Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2005
02/17/2005US20050035404 High voltage transistor and method of manufacturing the same
02/17/2005US20050035403 System with meshed power and signal buses on cell array
02/17/2005US20050035402 Trench MOSFET with increased channel density
02/17/2005US20050035401 Semiconductor device manufacturing method
02/17/2005US20050035400 Semiconductor device
02/17/2005US20050035399 Semiconductor device
02/17/2005US20050035398 Trench MOSFET with recessed clamping diode
02/17/2005US20050035397 Semiconductor device
02/17/2005US20050035396 Non-volatile semiconductor memory device in which selection gate transistors and memory cells have different structures
02/17/2005US20050035395 Array of multi-bit ROM cells with each cell having bi-directional read and a method for making the array
02/17/2005US20050035394 Nonvolatile semiconductor device with floating gate structure
02/17/2005US20050035393 Split-gate non-volatile memory
02/17/2005US20050035392 Double-sided capacitor structure for a semiconductor device and a method for forming the structure
02/17/2005US20050035391 Multi-structured Si-fin and method of manufacture
02/17/2005US20050035390 Structure and method of making an enhanced surface area capacitor
02/17/2005US20050035389 Dynamic random access memory trench capacitors
02/17/2005US20050035388 Multi-bit memory unit and fabrication method thereof
02/17/2005US20050035387 Semiconductor memory device having high electrical performance and mask and photolithography friendliness
02/17/2005US20050035386 Magnetic tunnel junction structure having an oxidized buffer layer and method of fabricating the same
02/17/2005US20050035385 Semiconductor memory device
02/17/2005US20050035384 Ferroelectric memory devices having expanded plate lines
02/17/2005US20050035379 Semiconductor device structured to prevent oxide damage during HDP CVD
02/17/2005US20050035378 MOS transistor and method of manufacturing the same
02/17/2005US20050035377 Solid-state camera device and method of manufacturing the same, and method of making mask for manufacturing the device
02/17/2005US20050035372 Semiconductor device for integrated injection ligic cell and process for fabricating the same
02/17/2005US20050035371 Semiconductor device with alternating conductivity type layer and method of manufacturing the same
02/17/2005US20050035370 Semiconductor structure for a heterojunction bipolar transistor and a method of making same
02/17/2005US20050035369 Structure and method of forming integrated circuits utilizing strained channel transistors
02/17/2005US20050035363 Light emitting element, method of manufacturing the same, and semiconductor device having light emitting element
02/17/2005US20050035359 Semiconductor device and semiconductor substrate, and method of fabricating the same
02/17/2005US20050035357 Semiconductor package having light sensitive chips
02/17/2005US20050035356 Opto-coupler
02/17/2005US20050035352 Thin film semiconductor element and method of manufacturing the same
02/17/2005US20050035351 Device and method for protecting gate terminal and lead
02/17/2005US20050035350 Thin film transistor liquid crystal display and manufacturing method thereof
02/17/2005US20050035349 Epitaxial wafer and method for manufacturing method
02/17/2005US20050035348 Bottom gate-type thin-film transistor and method for manufacturing the same
02/17/2005US20050035347 Probe card assembly
02/17/2005US20050035345 Semiconductor device with high-k gate dielectric
02/17/2005US20050035313 Method and apparatus for mapping of wafers located inside a closed wafer cassette
02/17/2005US20050035308 Pattern writing equipment
02/17/2005US20050035307 Lithographic apparatus, device manufacturing method, and device manufactured thereby
02/17/2005US20050035306 Focused charged particle beam apparatus
02/17/2005US20050035299 Lens array with a laterally movable optical axis for corpuscular rays
02/17/2005US20050035290 Automatic methods for focus and astigmatism corrections in charged-particle beam instrument
02/17/2005US20050035270 Solid state image pickup device and method of fabricating the same
02/17/2005US20050035181 Package substrate and process thereof
02/17/2005US20050035113 Guided heating apparatus and method for using the same
02/17/2005US20050035108 Heat-treatment system and method
02/17/2005US20050035104 Laser irradiation method, laser irradiation apparatus, and method of manufacturing a semiconductor device
02/17/2005US20050035103 Laser thin film poly-silicon annealing optical system
02/17/2005US20050035100 Method of dividing a plate-like workpiece
02/17/2005US20050035099 Method of dividing a plate-like workpiece
02/17/2005US20050035095 Laser annealing apparatus and semiconductor device manufacturing method
02/17/2005US20050035000 Positioning microelecrtrons substrate between electrodes; polishing; removal electroconductive materials; detecting signals
02/17/2005US20050034999 Methods and apparatus for electrically and/or chemically-mechanically removing conductive material from a microelectronic substrate
02/17/2005US20050034976 Method and apparatus for plating and polishing semiconductor substrate
02/17/2005US20050034960 Parts mounting and assembling apparatus
02/17/2005US20050034821 Method and apparatus for separating member
