Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/2005
06/29/2005EP1546827A1 Method and apparatus for the monitoring and control of a semiconductor manufacturing process
06/29/2005EP1546804A1 Device for transferring a pattern to an object
06/29/2005EP1546681A1 A method of manufacturing integrated circuit sensors
06/29/2005EP1546656A2 Method and apparatus for monitoring integrated circuit fabrication
06/29/2005EP1546650A1 Process endpoint detection method using broadband reflectometry
06/29/2005EP1546649A1 Method for in-situ monitoring of patterned substrate processing using reflectometry
06/29/2005EP1546437A2 Thin films of oxidic materials having a high dielectric constant
06/29/2005EP1546222A1 Photoresists, fluoropolymers and processes for 157 nm microlithography
06/29/2005EP1546221A2 PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY
06/29/2005EP1546028A2 Method for selectively covering a micro machined surface
06/29/2005EP1546026A2 Fabrication of 3d photopolymeric devices
06/29/2005EP1545836A1 Retaining ring for holding semiconductor wafers in a chemical-mechanical polishing device
06/29/2005EP1545832A1 Partial-membrane carrier head
06/29/2005EP1545828A1 Method and appartus for high volume assembly of radio frequency identification tags
06/29/2005EP1335997B1 Method and device for controlling the surface temperatures of substrates in a chemical vapour deposition reactor
06/29/2005EP1317801B1 Thick film millimeter wave transceiver module
06/29/2005EP1060647A4 Method of making microwave, multifunction modules using fluoropolymer composite substrates
06/29/2005EP1007762B1 Method and apparatus for detecting the endpoint of a chamber cleaning
06/29/2005CN2706861Y Longitudinal heat treatment device
06/29/2005CN1633714A 2f2 memory device system and method
06/29/2005CN1633713A Folded bit line dram with vertical ultra thin body transistors
06/29/2005CN1633712A 半导体器件及其制造方法 Semiconductor device and manufacturing method thereof
06/29/2005CN1633709A Semicoductor radiating substrate and production method therefor and package
06/29/2005CN1633708A Semiconductor device and method of manufacturing the same
06/29/2005CN1633707A Method and apparatus for nitride spacer etch process implementing in situ interferometry endpoint detection and non-interferometry endpoint monitoring
06/29/2005CN1633705A Semiconductor device and method of manufacturing the same
06/29/2005CN1633704A 半导体装置及其制造方法 Semiconductor device and manufacturing method thereof
06/29/2005CN1633703A Method of forming nickel silicide using a one-step rapid thermal anneal process and backend processing
06/29/2005CN1633702A Substrate treating method and production method for semiconductor device
06/29/2005CN1633701A Post-etch photoresist strip with O2 and NH3 for organosilicate glass low-K dielectric etch applications
06/29/2005CN1633700A Method for fabricating group iii nitride compound semiconductors and group iii nitride compound semiconductor devices
06/29/2005CN1633699A Charge controlled avalanche photodiode and method of making the same
06/29/2005CN1633698A Chemical-mechanical polishing slurry and method
06/29/2005CN1633658A 集成电路芯片设计 IC chip design
06/29/2005CN1633627A Photosensitve resin composition
06/29/2005CN1633626A Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask
06/29/2005CN1633602A Semiconductor device and its test method
06/29/2005CN1633600A Contact structure having silicon finger contactor
06/29/2005CN1633523A Method for forming a micro-pattern on a substrate by using capillary force
06/29/2005CN1633520A Plating device and method
06/29/2005CN1633519A Electroplating solution containing organic acid complexing agent
06/29/2005CN1633518A Aperture masks for circuit fabrication
06/29/2005CN1633517A In-line deposition processes for circuit fabrication
06/29/2005CN1633515A Aperture masks for circuit fabrication
06/29/2005CN1633513A Lead-free tin-silver-copper alloy solder composition
06/29/2005CN1633487A Adhesive sheet and semiconductor device and process for producing the same
06/29/2005CN1633486A Process for chemical-mechanical polishing of metal substrates
06/29/2005CN1633383A Glass substrate package
06/29/2005CN1632954A Picture element structure and thin film transistor array and mending method thereof
06/29/2005CN1632953A High power MOS transistor and manufacturing method thereof
06/29/2005CN1632952A Non-volatile memory structure and method for manufacturing same
06/29/2005CN1632951A Thin-film transistor array substrate and mending method thereof
06/29/2005CN1632948A Method for implementing signal transmission between ICs using multilevel technology
