Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/2012
06/21/2012WO2012079786A1 Device, apparatus and method for ascertaining orientation errors
06/21/2012WO2012079773A1 Apparatus and method for the thermal treatment of substrates
06/21/2012WO2012079750A1 Mobile, transportable electrostatic substrate retaining arrangement
06/21/2012WO2012079597A1 Holding device for holding and mounting a wafer
06/21/2012WO2012079485A1 Substrate bearing apparatus and substrate processing device using same
06/21/2012WO2012079477A1 Scr apparatus and method for adjusting the sustaining voltage
06/21/2012WO2012079463A1 Cmos devices and method for manufacturing the same
06/21/2012WO2012079458A1 Ldmos device and fabrication method thereof
06/21/2012WO2012079456A1 Trench mosfet device and method for fabricating the same
06/21/2012WO2012079307A1 Method for filling opening
06/21/2012WO2012079304A1 Mos transistor and manufacturing method thereof
06/21/2012WO2012079295A1 Method and system for manufacturing device using shadow mask technology production line
06/21/2012WO2012079272A1 Transistor and semiconductor device having transistor and manufacturing method thereof
06/21/2012WO2012079113A1 A method of forming a germanium layer on a silicon substrate and a photovoltaic device including a germanium layer
06/21/2012WO2012079101A1 Device and method for metallizing wafers
06/21/2012WO2012060983A3 Ternary metal alloys with tunable stoichiometries
06/21/2012WO2012058678A3 Substrate shipper
06/21/2012WO2012058676A3 Substrate shipper
06/21/2012WO2012058184A3 Plasma processing apparatus with reduced effects of process chamber asymmetry
06/21/2012WO2012058005A3 Apparatus having improved substrate temperature uniformity using direct heating methods
06/21/2012WO2012057967A3 Methods and apparatus for controlling photoresist line width roughness
06/21/2012WO2012054682A3 Improved schottky rectifier
06/21/2012WO2012054627A3 Front opening wafer container with wafer cushion
06/21/2012WO2012054625A3 Front opening wafer container with robotic flange
06/21/2012WO2012054206A3 Quartz showerhead for nanocure uv chamber
06/21/2012WO2012054198A3 Methods of fault detection for multiplexed heater array
06/21/2012WO2012051245A3 Focus offset contamination inspection
06/21/2012WO2012051121A3 Building a library of spectra for optical monitoring
06/21/2012WO2012051082A3 Method and system for forming high accuracy patterns using charged particle beam lithography
06/21/2012WO2012051003A3 Self-aligning adhesive using solvent and solventless organic resin system in electronic packaging
06/21/2012WO2012049087A3 Semiconductor module and method of manufacturing a semiconductor module
06/21/2012WO2012047819A3 Apparatus and methods for plasma etching
06/21/2012WO2012047810A3 Securing mechanism and method for wafer bonder
06/21/2012WO2012047770A3 Chemical mechanical planarization processes for fabrication of finfet devices
06/21/2012WO2012047636A3 Vacuum process chamber component and methods of making
06/21/2012WO2012047034A3 Substrate processing device equipped with semicircle shaped antenna
06/21/2012WO2012047008A3 Method for manufacturing a polycrystalline silicon thin film
06/21/2012WO2012044060A3 Microwave generation device, driving method of device thereof, and waste gas removal system
06/21/2012WO2012040733A3 Barrier layers
06/21/2012WO2012040317A3 Plasma-activated deposition of conformal films
06/21/2012WO2012040080A3 Microelectronic transistor having an epitaxial graphene channel layer
06/21/2012WO2012037312A3 Low profile dual arm vacuum robot
06/21/2012WO2012036393A3 Substrate-processing apparatus and substrate-transferring method
06/21/2012WO2012030752A3 Silicon polishing compositions with high rate and low defectivity
06/21/2012WO2012027009A4 Gas distribution showerhead with high emissivity surface
06/21/2012WO2012009520A3 Conductive sidewall for microbumps
06/21/2012WO2012009140A3 Three dimensional memory and methods of forming the same
06/21/2012WO2011095560A3 Method and device for heat treating the wafer-shaped base material of a solar cell
06/21/2012US20120156895 Chemical vapor deposition process for aluminum silicon nitride
06/21/2012US20120156894 Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same
06/21/2012US20120156893 Method for producing siliceous film and polysilazane coating treatment liquid used therefor
06/21/2012US20120156892 Solution and process for activating the surface of a semiconductor substrate
