Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/2005
06/30/2005US20050142737 Methods of fabricating MIM capacitors in semiconductor devices
06/30/2005US20050142736 Methods of fabricating semiconductor devices
06/30/2005US20050142735 Method of fabricating MOS transistor
06/30/2005US20050142734 Isolation methods in semiconductor devices
06/30/2005US20050142733 Thin film capacitor and its manufacture method
06/30/2005US20050142732 Semiconductor device and fabricating method thereof
06/30/2005US20050142731 Lateral phase change memory and method therefor
06/30/2005US20050142730 Method of manufacturing CMOS transistor by using SOI substrate
06/30/2005US20050142729 Methods for forming a field effect transistor
06/30/2005US20050142728 Methods of forming wells in semiconductor devices
06/30/2005US20050142727 Methods of forming silicide layer of semiconductor device
06/30/2005US20050142726 Method of forming gate of flash memory cell
06/30/2005US20050142725 Method of fabricating non-volatile memory device
06/30/2005US20050142724 Method of fabricating isolated semiconductor devices in epi-less substrate
06/30/2005US20050142723 Method of fabricating high-voltage CMOS device
06/30/2005US20050142722 Method for fabricating gate electrode of semiconductor device
06/30/2005US20050142721 Methods of fabricating nonvolatile memory using a quantum dot
06/30/2005US20050142720 Method for fabricating MOS field effect transistor
06/30/2005US20050142719 Method of fabricating MOS transistor
06/30/2005US20050142718 Semiconductor device having a dual-damascene gate and manufacturing method thereof
06/30/2005US20050142717 Method of forming transistors with ultra-short gate feature
06/30/2005US20050142716 Method of manufacturing semiconductor device, film-forming apparatus, and storage medium
06/30/2005US20050142715 Semiconductor device with high dielectric constant insulator and its manufacture
06/30/2005US20050142714 Method of fabricating thin film transistor array substrate
06/30/2005US20050142713 Method of manufacturing a semiconductor integrated circuit device
06/30/2005US20050142712 Method for forming gate dielectric layer
06/30/2005US20050142711 Method of manufacturing a semiconductor device
06/30/2005US20050142710 Method of forming antistatic film and image display device formed thereby
06/30/2005US20050142709 Method for fabricating field effect transistor
06/30/2005US20050142708 Method for forming polycrystalline silicon film
06/30/2005US20050142707 Method of crystallizing/activating polysilicon layer and method of fabricating thin film transistor having the same polysilicon layer
06/30/2005US20050142706 Method of preventing semiconductor layers from bending and semiconductor device formed thereby
06/30/2005US20050142705 Semiconductor device and method for manufacturing the same
06/30/2005US20050142704 Method for fabricating liquid crystal display device
06/30/2005US20050142703 Dual-gate transistor device and method of forming a dual-gate transistor device
06/30/2005US20050142702 Semiconductor device and manufacturing method thereof
06/30/2005US20050142701 Display device and method for manufacturing the same
06/30/2005US20050142700 Strained silicon on a SiGe on SOI substrate
06/30/2005US20050142699 Method and structure for electrostatic discharge protection of photomasks
06/30/2005US20050142698 Method for fabricating split gate flash memory device
06/30/2005US20050142697 Fabrication method of semiconductor integrated circuit device
06/30/2005US20050142696 Method of backside grinding a bumped wafer
06/30/2005US20050142695 Induction-based heating for chip attach
06/30/2005US20050142694 Stacking memory chips using flat lead-frame with breakaway insertion pins and pin-to-pin bridges
06/30/2005US20050142693 Semiconductor device with intermediate connector
06/30/2005US20050142692 Wafer-level packaging of optoelectronic devices
06/30/2005US20050142691 Mounting structure of semiconductor chip, semiconductor device and method of making the semiconductor device
06/30/2005US20050142690 Method for forming contact in semiconductor device
06/30/2005US20050142687 Method for manufacturing a semicondutor component, as well as a semicondutor component, in particular a diaphragm sensor
06/30/2005US20050142685 Hermetic wafer-level packaging for MEMS devices with low-temperature metallurgy
06/30/2005US20050142683 System for developing a nitrogen-containing active region
06/30/2005US20050142682 Method for fabricating nitride semiconductor, method for fabricating nitride semiconductor device, and nitride semiconductor device
06/30/2005US20050142681 Mask and method of manufacturing liquid crystal display device using the same
06/30/2005US20050142680 Method for fabrication liquid crystal display device and diffraction mask therefor
06/30/2005US20050142679 Method of manufacturing array substrate for liquid crystal display device
06/30/2005US20050142677 Semiconductor light emitting device and its manufacture
06/30/2005US20050142676 Method for fabricating polysilicon liquid crystal display device
06/30/2005US20050142674 Fabrication method of semiconductor integrated circuit device
06/30/2005US20050142673 Method for manufacturing semiconductor device
