| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 09/21/2004 | US6792693 Wafer dryer system for PRS wet bench |
| 09/21/2004 | US6792677 Method of manufacturing an electronic component unit |
| 09/21/2004 | US6792676 Apparatus and method for mounting electronic parts |
| 09/21/2004 | US6792672 Heat sink manufacturing apparatus |
| 09/16/2004 | WO2004079884A1 In-vacuum drive device and substrate transportation system using the same |
| 09/16/2004 | WO2004079835A1 Nanoscale control of the spatial distribution, shape and size of thin films of conjugated organic molecules through the production of silicon oxide nanostructures |
| 09/16/2004 | WO2004079834A1 Organic field effect transistor and method for producing the same |
| 09/16/2004 | WO2004079827A1 Field-effect transistor with spin-dependent transmission characteristic and nonvolatile memory using same |
| 09/16/2004 | WO2004079826A1 Method for manufacturing thin film transistor, display, and electronic device |
| 09/16/2004 | WO2004079824A2 Charge-trapping memory arrays |
| 09/16/2004 | WO2004079820A1 Two-power source type integrated circuit |
| 09/16/2004 | WO2004079819A1 Method of forming trench isolation structure |
| 09/16/2004 | WO2004079818A1 Precision substrate storage container |
| 09/16/2004 | WO2004079817A1 Adhering and releasing method for protective tape |
| 09/16/2004 | WO2004079815A2 Non volatile memory cell |
| 09/16/2004 | WO2004079814A2 Modulated/composited cvd low-k films with improved mechanical and electrical properties for nanoelectronic devices |
| 09/16/2004 | WO2004079813A1 Substrate processor and method of manufacturing device |
| 09/16/2004 | WO2004079812A1 Improved method and apparatus for removing contaminants from the surface of a substrate |
| 09/16/2004 | WO2004079811A1 Plasma processing apparatus and method |
| 09/16/2004 | WO2004079810A1 Laser machining using an active assist gas |
| 09/16/2004 | WO2004079809A1 Electropolishing endpoint detection method |
| 09/16/2004 | WO2004079808A1 Substrate processing system and method for manufacturing semiconductor device |
| 09/16/2004 | WO2004079807A1 Defect-free thin and planar film processing |
| 09/16/2004 | WO2004079806A1 Vaporizer, film forming apparatus including the same, method of vaporization and method of forming film |
| 09/16/2004 | WO2004079805A1 Substrate-processing apparatus and temperature-regulating apparatus |
| 09/16/2004 | WO2004079804A1 Substrate processing device, and semiconductor device producing method |
| 09/16/2004 | WO2004079803A1 Nitride semiconductor device and method for manufacturing same |
| 09/16/2004 | WO2004079802A1 Substrate of gallium nitride single crystal and process for producing the same |
| 09/16/2004 | WO2004079801A1 Preventive treatment process for the ring of a multilayer wafer |
| 09/16/2004 | WO2004079800A1 Immersion liquid for immersion exposure process and resist pattern forming method using such immersion liquid |
| 09/16/2004 | WO2004079796A2 Atomic layer deposited dielectric layers |
| 09/16/2004 | WO2004079794A2 Trench power mosfet with planarized gate bus |
| 09/16/2004 | WO2004079786A2 Apparatus and method for reducing impurities in a semiconductor material |
| 09/16/2004 | WO2004079784A2 Integrated photodetector and heterojunction bipolar transistors |
| 09/16/2004 | WO2004079783A2 Method to improve profile control and n/p loading in dual doped gate applications |
| 09/16/2004 | WO2004079780A2 A method of patterning photoresist on a wafer using a reflective mask with a multi-layer arc |
| 09/16/2004 | WO2004079779A2 A method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 09/16/2004 | WO2004079764A2 Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions |
| 09/16/2004 | WO2004079744A2 Magnetic memory cell junction and method for forming a magnetic memory cell junction |
| 09/16/2004 | WO2004079742A2 Method of forming a flux concentrating layer of a magnetic device |
| 09/16/2004 | WO2004079700A1 Element transfer method and display device |
| 09/16/2004 | WO2004079598A1 Circuit arrangement design method and program |
| 09/16/2004 | WO2004079496A2 System for fabricating electrical circuits employing a fluid flow supporter |
| 09/16/2004 | WO2004079453A1 Resist material for liquid immersion exposure process and method of forming resist pattern with the resist material |
| 09/16/2004 | WO2004079059A1 (001)-orientated perovskite film formation method and device having perovskite film |
| 09/16/2004 | WO2004079042A1 Method of forming thin film, thin film forming apparatus, program and computer-readable information recording medium |
| 09/16/2004 | WO2004079039A1 Hafnium alloy target and process for producing the same |
| 09/16/2004 | WO2004078936A2 Methods for preventing gluconoylation of proteins |
| 09/16/2004 | WO2004078870A1 Conductive adhesive compositions with electical stability and good impact resistance for use in electronics devices |
