Patents
Sitemap › C09 - Dyes; Paints; Polishes; Natural resins; Adhesives; Compositions not otherwise provided for; Applications of materials not otherwise provided for › C09G - Polishing compositions other than french polish; Ski waxes › C09G 1 - Polishing compositions
Patents for C09G 1 - Polishing compositions (7,846)
01/1999
01/19/1999US5861055 Slurries of polishing particles suspended in mixtures of soluble film forming polymeric binder, solvent and wetting agent; dissolving film frees particles to polish surface in chemical mechanical polishing
01/19/1999US5861054 Cotaining particles selected from silicon carbide, siliconnitride, graphite dispersed in acidic solvent; semiconductor etching
01/19/1999US5860848 Polishing silicon wafers with improved polishing slurries
01/19/1999CA2001870C Polish containing a silicone rubber powder
01/13/1999CN1204674A Brightener and manufacturing method thereof
01/12/1999US5858813 Chemical mechanical polishing a thin layer of metal or alloy with a slurry containing an abrasive, an oxidizing agent, and succinic acid
01/07/1999WO1999000459A1 Improved plasticized aqueous coating compositions
01/05/1999US5855633 Lapping slurry
12/1998
12/22/1998US5851272 Non-oil organic spray wax compositions
12/22/1998CA2005948C Water sheeting zwitterionomeric aminofunctional siloxanes
12/16/1998CN1201812A Preparation of stain-eliminating polishing powder
12/16/1998CN1201806A Polymer compositions
12/15/1998US5849838 Aqueous scratch cover compositions for finished wooden articles
12/09/1998EP0868543A4 Improved polishing slurries and methods for their use
12/01/1998US5844007 Lustering and protecting agent for rubber, vinyl, and the like
11/1998
11/26/1998WO1998053488A1 Method for polishing a composite comprising an insulator, a metal, and titanium
11/25/1998EP0879852A1 Polish compositions comprising a methacrylate polymer
11/25/1998CN1199762A Multifunctional leather clothing oiling cream and its preparation
11/24/1998US5840629 Copper chemical mechanical polishing slurry utilizing a chromate oxidant
11/21/1998CA2237839A1 Polymer compositions
11/18/1998EP0878838A2 Process for chemical-mechanical polishing of semiconductor or insulating layers
11/18/1998CN1199429A Improved polishing slurries and method for their use
11/17/1998US5837745 UV curable polish and method of use
11/17/1998US5837078 Volatile organic compounds with beeswax for surface protective coatings
11/17/1998US5836806 Slurries for chemical mechanical polishing
11/12/1998WO1998050200A1 Abrasive and method for polishing semiconductor substrate
11/11/1998EP0732969B1 Water-in-oil emulsions containing increased amounts of oil and methods for preparing same
11/05/1998DE19817087A1 Production of buffer system, for polishing of silicon
11/04/1998EP0875547A2 Polishing agent for semiconductor and method for its production
10/1998
10/29/1998WO1998048453A1 Planarization compositions for cmp of interlayer dielectrics
10/29/1998WO1998047976A1 Buffer solutions for suspensions used in chemical-mechanical polishing
10/28/1998EP0874036A1 Fine particulate polishing agent, method for producing the same and method for producing semiconductor devices.
10/27/1998US5827781 Planarization slurry including a dispersant and method of using same
10/21/1998EP0872509A1 Oligo- or polyisobutylene- groups containing organosilicon compounds
10/21/1998EP0603191B1 Ultraviolet blocking polysiloxane resin and process for making the same
10/15/1998WO1998045055A1 Uv curable polish and method of use
10/14/1998CN1195686A Quick polishing shoe cream formula and its preparation technology
10/14/1998CN1195685A Detergent for washing car with protecting function
10/08/1998WO1998044061A1 Planarization composition for removing metal films
10/07/1998EP0868543A1 Improved polishing slurries and methods for their use
10/07/1998EP0868491A1 Wax-free furniture polish with silicone components
10/07/1998EP0868450A1 Room temperature coalescable aqueous fluoropolymer dispersions and method for their manufacture
10/07/1998CN1195011A Leather shoe beautifying cream
10/01/1998WO1998042791A1 Chemical-mechanical polishing slurry formulation and method for tungsten and titanium thin films
10/01/1998WO1998042790A1 Chemical-mechanical polishing slurry formulation and method for tungsten and titanium thin films
09/1998
09/30/1998CN1194288A Nanometer silicon dioxide polishing agent and its preparing method
09/24/1998WO1998041671A1 Composition and method for polishing a composite comprising titanium
