Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/1995
01/18/1995EP0634790A2 Method for determination of resistivity of N-Type silicon Epitaxial layer
01/18/1995EP0634789A2 A method of oxidizing a semiconductor wafer
01/18/1995EP0634788A2 Method of manufacturing semiconductor device utilizing selective CVD method
01/18/1995EP0634787A1 Subsrate tray and ceramic blade for semiconductor processing apparatus
01/18/1995EP0634786A2 Improved susceptor
01/18/1995EP0634785A1 Improved susceptor design
01/18/1995EP0634784A1 Variable speed wafer exchange robot
01/18/1995EP0634783A1 Thermal process module for substrate coat/develop system
01/18/1995EP0634782A1 Method and apparatus for adjustment of spacing between wafer and PVD target during semiconductor processing
01/18/1995EP0634779A1 Collimation chamber with rotatable pedestal
01/18/1995EP0634778A1 Hollow cathode array
01/18/1995EP0634777A1 Electrode assembly useful in confined plasma assisted chemical etching
01/18/1995EP0634750A2 Apparatus and method for reading multi-level data stored in a semiconductor memory
01/18/1995EP0634701A1 Exposure apparatus, and manufacturing method for devices using same
01/18/1995EP0634700A1 Scanning type exposure apparatus
01/18/1995EP0634699A1 Clustered photolithography system
01/18/1995EP0634504A1 Process for the production of rods and ingots from semiconductor material expanding on solidification, by crystallisation of a melt prepared from granules, and device therefore
01/18/1995EP0634498A1 Etched sputtering target and process
01/18/1995EP0634053A1 METHOD AND STRUCTURE FOR SUPPRESSING CHARGE LOSS IN EEPROMs/EPROMs AND INSTABILITIES IN SRAM LOAD RESISTORS
01/18/1995EP0634052A1 Semiconductor optical devices and techniques
01/18/1995EP0634028A1 Method for forming a lithographic pattern in a process for manufacturing semiconductor devices
01/18/1995EP0633997A1 A rapid thermal processing apparatus for processing semiconductor wafers
01/18/1995EP0633823A1 Removal of surface contaminants by irradiation
01/18/1995EP0582710A4 Electrically programmable memory cell.
01/17/1995US5383159 Semiconductor memory device of alternately-activated open bit-line architecture
01/17/1995US5383155 Data output latch control circuit and process for semiconductor memory system
01/17/1995US5383152 Semiconductor memory device and its fabrication method
01/17/1995US5383150 Semiconductor memory device
01/17/1995US5383149 Ulsi mask ROM structure and method of manufacture
01/17/1995US5383136 Electrical test structure and method for measuring the relative locations of conducting features on an insulating substrate
01/17/1995US5383132 Design verification device
01/17/1995US5383093 Hybrid integrated circuit apparatus
01/17/1995US5383088 Storage capacitor with a conducting oxide electrode for metal-oxide dielectrics
01/17/1995US5383080 Semiconductor integrated circuit having voltage limiter circuit
01/17/1995US5382999 Optical pattern projecting apparatus
01/17/1995US5382911 Reaction chamber interelectrode gap monitoring by capacitance measurement
01/17/1995US5382837 Switching circuit for semiconductor device
01/17/1995US5382832 Semiconductor device and wafer structure having a planar buried interconnect by wafer bonding
01/17/1995US5382828 Triple self-aligned bipolar junction transistor
01/17/1995US5382826 Stacked high voltage transistor unit
01/17/1995US5382825 Spiral edge passivation structure for semiconductor devices
01/17/1995US5382820 High voltage CMOS device to integrate low voltage controlling device
01/17/1995US5382819 Semiconductor device having MOS source follower circuit
01/17/1995US5382817 Semiconductor device having a ferroelectric capacitor with a planarized lower electrode
01/17/1995US5382816 Semiconductor device having vertical transistor with tubular double-gate
01/17/1995US5382815 Carrier conduction conductor-insulator semiconductor (CIS) transistor
01/17/1995US5382814 Semiconductor device with low thermally generated leakage current
01/17/1995US5382809 Doped diamond
01/17/1995US5382808 Metal boride ohmic contact on diamond and method for making same
