Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2005
02/17/2005US20050037619 Method and apparatus for supporting a semiconductor wafer during processing
02/17/2005US20050037618 Singulation method used in leadless packaging process
02/17/2005US20050037617 Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission
02/17/2005US20050037616 Method of improving surface planarity
02/17/2005US20050037614 Method for manufacturing wiring and method for manufacturing semiconductor device
02/17/2005US20050037613 Diffusion barrier for copper lines in integrated circuits
02/17/2005US20050037612 Superconductor device and method of manufacturing the same
02/17/2005US20050037611 EMI and noise shielding for multi-metal layer high frequency integrated circuit processes
02/17/2005US20050037610 Methods of filling trenches using high-density plasma deposition (HDP)
02/17/2005US20050037609 Semiconductor device and production method therefor
02/17/2005US20050037608 Deep filled vias
02/17/2005US20050037606 Insulative materials including voids and precursors thereof
02/17/2005US20050037605 Method of forming metal interconnection layer of semiconductor device
02/17/2005US20050037604 Multilayer interconnect structure containing air gaps and method for making
02/17/2005US20050037603 Method for forming, under a thin layer of a first material, portions of another material and/or empty areas
02/17/2005US20050037602 Semiconductor device using bumps, method for fabricating same, and method for forming bumps
02/17/2005US20050037601 Semiconductor package substrate having contact pad protective layer formed thereon and method for fabricating the same
02/17/2005US20050037600 Method for implanting ions into semiconductor substrate
02/17/2005US20050037599 Process for fabricating strained layers of silicon or of a silicon/germanium alloy
02/17/2005US20050037598 Method for producing polycrystalline silicon germanium and suitable for micromachining
02/17/2005US20050037597 Semiconductor processing system and method
02/17/2005US20050037596 Internal gettering in SIMOX SOI silicon substrates
02/17/2005US20050037595 Method of recovering and reproducing substrates and method of producing semiconductor wafers
02/17/2005US20050037594 [method of doping sidewall of isolation trench]
02/17/2005US20050037593 Process for producing an integrated electronic circuit comprising superposed components and integrated electronic circuit thus obtained
02/17/2005US20050037592 Devices having improved capacitance and methods of their fabrication
02/17/2005US20050037591 Method for producing a capacitor
02/17/2005US20050037590 Semiconductor device and method for manufacturing same
02/17/2005US20050037589 Method for forming inductor in semiconductor device
02/17/2005US20050037588 Method for manufacturing and structure of semiconductor device with sinker contact region
02/17/2005US20050037587 Heterojunction bipolar transistor
02/17/2005US20050037586 Method for manufacturing a bipolar transistor
02/17/2005US20050037585 Semiconductor device including air gap between semiconductor substrate and L-shaped spacer and method of fabricating the same
02/17/2005US20050037584 Methods of forming a transistor with an integrated metal silicide gate electrode
02/17/2005US20050037583 Semiconductor transistors and methods of fabricating the same
02/17/2005US20050037582 Device threshold control of front-gate silicon-on-insulator mosfet using a self-aligned back-gate
02/17/2005US20050037581 Multibit ROM cell and method therefor
02/17/2005US20050037580 Manufacturing method for semiconductor device
02/17/2005US20050037579 Method of fabricating semiconductor device
02/17/2005US20050037578 [method for forming an oxide/ nitride/oxide stacked layer]
02/17/2005US20050037577 Method of fabricating local sonos type gate structure and method of fabricating nonvolatile memory cell having the same
02/17/2005US20050037576 Method of manufacturing an array of bi-directional nonvolatile memory cells
02/17/2005US20050037575 Nonvolatile memory devices and methods of fabricating the same
02/17/2005US20050037574 Semiconductor memory device and manufacturing method thereof
02/17/2005US20050037573 Flash memories and methods of fabricating the same
02/17/2005US20050037572 Methods of fabricating flash memory devices including word lines with parallel sidewalls and related devices
02/17/2005US20050037571 Fowler-Nordheim block alterable EEPROM memory cell
02/17/2005US20050037570 Semiconductor capacitor structure and method to form same
02/17/2005US20050037569 Semiconductor device and method of manufacturing the same
02/17/2005US20050037568 Metal-insulator-metal capacitor
02/17/2005US20050037567 [split gate flash memory cell and manufacturing method thereof]
