Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2013
07/24/2013CN103219290A Grid-dividing type flash memory and forming method thereof
07/24/2013CN103219289A Flash memory with removal of floating-gate sharp corners and manufacturing method of flash memory
07/24/2013CN103219288A Semiconductor device and forming method thereof
07/24/2013CN103219287A Method for improving carrier mobility of complementary metal oxide semiconductor (CMOS) device
07/24/2013CN103219286A LED (light emitting diode) display screen and manufacture method thereof
07/24/2013CN103219285A Active matrix displays and other electronic devices having plastic substrates
07/24/2013CN103219284A Thin film transistor (TFT) array substrate, manufacturing method and display device of TFT array substrate
07/24/2013CN103219283A Array substrate, manufacturing method of array substrate and display device of array substrate
07/24/2013CN103219282A Through silicon via (TSV) exposure process
07/24/2013CN103219281A Through silicon via (TSV) back surface exposure process
07/24/2013CN103219280A Method for manufacturing ductile circuit interconnection structure by utilization of electrostatic spinning technique and product thereof
07/24/2013CN103219279A Semiconductor devices with copper interconnects and methods for fabricating same
07/24/2013CN103219278A Metal filling process of silicon wafer through hole
07/24/2013CN103219277A Integrated circuit and method of forming an integrated circuit
07/24/2013CN103219276A Methods for fabricating semiconductor devices with reduced damage to shallow trench isolation (sti) regions
07/24/2013CN103219275A Manufacturing method of silicon germanium on insulator (SGOI) or strained silicon on insulator (sSOI) with high relaxation and low defect density
07/24/2013CN103219274A Silicon germanium on insulator (SGOI) or strained silicon on insulator (sSOI) preparation method based on quantum well structure
07/24/2013CN103219273A Wet method etching and bearing device and method
07/24/2013CN103219272A Methods of forming semiconductor devices
07/24/2013CN103219271A Suction chuck and trasfering apparatus
07/24/2013CN103219270A 机械手定位装置 Manipulator positioning device
07/24/2013CN103219269A Wafer pre-locating device based on machine vision and method thereof
07/24/2013CN103219268A Moving system
07/24/2013CN103219267A Automatic conveying system for wafer testing
07/24/2013CN103219266A Wafer waxing table
07/24/2013CN103219265A Device and method for releasing a product substrate from a holder substrate
07/24/2013CN103219264A Pulse train annealing method and apparatus
07/24/2013CN103219263A Peeling device and method for producing electronic device
07/24/2013CN103219262A System and method for processing substrate surface
07/24/2013CN103219261A Substrate processing device and substrate processing method
07/24/2013CN103219260A Etching device using extreme-edge gas pipeline
07/24/2013CN103219259A Wafer processing jig
07/24/2013CN103219258A Wafer defect sampling inspection system and method thereof
07/24/2013CN103219257A Testing device of stack type wafer
07/24/2013CN103219256A Rendering method for position measurement distribution image of epitaxy susceptor corresponding to light-emitting diode epitaxy wafer
07/24/2013CN103219255A Ultrasonic welding chopper with multiple bonding wire grooves
07/24/2013CN103219254A Method for forming metal pad
07/24/2013CN103219253A Chip size packing structure and chip size packaging method
07/24/2013CN103219252A Deflash method and apparatus for strip-shaped element
07/24/2013CN103219251A Method for packaging large-size chip by using metal-based nano fiber composite heat dissipation material
07/24/2013CN103219250A Preparation method of graphene radiating fins
07/24/2013CN103219249A Manufacturing method of palladium-plated gold-plated double-plating bonding copper wire
07/24/2013CN103219248A Manufacturing method of gold-plated bonding copper wire
07/24/2013CN103219247A Manufacturing method of silver-plated bonding copper wire
07/24/2013CN103219246A Manufacturing method of palladium-plated silver-plated double-plating bonding copper wire
07/24/2013CN103219245A Manufacturing method of palladium-plated bonding copper wire
07/24/2013CN103219244A Semiconductor substrate process, packaging method, packaging, and system-level packaging structure
07/24/2013CN103219243A Manufacturing method of patterning metal lines
07/24/2013CN103219242A Method for adjusting threshold voltage of multi-gate structure device
07/24/2013CN103219241A Method of preparing groove discrete semiconductor device
07/24/2013CN103219240A Manufacturing method of semi-conductor device
07/24/2013CN103219239A Method for manufacturing AlGaN/GaN HEMT (High Electron Mobility Transistor) with high thermal stability
