| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 12/28/1994 | EP0421446B1 Semiconductor device wherein n-channel MOSFET, p-channel MOSFET and nonvolatile memory cell are formed in one chip |
| 12/28/1994 | EP0363437B1 Heating system for reaction chamber of chemical vapor deposition equipment |
| 12/28/1994 | CN1096916A Apparatus for sealing of semiconductor with resin |
| 12/28/1994 | CN1027204C Producing method for visible photoluminescence silicon quantum spot |
| 12/28/1994 | CN1027199C Integrated circuit for analog system |
| 12/27/1994 | US5377300 Heater for processing gases |
| 12/27/1994 | US5377140 Cell for random access memory |
| 12/27/1994 | US5377139 Process forming an integrated circuit |
| 12/27/1994 | US5377118 Method for accurate calculation of vertex movement for three-dimensional topography simulation |
| 12/27/1994 | US5377077 Ultra high density integrated circuit packages method and apparatus |
| 12/27/1994 | US5377071 Sensor apparatus and method for real-time in-situ measurements of sheet resistance and its uniformity pattern in semiconductor processing equipment |
| 12/27/1994 | US5377031 Single crystal silicon tiles for liquid crystal display panels including light shielding layers |
| 12/27/1994 | US5377009 Alignment method |
| 12/27/1994 | US5376988 Parallel-moving apparatus and lens moving device in an exposing apparatus using the same |
| 12/27/1994 | US5376979 Slide projector mountable light valve display |
| 12/27/1994 | US5376906 CCD filter having comb-shaped characteristics |
| 12/27/1994 | US5376883 Analysis of integrated circuit operability using a focused ion beam |
| 12/27/1994 | US5376882 Method and apparatus for positioning an integrated circuit device in a test fixture |
| 12/27/1994 | US5376879 Method and apparatus for evaluating electrostatic discharge conditions |
| 12/27/1994 | US5376844 Programmable logic device with multiplexer-based programmable interconnections |
| 12/27/1994 | US5376837 Semiconductor integrated circuit device having built-in voltage drop circuit |
| 12/27/1994 | US5376825 Integrated circuit package for flexible computer system alternative architectures |
| 12/27/1994 | US5376824 Method and an encapsulation for encapsulating electrical or electronic components or assemblies |
| 12/27/1994 | US5376823 Lateral bipolar transistor and method of producing the same |
| 12/27/1994 | US5376821 Integrated emitter switching configuration using bipolar transistors |
| 12/27/1994 | US5376815 Semiconductor device having bipolar-mos composite element pellet suitable for pressure contacted structure |
| 12/27/1994 | US5376814 Method of constructing reduced size highly integrated static random access memory with double vertical channel structure |
| 12/27/1994 | US5376812 Semiconductor device |
| 12/27/1994 | US5376802 Stencil mask and charge particle beam exposure method and apparatus using the stencil mask |
| 12/27/1994 | US5376791 Secondary ion mass spectometry system |
| 12/27/1994 | US5376593 Method for fabricating stacked layer Si3 N4 for low leakage high capacitance films using rapid thermal nitridation |
| 12/27/1994 | US5376592 Method of heat-treating a semiconductor wafer to determine processing conditions |
| 12/27/1994 | US5376591 Method for manufacturing semiconductor device |
| 12/27/1994 | US5376590 Semiconductor device and method of fabricating the same |
| 12/27/1994 | US5376589 Method of fabricating similar indexed dissociated chips |
| 12/27/1994 | US5376588 Method for making high pin count package for semiconductor device |
| 12/27/1994 | US5376586 Method of curing thin films of organic dielectric material |
| 12/27/1994 | US5376585 Method for forming titanium tungsten local interconnect for integrated circuits |
| 12/27/1994 | US5376584 Process of making pad structure for solder ball limiting metallurgy having reduced edge stress |
| 12/27/1994 | US5376583 Method for producing P-type impurity induced layer disordering |
| 12/27/1994 | US5376580 Wafer bonding of light emitting diode layers |
| 12/27/1994 | US5376579 Schemes to form silicon-on-diamond structure |
| 12/27/1994 | US5376578 Method of fabricating a semiconductor device with raised diffusions and isolation |
| 12/27/1994 | US5376577 Method of forming a low resistive current path between a buried contact and a diffusion region |
| 12/27/1994 | US5376576 Method for the insulation of polysilicon film in semiconductor device |
| 12/27/1994 | US5376575 Method of making dynamic random access memory having a vertical transistor |
| 12/27/1994 | US5376574 Capped modular microwave integrated circuit and method of making same |
| 12/27/1994 | US5376573 Method of making a flash EPROM device utilizing a single masking step for etching and implanting source regions within the EPROM core and redundancy areas |
| 12/27/1994 | US5376572 Method of making an electrically erasable programmable memory device with improved erase and write operation |
