Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2006
02/22/2006CN1739189A Selective etching of a protective layer
02/22/2006CN1739188A Atomic layer deposition methods
02/22/2006CN1739187A Crystallized semiconductor device, method for producing same and crystallization apparatus
02/22/2006CN1739186A Chip transfer method and apparatus
02/22/2006CN1739185A End point detection in time division multiplexed etch processes
02/22/2006CN1739165A Programmable interconnect cell for configuring a field programmable gate array
02/22/2006CN1739152A Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method
02/22/2006CN1739066A Electron beam processing technology for mask repair
02/22/2006CN1739034A Laser beam inspection equipment
02/22/2006CN1739015A Method and system for determining characteristics of substrates employing fluid geometries
02/22/2006CN1738928A Compositions for copper, tantalum and tantalum nitride chemical mechanical method complanation
02/22/2006CN1738926A Film-forming apparatus component and method for cleaning same
02/22/2006CN1738922A Film forming method and film forming device using plasma CVD
02/22/2006CN1738921A Component for film forming device and method of washing the component
02/22/2006CN1738882A Pressure sensitive adhesive sheet, method of protecting semiconductor wafer surface and method of processing work
02/22/2006CN1738845A Method of fabricating polyurethane foam with micro pores and polishing pad therefrom
02/22/2006CN1738826A Chemical vapor deposition precursors for deposition of tantalum-based materials
02/22/2006CN1738514A High thermal cycle conductor system
02/22/2006CN1738071A High work function transparent conductive oxide film electrode and its preparing method
02/22/2006CN1738070A Thin film transistor and method of fabricating the same
02/22/2006CN1738062A Capacitor having a dielectric layer that reduces leakage current and a method of manufacturing the same
02/22/2006CN1738061A Metal inducement single direction transverse crystallization thin film transistor device and its preparing method
02/22/2006CN1738059A Semiconductor device and method of manufacturing the same
02/22/2006CN1738058A Switch element of pixel electrode and its manufacturing method
02/22/2006CN1738057A Metal-oxide-semiconductor device having an enhanced shielding structure
02/22/2006CN1738056A Transistor and method of manufacturing the same
02/22/2006CN1738054A Field-effect transistor, complementary field-effect transistor, and method of manufacturing field-effect transistor
02/22/2006CN1738053A Non-volatile memory devices having trenches and methods of forming the same
02/22/2006CN1738052A Ferroelectric memory and ferroelectric capacitor with ir-alloy electrode or ru-alloy electrode and method of manufacturing same
02/22/2006CN1738051A Non-volatility memory, switching method and preparing method based on resistance change
02/22/2006CN1738050A Semiconductor device and method of manufacturing the same
02/22/2006CN1738049A Microelectronics element and its manufacturing method
02/22/2006CN1738048A Cascode amplifier, its circuit and method for manufacturing such amplifier arrangement
02/22/2006CN1738047A Logic gate array and method of forming a logic gate array
02/22/2006CN1738045A Grounded gate and isolation techniques for reducing dark current in CMOS image sensors
02/22/2006CN1738043A Failure analysis vehicle for yield enhancement with self test at speed burnin capability for reliability testing
02/22/2006CN1738042A IC structure and its forming method
02/22/2006CN1738041A QFN package and its method
02/22/2006CN1738040A Cof semiconductor device and a manufacturing method for the same
02/22/2006CN1738039A Semiconductor device and manufacturing method of the same
02/22/2006CN1738029A Method for manufacturing interpoly dielectric
02/22/2006CN1738028A Method for fabricating semiconductor device
02/22/2006CN1738027A Semiconductor chip manufacturing method, semiconductor chip, semiconductor device manufacturing method, and semiconductor device
02/22/2006CN1738026A Dielectric memory device and method for fabricating the same
02/22/2006CN1738025A Method for manufacturing trajectory with enlarged capacitive coupling and corresponding trajectory
02/22/2006CN1738024A Nonvolatile semiconductor memory device and method for fabricating the same
02/22/2006CN1738023A Three dimensional integrated circuit and method of design
02/22/2006CN1738022A Method of forming via structures and method of fabricating phase change memory devices incorporating such via structures