| 09/16/2004 | WO2004078868A1 Vacuum ultraviolt ray bonding apparatus |
| 09/16/2004 | WO2004078411A2 Method and apparatus for local polishing control |
| 09/16/2004 | WO2004078410A2 Agent for increasing selection ratio of polishing rates |
| 09/16/2004 | WO2004078362A1 Coating apparatus and method for manufacturing organic electronic device |
| 09/16/2004 | WO2004064132A8 Method of producing a complex structure by assembling stressed structures |
| 09/16/2004 | WO2004061967A3 Well regions of semiconductor devices |
| 09/16/2004 | WO2004061916A3 Method of forming a low-k dual damascene interconnect structure |
| 09/16/2004 | WO2004061911A3 Semiconductor devices with reduced active region defects and unique contacting schemes |
| 09/16/2004 | WO2004059728A3 Method of fabricating an integrated circuit and semiconductor chip |
| 09/16/2004 | WO2004053995A3 Solid-state circuit assembly |
| 09/16/2004 | WO2004038772A3 Method to control dimensions of features on a substrate with an organic anti-reflective coating |
| 09/16/2004 | WO2004030013A3 Baffle plate in a plasma processing system |
| 09/16/2004 | WO2004028952A3 Small scale wires with microelectromechanical devices |
| 09/16/2004 | WO2004025746A3 Method for treating a photovoltaic active layer and organic photovoltaic element |
| 09/16/2004 | WO2004025711A3 Large area substrate processing system |
| 09/16/2004 | WO2004019384A3 Semiconductor constructions with gated isolation regions having indium-doped sub-regions |
| 09/16/2004 | WO2004006021A3 Optical device comprising an light source |
| 09/16/2004 | WO2003105223A3 Quad flat non-leaded package comprising a semiconductor device |
| 09/16/2004 | WO2003087945A3 Interferometric measuring device and projection illumination installation comprising one such measuring device |
| 09/16/2004 | WO2003067601A8 Magnetic storage unit using ferromagnetic tunnel junction element |
| 09/16/2004 | US20040181765 Layout and wiring system and recording medium recording the wiring method |
| 09/16/2004 | US20040181761 Circuit simulation for a circuit including transistors |
| 09/16/2004 | US20040181720 Isolation testing circuit and testing circuit optimization method |
| 09/16/2004 | US20040181630 Devices having horizontally-disposed nanofabric articles and methods of making the same |
| 09/16/2004 | US20040181486 Probe card designed by automated system |
| 09/16/2004 | US20040181386 Method of designing semiconductor device allowing control of current driving capability depending on shape of element forming region |
| 09/16/2004 | US20040181361 Graphic contour extracting method, pattern inspecting method, program and pattern inspecting system |
| 09/16/2004 | US20040181299 Prediction method and apparatus of a processing result |
| 09/16/2004 | US20040180612 Boron-containing polishing system and method |
| 09/16/2004 | US20040180610 Polishing apparatus and polishing method |
| 09/16/2004 | US20040180607 Polishing method and polishing apparatus |
| 09/16/2004 | US20040180558 Methods of forming silicon dioxide layers, and methods of forming trench isolation regions |
| 09/16/2004 | US20040180557 Method for forming silicon dioxide film using siloxane |
| 09/16/2004 | US20040180556 Method for modifying dielectric characteristics of dielectric layers |
| 09/16/2004 | US20040180555 Circuit constructions |
| 09/16/2004 | US20040180554 Composition for forming porous film and method for forming the same, porous film and method for forming the same, interlevel insulator film, and semiconductor device |
| 09/16/2004 | US20040180553 Method of depositing ALD thin films on wafer |
| 09/16/2004 | US20040180551 Carbon hard mask for aluminum interconnect fabrication |
| 09/16/2004 | US20040180550 Method for forming shallow trench isolation with control of bird beak |
| 09/16/2004 | US20040180549 Semiconductor device, method of manufacturing the same, circuit board and electronic apparatus |
| 09/16/2004 | US20040180548 Dual trench alternating phase shift mask fabrication |
| 09/16/2004 | US20040180547 Process integration for integrated circuits |
| 09/16/2004 | US20040180546 Polish method for semiconductor device planarization |
| 09/16/2004 | US20040180545 System, method and apparatus for improved local dual-damascene planarization |
| 09/16/2004 | US20040180544 Silicon substrate etching method and etching apparatus |
| 09/16/2004 | US20040180543 Semiconductor device with epitaxial C49-titanium silicide (TiSi2) layer and method for fabricating the same |
| 09/16/2004 | US20040180542 Low temperature deposition of complex metal oxides (CMO) memory materials for non-volatile memory integrated circuits |
| 09/16/2004 | US20040180541 Soft metal conductor and method of making |
| 09/16/2004 | US20040180540 Substrate fabrication method and substrate |
| 09/16/2004 | US20040180539 Method of forming a penetration electrode and substrate having a penetration electrode |
| 09/16/2004 | US20040180538 Method for producing a copper connection |