06/30/2005US20050142672 Method for monitoring an ion implanter
06/30/2005US20050142671 Low energy dose monitoring of implanter using implanted wafers
06/30/2005US20050142670 Method for determining the equivalency index of products and processes
06/30/2005US20050142669 Method for patching up thin-film transistor circuits on a display panel by local thin-film deposition
06/30/2005US20050142668 Method of manufacturing thin film magnetic head
06/30/2005US20050142667 Fabrication method of self-aligned ferroelectric gate transistor using buffer layer of high etching selectivity
06/30/2005US20050142597 For confining liquids inside the channels for use in biological tests such as cell purification, lysis, amplification or purification, and analysis of the resulting amplified or purified product
06/30/2005US20050142551 Fabrication of a high resolution biological molecule detection device with aluminum electrical conductors
06/30/2005US20050142501 Method of forming an isolated line pattern using photolithography
06/30/2005US20050142500 Exposure methods
06/30/2005US20050142497 Method of forming a pattern in a semiconductor device and method of forming a gate using the same
06/30/2005US20050142486 Chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths; polymers containing acrylate/anhydride groups exhibit improved adhesion to underlying silicon oxynitride and silicon nitride surfaces; relief imaging
06/30/2005US20050142481 Poly(meth)acrolein acetalized with a hydroxyalkyl alkanoate, e.g., ethyl lactate; capable of preventing scattered reflection from a bottom film layer, eliminating standing wave effect due to alteration of of the photoresist film, and increasing thickness uniformity; increased etching velocity
06/30/2005US20050142465 Method for fabricating a liquid crystal display device
06/30/2005US20050142461 Photo mask and method for fabricating the same
06/30/2005US20050142460 Method of fabricating a photomask
06/30/2005US20050142459 Line photo masks and methods of forming semiconductor devices using the same
06/30/2005US20050142457 Improving line resolution by using an overlapping exposing process; pattern bridges can be completely removed by the overlapping exposing process
06/30/2005US20050142456 Masks for fabricating semiconductor devices and methods of forming mask patterns
06/30/2005US20050142454 Grid with a space smaller than a minimum pitch allowed by a design rule, and provides hole patterns at lattice points, which are the intersections of the grid; semiconductor integrated circuit manufacturing; flexibility of hole pattern arrangement and quality of hole pattern arrangement easily evaluated
06/30/2005US20050142453 Mask pattern with edges having inverted shapes to alleviate the effects of diffraction of laser beams to reduce overlap regions such that crystallization characteristics are improved
06/30/2005US20050142452 Polycrystalline silicon thin film having uniform crystallization characteristics
06/30/2005US20050142451 Includes a transmissive portion defining a crystallization pattern and an alignment pattern, and a shielding portion surrounding the transmissive portion; use making an liquid crystal display (LCD) device where a driving circuit and a pixel thin film transistor are formed on a single substrate
06/30/2005US20050142450 Laser beam pattern mask and crystallization method using the same
06/30/2005US20050142449 Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography
06/30/2005US20050142364 High strain point glasses
06/30/2005US20050142361 Amorphous carbon, amorphous-carbon coated member, and process for forming amorphous carbon film
06/30/2005US20050142299 Method for forming polycrystalline silicon film of polycrystalline silicon TFT
06/30/2005US20050142293 separating pattern layouts into discrete design layers having only parallel layout features; multi-pass features can be avoided, and homogenous, smooth-edged printed patterns can be printed
06/30/2005US20050142290 Substrate support adapter system
06/30/2005US20050142050 Laser beam generator; mask mounted over stage being moved to transmit laser beam; alignment keys are formed on a substrate with one mask having multiple different patterns, and a crystallization process is progressed in parallel to an imaginary line connecting the alignment keys with information
06/30/2005US20050142010 Fore-line preconditioning for vacuum pumps
06/30/2005US20050142000 Plasma-based gas treatment system integrated in a vacuum pump
06/30/2005US20050141891 Line width measuring method, substrate processing method, substrate processing apparatus and substrate cooling processing unit
06/30/2005US20050141839 Waveguide compositions and waveguides formed therefrom
06/30/2005US20050141838 Optical waveguide device and manufacturing method thereof
06/30/2005US20050141764 Pattern analysis method and pattern analysis apparatus
06/30/2005US20050141761 Method and apparatus for measuring dimensions of a pattern on a semiconductor device
06/30/2005US20050141584 Optical coupler and electronic equipment using same
06/30/2005US20050141580 Laser thin film poly-silicon annealing system
06/30/2005US20050141579 Semiconductor laser and method for fabricating the same