| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 02/07/1995 | US5387548 Method of forming an etched ohmic contact |
| 02/07/1995 | US5387546 Method for manufacturing a semiconductor device |
| 02/07/1995 | US5387545 Deoxidizing, doping the surface natural silicon dioxide with hydrogen and impurities gas mixtures |
| 02/07/1995 | US5387544 Method of making a semiconductor device including carbon as a dopant |
| 02/07/1995 | US5387542 Polycrystalline silicon thin film and low temperature fabrication method thereof |
| 02/07/1995 | US5387541 Method of making silicon-on-porous-silicon by ion implantation |
| 02/07/1995 | US5387540 Vapor deposition of thin layer of silicon dioxide over trench isolation and adjuscent active region, forming a gate electrode over thin layer, and dielectric lies between them |
| 02/07/1995 | US5387539 Method of manufacturing trench isolation |
| 02/07/1995 | US5387538 Method of fabrication of integrated circuit isolation structure |
| 02/07/1995 | US5387537 Process for manufacturing isolated semiconductor components in a semiconductor wafer |
| 02/07/1995 | US5387536 Method of making a low capacitance floating diffusion structure for a solid state image sensor |
| 02/07/1995 | US5387535 Method of fabricating semiconductor devices in CMOS technology with local interconnects |
| 02/07/1995 | US5387534 Method of forming an array of non-volatile sonos memory cells and array of non-violatile sonos memory cells |
| 02/07/1995 | US5387533 Method of making dynamic random access memory |
| 02/07/1995 | US5387531 Hole capacitor for dram cell and a fabrication method thereof |
| 02/07/1995 | US5387530 Threshold optimization for soi transistors through use of negative charge in the gate oxide |
| 02/07/1995 | US5387529 Production method of a MESFET semiconductor device |
| 02/07/1995 | US5387528 Method of manufacturing a semiconductor device comprising an insulated gate field effect device |
| 02/07/1995 | US5387497 High resolution lithography method using hydrogen developing reagent |
| 02/07/1995 | US5387495 Coating top surface of substrate with insulating layer of tetrafluoroethylene, depositing conductive seed layer, lines, patterned layer of posts, removing portions of seed layer, depositing liquid fluorinated hydrocarbon dielectric |
| 02/07/1995 | US5387494 Includes a latex binder polymer having carboxylic acid functionality, a photopolymerizable monomer fraction and a photoinitiator |
| 02/07/1995 | US5387484 For use with lasers for ablation of ceramics, polymers and metals; blocking, reflecting, transmission of beams |
| 02/07/1995 | US5387474 Reducing X-Y shrinkage and distortion on firing |
| 02/07/1995 | US5387459 Multilayer structure having an epitaxial metal electrode |
| 02/07/1995 | US5387444 Ultrasonic method for coating workpieces, preferably using two-part compositions |
| 02/07/1995 | US5387316 Wafer etch protection method |
| 02/07/1995 | US5387315 Process for deposition and etching of copper in multi-layer structures |
| 02/07/1995 | US5387312 High selective nitride etch |
| 02/07/1995 | US5387311 Depositing oxide layer on conductive substrate, providing via holes, depositing anti-fuse material over oxide layer and within holes, depositing spacer material, etching, masking, etching |
| 02/07/1995 | US5387289 Film uniformity by selective pressure gradient control |
| 02/07/1995 | US5387265 Semiconductor wafer reaction furnace with wafer transfer means |
| 02/07/1995 | US5387067 Direct load/unload semiconductor wafer cassette apparatus and transfer system |
| 02/07/1995 | US5386936 For integrated circuit devices |
| 02/07/1995 | US5386645 Rotary-type wafer drying apparatus with anti-deflection cover |
| 02/07/1995 | US5386625 Tab type IC assembling method and an IC assembled thereby |
| 02/07/1995 | US5386624 Method for underencapsulating components on circuit supporting substrates |
| 02/07/1995 | US5386623 Process for manufacturing a multi-chip module |
| 02/07/1995 | US5386620 Punching and shaping machine tool with cam gear |
| 02/07/1995 | CA2001982C Ceramic substrate with metal filled via holes for hybrid microcircuits and method of making the same |
| 02/07/1995 | CA1334245C Method and apparatus for coating semiconductor components on a dielectric film |
| 02/03/1995 | CA2129212A1 Use of a saw frame with tape as a substrate carrier for wafer level backend processing |
| 02/02/1995 | WO1995003685A1 Semiconductor inner lead bonding tool |
| 02/02/1995 | WO1995003629A1 Thin film semiconductor device, its manufacture, and display system |
| 02/02/1995 | WO1995003628A1 Integrated laser structuring process for thin film solar cells |
| 02/02/1995 | WO1995003626A1 Structures for preventing reverse engineering of integrated circuits |
| 02/02/1995 | WO1995003625A1 Pad structure with parasitic mos transistor for use with semiconductor devices |
| 02/02/1995 | WO1995003624A1 Coated bonding wires in high lead count packages |
| 02/02/1995 | WO1995003436A1 Stationary aperture plate for reactive sputter deposition |
| 02/02/1995 | WO1995003245A1 System and method for dispensing liquid from storage containers |
