H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2004
11/30/2004	US6825507 Semiconductor device having high electron mobility comprising a SiGe/Si/SiGe substrate
11/30/2004	US6825506 Field effect transistor and method of fabrication
11/30/2004	US6825502 Light emitting element, method of manufacturing the same, and semiconductor device having light emitting element
11/30/2004	US6825501 Robust Group III light emitting diode for high reliability in standard packaging applications
11/30/2004	US6825497 Active matrix substrate for a liquid crystal display and method of forming the same
11/30/2004	US6825496 Light emitting device
11/30/2004	US6825494 Polycrystalline silicon thin film used in a thin film transistor and a device using the same
11/30/2004	US6825493 Silicon crystallization method
11/30/2004	US6825492 Method of manufacturing a semiconductor device
11/30/2004	US6825488 Semiconductor device and manufacturing method thereof
11/30/2004	US6825486 System for mapping wafers using predictive dynamic lighting
11/30/2004	US6825482 Ion implantation system for manufacturing semiconductor device
11/30/2004	US6825481 Exposure apparatus, control method thereof, and device manufacturing method using the same
11/30/2004	US6825468 Fine stencil structure correction device
11/30/2004	US6825448 Low residual-stress brazed terminal for heater
11/30/2004	US6825447 Apparatus and method for uniform substrate heating and contaminate collection
11/30/2004	US6825249 Epoxy, silicone, acrylic or polyimide resin films; noncracking; void-free; accuracy
11/30/2004	US6825156 Semiconductor process residue removal composition and process
11/30/2004	US6825134 Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow
11/30/2004	US6825133 Use of fluorine implantation to form a charge balanced nitrided gate dielectric layer
11/30/2004	US6825132 Manufacturing method of semiconductor device including an insulation film on a conductive layer
11/30/2004	US6825131 Method for forming dielectric thin film and dielectric thin film formed thereby
11/30/2004	US6825130 CVD of porous dielectric materials
11/30/2004	US6825129 Method for manufacturing memory device
11/30/2004	US6825128 Method for manufacturing semiconductor device
11/30/2004	US6825125 Thin-film-transistor-array substrate, thin-film-transistor-array fabrication method, and display device
11/30/2004	US6825124 Method of forming metal line in semiconductor device
11/30/2004	US6825123 Method for treating semiconductor processing components and components formed thereby
11/30/2004	US6825122 Method for fabricating a patterned thin film and a micro device
11/30/2004	US6825121 Method of manufacturing a capacitor of a semiconductor device
11/30/2004	US6825120 Metal surface and film protection method to prolong Q-time after metal deposition
11/30/2004	US6825119 Method of piping defect detection
11/30/2004	US6825118 Method of manufacturing semiconductor device having trench element-isolating structure
11/30/2004	US6825117 High PH slurry for chemical mechanical polishing of copper
11/30/2004	US6825116 Method for removing structures
11/30/2004	US6825115 Post silicide laser thermal annealing to avoid dopant deactivation
11/30/2004	US6825114 Selective stress-inducing implant and resulting pattern distortion in amorphous carbon patterning
11/30/2004	US6825112 Semiconductor device and method of production thereof
11/30/2004	US6825110 Method for fabricating semiconductor component with an optimized thickness
11/30/2004	US6825109 Methods of fabricating buried digit lines
11/30/2004	US6825108 Ball grid array package fabrication with IC die support structures
11/30/2004	US6825106 Method of depositing a conductive niobium monoxide film for MOSFET gates
11/30/2004	US6825105 Manufacture of semiconductor devices with Schottky barriers
11/30/2004	US6825104 Semiconductor device with selectively diffused regions
11/30/2004	US6825102 Method of improving the quality of defective semiconductor material
11/30/2004	US6825101 Methods for annealing a substrate and article produced by such methods
11/30/2004	US6825100 Method for fabricating conductive line on a wafer
11/30/2004	US6825099 Method and apparatus for separating member
11/30/2004	US6825098 Method for fabricating microstructures and arrangement of microstructures
11/30/2004	US6825097 Triple oxide fill for trench isolation
11/30/2004	US6825096 Method of forming an alignment mark structure using standard process steps for forming vertical gate transistors
11/30/2004	US6825095 Methods of forming capacitors
11/30/2004	US6825094 Method for increasing capacitance of deep trench capacitors
11/30/2004	US6825093 Process window enhancement for deep trench spacer conservation