09/23/1998CN1193646A Anti-moulding polishing agent for bamboo and wood products
09/08/1998US5804513 Abrasive composition and use of the same
09/03/1998DE19707970A1 Poly:carboxylic acid functionalised poly:organo:siloxane
09/01/1998US5800577 Polishing composition for chemical mechanical polishing
08/1998
08/27/1998WO1998037166A1 Sulfur-containing phosphor powders, methods for making phosphor powders and devices incorporating same
08/27/1998WO1998037165A1 Oxygen-containing phosphor powders, methods for making phosphor powders and devices incorporating same
08/27/1998WO1998036888A1 Aerosol method and apparatus, particulate products, and electronic devices made therefrom
08/27/1998WO1998036887A1 Aerosol method and apparatus for making particulate products
08/26/1998EP0860488A1 Polishing composition and method of polishing end surfaces of light guides
08/12/1998EP0857778A2 Cleaning formulation
08/04/1998US5789036 Protective coating containing surfactant
07/1998
07/23/1998WO1998031758A1 Preparations containing wax
07/23/1998CA2278333A1 Preparations containing wax
07/21/1998US5783489 Comprising water, an abrasive, a first oxidizer and a second oxidizer; low dielectric polishing selectivity; high polishing selectivities towards titanium, titanium nitride and aluminum alloy; integrated circuits
07/21/1998US5782991 Surface treating process
07/21/1998US5782962 Cleaning and polishing composition
07/16/1998DE19701012A1 Wachshaltige Präparate Waxy preparations
07/15/1998EP0853335A2 Slurry and process for the mechano-chemical polishing of semiconductor devices
07/15/1998EP0853110A1 CMP slurry with high selectivity
07/15/1998EP0852615A1 Chemical mechanical polishing composition and process
07/15/1998CN1187406A New chemical mechanical polishing process for layers of isolating material based on silicon derivatives or silicon
07/10/1998CA2226767A1 Cleaning formulations incorporating alkyl aromatic compounds
07/09/1998WO1998029515A1 Composition for oxide cmp
07/08/1998EP0851798A1 Compositions and methods for polishing silica, silicates, and silicon nitride
07/01/1998EP0850876A1 Pyrogenically prepared doped oxides
07/01/1998EP0850272A1 Flooring material
07/01/1998CN1186096A Multifunctional spray polishing wax and production thereof
06/1998
06/30/1998US5772780 Using slurry of cerium oxide particles; for semiconductors
06/25/1998WO1998027162A1 Dispersions of blended polycarboxypolyamide resins and alkali dispersible resins, their preparation and their use
06/25/1998DE19652849A1 Method for preserving motor vehicles
06/25/1998CA2275564A1 Dispersions of blended polycarboxypolyamide resins and alkali dispersible resins, their preparation and their use
06/24/1998CN1185472A 抛光组合物 The polishing composition
06/24/1998CN1185471A Polishing composition
06/23/1998US5770640 Finishing agents and method of using the same
06/23/1998US5770103 Composition and method for polishing a composite comprising titanium
06/23/1998US5769689 Compositions and methods for polishing silica, silicates, and silicon nitride
06/18/1998WO1998026025A1 Chemical mechanical polishing copper substrates
06/18/1998WO1998025981A1 Amphiphilic graft polymers based on graft bases containing n-vinylcarboxylic acid units, process for their preparation and their use
06/18/1998DE19651243A1 Amphiphile Pfropfpolymerisate auf Basis von N-Vinylcarbonsäureamid-Einheiten enthaltenden Pfropfgrundlagen, Verfahren zu ihrer Herstellung und ihre Verwendung Amphiphilic graft polymers based on N-vinylcarboxamide units containing graft bases, process for their preparation and their use
06/18/1998CA2272102A1 Amphiphilic graft polymers based on graft bases containing n-vinylcarboxylic acid units, process for their preparation and their use
06/16/1998US5766279 Mixed oxides
06/10/1998EP0846742A2 Chemical mechanical polishing slurry useful for copper substrates
06/10/1998EP0846741A1 Polishing composition
06/10/1998EP0846740A1 Slurry compositions
06/10/1998EP0717758B1 Stable aqueous polyolefin-wax dispersions
06/09/1998US5763379 Drying-aid composition
06/09/1998US5763325 Fabrication process of a semiconductor device using a slurry containing manganese oxide
06/05/1998CA2223377A1 Doped, pyrogenically prepared oxides
06/04/1998WO1998023697A1 Composition and method for polishing rigid disks
06/04/1998WO1998023408A1 A composition and slurry useful for metal cmp
06/03/1998EP0845512A1 Polishing composition
06/02/1998US5760113 Floor polish composition
06/02/1998US5759917 Composition for oxide CMP
1 ... 60 61 62 63 64 65 66 67 68 69 70 71 72 73 74 75 76 77 78 79