| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 02/15/2006 | CN1734771A Floating gate type involatile memory and its manufacturing method |
| 02/15/2006 | CN1734770A Floating gate type nonvolatile memory |
| 02/15/2006 | CN1734769A Semiconductor device and method for fabricating the same |
| 02/15/2006 | CN1734766A Resistor element, semiconductor integrated circuit device having the same, and fabrication methods thereof |
| 02/15/2006 | CN1734764A Semiconductor device with crack prevention ring and method of manufacture thereof |
| 02/15/2006 | CN1734763A MIM capacitor on CMOS device and manufacturing method thereof |
| 02/15/2006 | CN1734762A Matrix type LED and manufacturing method thereof |
| 02/15/2006 | CN1734760A 半导体元件及其制造方法 Semiconductor device and manufacturing method |
| 02/15/2006 | CN1734759A Bonding configurations for lead-frame-based and substrate-based semiconductor packages and method of fabrication thereof |
| 02/15/2006 | CN1734755A Method for metallization and passivation of solderable topmost part of source packaging semiconductor die |
| 02/15/2006 | CN1734754A Integrated circuit packaging structure and manufacturing method thereof |
| 02/15/2006 | CN1734750A Method for manufacturing film integrated circuit and element substrate |
| 02/15/2006 | CN1734749A Transferring method of thin film device, production method of active matrix substrate |
| 02/15/2006 | CN1734748A Process for manufacturing 0.8 micron silicon bipolar CMOS integrated circuit |
| 02/15/2006 | CN1734747A Titanium silicide realization method in CMOS process by means of titanium deposition at normal temperature |
| 02/15/2006 | CN1734746A Method for manufacturing semiconductor member |
| 02/15/2006 | CN1734745A Lens structures suitable for use in image sensors and method for making the same |
| 02/15/2006 | CN1734744A Physical design system and method |
| 02/15/2006 | CN1734743A Method of forming wiring pattern and method of manufacturing tft substrate using the same |
| 02/15/2006 | CN1734742A Layer arrange forming method and layer arrange |
| 02/15/2006 | CN1734741A Method for manufacturing semiconductor devices |
| 02/15/2006 | CN1734740A Sequential reducing plasma and inert plasma pre-treatment method for oxidizable conductor layer |
| 02/15/2006 | CN1734739A Method for manufacturing capacitor |
| 02/15/2006 | CN1734738A Systems and methods for temperature control of semiconductor wafers |
| 02/15/2006 | CN1734737A Intermetallic spring structure |
| 02/15/2006 | CN1734736A TV and electronic apparatus and method for making semiconductor member |
| 02/15/2006 | CN1734735A Method of controlling crystal surface morphology using metal adsorption |
| 02/15/2006 | CN1734734A Film forming method, film forming device and storage medium |
| 02/15/2006 | CN1734733A Silicon-based material layer, forming method, structure, device, emitter and display incorporating the silicon-based material layer |
| 02/15/2006 | CN1734732A Al/Ti/Al/Ti/Au ohmic contact system adapted to GaN device |
| 02/15/2006 | CN1734731A Ti/Al/Ti/Pt/Au ohmic contact system adapted to GaN device |
| 02/15/2006 | CN1734730A Al/Ti/Al/Ni/Au ohmic contact system adapted to GaN device |
| 02/15/2006 | CN1734729A Al/Ti/Al/Pt/Au ohmic contact system adapted to GaN device |
| 02/15/2006 | CN1734728A Al/Ti/Al/Ti/Pt/Au ohmic contact system adapted to GaN device |
| 02/15/2006 | CN1734727A Method of fabricating metal silicate layer using atomic layer deposition technique |
| 02/15/2006 | CN1734726A Method and apparatus for forming silicon oxide film |
| 02/15/2006 | CN1734725A 紫外线阻挡层 UV barrier |
| 02/15/2006 | CN1734724A Plasma processing method and post-processing method |
| 02/15/2006 | CN1734723A Wafer dividing method and apparatus |
| 02/15/2006 | CN1734722A Etching method, a method of forming a trench isolation structure, a semiconductor substrate and a semiconductor apparatus |
| 02/15/2006 | CN1734721A Semiconductor-dielectric-semiconductor device structure fabricated by wafer bonding |
| 02/15/2006 | CN1734720A Crystallization apparatus, crystallization method, and phase modulation device |
| 02/15/2006 | CN1734719A Nitride semiconductor single-crystal substrate and method of its synthesis |
| 02/15/2006 | CN1734718A Compound semiconductor substrate and its production method |
| 02/15/2006 | CN1734717A Process for manufacturing photosensitive flat-panel with Se allotropic P.N or N.P structure |
| 02/15/2006 | CN1734716A Methods and systems for rapid thermal processing |
| 02/15/2006 | CN1734715A Small lot size lithography bays |
| 02/15/2006 | CN1734714A Semiconductor device including semiconductor thin film, which is subjected to heat treatment to have alignment mark, crystallizing method for the semiconductor thin film, and crystallizing apparatus f |