06/21/2012US20120156891 Silicon dioxide film fabricating process
06/21/2012US20120156890 In-situ low-k capping to improve integration damage resistance
06/21/2012US20120156889 Methods for forming high-k crystalline films and related devices
06/21/2012US20120156888 Slimming method of carbon-containing thin film and oxidation apparatus
06/21/2012US20120156887 Vacuum processing apparatus and vacuum processing method
06/21/2012US20120156886 Substrate processing apparatus, method of manufacturing substrate, and method of manufacturing semiconductor device
06/21/2012US20120156885 Method and system for processing semiconductor wafer
06/21/2012US20120156884 Film forming method of amorphous carbon film and manufacturing method of semiconductor device using the same
06/21/2012US20120156883 Method of forming patterns of semiconductor device
06/21/2012US20120156882 Method for fabricating large-area nanoscale pattern
06/21/2012US20120156881 Method for defining a separating structure within a semiconductor device
06/21/2012US20120156880 Rapid and uniform gas switching for a plasma etch process
06/21/2012US20120156879 Resist pattern improving material, method for forming resist pattern, and method for producing semiconductor device
06/21/2012US20120156878 Method for producing epitaxial silicon wafer
06/21/2012US20120156877 Showerhead for Processing Chamber
06/21/2012US20120156876 Self-aligned nand flash select-gate wordlines for spacer double patterning
06/21/2012US20120156875 Laser based processing of layered materials
06/21/2012US20120156874 Chemical mechanical polishing slurry composition and method for producing semiconductor device using the same
06/21/2012US20120156873 Method for restricting lateral encroachment of metal silicide into channel region
06/21/2012US20120156872 Methods for depositing materials in high aspect ratio features
06/21/2012US20120156871 Methods for forming conductive vias in semiconductor device components
06/21/2012US20120156870 Chip Pad Resistant to Antenna Effect and Method
06/21/2012US20120156869 Method for fabricating semiconductor device with buried gate
06/21/2012US20120156868 Method for fabricating semiconductor device with buried word line
06/21/2012US20120156867 Methods of manufacturing a semiconductor device
06/21/2012US20120156866 Method of forming patterns of semiconductor device
06/21/2012US20120156865 Enhanced Patterning Uniformity of Gate Electrodes of a Semiconductor Device by Late Gate Doping
06/21/2012US20120156864 Formation of a Channel Semiconductor Alloy by a Nitride Hard Mask Layer and an Oxide Mask
06/21/2012US20120156863 Substrate pretreatment for subsequent high temperature group iii depositions
06/21/2012US20120156862 High efficiency rectifier
06/21/2012US20120156861 QUASI-HYDROPHOBIC Si-Si WAFER BONDING USING HYDROPHILIC Si SURFACES AND DISSOLUTION OF INTERFACIAL BONDING OXIDE
06/21/2012US20120156860 Pressurized treatment of substrates to enhance cleaving process
06/21/2012US20120156859 Process for fabricating integrated-circuit chips
06/21/2012US20120156858 Optical device wafer processing method
06/21/2012US20120156857 Continuous metal semiconductor alloy via for interconnects
06/21/2012US20120156856 Process margin engineering in charge trapping field effect transistors
06/21/2012US20120156855 Methods of manufacturing semiconductor devices
06/21/2012US20120156854 Method of forming stacked metal oxide layers
06/21/2012US20120156853 Highly integrated phase change memory device having micro-sized diodes and method for manufacturing the same
06/21/2012US20120156852 Semiconductor device and method of manufacturing the same
06/21/2012US20120156851 Phase change memory device and fabrication method thereof
06/21/2012US20120156850 Method for fabricating fine pattern
06/21/2012US20120156849 Method for fabricating semiconductor device
06/21/2012US20120156848 Method of manufacturing non-volatile memory device and contact plugs of semiconductor device
06/21/2012US20120156847 Layer formation with reduced channel loss
06/21/2012US20120156846 Semiconductor Devices Comprising a Channel Semiconductor Alloy Formed with Reduced STI Topography
06/21/2012US20120156845 Method of forming a field effect transistor and schottky diode
06/21/2012US20120156844 Semiconductor devices including vertical channel transistors and methods of fabricating the same
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