| Patents for C09G 1 - Polishing compositions (7,846) |
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| 09/26/2000 | US6124490 Reacting a diamino-containing polysiloxane with an unsaturated dicarboxylic acid or cyclic anhydride in the presence of a low molecular weight silicone oil or other solvent to form a gel |
| 09/20/2000 | EP1036836A1 Aqueous dispersion for chemical mechanical polishing |
| 09/20/2000 | CN1266875A Paste composition of free abrasive and abrading method using same |
| 09/19/2000 | US6120571 A polishing agent for semiconductor, comprising cerium oxide particles having a weight average particle size of from 0.2 to 0.3 mu.m, a crystallite size from 300 to 500 ang, and specific area of 15 to 30 m2/gram |
| 09/14/2000 | WO2000053691A1 Working liquids and methods for modifying structured wafers suited for semiconductor fabrication |
| 09/13/2000 | CN1266078A Leather polishing agent with function of mildew=proofing and colouring |
| 09/12/2000 | US6117783 The chemical and mechanical polishing solution comprises a hydroxylamine compound and octyphenyl polyethylene |
| 09/12/2000 | US6117775 Polishing method |
| 09/12/2000 | US6117220 Polishing composition and rinsing composition |
| 09/06/2000 | EP1032615A1 Process for preparing metal oxide slurry suitable for semiconductor chemical mechanical polishing |
| 09/06/2000 | CN1265409A Formulation and production process of multipurpose shoe cream |
| 09/06/2000 | CN1056167C Aerosol type dirty-cleaning and glazing protective agent containing high molecular component |
| 09/05/2000 | US6114247 Polishing cloth for use in a CMP process and a surface treatment thereof |
| 08/30/2000 | CN1264636A Mechanical chemical polishing method for aluminium or aluminium alloy conducting layer |
| 08/30/2000 | CN1055946C Anti-moulding polishing agent for bamboo and wood products |
| 08/29/2000 | US6110832 Dispensing a high viscosity slurry onto a rotating polishing pad and pressing the wafer onto the slurry coated polishing pad |
| 08/29/2000 | US6110241 Abrasive grain with improved projectability |
| 08/24/2000 | WO2000049647A1 Method for cmp of low dielectric constant polymer layers |
| 08/23/2000 | EP1029907A1 Process for mechanical chemical polishing of a layer of aluminium or aluminium alloy conducting material |
| 08/23/2000 | CN1263923A 抛光组合物 The polishing composition |
| 08/22/2000 | US6107530 Use of polyolefin waxes synthesized by means of metallocene catalysts for the preparation of solvent-containing pastes |
| 08/16/2000 | EP1028150A2 Protective and gloss layer from water-soluble polymers for preserving against fouling |
| 08/16/2000 | EP1027394A1 Abrasive particles for surface polishing |
| 08/09/2000 | EP1025175A1 Composition and process for treating hard surfaces |
| 08/08/2000 | US6100325 Comprising polytetrafluoroethylene or a copolymer of tetrafluoroethylene, a fluorinated liquid, a surfactant; as a coatings or an additive for detergent and polishing compositions |
| 08/08/2000 | US6099604 Slurry with chelating agent for chemical-mechanical polishing of a semiconductor wafer and methods related thereto |
| 08/02/2000 | CN1055102C Floor wax powder and its working method |
| 07/26/2000 | EP1021491A1 Polishing agent and use thereof to planish a semiconductor substrate |
| 07/26/2000 | CN1261393A Improved plasticized aqueous coating compositions |
| 07/19/2000 | EP1020506A2 Water-laden solid matter of vapor-phase processed inorganic oxide particles and slurry for polishing and manufacturing method of semiconductor devices |
| 07/19/2000 | EP1020502A1 The use of polymers as furniture polishes |
| 07/19/2000 | EP1020501A2 Aqueous chemical mechanical polishing dispersion composition, wafer surface polishing process and manufacturing process of a semiconductor device |
