Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2013
08/28/2013CN101661986B Method for producing nitride semiconductor optical device and epitaxial wafer
08/28/2013CN101483144B Method for forming bumps, semiconductor device and method for manufacturing same, substrate processing apparatus, and semiconductor manufacturing apparatus
08/28/2013CN101457125B Chemico-mechanical polishing liquid
08/28/2013CN101457124B Chemico-mechanical polishing liquid
08/28/2013CN101419945B Method for manufacturing semiconductor device
08/28/2013CN101359693B Thin film transistor, array substrate having the transistor, and method of manufacturing the array substrate
08/28/2013CN101231957B Non-volatile semiconductor memory device and manufacturing method thereof
08/28/2013CN101225541B Method of manufacturing semiconductor single crystal by czochralski technology, and single crystal ingot and wafer using the same
08/27/2013US8520987 Method of fabricating an optical transformer
08/27/2013US8520360 Electrostatic chuck with wafer backside plasma assisted dechuck
08/27/2013US8520184 Immersion exposure apparatus and device manufacturing method with measuring device
08/27/2013US8519846 Tracking system for gamma radiation sterilized bags and disposable items
08/27/2013US8519532 Semiconductor device including cladded base plate
08/27/2013US8519527 Isostress grid array and method of fabrication thereof
08/27/2013US8519523 Microelectronic device packages, stacked microelectronic device packages, and methods for manufacturing microelectronic devices
08/27/2013US8519522 Semiconductor package
08/27/2013US8519516 Semiconductor constructions
08/27/2013US8519515 TSV structure and method for forming the same
08/27/2013US8519511 Substrate dividing method
08/27/2013US8519508 Semiconductor device having an anti-fuse element and a transistor with a pocket region
08/27/2013US8519489 Method and apparatus for tunable electrical conductivity
08/27/2013US8519488 III-V metal-oxide-semiconductor device
08/27/2013US8519487 Semiconductor device
08/27/2013US8519486 Semiconductor device having a plurality of phosphorus-doped silicon carbide layers
08/27/2013US8519484 Semiconductor devices having dual trench, methods of fabricating the same, and electronic system having the same
08/27/2013US8519483 Semiconductor device having a high resistance to ionizing radiation
08/27/2013US8519482 Reliable contacts
08/27/2013US8519480 Electrostatic discharge protection device
08/27/2013US8519461 Device with post-contact back end of line through-hole via integration
08/27/2013US8519454 Structure and process for metal fill in replacement metal gate integration
08/27/2013US8519453 Thin film transistor device with metallic electrodes
08/27/2013US8519452 Semiconductor device with junction field-effect transistor and manufacturing method of the same
08/27/2013US8519447 Ion sensitive sensor with multilayer construction in the sensor region
08/27/2013US8519445 Poly profile engineering to modulate spacer induced stress for device enhancement
08/27/2013US8519443 Method for making a heterojunction bipolar transistor
08/27/2013US8519441 High speed high power nitride semiconductor device
08/27/2013US8519436 Lattice-mismatched semiconductor structures with reduced dislocation defect densities and related methods for device fabrication
08/27/2013US8519404 Light-emitting device and method for manufacturing the same
08/27/2013US8519388 Embedded structure for passivation integrity testing
08/27/2013US8519377 Nonvolatile memory device, nonvolatile memory device group, and manufacturing method thereof
08/27/2013US8518838 Method of thermal processing structures formed on a substrate
08/27/2013US8518837 Method of producing nanopatterned articles using surface-reconstructed block copolymer films
08/27/2013US8518836 Semiconductor patterning
08/27/2013US8518835 Methods of utilizing block copolymers to form patterns
08/27/2013US8518834 Method and apparatus for forming oxide film on carbon film
08/27/2013US8518833 Transparent electroconductive oxide layer and photoelectric converter using the same
08/27/2013US8518832 Process for masking and removal of residue from complex shapes
08/27/2013US8518831 Method of forming semiconductor memory device
08/27/2013US8518830 Plasma etching method and storage medium