02/22/2006CN1738021A Method for manufacturing semiconductor device
02/22/2006CN1738020A Self-timed reliability and yield vehicle with gated data and clock
02/22/2006CN1738019A Testing device for interconnection dependability estimation
02/22/2006CN1738018A Method for bonding nanometer material on metal electrode
02/22/2006CN1738017A Electrode structure of a semiconductor device and method of manufacturing the same
02/22/2006CN1738016A Method for manufacturing high reflectivity semiconductor illumination integrated light source module
02/22/2006CN1738015A Novel integrated circuit or discrete component flat bump package technics and its package structure
02/22/2006CN1738014A Integrated circuit or discrete component flat bump package technics and its package structure
02/22/2006CN1738013A Wafer level package structure of image sensing element and its package method
02/22/2006CN1738012A Chip radiator fin-fitting method
02/22/2006CN1738011A Fabrication method of thin film transistor
02/22/2006CN1738010A Schottky barrier diode and method of making the same
02/22/2006CN1738009A Deposition method of TiN film having a multi-layer structure
02/22/2006CN1738008A 半导体器件 Semiconductor devices
02/22/2006CN1738007A Precursor composition, method for manufacturing precursor composition, method for manufacturing strong electrolyte membrane and its uses
02/22/2006CN1738006A Method of forming a material film
02/22/2006CN1738005A Method and apparatus for joining protective tape
02/22/2006CN1738004A Method of manufacturing semiconductor wafer and method of manufacturing semiconductor device
02/22/2006CN1738003A Method for incising wafer
02/22/2006CN1738002A Manufacturing method of semiconductor device
02/22/2006CN1738001A Metallorganics chemical vapour deposition (CVD) preparing method for p-type ZnO thin film
02/22/2006CN1738000A Heteroepitaxy method for GaN semiconductor material
02/22/2006CN1737999A Method for preparing high electron mobility hydrogenated nano-crystalline silicon thin films using crystal lattice strain
02/22/2006CN1737998A Doping and method for III-v aluminum contained compound composed by direct or indirect band-gap
02/22/2006CN1737997A Method for preparing high electron mobility hydrogenated nano-crystalline silicon thin films
02/22/2006CN1737996A Manufacturing method of a semiconductor device
02/22/2006CN1737995A Substrate processing apparatus
02/22/2006CN1737994A Heat treatment prior to bonding two wafers
02/22/2006CN1737993A Mos electric fuse, its programming method, and semiconductor device using the same
02/22/2006CN1737992A Self-draining edge wheel system and method
02/22/2006CN1737991A High productivity plasma processing chamber
02/22/2006CN1737990A MIS capacitor and production method of MIS capacitor
02/22/2006CN1737885A Slurry compositions, methods of preparing slurry compositions, and methods of polishing an object using slurry compositions
02/22/2006CN1737883A Flat panel display and method for fabricating the same
02/22/2006CN1737694A Optical proximity correction using chamfers and rounding at corners
02/22/2006CN1737693A Wafer bake apparatus
02/22/2006CN1737692A Developing apparatus and method
02/22/2006CN1737690A Lithographic apparatus and device manufacturing method
02/22/2006CN1737689A Pellicle frame and pellicle for photolithography using the same
02/22/2006CN1737688A Lithographic apparatus and device manufacturing method
02/22/2006CN1737687A Passivation of multi-layer mirror for extreme ultraviolet lithography
02/22/2006CN1737686A Method and mechanism for suppressing adverse influence on imaging of symptoms of optical elements
02/22/2006CN1737680A Advanced oriented assist features for integrated circuit hole patterns
02/22/2006CN1737591A Prober and testing apparatus using same
02/22/2006CN1737208A Method and apparatus for plating semiconductor wafers
02/22/2006CN1737207A Electroplating head and method for operating the same
02/22/2006CN1737186A Plasma arc processing apparatus
02/22/2006CN1737072A Conductive adhesive agent and process for manufacturing article using the conductive adhesive agent
02/22/2006CN1737071A Polishing slurry, method of producing same, and method of polishing substrate
02/22/2006CN1736831A Methods and apparatus for transferring a substrate carrier within an electronic device manufacturing facility
02/22/2006CN1736830A Substrate transfer device and cleaning method thereof and substrate processing system and cleaning method thereof
02/22/2006CN1736681A Device and method for determining the orientation of a crystallographic plane in relation to a crystal surface