02/17/2005US20050034818 Apparatus and methods for coverlay removal and adhesive application
02/17/2005US20050034816 Plasma generation and control using a dual frequency RF source
02/17/2005US20050034815 Plasma processor
02/17/2005US20050034814 Method for removing the harmful effects of organic halogen compound gas, apparatus for removing the harmful effects of organic halogen compound gas, system for fabricating semiconductor devices, and method for fabricating semiconductor devices
02/17/2005US20050034812 Wafer probe for measuring plasma and surface characteristics in plasma processing environments
02/17/2005US20050034811 Sensor array for measuring plasma characteristics in plasma processing enviroments
02/17/2005US20050034810 Mask and container and manufacturing apparatus
02/17/2005US20050034809 Integrated tool with interchangeable wet processing components for processing microfeature workpieces and automated calibration systems
02/17/2005US20050034767 Processing apparatus having integrated pumping system
02/17/2005US20050034756 Method for forming a Si film, Si film and solar battery
02/17/2005US20050034745 Processing a workpiece with ozone and a halogenated additive
02/17/2005US20050034744 Ashing photoresist pattern; srtripping residues; aqueous solution containing tetramethylammonium hydroxide
02/17/2005US20050034743 Apparatus and method for cleaning probe card contacts
02/17/2005US20050034742 Cleaning method and cleaning apparatus
02/17/2005US20050034675 Susceptor and surface processing method
02/17/2005US20050034674 Processing apparatus for object to be processed and processing method using same
02/17/2005US20050034672 Evaporation source for deposition process and insulation fixing plate, and heating wire winding plate and method for fixing heating wire
02/17/2005US20050034667 Method and apparatus for forming silicon-containing insulation film having low dielectric constant
02/17/2005US20050034665 Apparatus for forming a film by CVD
02/17/2005US20050034664 Apparatus for depositing
02/17/2005US20050034661 System for developing a nitrogen-containing active region
02/17/2005US20050034660 Alignment means for chamber closure to reduce wear on surfaces
02/17/2005US20050034654 Method and apparatus for doping semiconductors
02/17/2005US20050034653 Polycrystalline tft uniformity through microstructure mis-alignment
02/17/2005US20050034622 Method for fabricating pattern, apparatus for fabricating pattern, conductive film wiring, method for fabricating device, electro-optical apparatus, and electronic apparatus
02/17/2005US20050034577 Apparatus and method for indexing and severing film
02/17/2005US20050034303 Process to allow electrical and mechanical connection of an electrical device with a face equipped with contact pads
02/17/2005US20050034288 Wafer position teaching method and teaching jig
02/17/2005DE19836032B4 Verfahren zum Herstellen eines Bipolar-Transistors und eines MOS-Transistor-Gates A method of manufacturing a bipolar transistor and a MOS transistor gate
02/17/2005DE19821452B4 Verfahren zur Herstellung einer Flachgrabenisolierung in einem Halbleitersubstrat A process for producing a flat grave isolation in a semiconductor substrate,
02/17/2005DE19741520B4 Vorrichtung zum Ausrichten gekerbter Wafer Apparatus for aligning notched wafer
02/17/2005DE10392497T5 Herstellungsverfahren und Herstellungsvorrichtung zum Vermeiden eines Prototypen-Aufschubs bei der ASIC/SOC-Herstellung Manufacturing process and manufacturing apparatus for avoiding a prototype deferral in ASIC / SOC-production
02/17/2005DE10392472T5 Halbleitererhitzungsverfahren mit gepulster Verarbeitung unter Verwendung von kombinierten Heizquellen Semiconductor heating method with pulsed processing using combined heat sources
02/17/2005DE10392464T5 Maskenmuster-Korrekturverfahren, Herstellungsverfahren einer Halbleitervorrichtung, Maskenherstellungsverfahren und Maske Mask pattern correction method, a semiconductor device manufacturing method, mask fabrication method and mask
02/17/2005DE10391795T5 Verfahren zum Bearbeiten eines Halbleiterwafers A method of processing a semiconductor wafer
02/17/2005DE10359493A1 Integrationsverfahren für eine Halbleitervorrichtung mit einer vertieften Gate-Elektrode Integration process for a semiconductor device with a recessed gate electrode
02/17/2005DE10352641A1 Charge-trapping memory cell especially SONOS- and NROM- storage cells, has memory layer sequence for charge-trapping with memory zone between confinement layers
02/17/2005DE10348253B3 Bonding of electronic chips inside a radiation transparent housing comprises directing radiation of specific wavelength through the housing wall to cure adhesive between chip and wall
02/17/2005DE10345391B3 Multi-chip module for a semiconductor device comprises a rewiring arrangement formed as a contact device on the substrate and on a contact protrusion
02/17/2005DE10336039A1 Positionierhilfe und Verfahren zur Unterstützung derAusrichtung von schweren Maschinen Positioning and procedures to support derAusrichtung of heavy machinery
02/17/2005DE10334522A1 Process for the liquid phase epitaxial production of a semiconductor arrangement for producing IR emitters comprises epitaxially forming a semiconductor layer of a III-V compound semiconductor from a melt containing an arsenide dopant