11/30/2004	US6825092 Semiconductor device having passive elements and method of making same
11/30/2004	US6825091 Semiconductor memory device and method of manufacturing same
11/30/2004	US6825090 Fluid dielectric variable capacitor
11/30/2004	US6825088 E-RAM with cobalt silicide layer over source/drain of memory cell part and over source/drain and gate wiring of logic part
11/30/2004	US6825087 Hydrogen anneal for creating an enhanced trench for trench MOSFETS
11/30/2004	US6825086 Strained-silicon channel CMOS with sacrificial shallow trench isolation oxide liner
11/30/2004	US6825085 Method to improve flash forward tunneling voltage (FTV) performance
11/30/2004	US6825084 Twin NAND device structure, array operations and fabrication method
11/30/2004	US6825083 Method for reducing shallow trench isolation edge thinning on thin gate oxides to improve peripheral transistor reliability and performance for high performance flash memory devices
11/30/2004	US6825082 Ferroelectric memory device and method of forming the same
11/30/2004	US6825081 Cell nitride nucleation on insulative layers and reduced corner leakage of container capacitors
11/30/2004	US6825080 Method for forming a MIM capacitor
11/30/2004	US6825079 Method for producing a horizontal insulation layer on a conductive material in a trench
11/30/2004	US6825078 Single poly-Si process for DRAM by deep N well (NW) plate
11/30/2004	US6825077 Method of forming memory cells and a method of isolating a single row of memory cells
11/30/2004	US6825076 Method of manufacturing the FeRAM semiconductor device with improved contact plug structure
11/30/2004	US6825075 Method of fabricating MIM capacitor with the encapsulated metal structure serving as the lower plate
11/30/2004	US6825074 Method of manufacturing a silicon-on-insulator (SOI) semiconductor device
11/30/2004	US6825073 Schottky diode with high field breakdown and low reverse leakage current
11/30/2004	US6825072 Method of manufacturing a semiconductor device
11/30/2004	US6825071 Semiconductor device and method of manufacturing the same
11/30/2004	US6825070 Electro-optical apparatus, driving substrate for an electro-optical apparatus and method of manufacturing them
11/30/2004	US6825069 System and method for fabricating a transistor by a low temperature heat treatment process
11/30/2004	US6825068 Process for fabricating thin film transistors
11/30/2004	US6825067 Mold cap anchoring method for molded flex BGA packages
11/30/2004	US6825065 Method for optical module packaging of flip chip bonding
11/30/2004	US6825064 Multi-chip semiconductor package and fabrication method thereof
11/30/2004	US6825055 Method for assembling integral type electronic component and integral type electronic component
11/30/2004	US6825053 Test key and method for validating the position of a word line overlaying a trench capacitor in DRAMS
11/30/2004	US6825051 Plasma etch resistant coating and process
11/30/2004	US6825049 Method and system for field assisted statistical assembly of wafers
11/30/2004	US6824958 Preparing a plurality of first photomasks including one or more resist masks; and transferring each pattern of said photomasks onto a second photomask by reduced projection exposure.
11/30/2004	US6824956 Addition polymer containing units of an adamantyl ester having hydroxy groups
11/30/2004	US6824955 Polymers, resist compositions and patterning process
11/30/2004	US6824951 Photoresist composition for resist flow process
11/30/2004	US6824933 Mask for manufacturing semiconductor devices, method for fabricating the same, and exposure method for the same
11/30/2004	US6824898 Dielectric thin film, method for making the same and electric components thereof
11/30/2004	US6824879 Comprising silicon-based compound and incorporatable organic absorbing compound that absorbs light at a wavelength less than 375 nm, wherein one of the silicon or absorber compounds comprises an alkyl, an alkoxy, a ketone, or an azo group
11/30/2004	US6824833 Stacked dielectric
11/30/2004	US6824825 Method for depositing metallic nitride series thin film
11/30/2004	US6824816 Process for producing metal thin films by ALD
11/30/2004	US6824814 Lanthanum/calcium/lead/manganese oxide (lcpmo); injecting perovskite precursor solution into spin-coating apparatus for deposition onto silicon substrate/electrode, baking, then annealing
11/30/2004	US6824757 Method and arrangement for generating ultrapure steam
11/30/2004	US6824699 Method of treating an insulting layer
11/30/2004	US6824697 Method for fabricating mems and microfluidic devices using smile, latent masking, and delayed locos techniques
11/30/2004	US6824666 Process control; controlling time and temperature; aftertreatment annealing

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