06/29/2005CN1632946A Method for making polysilicon high-ohmic resistor of integrated circuit
06/29/2005CN1632945A Non-volatile memory structure and method for manufacturing same
06/29/2005CN1632944A Method for manufacturing high-voltage integrated circuit
06/29/2005CN1632943A Method for manufacturing high accuracy analog circuit chip
06/29/2005CN1632942A Technique for porous filling damascene using light sensitive material
06/29/2005CN1632941A Method for forming etching barrier layer in dual damascene structure
06/29/2005CN1632940A Method for separately surface treatment to intermediate window and groove of double inlay
06/29/2005CN1632939A A shallow groove isolation technique in integrated circuit manufacturing technique
06/29/2005CN1632938A Shallow grooved-isolation technique without hard mask
06/29/2005CN1632937A Shallow junction shield groove technique for protecting active region area
06/29/2005CN1632936A Method for detecting interface defects of silicon bonding wafer
06/29/2005CN1632935A Testing method for chip synchronous clock and chip capable of synchronously testing clock function
06/29/2005CN1632934A Multi-diameter solder ball automatic releasing device
06/29/2005CN1632933A Surface passivation method for nuclear detector tellurium-zinc-cadmium wafer
06/29/2005CN1632932A A method for manufacturing thin-film transistor
06/29/2005CN1632931A Technique for improving voltage resistance of reduced surface field type LDMOS device
06/29/2005CN1632930A Plasma processing technique for reducing MOCVD TiN film thickness on through-hole side wall
06/29/2005CN1632929A Method for preparing porous thin film material with low dielectric constant
06/29/2005CN1632928A Filming method of silicon wafer after IMD CMP
06/29/2005CN1632927A Plasma etching method for eliminating organic substance using sulfur dioxide mixture gas
06/29/2005CN1632926A Silicon microbridge corrosion unit for ferroelectric film infrared detector
06/29/2005CN1632925A Wafer bonding surface processing agent and wafer bonding method
06/29/2005CN1632924A Wafer jetter assembly
06/29/2005CN1632923A Method for forming auto-alignment contact window
06/29/2005CN1632922A Novel ultra-thin nitrogen-contained grid medium preparing method
06/29/2005CN1632921A Two-step reduction etching technique capable of reducing grid characteristic dimension
06/29/2005CN1632920A Method for accurately controlling ion implantation concentration and pressure compensating factor synchronous control method
06/29/2005CN1632919A Method for eliminating primary pit defects of silicon monocrystal device making area
06/29/2005CN1632918A Thick epitaxy method capable of keeping good graphic completeness
06/29/2005CN1632917A Method for forming semiconductor material wafer and structure therefor
06/29/2005CN1632916A Method for manufacturing semiconductor device
06/29/2005CN1632915A Method for distinguishing imperfect graphic spacing to improve microimage process
06/29/2005CN1632914A Electroplating and/or electropolishing stand and method for electroplating and/or electropolishing wafers
06/29/2005CN1632913A Method for making silicon thin film on insulating silicon based substrate with graphics
06/29/2005CN1632912A Gas processing equipment having clearing device
06/29/2005CN1632911A Method for making thin film by transferring on base plate
06/29/2005CN1632910A Control wafer recovery and regenerating method and control wafer structure thereof
06/29/2005CN1632909A Injection apparatus for high-density plasma process
06/29/2005CN1632898A Middle concentration P-type doping transmission type gallium arsenide optical cathode material and method for preparing same
06/29/2005CN1632699A Method for manufacturing micro mechanical components with different aspect ratio using X-ray exposure
06/29/2005CN1632698A Method for projecting and photo etching on thick epitaxial layer
06/29/2005CN1632696A Light shield and method for forming polycrystalline silicon layer applying the same
06/29/2005CN1632685A Array substrate of thin film transistor liquid crystal display and manufacturing method thereof
06/29/2005CN1632681A Manufacturing method of liquid crystal display device
06/29/2005CN1632679A Copper conductor structure for liquid crystal display assembly and manufacturing method thereof
06/29/2005CN1632678A Copper conductor structure for liquid crystal display assembly and manufacturing method thereof
06/29/2005CN1632675A Method for manufacturing dot structure of thin film transistor liquid crystal display
1 ... 3807 3808 3809 3810 3811 3812 3813 3814 3815 3816 3817 3818 3819 3820 3821 3822 3823 3824 3825 3826 3827 ... 6590