| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 11/25/2004 | DE10318283A1 Verfahren zur Herstellung einer verspannten Schicht auf einem Substrat und Schichtstruktur A method for producing a strained layer on a substrate and layered structure |
| 11/25/2004 | DE10318078A1 Protecting wiring on wafers/chips comprises covering wafer with wiring on its whole surface with organic layer to protect wiring from corrosion and oxidation and form sealed coating |
| 11/25/2004 | DE10314596B3 Metal oxide semiconductor-compensation transistor component has a semiconductor body with a rear side with deep macropores or trenches vertically aligned to source electrode structures on the front side and to the sink regions |
| 11/25/2004 | DE10302644B3 Verfahren zur Herstellung einer Metallschicht über einem strukturierten Dielektrikum mittels stromloser Abscheidung unter Verwendung eines Katalysators A process for producing a metal layer over a patterned dielectric by means of electroless plating using a catalyst |
| 11/25/2004 | DE10297464T5 Kristallmaterialien für die optische Lithographie unter 160 NM und Herstellungsverfahren Crystal materials for optical lithography below 160 nm and manufacturing processes |
| 11/25/2004 | DE10205122B4 Halbleitervorrichtung und Verfahren zur Herstellung derselben A semiconductor device and method of manufacturing the same |
| 11/25/2004 | DE102004022455A1 Bipolartransistor mit isolierter Steuerelektrode Bipolar transistor with insulated gate electrode |
| 11/25/2004 | DE102004020833A1 Material mit niedriger Wärmeausdehnung und hoher Wärmeleitfähigkeit auf Kupferbasis sowie Verfahren zum Herstellen desselben Of the same material of low thermal expansion and high thermal conductivity copper-based as well as methods for preparing |
| 11/25/2004 | DE102004019886A1 Integrierte Hochspannungsschaltung A high voltage IC |
| 11/25/2004 | DE102004017526A1 System und Verfahren zur Ausführung eines reaktiven Ionenätzprozesses an einer Metallschicht System and method for performing a reactive ion etching process in a metal layer |
| 11/25/2004 | DE102004016705A1 Verfahren zur Ausbildung einer Öffnung für einen Kontakt in einem Halbleiterbauelement A method of forming an opening for a contact in a semiconductor device |
| 11/25/2004 | DE102004014208A1 Chipbehältnis, Verfahren zur Herstellung eines Chipbehältnisses und Chiptransportbehälter Chip container, method of manufacturing a chip container, and chip transport container |
| 11/25/2004 | DE102004012815A1 Halbleiterbauelement und Verfahren zu dessen Herstellung Semiconductor device and process for its preparation |
| 11/25/2004 | DE102004009626A1 Struktur eines mikroelektronischen Kondensators mit radialem Stromfluß Structure of a microelectronic capacitor with radial current flow |
| 11/25/2004 | DE10056256B4 Neue Technik zur Verbesserung der Kapazität eines tiefen Grabens durch dessen Oberflächenvergrößerung New technology to improve the capacity of a deep trench through its surface enlargement |
| 11/25/2004 | CA2524484A1 Plasma processing apparatus and method for producing same |
| 11/25/2004 | CA2523346A1 Organic polymers, laminates, and capacitors |
| 11/25/2004 | CA2522606A1 Metal mems devices and methods of making same |
| 11/24/2004 | EP1480507A1 Semiconductor mounting apparatus |
| 11/24/2004 | EP1480304A1 Quantum nano-composite semiconductor laser and quantum nano-composite array |
| 11/24/2004 | EP1480275A2 SONOS memory device having nanocrystal layer |
| 11/24/2004 | EP1480274A2 Nonvolatile semiconductor memory device having gate stack including oha film and method of manufacturing the same |
| 11/24/2004 | EP1480272A2 Organic EL display device, electronic equipment, and method for manufacturing the same |
| 11/24/2004 | EP1480266A2 Process of making integrated electronic circuit with stacked elements and corresponding integrated electronic circuit. |
| 11/24/2004 | EP1480265A2 SOI substrate manufacturing method and SOI substrate processing apparatus |
| 11/24/2004 | EP1480263A1 Method of treating surface, semiconductor device, process for producing semiconductor device, and apparatus for treatment |
| 11/24/2004 | EP1480262A1 Heat treatment system |
| 11/24/2004 | EP1480261A1 Cooling device and heat treating device using the same |
| 11/24/2004 | EP1480260A1 Crystal manufacturing method |
| 11/24/2004 | EP1480259A1 Heating device for manufacturing semiconductor |
| 11/24/2004 | EP1480257A1 Method of manufacturing an electronic integrated circuit having a capacitor |
| 11/24/2004 | EP1480256A2 Thin-plate supporting container |
| 11/24/2004 | EP1480255A2 Thin-plate supporting container |
| 11/24/2004 | EP1480254A2 Lid unit for thin plate supporting container |
| 11/24/2004 | EP1480252A1 Apparatus for treatment of semiconductor wafer |
| 11/24/2004 | EP1480234A2 Integrated circuit inductor with integrated vias |
| 11/24/2004 | EP1480225A2 Asymmetric memory cell |
| 11/24/2004 | EP1480086A1 Lithographic apparatus and device manufacturing method |
| 11/24/2004 | EP1480085A2 A method for controlling a critical dimension (CD) in an etch process |
| 11/24/2004 | EP1480082A1 Ringfield four mirror system with convex primary mirror for EUV lithography |
| 11/24/2004 | EP1480081A2 Use of water soluble negative tone photoresist for producing closely spaced contact holes |
| 11/24/2004 | EP1480080A1 Lithographic apparatus and device manufacturing method |