08/27/2013US8518829 Self-sealed fluidic channels for nanopore array
08/27/2013US8518828 Semiconductor device fabrication method
08/27/2013US8518827 Spectrum based endpointing for chemical mechanical polishing
08/27/2013US8518826 Metallization processes, mixtures, and electronic devices
08/27/2013US8518825 Method to manufacture trench-first copper interconnection
08/27/2013US8518824 Self aligning via patterning
08/27/2013US8518823 Through silicon via and method of forming the same
08/27/2013US8518822 Integrated circuit packaging system with multi-stacked flip chips and method of manufacture thereof
08/27/2013US8518821 Semiconductor device and a method of manufacturing the same
08/27/2013US8518820 Methods for forming contacts in semiconductor devices
08/27/2013US8518819 Semiconductor device contact structures and methods for making the same
08/27/2013US8518818 Reverse damascene process
08/27/2013US8518817 Method of electrolytic plating and semiconductor device fabrication
08/27/2013US8518816 Method for making electrical interconnections with carbon nanotubes
08/27/2013US8518815 Methods, devices, and materials for metallization
08/27/2013US8518814 Methods of fabrication of high-density laser diode stacks
08/27/2013US8518813 Semiconductor device and method of manufacturing semiconductor device
08/27/2013US8518812 Methods of forming electrical contacts
08/27/2013US8518811 Schottky diodes having metal gate electrodes and methods of formation thereof
08/27/2013US8518810 Method for manufacturing a semiconductor device
08/27/2013US8518809 Manufacturing method of silicon carbide single crystal
08/27/2013US8518808 Defects annealing and impurities activation in III-nitride compound
08/27/2013US8518807 Radiation hardened SOI structure and method of making same
08/27/2013US8518806 Method for producing group III nitride-based compound semiconductor, wafer including group III nitride-based compound semiconductor, and group III nitrided-based compound semiconductor device
08/27/2013US8518805 Method for manufacturing a semiconductor die and a semiconductor device comprising the semiconductor die obtained thereby
08/27/2013US8518804 Semiconductor device manufacturing method and manufacturing apparatus
08/27/2013US8518803 Laser processing method for semiconductor wafer
08/27/2013US8518802 Process for fabricating integrated-circuit chips
08/27/2013US8518801 Substrate dividing method
08/27/2013US8518800 Substrate dividing method
08/27/2013US8518799 Process of making semiconductor on glass substrates with a stiffening layer
08/27/2013US8518798 Semiconductor structure and method for making same
08/27/2013US8518797 Method of making an SOI substrate by using a separation layer with regions of non-uniform concentration
08/27/2013US8518796 Semiconductor die connection system and method
08/27/2013US8518795 Method of manufacturing semiconductor device
08/27/2013US8518794 Semiconductor devices and methods of forming thereof
08/27/2013US8518793 Oxygen diffusion barrier comprising Ru
08/27/2013US8518792 Method for fabricating a damascene self-aligned ferroelectric random access memory (F-RAM) having a ferroelectric capacitor aligned with a three dimensional transistor structure
08/27/2013US8518791 Method for fabricating a damascene self-aligned ferroelectric random access memory (F-RAM) with simultaneous formation of sidewall ferroelectric capacitors
08/27/2013US8518790 Method of forming memory device
08/27/2013US8518789 Integrated electronic device and method of making the same
08/27/2013US8518788 Methods of forming a plurality of capacitors
08/27/2013US8518787 Through wafer vias and method of making same
08/27/2013US8518786 Process for forming a metal oxide semiconductor devices
08/27/2013US8518785 Semiconductor device and method of manufacturing the same
08/27/2013US8518784 Adjusting of strain caused in a transistor channel by semiconductor material provided for threshold adjustment
08/27/2013US8518783 Gate structure for field effect transistor
08/27/2013US8518782 Semiconductor device including asymmetric lightly doped drain (LDD) region, related method and design structure
08/27/2013US8518781 Semiconductor device and manufacturing method thereof
08/27/2013US8518780 Fabrication methods of integrated semiconductor structure
08/27/2013US8518779 Semiconductor device and method for fabricating the same