Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/1993
08/10/1993US5234851 Forming gate electrode having windows on doped silicon substrate, forming second window region, masking, forming spaced apart, high conductivity layers in contact with polysilicon within windows, providing dielectric layer
08/10/1993US5234850 Method of fabricating a nitride capped MOSFET for integrated circuits
08/10/1993US5234849 Depositing photoresist pattern overcoatings before forming a gate metallization layer in order to reduce current leakage
08/10/1993US5234848 Method for fabricating lateral resonant tunneling transistor with heterojunction barriers
08/10/1993US5234847 Method of fabricating a BiCMOS device having closely spaced contacts
08/10/1993US5234846 Codeposition of polysilicon base contact and epitaxial layer, using doped glass layer as dopant source, dielectric, etch stop
08/10/1993US5234845 Method of manufacturing semiconductor IC using selective poly and EPI silicon growth
08/10/1993US5234844 Process for forming bipolar transistor structure
08/10/1993US5234843 Low temperature ion beam induced crystal growth changes amorphous film having small crystals to polycrystalline one having larger crystals
08/10/1993US5234842 Method of producing p-typed CdS
08/10/1993US5234793 Method for dimensionally accurate structure transfer in bilayer technique wherein a treating step with a bulging agent is employed after development
08/10/1993US5234791 Using an a compound forming an acid hardener upon exposure; negative lithography; sensitivity; resolution; etch resistance
08/10/1993US5234789 Mixture of alkali-soluble binder and photoactive compound
08/10/1993US5234769 Wear resistant transparent dielectric coatings
08/10/1993US5234664 Having slippage means between pulling shaft and seed crystal permitting difference between their rotational speeds; preventing vibrations and breakage
08/10/1993US5234609 X-ray permeable membrane for X-ray lithographic mask
08/10/1993US5234558 Electrically conductive circuit member, method of manufacturing the same and electrically conductive paste
08/10/1993US5234556 Irradiating a metalalkoxide solution to break the metal-alkoxy group bond; forming metal oxide prepolymer
08/10/1993US5234540 Process for etching oxide films in a sealed photochemical reactor
08/10/1993US5234539 Using intermediate layer material having low adhesive interface with metal layer, applying stress to detach metal, chemically removing intermediate layer
08/10/1993US5234537 Surface treating silicon carbide with mixture of fluoroform and argon; diffraction grating
08/10/1993US5234536 Process for the manufacture of an interconnect circuit
08/10/1993US5234535 Method of producing a thin silicon-on-insulator layer
08/10/1993US5234534 Pretreatment of holding the substrate and a solution in a mixture of 80% hydrogen and an inert gas; before starting changing to a 60% hydrogen mixture
08/10/1993US5234530 Apparatus for controlling assembly force
08/10/1993US5234528 Waiting mechanism permits pretreatment to prevent oxidation
08/10/1993US5234527 Liquid level detecting device and a processing apparatus
08/10/1993US5234526 Window for microwave plasma processing device
08/10/1993US5234501 Oxidation metod
08/10/1993US5234499 Spin coating apparatus
08/10/1993US5234303 In-vacuum conveyance robot
08/10/1993US5234155 Wire bonding method and apparatus
08/10/1993US5234153 Permanent metallic bonding method
08/10/1993US5234150 Method of manufacturing spotwise partial clad material
08/10/1993US5234149 Debondable metallic bonding method
08/10/1993CA1321268C Mesa undercutting semiconductor fabrication technique
08/10/1993CA1321247C Ecl eprom with cmos programming
08/10/1993CA1321229C Electron cyclotron resonance ion source
08/10/1993CA1321123C Devices and device fabrication with borosilicate glass
08/10/1993CA1321121C Process for producing compound semiconductor and semiconductor device using compound semiconductor obtained by same
08/07/1993CA2088902A1 Broad band optical reduction system using matched multiple refractive element materials
08/05/1993WO1993015589A1 Single crystal silicon arrayed devices for projection displays
08/05/1993WO1993015541A1 Shunt circuit for electrostatic discharge protection
08/05/1993WO1993015524A1 Fermi threshold field effect transistor with reduced gate and diffusion capacitance
08/05/1993WO1993015523A1 Quantum well p-channel field effect transistor, and integrated circuit having complementary transistors
08/05/1993WO1993015521A1 Backplane grounding for flip-chip integrated circuit
08/05/1993WO1993015520A1 Flexible multilayer circuit wiring board
08/05/1993WO1993015444A1 Method for the dry development of a silicon-containing lacquer film sensitive to uv and/or electron-beam radiation
08/05/1993WO1993015443A1 Method of applying a lacquer film sensitive to uv and/or electron-beam radiation
08/05/1993WO1993014884A1 Process for cleaning quartz and silicon surfaces
