| Patents for C09G 1 - Polishing compositions (7,846) |
|---|
| 10/21/1999 | DE19817555A1 Resin-bound polishing material for polishing semi-conductor wafers and glass fiber end faces |
| 10/20/1999 | EP0896591B1 Oxidised metallocene-polyolefin waxes |
| 10/19/1999 | US5968239 Polishing slurry |
| 10/19/1999 | US5968238 Polishing composition including water soluble polishing agent |
| 10/06/1999 | EP0946647A1 Dispersions of blended polycarboxypolyamide resins and alkali dispersible resins, their preparation and their use |
| 10/06/1999 | EP0946119A1 All purpose cleaner and polish in abrasive applicator |
| 10/06/1999 | CN1230579A Process of improving appearance of floor polish composition |
| 10/06/1999 | CN1230571A Process of improving leveling of floor polish composition |
| 09/29/1999 | EP0944657A1 Amphiphilic graft polymers based on graft bases containing n-vinylcarboxylic acid units, process for their preparation and their use |
| 09/28/1999 | US5959005 Silanized silica |
| 09/28/1999 | US5958288 Chemical mechanical polishing metal layer containing substrate by using a hydrogen peroxide or monopersulfate oxidizer, a catalyst containing ferric nitrate or other metal compound with multiple oxidation state |
| 09/23/1999 | WO1999047618A1 Chemical mechanical polishing slurry useful for copper substrates |
| 09/23/1999 | CA2324151A1 Chemical mechanical polishing slurry useful for copper substrates |
| 09/22/1999 | EP0943669A1 Process of improving the appearance of a floor polish composition |
| 09/22/1999 | EP0943668A1 Process of improving the leveling of a floor polish composition |
| 09/21/1999 | US5954997 Alumina abrasive; oxidizer, complexing agent such as ammonium oxalate, benzotriazole |
| 09/21/1999 | US5954975 Slurries for chemical mechanical polishing tungsten films |
| 09/21/1999 | US5954864 Polish and microencapsulated fragrance for furniture |
| 09/17/1999 | CA2265424A1 Process of improving the leveling of a floor polish composition |
| 09/17/1999 | CA2265415A1 Process of improving the appearance of a floor polish composition |
| 09/14/1999 | US5951724 Fine particulate polishing agent, method for producing the same and method for producing semiconductor devices |
| 09/08/1999 | EP0897421A4 Improved surface-coating composition |
| 09/07/1999 | US5948697 Catalytic acceleration and electrical bias control of CMP processing |
| 09/01/1999 | EP0939431A1 Cerium oxide abrasive and method of abrading substrates |
| 09/01/1999 | CN1227404A Method for producing semiconductor device |
| 09/01/1999 | CN1227403A Method of forming semiconductor device |
| 08/31/1999 | US5945474 Composition and method for removing a substance from a finished surface |
| 08/26/1999 | WO1999042537A1 Optical polishing formulation |
| 08/26/1999 | WO1999042534A1 Polishing composition including water soluble polishing agent |
| 08/26/1999 | WO1999042200A1 Aerosol method and apparatus for making particulate products |
| 08/18/1999 | EP0935512A1 Cryogenic polishing method for soft acrylic articles |
| 08/17/1999 | US5938505 In the formation of shallow trench isolation during semiconductor manufacturing |
| 08/10/1999 | US5935278 Abrasive composition for magnetic recording disc substrate |
| 08/10/1999 | US5934978 Methods of making and using a chemical-mechanical polishing slurry that reduces wafer defects |
| 08/04/1999 | EP0933166A1 Abrasive and method for polishing semiconductor substrate |
| 07/28/1999 | EP0931118A1 Composition and method for polishing a composite comprising titanium |
| 07/27/1999 | US5929230 Acylated sucrosemonocarboxylic acids |
| 07/21/1999 | CN1223308A Chemical mechanical polishing (CMP) slurry for copper and method of use in integrated circuit manufacture |
| 07/20/1999 | US5925607 Mixture of water-repelling, film-forming bromo- or chloro-fluoropolymer, mineral oil, hydrocarbon solvent with specified refractive index, silicone oil, surfactant, water; provides protection against water |
| 07/15/1999 | WO1999035089A1 Alumina powder, process for producing the same and polishing composition |
| 07/13/1999 | US5922091 Chemical mechanical polishing slurry for metallic thin film |
| 07/01/1999 | WO1999032570A1 A composition for chemical mechanical polishing |
| 06/29/1999 | US5916855 Chemical-mechanical polishing slurry formulation and method for tungsten and titanium thin films |
| 06/29/1999 | US5916819 Planarization fluid composition chelating agents and planarization method using same |
| 06/22/1999 | US5913969 Water based paint protectant |
| 06/16/1999 | EP0851798A4 Compositions and methods for polishing silica, silicates, and silicon nitride |
| 06/15/1999 | US5912298 Composition for floor polish |