| 07/19/2000 | EP1020500A1 Polishing slurry |
| 07/19/2000 | EP1020488A2 Composite particles and production process thereof, aqueous dispersion composition for chemical polishing, and process for manufacture of semiconductor device |
| 07/19/2000 | EP1019456A1 Polishing agent, method for chemical and mechanical planishing and use of said polishing agent to planish a semiconductor substrate |
| 07/19/2000 | CN1260372A Use of polymer as polisher for furniture |
| 07/13/2000 | WO2000040370A1 Chilled temperature polishing method for soft acrylic articles |
| 07/13/2000 | DE19850622C1 Liquid scouring agent for cleaning hard surfaces comprises fine abrasive material, surfactants, propylene carbonate, bentonite, perfume, preservative and water |
| 07/06/2000 | WO2000039844A1 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same |
| 07/06/2000 | WO2000039843A1 Cmp abrasive, liquid additive for cmp abrasive and method for polishing substrate |
| 07/05/2000 | EP1015521A1 Floor polish vehicle compositions employing sulfate- and sulfonate-containing copolymers |
| 07/04/2000 | US6083840 Slurry compositions and method for the chemical-mechanical polishing of copper and copper alloys |
| 07/04/2000 | US6083839 Unique chemical mechanical planarization approach which utilizes magnetic slurry for polish and magnetic fields for process control |
| 07/04/2000 | US6083419 Polishing composition including an inhibitor of tungsten etching |
| 06/29/2000 | WO2000037578A1 Cerium oxide slurry for polishing, process for preparing the slurry, and process for polishing with the slurry |
| 06/28/2000 | EP1013731A1 Low gloss polish formulations |
| 06/28/2000 | EP0664324B2 Coating material composition |
| 06/28/2000 | CN1257901A Process for preparing conditioning cleaner of leather shoes |
| 06/28/2000 | CN1257893A Partial ester contg. polyol and montanin cerotic acid and wax preparation of montanin cerotic acid celcium soap |
| 06/28/2000 | CN1053933C Improved compositions and method for polishing |
| 06/23/2000 | CA2292312A1 Low gloss polish formulations |
| 06/22/2000 | WO2000036037A1 Compositions and methods for polishing semiconductor wafers |
| 06/21/2000 | EP1010728A2 Wax composition containing a partial ester of polyols and montanwax acid and calcium soaps of montan wax acid |
| 06/21/2000 | DE19858852A1 Wachspräparat enthaltend Partialester von Polyolen und Montanwachssäure und Ca-Seifen der Montanwachssäure Wax preparation containing partial esters of polyols and montan wax acid and Ca soaps of montan wax acid |
| 06/21/2000 | CN1256992A Compositions and method for reducing hollow of patterned matel in chemical-mechanical polishing |
| 06/15/2000 | CA2292172A1 Weightless manufacturing on earth |
| 06/14/2000 | EP1007308A4 Aerosol method and apparatus, particulate products, and electronic devices made therefrom |
| 06/14/2000 | EP1007308A1 Aerosol method and apparatus, particulate products, and electronic devices made therefrom |
| 06/08/2000 | WO2000032712A1 Abrasive fluid compositions |
| 06/07/2000 | EP1006166A1 Polishing composition and polishing method employing it |
| 06/02/2000 | WO2000031794A1 Chemical mechanical polishing of feram capacitors |
| 06/02/2000 | WO2000031198A1 Polishing by using polymeric compositions |
| 05/31/2000 | EP1004636A2 Formulation and method for restoration and/or recovery of non-wooden surfaces |
| 05/31/2000 | EP1004635A2 Formulation and method for the restoration and/or recovery of non wooden surfaces |
| 05/31/2000 | CN1254742A Antiskid floor wax |
| 05/31/2000 | CN1254741A Moisture-proof white polishing cream |
| 05/30/2000 | US6069083 Polishing substrate surface having a stop film underlying material to be polished away using slurry of abrasive particles composed of same material as stop film |