08/05/1993WO1993013547A3 Integrated circuit
08/05/1993WO1993009599A3 Analog-to-digital converter and method of fabrication
08/05/1993DE4302509A1 Testing characteristics of high density circuit board - using matrix of test electrodes identical to board electrodes with precision alignment to obtain maximum inter-electrode conductivity
08/05/1993DE4212501C1 Deposition of silicon nitride polymer layer on substrate - using linear or cyclic silazane in gas, giving good quality and high coating ratio
08/05/1993DE4202652A1 Verfahren zum aufbringen einer uv- und/oder elektronenstrahlempfindlichen lackschicht A method for muster a uv and / or electron beam sensitive resist layer
08/05/1993DE4202651A1 Verfahren zur trockenentwicklung einer siliziumhaltigen ultraviolett- und/oder elektronenstrahlempfindlichen lackschicht A method for dry development of a silicon-containing ultraviolet and / or electron beam sensitive resist layer
08/04/1993EP0554195A1 Auto-protected semi-conductor protection component
08/04/1993EP0554150A1 Improvement in a frame-supported pellicle for protection of photolithographic mask
08/04/1993EP0554123A1 A method for forming a contact
08/04/1993EP0554101A1 Radiation-sensitive resin composition
08/04/1993EP0554079A2 A reactive gas for plasma assisted chemical etching and method for stable plasma etching of substrates over edges
08/04/1993EP0554063A1 Semiconductor device and liquid crystal display
08/04/1993EP0554051A1 Image display device with single crystal silicon layer and methods of producing and driving the same
08/04/1993EP0554040A2 Photosensitive resin compositions, their preparation and use
08/04/1993EP0554019A1 Improved bump structure and method for thermo-compression bonding to a semi-conductor device
08/04/1993EP0553976A2 Lightly doped drain etch method for semiconductor manufacture
08/04/1993EP0553967A1 Semiconductor wafer dry cleaning method and apparatus using a light source
08/04/1993EP0553961A2 Reactive ion etch process including hydrogen radicals
08/04/1993EP0553904A1 Thermal dissipation of integrated circuits using diamond paths
08/04/1993EP0553869A2 Method for transferring charge, charge transfer device and solid state image sensing device using the same
08/04/1993EP0553861A1 Semiconductor wafer with low surface roughness and semiconductor device
08/04/1993EP0553860A2 Semiconductor substrate and process for preparing the same
08/04/1993EP0553859A2 Semiconductor substrate and process for producing the same
08/04/1993EP0553857A2 Semiconductor substrate and process for preparing the same
08/04/1993EP0553856A2 Semiconductor substrate and method for preparing same
08/04/1993EP0553855A2 Semiconductor device substrate and process for producing the same
08/04/1993EP0553854A2 Semiconductor wafer, and process for production thereof
08/04/1993EP0553853A2 Process for preparing semiconductor substrate
08/04/1993EP0553852A2 Process for producing semiconductor substrate
08/04/1993EP0553826A1 Detecting device
08/04/1993EP0553807A1 Semiconductor device having organically doped structure
08/04/1993EP0553791A1 Capacitor electrode for dram and process of fabrication thereof
08/04/1993EP0553775A1 Semiconductor device and manufacturing method of same
08/04/1993EP0553774A1 Semiconductor device and method for producing the same
08/04/1993EP0553737A1 Radiation-sensitive composition
08/04/1993EP0553726A1 Semiconductor logic circuit
08/04/1993EP0553704A1 Radio frequency induction plasma processing system utilizing a uniform field coil
08/04/1993EP0553691A1 Passive shield for CVD wafer processing which prevents frontside edge and backside deposition
08/04/1993EP0553589A2 Bipolar transistor with low extrinsic base resistance and low noise
08/04/1993EP0553557A1 Process for making a multilayer lead frame assembly for an integrated circuit structure and multilayer integrated circuit die package formed by such process
08/04/1993EP0553543A1 Method for forming resist pattern
08/04/1993EP0553469A2 Plasma-etching process for the rapid and damage-free cleaning of reaction chambers and principally in the deposition or etching of layers on silicon substrats
08/04/1993EP0553465A1 Process for the manufacture of a perforated work article
08/04/1993EP0553464A1 Fabrication process of a solar cell from a wafer substrate
08/04/1993EP0553393A1 Semiconductor device and method for producing the semiconductor device
08/04/1993EP0351413B1 Method and apparatus for production of three-dimensional objects by photosolidification
08/04/1993EP0305513B1 Low leakage cmos/insulator substrate devices and method of forming the same
08/04/1993EP0284624B1 Method of forming a multichip integrated circuit package
08/04/1993EP0267249B1 Device for manual wire bonding
08/03/1993US5233669 Device for and method of detecting positioning marks for cutting ceramic laminated body
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