| 02/02/1995 | WO1995003152A1 Shaped lead structure and method |
| 02/02/1995 | DE4426347A1 Flat construction element with a grid system of through-holes |
| 02/02/1995 | DE4425552A1 Wafermaßstabsarchitektur für programmierbare Logikschaltungen Wafer-scale architecture for programmable logic circuits |
| 02/02/1995 | DE4422038A1 Exposure method for the production of semiconductor components, and a diffraction mask used for this purpose |
| 02/02/1995 | DE4421633A1 Semiconductor device and method for production thereof |
| 02/02/1995 | DE4339721C1 Method for producing a matrix of thin-film transistors |
| 02/02/1995 | DE4325712A1 Method for encapsulating electrical or electronic components or modules, and encapsulation of electrical or electronic components or modules |
| 02/02/1995 | DE4325543A1 Process and apparatus for the wet chemical treatment of silicon material |
| 02/02/1995 | DE4325518A1 Method for smoothing the edge of semiconductor wafers |
| 02/02/1995 | CA2164975A1 Stationary aperture plate for reactive sputter deposition |
| 02/01/1995 | EP0637196A1 Process for manufacturing integrated microcircuits |
| 02/01/1995 | EP0637134A1 Variable impedance delay elements |
| 02/01/1995 | EP0637086A2 Light emitting semiconductor device and light enhanced deposition method for fabricating the same |
| 02/01/1995 | EP0637083A1 Semiconductor device having a reduced wiring area in and out of data path zone |
| 02/01/1995 | EP0637081A2 Micro sensor with plug connections |
| 02/01/1995 | EP0637075A1 Semiconductor device sealed with molded resin |
| 02/01/1995 | EP0637074A2 Method of forming active and isolation areas with split active patterning |
| 02/01/1995 | EP0637073A1 Process for realizing low threshold P-channel MOS transistors for complementary devices (CMOS) |
| 02/01/1995 | EP0637072A2 Spin-on conductor process for integrated circuits |
| 02/01/1995 | EP0637071A2 Planarization process for IC trench isolation using oxidised polysilicon filler |
| 02/01/1995 | EP0637070A1 Perimeter independent precision locating member for a semiconductor chip and method of making said member |
| 02/01/1995 | EP0637069A1 Method of obtaining high quality silicon dioxide passivation on silicon carbide and resulting passivated structures |
| 02/01/1995 | EP0637068A2 Manufacture of thin-film transistors |
| 02/01/1995 | EP0637067A2 Plasma etching using xenon |
| 02/01/1995 | EP0637066A1 Process for increasing sacrificial oxide layer etch rate to reduce field oxide loss, using a step of ionic implantation |
| 02/01/1995 | EP0637065A2 Chemical mechanical planarization of shallow trenches in semiconductor substrates |
| 02/01/1995 | EP0637064A2 Method and apparatus for high-flatness etching of wafer |
| 02/01/1995 | EP0637063A1 Method of in-situ cleaning of native oxide from silicon surfaces |
| 02/01/1995 | EP0637062A2 Process for manufacturing semi-conducteur device with planarized surface and application to the manufacturing of bipolar transistors and DRAM |
| 02/01/1995 | EP0637061A1 Threshold optimization for SOI transistors through use of negative charge in the gate oxide |
| 02/01/1995 | EP0637060A2 Method for forming isolated intrapolycrystalline silicon structures |
| 02/01/1995 | EP0637059A2 Direct MOMBE and MOVPE growth of II-VI materials on silicon |
| 02/01/1995 | EP0637058A1 Gas inlets for wafer processing chamber |
| 02/01/1995 | EP0637057A1 Method and apparatus for depositing metal fine lines on a substrate |
| 02/01/1995 | EP0637055A1 Plasma processing apparatus |
| 02/01/1995 | EP0637052A1 Method for producing a stream of ionic aluminum |
| 02/01/1995 | EP0637049A1 Process for making an electric conducting point of doped silicon and application of the process for manufacturing components used in vacuum electronics |
| 02/01/1995 | EP0637042A2 Device for affecting an input signal |
| 02/01/1995 | EP0637035A1 Circuit structure for a memory matrix and corresponding manufacturing method |
| 02/01/1995 | EP0637034A1 Method for detecting faulty elements of a redundancy semiconductor memory |
| 02/01/1995 | EP0637032A2 Parallel processor structure and package |
| 02/01/1995 | EP0636896A1 Boundary scan cell |
| 02/01/1995 | EP0636866A2 Method and circuit arrangement for measuring the temperature of a barrier layer of a GTO thyristor |
| 02/01/1995 | EP0636707A2 Nitrogen trifluoride thermal cleaning apparatus and process |
| 02/01/1995 | EP0636706A2 Apparatus for chemical vapor deposition of diamond including graphite substrate holders |
| 02/01/1995 | EP0636705A2 A vertical type vapor phase growth apparatus |
| 02/01/1995 | EP0636704A1 Silicon nitride deposition |
| 02/01/1995 | EP0636586A1 Photomask substrate plate of synthetic fused silica glass for photolithography |
| 02/01/1995 | EP0636285A1 Stabilizer for switch-mode powered rf plasma processing. |
| 02/01/1995 | EP0636276A1 Semiconductor wafer temperature determination by optical measurement of wafer expansion in processing apparatus chamber |
| 02/01/1995 | EP0636271A1 Multilayer electrodes for ferroelectric devices |