| 02/15/2006 | CN1734713A Substrate treating apparatus |
| 02/15/2006 | CN1734712A Plasma processing apparatus and method |
| 02/15/2006 | CN1734711A Vacuum processing device |
| 02/15/2006 | CN1734710A Semiconductor processing equipment having tiled ceramic liner |
| 02/15/2006 | CN1734709A Method and apparatus for applying a protecting film to a semiconductor wafer |
| 02/15/2006 | CN1734708A Double-side processing method for wafer |
| 02/15/2006 | CN1734706A A process for controlling the proximity effect correction |
| 02/15/2006 | CN1734662A Magnetic tunnel junction structures, magnetic random access memory cells employing the same and photomasks used in formation thereof |
| 02/15/2006 | CN1734354A Lithographic apparatus, an apparatus comprising an illumination system, and device manufacturing method |
| 02/15/2006 | CN1734353A Photolithography device and method for manufacturing the same |
| 02/15/2006 | CN1734352A Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device |
| 02/15/2006 | CN1734337A 掩模 Mask |
| 02/15/2006 | CN1734335A Variable mask device for crystallizing silicon layer and method for crystallizing using the same |
| 02/15/2006 | CN1734334A Liquid crystal display device and fabrication method thereof |
| 02/15/2006 | CN1734333A Liquid crystal display device and method of fabricating the same |
| 02/15/2006 | CN1734332A Pixel structure of thin film transistor LCD and manufacturing method thereof |
| 02/15/2006 | CN1734320A Display and its manufacturing method |
| 02/15/2006 | CN1734279A Positioning method for detecting flip-chip substrate |
| 02/15/2006 | CN1734247A III-V group nitride system semiconductor self-standing substrate, method of making the same and III-V group nitride system semiconductor wafer |
| 02/15/2006 | CN1733967A Precursor compounds for deposition of ceramic and metal films and preparation methods thereof |
| 02/15/2006 | CN1733966A Apparatus for heating substrate and method for controlling temperature of susceptor for heated substrate |
| 02/15/2006 | CN1733879A Semiconductor substrate cleaning liquid and semiconductor substrate cleaning process |
| 02/15/2006 | CN1733856A Slurry, chemical mechanical polishing method using the slurry, and method of forming metal wiring using the slurry |
| 02/15/2006 | CN1733594A Carbon nanometer tube and its positioning method, transistor and its manufacturing method and semiconductor device |
| 02/15/2006 | CN1733578A Work-piece conveyance and storage device and cutting apparatus having the same |
| 02/15/2006 | CN1733577A Substrate transport apparatus |
| 02/15/2006 | CN1733566A Box used for glass basal plate conveyance |
| 02/15/2006 | CN1733565A Spacer and combination of wafer storage box and spacer |
| 02/15/2006 | CN1733367A Dispensation of controlled quantities of material onto a substrate |
| 02/15/2006 | CN1242664C Parts installation device |
| 02/15/2006 | CN1242661C Method for mfg. multilayer ceramic plate |
| 02/15/2006 | CN1242656C Device for processing micro wave plasma and control method for processing plasma |
| 02/15/2006 | CN1242608C Correlation secondary sampling circuit and CMOS image sensor containing the same circuit |
| 02/15/2006 | CN1242607C Solid camera device and its manufacturing method |
| 02/15/2006 | CN1242493C Semiconductor chip manufacturing method |
| 02/15/2006 | CN1242492C Semiconductor device and display device |
| 02/15/2006 | CN1242489C Semiconductor device and producing method thereof |
| 02/15/2006 | CN1242487C Charge transfer device |
| 02/15/2006 | CN1242486C Semiconductor memory device and making method thereof |
| 02/15/2006 | CN1242485C Semiconductor device and manufacturing method thereof |
| 02/15/2006 | CN1242484C Semiconductor device and its making method |
| 02/15/2006 | CN1242483C Storage element having composite contact plug and mfg method |
| 02/15/2006 | CN1242482C Storage device having independant triode transistor and its operation and producing method |
| 02/15/2006 | CN1242481C High coupling rate rapid flash memory manufacturing method |
| 02/15/2006 | CN1242480C Complementary MIS device |
| 02/15/2006 | CN1242479C Semiconductor integrated circuit and D/A converter and A/D converter |
| 02/15/2006 | CN1242478C Electrostatic discharge (ESD) protection circuit |
| 02/15/2006 | CN1242476C Semiconductor device and photoelectric device including same |
| 02/15/2006 | CN1242473C Semiconductor device and manufacture method thereof |
| 02/15/2006 | CN1242472C Welding spot structure for increasing packing reliability |
| 02/15/2006 | CN1242471C Semiconductor device and mfg. method thereof |
| 02/15/2006 | CN1242469C Radiator and its manufacturing method |