02/17/2005US20050037566 [split gate flash memory cell and manufacturing method thereof]
02/17/2005US20050037565 Method of fabricating an oxide collar for a trench capacitor
02/17/2005US20050037564 Method and structure of an auxiliary transistor arrangement used for fabricating a semiconductor memory device
02/17/2005US20050037563 Capacitor structures
02/17/2005US20050037562 Semiconductor capacitor structure and method for manufacturing the same
02/17/2005US20050037561 Self-aligned drain/channel junction in vertical pass transistor dram cell design for device scaling
02/17/2005US20050037560 Data storage medium
02/17/2005US20050037559 Method of manufacturing a semiconductor device
02/17/2005US20050037558 Method for fabricating transistor having fully silicided gate
02/17/2005US20050037557 Transition metal alloys for use as a gate electrode and devices incorporating these alloys
02/17/2005US20050037556 Formation of self-organized stacked islands for self-aligned contacts of low dimensional structures
02/17/2005US20050037555 Semiconductor device having a random grained polysilicon layer and a method for its manufacture
02/17/2005US20050037554 Method for manufacturing semiconductor device
02/17/2005US20050037553 Laser irradiation method, method for manufacturing a semiconductor device, and a semiconductor device
02/17/2005US20050037552 Beam irradiation apparatus, beam irradiation method, and method for manufacturing semiconductor device
02/17/2005US20050037551 Isotropic polycrystalline silicon and method for producing same
02/17/2005US20050037550 Thin film transistor using polysilicon and a method for manufacturing the same
02/17/2005US20050037549 Semiconductor device and method for forming the same
02/17/2005US20050037548 SOI field effect transistor element having a recombination region and method of forming same
02/17/2005US20050037547 Nanotube device structure and methods of fabrication
02/17/2005US20050037545 Flip chip on lead frame
02/17/2005US20050037544 Method of forming a leadframe for a semiconductor package
02/17/2005US20050037542 Process for producing a semiconductor device
02/17/2005US20050037541 Wafer processing method
02/17/2005US20050037540 Three-dimensional module comprised of layers containing IC chips with overlying interconnect layers and a method of making the same
02/17/2005US20050037539 Semiconductor package, semiconductor device, electronic device, and method for producing semiconductor package
02/17/2005US20050037538 Method for manufacturing solid-state imaging devices
02/17/2005US20050037537 Method for manufacturing semiconductor devices
02/17/2005US20050037536 Semiconductor packaging structure and method for forming the same
02/17/2005US20050037534 MEMS device and interposer and method for integrating MEMS device and interposer
02/17/2005US20050037533 Method of controlling a capacitance of a thin film transistor liquid crystal display (TFT-LCD) storage capacitor
02/17/2005US20050037531 Method for manufacturing micro-structural unit
02/17/2005US20050037530 Floating gate memory structures and fabrication methods
02/17/2005US20050037529 Method of fabricating display device
02/17/2005US20050037528 Thin film transistor liquid crystal display and fabrication method thereof
02/17/2005US20050037527 Light emitting element, method of manufacturing the same, and semiconductor device having light emitting element
02/17/2005US20050037526 Nitride semiconductor substrate production method thereof and semiconductor optical device using the same
02/17/2005US20050037524 Method of manufacturing semiconductor device having trench isolation
02/17/2005US20050037522 Dummy fill for integrated circuits
02/17/2005US20050037521 Methods and apparatus for processing semiconductor devices by gas annealing
02/17/2005US20050037520 Method for obtaining reversible resistance switches on a PCMO thin film when integrated with a highly crystallized seed layer
02/17/2005US20050037291 Method for forming fine resist pattern
02/17/2005US20050037289 monomers that can be homopolymerized or copolymerized with other reactive components to make resins within sub-200 nanometer (nm) photoresist compositions
02/17/2005US20050037275 Pattern forming method and wiring pattern forming method, and electro-optic device and electronic equipment
02/17/2005US20050037272 Method and apparatus for manufacturing semiconductor
02/17/2005US20050037271 For resist pattern; observation data such as electron microscopy is applied to model data created beforehand in accordance with the exposure conditions to estimate fluctuations in the exposure dose and the focal position
02/17/2005US20050037270 Method for measuring overlay shift
02/17/2005US20050037267 Illumination multilayer, vertical pattern through mask
02/17/2005US20050037154 Method for forming thin film