07/24/2013CN103219238A Full-self-aligned insulated gate bipolar transistor device and manufacturing method thereof
07/24/2013CN103219237A Manufacturing method of self-aligned insulated gate bipolar transistor
07/24/2013CN103219236A Internal transparent collector insulated gate bipolar translator (IGBT) manufacturing technology with collector region carbon injection
07/24/2013CN103219235A Method for improving electric leakage of transistor of high-voltage device
07/24/2013CN103219234A Etching method and etching apparatus
07/24/2013CN103219233A Method for flattening wafer
07/24/2013CN103219232A Wet etching machine table device
07/24/2013CN103219231A Methods of forming replacement gate structures for semiconductor devices
07/24/2013CN103219230A Manufacturing method of low temperature polysilicon, low temperature polysilicon thin film and thin film transistor
07/24/2013CN103219229A Quantitative judging method and feedback system for ELA (excimer laser annealing) heterogeneity
07/24/2013CN103219228A Manufacturing method of polycrystalline silicon layer and polycrystalline silicon thin film transistor and manufacturing method thereof
07/24/2013CN103219227A 等离子体清洗方法 Plasma cleaning method
07/24/2013CN103219226A Method for reducing metal pollution on back of wafer during sedimentation of amorphous carbon film
07/24/2013CN103219225A Barrier layer material for silicon-based ferroelectric capacitor integration and integrating method
07/24/2013CN103219224A Wafer manufacturing process with environmental-friendly processing function
07/24/2013CN103219223A Device and method for removing wafer residual hydrogen bromide
07/24/2013CN103217846A Array substrate and display device
07/24/2013CN103217843A Array substrate, manufacturing method thereof and liquid crystal panel
07/24/2013CN103215650A Rapid thermal annealing apparatus
07/24/2013CN103215568A Gas supply head and substrate processing apparatus
07/24/2013CN103215567A Film deposition apparatus
07/24/2013CN103215561A Plasma depositing and etching system
07/24/2013CN103215549A Shielding design for metal gap filling
07/24/2013CN103215535A Method for preparing protective coating layer for surface of plasma etched cavity
07/24/2013CN103214972A Composition and method for planarizing surfaces
07/24/2013CN103213371A Method for manufacturing electronic device and method for manufacturing glass laminate
07/24/2013CN103213133A Robot system
07/24/2013CN103213124A Robot system
07/24/2013CN103212776A Electronic device, method of manufacturing, and electronic device manufacturing apparatus
07/24/2013CN102812555B Semiconductor device and method for manufacturing the same
07/24/2013CN102576191B Photosensitive resin composition and use thereof
07/24/2013CN102468209B Method for forming buried layer of SiGe heterojunction bipolar transistor (HBT)
07/24/2013CN102456726B 锗硅异质结双极晶体管 SiGe heterojunction bipolar transistor
07/24/2013CN102456614B Realization method for metal source-substrate passage in radio-frequency LDMOS (laterally-diffused metal oxide semiconductor) apparatus
07/24/2013CN102456541B Preparation method of SiGe monitoring piece and method for employing piece to carry out monitoring
07/24/2013CN102437052B Method for forming silicides
07/24/2013CN102420133B Method for manufacturing insulated gate bipolar transistor (IGBT) device
07/24/2013CN102412311B PN junction variodenser in BiCMOS (bipolar complementary metal oxide semiconductor) process and manufacturing method thereof
07/24/2013CN102412287B Silicon-germanium HBT (heterojunction bipolar transistor) device and fabrication method thereof
07/24/2013CN102412283B Silicon-germanium HBT (heterojunction bipolar transistor) device and fabrication method thereof
07/24/2013CN102412281B Silicon-germanium heterojunction bipolar transistor
07/24/2013CN102412185B Method for decreasing resistance of source contact pin in radio-frequency LDMOS (Laterally Diffused Metal Oxide Semiconductor) device
07/24/2013CN102412149B Production method of low-noise germanium-silicon heterojunction bipolar transistor
07/24/2013CN102405438B Polarization film lamination apparatus, and LCD device production system equipped with same
07/24/2013CN102403343B Vertical parasitic PNP device in BiCMOS (bipolar complementary metal oxide semiconductor) process and manufacturing method
07/24/2013CN102403218B Etching method for contact holes
07/24/2013CN102386219B Parasitic transversal type plug-and-ply (PNP) triode in silicon germanium (SiGe) heterojunction bipolar transistor (HBT) process and manufacturing method
07/24/2013CN102376570B Manufacturing method of N-type radio frequency lateral double-diffused metal-oxide semiconductor (LDMOS)