| 12/27/1994 | US5376571 Method of making contact alignment for nonvolatile memory devices |
| 12/27/1994 | US5376569 Superconducting field-effect transistors with inverted MISFET structure and method for making the same |
| 12/27/1994 | US5376568 Method of fabricating high voltage complementary metal oxide semiconductor transistors |
| 12/27/1994 | US5376566 N-channel field effect transistor having an oblique arsenic implant for lowered series resistance |
| 12/27/1994 | US5376565 Fabrication of lateral bipolar transistor |
| 12/27/1994 | US5376564 Method of manufacturing a bipolar transistor having a decreased collector-base capacitance |
| 12/27/1994 | US5376563 Method of manufacturing an emitter base self alignment structure |
| 12/27/1994 | US5376562 Method for forming vertical transistor structures having bipolar and MOS devices |
| 12/27/1994 | US5376561 High density electronic circuit modules |
| 12/27/1994 | US5376560 Doping with inert gases |
| 12/27/1994 | US5376559 Method of manufacturing a lateral field effect transistor |
| 12/27/1994 | US5376504 Acid-hardening photoresists comprising a purified hexamethoxy methylmelamine resin as a crosslinker |
| 12/27/1994 | US5376499 Highly heat-resistant positive resists comprising end-capped hydroxypolyamides |
| 12/27/1994 | US5376498 Negative type radiation-sensitive resin composition |
| 12/27/1994 | US5376496 Radiation-sensitive mixture, radiation-sensitive recording material produced therewith containing halogenated methyl groups in the polymeric binder |
| 12/27/1994 | US5376482 Photomask having alignment marks |
| 12/27/1994 | US5376435 Microelectronic interlayer dielectric structure |
| 12/27/1994 | US5376405 Chemical vapor deposition technique for depositing titanium silicide on semiconductor wafers |
| 12/27/1994 | US5376241 Electrochemically etching to form porous layer on exposed surface of wafer |
| 12/27/1994 | US5376236 Oxidized titanium forms a complex in etchant; when concentration reaches solubility limit, it precipitates and forms film on surface |
| 12/27/1994 | US5376235 Method to eliminate corrosion in conductive elements |
| 12/27/1994 | US5376234 Mixture of etchant contaiing mercaptan, sulfide of disulfide fluorocarbon |
| 12/27/1994 | US5376233 Method for selectively etching oxides |
| 12/27/1994 | US5376231 Substrate for recording head, recording head and method for producing same |
| 12/27/1994 | US5376230 Method of manufacturing a semiconductor device |
| 12/27/1994 | US5376229 Forming layer for first device region, depositing epitaxial semiconductor lift-off layer, removing part of first device region to open areas for depositing layer of second device region, removing lift-off layer |
| 12/27/1994 | US5376228 Dry etching method |
| 12/27/1994 | US5376227 Multilevel resist process |
| 12/27/1994 | US5376226 Method of making connector for integrated circuit chips |
| 12/27/1994 | US5376225 Forming first etching mask for one side wall surface, etching with directional ion beam inclined to side of first side wall surface, forming mask for second side wall surface, etching with ion beam inclined to side of second side wall surface |
| 12/27/1994 | US5376224 Method and apparatus for non-contact plasma polishing and smoothing of uniformly thinned substrates |
| 12/27/1994 | US5376223 Using hydrogen and argon plasma and specific electron cyclotron resonance parameters in oxygen-free environment |
| 12/27/1994 | US5376222 Polishing method for polycrystalline silicon |
| 12/27/1994 | US5376216 Device for holding and rotating a substrate |
| 12/27/1994 | US5376215 Apparatus for production of extremely thin SOI film substrate |
| 12/27/1994 | US5376212 Reduced-pressure processing apparatus |
| 12/27/1994 | US5376211 Magnetron plasma processing apparatus and processing method |
| 12/27/1994 | US5376180 Apparatus for holding disk-shaped substrates in the vacuum chamber of a coating or etching apparatus |
| 12/27/1994 | US5376176 Silicon oxide film growing apparatus |
| 12/27/1994 | US5376010 Burn-in socket |
| 12/27/1994 | US5375989 Apparatus for plastic encapsulation of a semiconductor element |
| 12/27/1994 | US5375710 IC carrier |
| 12/27/1994 | US5375630 Process for forming lead frame of quad flat semiconductor package |
| 12/27/1994 | US5375557 High pressure liquid phase epitaxy reactor chamber with direct see through capability |
| 12/27/1994 | US5375291 Device having brush for scrubbing substrate |
| 12/25/1994 | CA2126111A1 Wafer-like processing after sawing dmds |
| 12/25/1994 | CA2122118A1 Method for low temperature growth of epitaxial silicon and devices produced thereby |
| 12/24/1994 | CA2126292A1 Method of manufacturing and inspecting semiconductor devices |
| 12/22/1994 | WO1994029960A1 Controlled semiconductor capacitors |
| 12/22/1994 | WO1994029904A1 METHOD FOR PREPARING A CuInSe2 COMPOUND |
| 12/22/1994 | WO1994029903A1 Laterally graded emitter for bipolar transistor |