H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/1993
08/17/1993	US5237184 For providing a target function
08/17/1993	US5237182 Electroluminescent device of compound semiconductor with buffer layer
08/17/1993	US5237152 Apparatus for thin-coating processes for treating substrates of great surface area
08/17/1993	US5237130 Flip chip technology using electrically conductive polymers and dielectrics
08/17/1993	US5237037 Radiation-sensitive compositions containing fully substituted novolak polymers
08/17/1993	US5236984 Cold-curable silicone resin composition
08/17/1993	US5236874 Method for forming a material layer in a semiconductor device using liquid phase deposition
08/17/1993	US5236873 Forming a doped polysilicon layer, immersing wafer in electroless plating bath to form metal contact layer and selectively etching mask
08/17/1993	US5236872 Method of manufacturing a semiconductor device having a semiconductor body with a buried silicide layer
08/17/1993	US5236871 Method for producing a hybridization of detector array and integrated circuit for readout
08/17/1993	US5236869 Method of producing semiconductor device
08/17/1993	US5236868 Formation of titanium nitride on semiconductor wafer by reaction of titanium with nitrogen-bearing gas in an integrated processing system
08/17/1993	US5236866 Metal interconnection layer having reduced hillock formation in semi-conductor device and manufacturing method therefor
08/17/1993	US5236865 Method for simultaneously forming silicide and effecting dopant activation on a semiconductor wafer
08/17/1993	US5236863 Forming trenches in the surface of a silicon semiconductor wafer
08/17/1993	US5236862 Method of forming oxide isolation
08/17/1993	US5236861 Manufacturing method of metal-insulator-semiconductor device using trench isolation technique
08/17/1993	US5236859 Method of making stacked-capacitor for a dram cell same
08/17/1993	US5236858 Method of manufacturing a semiconductor device with vertically stacked structure
08/17/1993	US5236857 Resistor structure and process
08/17/1993	US5236856 Doping, masking, etching
08/17/1993	US5236853 Manufactuirng read only memory integrated circuits having closely spaced, uniform width conductor lines
08/17/1993	US5236852 Method for contacting a semiconductor device
08/17/1993	US5236851 Method for fabricating semiconductor devices
08/17/1993	US5236850 Sputtering in hydrogen atmosphere, crystallization, heating to form semiconductive path, forming current source region and current drain regions
08/17/1993	US5236602 Exposure to ultraviolet radiation
08/17/1993	US5236556 Plasma apparatus
08/17/1993	US5236552 Exposing to mixture of fluoro-containing organic acid, corrosion inhibitor, amide solvent
08/17/1993	US5236551 Termination of metallization
08/17/1993	US5236550 Method for plasma etch of ruthenium
08/17/1993	US5236549 Isotropic etching prevented by continuous plasma production during etching switching periods
08/17/1993	US5236548 Magazine for holding disk-type workpieces in particular semiconductor wafers during wet-chemical surface treatment in liquid baths
08/17/1993	US5236547 Ion implanting by focused iion beam into selected region of film, etching
08/17/1993	US5236546 Forming silicon nitride and silicon dioxide films on glass substrate, etching oxide to form concavity, oxidizing nitride and annealing walls, opening oxide film to expose nitride, vapor depositing silicon single crystal, flattening
08/17/1993	US5236544 Monocrystal on insulating film
08/17/1993	US5236537 Plasma etching apparatus
08/17/1993	US5236515 For semiconductors
08/17/1993	US5236295 Arm apparatus for conveying semiconductor wafer and processing system using same
08/17/1993	US5236118 Aligning, contacting for initial bonding, annealing to strengthen bonds
08/17/1993	US5236076 Apparatus for automatically unloading device in handler
08/17/1993	US5235995 Semiconductor processor apparatus with dynamic wafer vapor treatment and particulate volatilization
08/17/1993	CA2008499C Method for formation of an isolating oxide layer
08/17/1993	CA2004231C Conducting material and a method of fabricating thereof
08/17/1993	CA1321298C Alignment of lithographic system
08/12/1993	DE4203693A1 Holder for work objects - has projecting distance piece on surface of round disc which is set below radially grooved larger disc at variable distance
08/11/1993	WO1993016489A1 Method for measuring semiconductor junction temperature
08/11/1993	EP0555133A1 Method for evaluating semiconductor wafers and a device carrying out the same
08/11/1993	EP0555085A1 Sputtering target