| 11/24/2004 | EP1480072A2 High quality and ultra large screen liquid crystal display device and production method thereof |
| 11/24/2004 | EP1479795A1 Process for producing group iii nitride compound semiconductor |
| 11/24/2004 | EP1479793A2 Plating method |
| 11/24/2004 | EP1479790A1 Cvd deposition of hf and zr containing oxynitride films |
| 11/24/2004 | EP1479741A2 Chemical mechanical polishing method for STI |
| 11/24/2004 | EP1479700A1 Processes for preparing photoresist compositions |
| 11/24/2004 | EP1479479A1 Polishing pad |
| 11/24/2004 | EP1479267A1 System and method for lamp split zone control |
| 11/24/2004 | EP1479165A1 Floor planning for programmable gate array having embedded fixed logic circuitry |
| 11/24/2004 | EP1479143A2 Long wavelength vcsel comprising a tunnel junction with carbon doped gaassb |
| 11/24/2004 | EP1479109A2 Electronic device |
| 11/24/2004 | EP1479108A1 Bipolar transistor structure |
| 11/24/2004 | EP1479105A1 Floating gate memory cell, floating gate memory arrangement, switching circuit arrangement, and method for producing a floating gate memory cell |
| 11/24/2004 | EP1479104A1 Method of forming electrical connection means of ultimate dimensions and device comprising such connection means |
| 11/24/2004 | EP1479103A1 METHOD OF CREATING HIGH-QUALITY RELAXED SiGe-ON-INSULATOR FOR STRAINED Si CMOS APPLICATIONS |
| 11/24/2004 | EP1479102A1 METHOD OF FORMING DIFFERENT SILICIDE PORTIONS ON DIFFERENT SILICON−CONTAINING REGIONS IN A SEMICONDUCTOR DEVICE |
| 11/24/2004 | EP1479101A2 Integrated circuit having interconnect to a substrate and method therefor |
| 11/24/2004 | EP1479100A1 Method for fabricating a semiconductor device having different metal silicide portions |
| 11/24/2004 | EP1479025A2 Methods and apparatus for semiconductor testing |
| 11/24/2004 | EP1478979A2 An image forming method and apparatus |
| 11/24/2004 | EP1478978A2 Self-aligned pattern formation using dual wavelengths |
| 11/24/2004 | EP1478977A2 Polymers blends and their use in photoresist compositions for microlithography |
| 11/24/2004 | EP1478976A1 Critical dimension control using full phase and trim masks |
| 11/24/2004 | EP1478970A1 Method for manufacturing flat panel display substrates |
| 11/24/2004 | EP1478953A1 Monochromator mirror for the euv-spectral range |
| 11/24/2004 | EP1478708A1 Method and composition for polishing a substrate |
| 11/24/2004 | EP1478683A1 Spin-on-glass anti-reflective coatings for photolithography |
| 11/24/2004 | EP1478681A1 Spin-on-glass anti-reflective coatings for photolithography |
| 11/24/2004 | EP1478582A1 Wafer container cushion system |
| 11/24/2004 | EP1478494A1 Method and system for controlling the chemical mechanical polishing of substrates by calculating an overpolishing time and/or a polishing time of a final polishing step |
| 11/24/2004 | EP1478492A2 Polishing composition |
| 11/24/2004 | EP1392894B1 Molecular beam epitaxy equipment |
| 11/24/2004 | EP1226604A4 Fabrication process of a semiconductor device |
| 11/24/2004 | EP1218917B1 High transmission, low energy beamline apparatus for ion implanter |
| 11/24/2004 | EP1190448A4 Chip package with molded underfill |
| 11/24/2004 | EP1016129B1 Controlling threading dislocation densities using graded layers and planarization |
| 11/24/2004 | EP1004057B1 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
| 11/24/2004 | EP0984846B1 Method of manufacturing a polymeric polishing pad having photolithographically induced surface pattern |
| 11/24/2004 | EP0710430B1 Processing low dielectric constant materials for high speed electronics |
| 11/24/2004 | CN2658938Y Integrated circuit testing card |
| 11/24/2004 | CN1550124A Liquid crystal polymers for flexible circuits |
| 11/24/2004 | CN1550048A Method of forming chalcogenide comprising devices and method of forming a programmable memory cell of memory circuitry |
| 11/24/2004 | CN1550045A Method of depositing an oxide layer on a substrate and a photovoltaic cell using said substrate |
| 11/24/2004 | CN1550043A Semiconductor device and its manufacturing method |
| 11/24/2004 | CN1550040A 非易失性半导体存储器 The nonvolatile semiconductor memory |
| 11/24/2004 | CN1550038A Making contact with the emitter contact of a semiconductor |
| 11/24/2004 | CN1550037A Process for charged particle beam micro-machining of copper |
| 11/24/2004 | CN1550036A Method of fabricating low-dielectric constant interlevel dielectric films for beol interconnects with enhanced adhesion and low-defect density |
| 11/24/2004 | CN1550034A Constant pH polish and scrub |
| 11/24/2004 | CN1550033A Substrate holder and plating apparatus |
| 11/24/2004 | CN1550032A Four-bar linkage wafer clamping mechanism |
| 11/24/2004 | CN1550031A Shielding system for plasma chamber |
| 11/24/2004 | CN1550030A Elongated semiconductors, growing such semiconductors, devices including such semiconductors and fabricating such devices |
| 11/24/2004 | CN1550027A Configurable plasma volume etch chamber |
| 11/24/2004 | CN1550018A Compensation of a bias magnetic field in a storage surface of a magnetoresistive storage cell |
| 11/24/2004 | CN1550017A MRAM with midpoint generator reference |
| 11/24/2004 | CN1549957A Tool services layer for providing tool service functions in conjunction with tool functions |
| 11/24/2004 | CN1549954A Fluoropolymer-coated photomasks for photolithography |