| 06/15/1999 | US5911966 High surface area alumina solid |
| 06/02/1999 | EP0919602A1 Metal polishing agent and process for polishing metal using same |
| 06/02/1999 | CN1218280A Method and apparatus for chemically grinding process for manufacture of integrated circuits |
| 06/02/1999 | CN1218077A PH-buffered slurry and use thereof for polishing |
| 05/27/1999 | DE19752435A1 Redispersible polymer powder |
| 05/26/1999 | CN1217363A Wax with water contained in |
| 05/25/1999 | US5906949 Efficient and noncontaminated planarization using alkaline aqueous slurry containing sialon abrasive particles |
| 05/25/1999 | CA2001011C Glazing agent for an automobile |
| 05/19/1999 | EP0916700A2 Use of polyolefin waxes in solvent-containing pastes |
| 05/19/1999 | CN1216998A Oxidised metallocene-polyolefin waxes |
| 05/19/1999 | CN1216727A Lapping method |
| 05/18/1999 | US5904758 Method for cleaning exterior surfaces of automotive vehicles |
| 05/18/1999 | US5904159 Dispersing, in an aqueous solvent, a fumed silica havingspecified ranges of particle size and light scattering index;semiconductor wafers and inter-layer dielectrics in integrated circuits |
| 05/14/1999 | WO1999023189A1 Abrasive particles for surface polishing |
| 05/12/1999 | EP0915140A1 Aqueous wood varnish for interior application and process for its preparation |
| 05/12/1999 | EP0915119A1 Aminosiloxane-containing compositions |
| 05/12/1999 | EP0616037B1 Method for the regenerative and preservative treatment of leather, specially bindings |
| 05/06/1999 | EP0913442A2 Polishing method |
| 05/05/1999 | CN1043239C 地板上光漆组合物 Floor polish composition |
| 04/29/1999 | WO1999020704A1 Composition and process for treating hard surfaces |
| 04/27/1999 | US5897375 Improved throughput; reduced corrosion; pitting, performance yield; interconnects in integrated circuits, |
| 04/08/1999 | WO1999016843A1 Polishing agent, method for chemical and mechanical planishing and use of said polishing agent to planish a semiconductor substrate |
| 04/08/1999 | WO1999016842A1 Polishing agent and use thereof to planish a semiconductor substrate |
| 04/07/1999 | EP0850272B1 Flooring material |
| 04/06/1999 | US5891205 Chemical mechanical polishing composition |
| 03/24/1999 | EP0840664A4 Compositions for polishing silicon wafers and methods |
| 03/23/1999 | US5885334 Applying polishing fluid comprising alkaline suspension containing a water soluble silicic acid, abrasive colloidal silica and a base on the surface of polishing pad and polishing the silicon wafer surface with the pad |
| 03/17/1999 | EP0902070A1 Improvements relating to furniture polish |
| 03/17/1999 | CN1210878A Polishing agent for VCD disc |
| 03/16/1999 | US5882387 Polysiloxane and volatile diluent, wipe-on |
| 03/11/1999 | WO1999011726A1 Floor polish vehicle compositions employing sulfate- and sulfonate-containing copolymers |
| 03/10/1999 | EP0900833A1 Polymer for improving the burnish response of a floor polish |
| 03/09/1999 | US5880204 Coating composition comprising aqueous dispersion of particles comprising semi-crystalline first copolymer enveloped by amorphous second copolymer |
| 03/08/1999 | CA2245792A1 Polymer compositions |
| 03/02/1999 | US5877089 Slurry containing manganese oxide |
| 03/02/1999 | US5876490 Polish process and slurry for planarization |
| 02/25/1999 | WO1999008838A1 Chemical mechanical polishing composition |
| 02/24/1999 | EP0897421A1 Improved surface-coating composition |
| 02/24/1999 | CN1209155A Wax-free furniture polish with silicone components |
| 02/17/1999 | EP0896591A1 Oxidised metallocene-polyolefin waxes |
| 02/17/1999 | CN1208248A Mechanical-chemical polishing method for semiconductor or insulation material layer |
| 02/10/1999 | EP0896042A1 A polishing composition including an inhibitor of tungsten etching |
| 02/10/1999 | CN1207403A Wax emulsion type leather polish |
| 02/10/1999 | CN1042039C Method for polishing hydrophilic contact lens |
| 02/04/1999 | WO1999005706A1 A polishing composition including an inhibitor of tungsten etching |
| 02/03/1999 | EP0894839A2 Fluoropolymer dispersions |
| 02/03/1999 | EP0894838A2 Perfluoropolymer dispersions |
| 02/02/1999 | US5866031 Slurry formulation for chemical mechanical polishing of metals |
| 02/02/1999 | US5865882 Voc-free protective coating |
| 01/28/1999 | WO1999003813A1 Amine ether acid salt surfactant composition |
| 01/28/1999 | CA2301146A1 Amine ether acid salt surfactant composition |
| 01/21/1999 | WO1999002623A1 Composition and method for polishing a composite comprising titanium |
| 01/20/1999 | EP0891948A1 Aluminium oxide containing solid of high specific surface |