| 05/30/2000 | US6068787 Chemical mechanical polishing; mixture of catalyst and stabilizer |
| 05/24/2000 | CN1253980A Leather protection agent |
| 05/24/2000 | CN1253963A Grinding composite and potching composite |
| 05/18/2000 | DE19852752A1 Lederpflegemittel Leather Care |
| 05/17/2000 | EP1000995A1 Abrasive composition for the electronics industry |
| 05/17/2000 | EP1000990A2 Leather preserving agent |
| 05/17/2000 | CN1253160A New type abrasive composition used in integrated circuit electronic industry |
| 05/17/2000 | CN1052502C Compositions and methods for polishing and planarizing surfaces |
| 05/16/2000 | US6063438 Finishing agents and method of using the same |
| 05/16/2000 | US6063306 Chemical mechanical polishing slurry useful for copper/tantalum substrate |
| 05/16/2000 | US6062952 Planarization process with abrasive polishing slurry that is selective to a planarized surface |
| 05/11/2000 | WO2000025939A1 Silicone gel waxes and silicone gel protectants |
| 05/10/2000 | EP0999254A1 Polymer particles and polishing material containing them |
| 05/09/2000 | US6060396 Polishing agent used for polishing semiconductor silicon wafers and polishing method using the same |
| 05/09/2000 | US6060395 Planarization method using a slurry including a dispersant |
| 05/09/2000 | CA2052572C Silicon emulsion preservative and protective coatings for rubber and po lymer |
| 05/04/2000 | WO2000024842A1 A chemical mechanical polishing slurry system having an activator solution |
| 05/02/2000 | CA2004525C Improved transition metal crosslinking of acid-containing polymers |
| 04/27/2000 | WO2000023534A1 Slurries of abrasive inorganic oxide particles and method for adjusting the abrasiveness of the particles |
| 04/27/2000 | CA2347632A1 Slurries of abrasive inorganic oxide particles and method for adjusting the abrasiveness of the particles |
| 04/26/2000 | CN1251380A Abrasive thick liquid and preparation method thereof |
| 04/19/2000 | EP0993492A1 Improved plasticized aqueous coating compositions |
| 04/18/2000 | US6051155 For treatment of wooden and leather surfaces, having a content of micronized transparent titanium dioxide particles with a crystallite size of 5 to 50 nm and wherein the titanium dioxide particles are doped with alumina or zirconia |
| 04/04/2000 | US6046112 Aqueous slurry comprising zirconia abrasive particles and tetra(methyl or butyl)ammonium hydroxide surfactant for selective polishing of low dielectric constant siloxane based spin-on-glass layers during integrated circuit fabrication |
| 04/04/2000 | US6046110 Copper-based metal polishing solution and method for manufacturing a semiconductor device |
| 04/04/2000 | US6046099 Plug or via formation using novel slurries for chemical mechanical polishing |
| 04/04/2000 | US6045605 Abrasive material for polishing a semiconductor wafer, and methods for manufacturing and using the abrasive material |
| 03/30/2000 | WO2000017283A1 Oxidizing polishing slurries for low dielectric constant materials |
| 03/30/2000 | WO2000017282A1 Process for preparing metal oxide slurry suitable for semiconductor chemical mechanical polishing |
| 03/30/2000 | WO2000017281A1 Polishing liquid for polishing components, preferably wafers, especially for chemically-mechanically polishing components of this type |
| 03/30/2000 | DE19842709A1 Polierflüssigkeit zum Polieren von Bauelementen, vorzugsweise Wafern, insbesondere zum Chemisch-Mechanischen Polieren derartiger Bauelemente Polishing liquid for polishing devices, preferably wafers, in particular for mechanical chemical polishing of such devices |
| 03/29/2000 | CN1248994A Composition for oxide CMP |
| 03/29/2000 | CN1248602A Cream for leather jacket |