08/11/1993	EP0555040A1 A single crystal pulling apparatus
08/11/1993	EP0555039A2 Alternate metal/source virtual ground flash EPROM cell array
08/11/1993	EP0555032A1 Semiconductor contact via structure and method
08/11/1993	EP0555020A1 Solid-state image pickup device and manufacturing method of the same
08/11/1993	EP0555018A1 Method for evaluating semiconductor wafers
08/11/1993	EP0554994A1 Broad band optical reduction system using matched refractive materials
08/11/1993	EP0554795A1 Semiconductor device substrate and process for preparing the same
08/11/1993	EP0554742A2 Lead-on-chip semiconductor device
08/11/1993	EP0554622A2 Apparatus and method for testing bare dies
08/11/1993	EP0554610A1 Charge transfer device having a bent transfer channel
08/11/1993	EP0554522A2 Rotary lock for transferring a substrate from one treatment- chamber to a neighbouring one
08/11/1993	EP0554498A2 Method of fabricating SOI substrate with uniform thin silicon film
08/11/1993	EP0554396A1 Rapid-curing adhesive formulation for semiconductor devices
08/11/1993	EP0515577A4 Making and testing an integrated circuit using high density probe points
08/11/1993	EP0428663B1 Process and device for rapid spectral analysis of a signal at one or more measurement points
08/11/1993	EP0402368B1 Cvd process for depositing a layer on an electrically conductive thin-layer structure
08/11/1993	EP0385979B1 High-density electronic modules, process and product
08/11/1993	CN2140103Y Four-bar quartz boat
08/10/1993	US5235626 Segmented mask and exposure system for x-ray lithography
08/10/1993	US5235489 Integrated solution to high voltage load dump conditions
08/10/1993	US5235448 Liquid crystal display having proportional tft channel width
08/10/1993	US5235312 Polysilicon resistors and methods of fabrication
08/10/1993	US5235271 System and method for testing manufactured lots of electronic devices
08/10/1993	US5235212 Semiconductor device having a mechanical buffer
08/10/1993	US5235211 Semiconductor package having wraparound metallization
08/10/1993	US5235206 Vertical bipolar transistor with recessed epitaxially grown intrinsic base region
08/10/1993	US5235205 Laser trimmed integrated circuit
08/10/1993	US5235204 Reverse self-aligned transistor integrated circuit
08/10/1993	US5235202 Semiconductor having layer of borophosphosilicate glass over gate electrode
08/10/1993	US5235201 Semiconductor device with input protection circuit
08/10/1993	US5235200 Semiconductor integrated circuit device
08/10/1993	US5235189 Thin film transistor having a self-aligned gate underlying a channel region
08/10/1993	US5235140 Electrode bump for flip chip die attachment
08/10/1993	US5235015 High speed aqueous solvent developable photopolymer compositions
08/10/1993	US5234869 Low pressure vapor deposition in heated tube using mixtures of momo-, di-, tri- or tetrakis/dimethylamino/silanes with nitrogen or ammonia
08/10/1993	US5234868 Method for determining planarization endpoint during chemical-mechanical polishing
08/10/1993	US5234867 Method for planarizing semiconductor wafers with a non-circular polishing pad
08/10/1993	US5234866 Semiconductor device and process for producing the same, and lead frame used in said process
08/10/1993	US5234865 Method of soldering together two components
08/10/1993	US5234864 Etching contactor windows in interior dielectric layer yields uniform contact resistance
08/10/1993	US5234863 Method of manufacturing doped contacts to semiconductor devices
08/10/1993	US5234862 Vacuum deposition at controlled temperature and pressure
08/10/1993	US5234861 Epitaxial growth of silicon in trench
08/10/1993	US5234860 Forming and bonding support oxide layer to image sensor oxide layer
08/10/1993	US5234859 LOCOS type field isolating film and semiconductor memory device formed therewith
08/10/1993	US5234858 Stacked surrounding wall capacitor
08/10/1993	US5234857 Growing electroconductive silicon layer through pinholes in dielectric layer for high density packing
08/10/1993	US5234856 Patterning wordlines from conductive layer overlaid with silicon dioxide, doping, depositing spacer layer, doping, depositing dielectric, etching, doping, depositing etch stop layer, etching, oxidation, depositing dielectric and plate
08/10/1993	US5234855 Stacked comb spacer capacitor
08/10/1993	US5234854 Method for manufacturing semiconductor device
08/10/1993	US5234853 Method of producing a high voltage MOS transistor
08/10/1993	US5234852 Sloped spacer for MOS field effect devices comprising reflowable glass layer

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