01/17/1995US5382807 Field effect thin film transistor and static-type semiconductor memory device provided with memory cell having complementary field effect transistor and method of manufacturing the same
01/17/1995US5382806 Specimen carrier platform and scanning assembly
01/17/1995US5382803 Ion injection device
01/17/1995US5382800 Charged particle beam exposure method and apparatus
01/17/1995US5382795 Ultrafine silicon tips for AFM/STM profilometry
01/17/1995US5382759 Massive parallel interconnection attachment using flexible circuit
01/17/1995US5382758 Diamond substrates having metallized vias
01/17/1995US5382757 Multilayer printed wiring board and process for manufacturing the same
01/17/1995US5382565 Superconducting field-effect transistors with inverted MISFET structure
01/17/1995US5382551 Method for reducing the effects of semiconductor substrate deformities
01/17/1995US5382550 Method of depositing SiO2 on a semiconductor substrate
01/17/1995US5382549 Method of manufacturing polycrystalline silicon having columnar orientation
01/17/1995US5382548 Method for making polystalline silicon thin film
01/17/1995US5382547 Void free oxide fill for interconnect spaces
01/17/1995US5382546 Semiconductor device and method of fabricating same, as well as lead frame used therein and method of fabricating same
01/17/1995US5382545 Interconnection process with self-aligned via plug
01/17/1995US5382544 Manufacturing method of a semiconductor device utilizing thin metal film
01/17/1995US5382542 Method of growth of II-VI materials on silicon using As passivation
01/17/1995US5382541 Method for forming recessed oxide isolation containing deep and shallow trenches
01/17/1995US5382540 Process for forming an electrically programmable read-only memory cell
01/17/1995US5382539 Method for manufacturing a semiconductor device including nonvolatile memories
01/17/1995US5382538 Method for forming MOS transistors having vertical current flow and resulting structure
01/17/1995US5382537 Method of making thin film transistors
01/17/1995US5382536 Method of fabricating lateral DMOS structure
01/17/1995US5382534 Semiconductors
01/17/1995US5382533 Method of manufacturing small geometry MOS field-effect transistors having improved barrier layer to hot electron injection
01/17/1995US5382532 Method for fabricating CMOS semiconductor devices
01/17/1995US5382531 Method for continuously manufacturing a semiconductor device
01/17/1995US5382498 Processes for electron lithography
01/17/1995US5382484 Method of correcting defects in the pattern of phase shift mask
01/17/1995US5382483 Exposure to patterns, masking, radiation and forming spacer of phase shifting material
01/17/1995US5382469 Ceramic-titanium nitride electrostatic chuck
01/17/1995US5382447 Electroless depositing of capping metal over conductive metal; oxidation; coating with polyimide precursor; heating, curing
01/17/1995US5382340 Measurement, adjustment during deposition
01/17/1995US5382320 Semiconductors
01/17/1995US5382316 Carbon fluorine compounds with oxygen, water vapor and applying to substrates
01/17/1995US5382315 Direct-write deposition, semiconductors
01/17/1995US5382314 Laminating with retarder before etching with molten material
01/17/1995US5382311 Stage having electrostatic chuck and plasma processing apparatus using same
01/17/1995US5382296 Method for cleaning semiconductor products
01/17/1995US5382272 Activated polishing compositions
01/17/1995US5382128 Wafer transfer device
01/17/1995US5382127 Pressurized interface apparatus for transferring a semiconductor wafer between a pressurized sealable transportable container and a processing equipment
01/17/1995US5382095 Static pressure bearing device
01/17/1995US5381946 Method of forming differing volume solder bumps
01/17/1995US5381944 Low temperature reactive bonding
01/17/1995US5381848 Casting of raised bump contacts on a substrate
01/17/1995US5381808 Cleaning treatment apparatus
01/17/1995US5381807 Method of stripping resists from substrates using hydroxylamine and alkanolamine
01/17/1995US5381756 Magnesium doping in III-V compound semiconductor
01/17/1995US5381701 Dust particle exposure chamber