surface treating articles and methods of making same |
| 01/05/2000 | CN1240223A Polishing composition and surface treating composition |
| 01/04/2000 | US6011104 Footware dressings incorporating fluorocarbons |
| 01/04/2000 | US6010391 Cryogenic polishing method for soft acrylic articles |
| 12/29/1999 | WO1999067056A1 Composition for the chemical mechanical polishing of metal layers |
| 12/29/1999 | EP0967260A1 Polishing composition and surface treating composition |
| 12/29/1999 | EP0967259A1 A polishing compound and a method for polishing |
| 12/28/1999 | US6007592 Comprising water, an alumina abrasive and a polishing accelerator of a basic aluminum nitrate (al(oh)xno3)(3-x); magnetic memory disk; smoothness; accuracy; efficiency; |
| 12/28/1999 | CA2007805C Buffing composition |
| 12/22/1999 | CN1239129A Polishing composition |
| 12/16/1999 | WO1999064527A1 Composition and method for polishing in metal cmp |
| 12/15/1999 | EP0963419A1 Composition for oxide cmp |
| 12/15/1999 | CN1238812A Multi-oxidizer slurry for chemical mechanical polishing |
| 12/15/1999 | CN1238365A Edge polishing composition |
| 12/14/1999 | US6001730 Chemical mechanical polishing (CMP) slurry for polishing copper interconnects which use tantalum-based barrier layers |
| 12/14/1999 | US6001269 Composite is polished in a standard polishing machine using an aqueous slurry comprising submicron abrasive particles, potassium iodate and hydrogen peroxide and a base to adjust the ph of used slurry |
| 12/08/1999 | EP0962508A1 Wafer edge polishing composition |
| 12/07/1999 | US5998541 Finishing agents and method of using the same |
| 12/07/1999 | US5997620 Polishing composition |
| 12/02/1999 | WO1999061540A1 Cmp slurry containing a solid catalyst |
| 12/02/1999 | WO1999061244A1 Silicon oxide particles |
| 12/02/1999 | CA2336482A1 Cmp slurry containing a solid catalyst |
| 12/02/1999 | CA2333259A1 Silicon oxide particles |
| 11/30/1999 | US5994424 Surface treatment; aqueous emulsion containing free radical promoter, rheology modifier and polymer solids |
| 11/30/1999 | US5994020 Wax containing colorants |
| 11/30/1999 | US5993686 Fluoride additive containing chemical mechanical polishing slurry and method for use of same |
| 11/30/1999 | US5993685 Planarization composition for removing metal films |
| 11/24/1999 | EP0959125A1 Cleaning, polishing and preserving agent |
| 11/24/1999 | EP0959116A2 A polishing compound and a method for polishing |
| 11/23/1999 | US5989640 Propellant-free lustering and protecting agent for rubber, vinyl, and the like |
| 11/23/1999 | US5989301 Optical polishing formulation |
| 11/17/1999 | CN1235698A Cerium oxide abrasive and method of abrading substrates |
| 11/17/1999 | CN1234986A Rice polishing agent and preparing method thereof |
| 11/16/1999 | US5985255 Fluid composition containing a wax microdispersion and a cationic surfactant, a method for its preparation and uses thereof |
| 11/09/1999 | US5980775 Composition and slurry useful for metal CMP |
| 11/03/1999 | EP0953024A1 Preparations containing wax |
| 11/02/1999 | US5977228 Plasticized aqueous coating compositions |
| 11/02/1999 | US5976480 Vaporizing silicon halides, mixing the vapors with a carrier gas, heating the mixture to temperatures definitely above the boiling point of the silicon-halogen compound, mixing with hydrogen and combustion in a known manner in a burner. |
| 10/27/1999 | EP0952197A2 Improved siloxane automotive protectant compositions |
| 10/24/1999 | CA2269448A1 Improved siloxane automotive protectant compositions |
| 10/21/1999 | WO1999053532A1 Slurry for chemical-mechanical polishing metal surfaces |