| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 02/21/2006 | US7002167 Charged-particle beam writer |
| 02/21/2006 | US7002166 Method and system for single ion implantation |
| 02/21/2006 | US7002151 Scanning electron microscope |
| 02/21/2006 | US7002141 Atomic lithography apparatus using electro-optic effect and method of manufacturing atomic structure |
| 02/21/2006 | US7002134 Dryer lid/robot collision prevention system |
| 02/21/2006 | US7002113 Heater inspection apparatus and semiconductor manufacturing apparatus having heater inspection apparatus mounted thereon |
| 02/21/2006 | US7001978 methods for preparing high performance photosensitive polyarylene ether polymers from haloalkylated intermediate polymers, wherein resulting polymers have a desirably low halogen content and, when cured, exhibit desirably low crosslink density |
| 02/21/2006 | US7001874 Non-corrosive cleaning composition for removing plasma etching residues |
| 02/21/2006 | US7001856 Method of calculating a pressure compensation recipe for a semiconductor wafer implanter |
| 02/21/2006 | US7001855 Flash memory device and fabrication process thereof, method of forming a dielectric film |
| 02/21/2006 | US7001854 Hydrogen-based phosphosilicate glass process for gap fill of high aspect ratio structures |
| 02/21/2006 | US7001853 illuminating a masked substrate; applying resin to dark regions; photopolymerizing or spot-curing to form flow barriers; precisely situated resins without adhesive residues on adjacent surfaces; semiconductors, microfluidic chips |
| 02/21/2006 | US7001852 Method of making a high quality thin dielectric layer |
| 02/21/2006 | US7001851 Steam oxidation method |
| 02/21/2006 | US7001850 Method of depositing dielectric films |
| 02/21/2006 | US7001849 Surface treatment and protection method for cadmium zinc telluride crystals |
| 02/21/2006 | US7001848 Hydrogen plasma photoresist strip and polymeric residue cleanup process for oxygen-sensitive materials |
| 02/21/2006 | US7001847 Micro pattern forming method and semiconductor device manufacturing method |
| 02/21/2006 | US7001846 High-density SOI cross-point memory array and method for fabricating same |
| 02/21/2006 | US7001845 Methods of treating surfaces of substrates |
| 02/21/2006 | US7001844 Material for contact etch layer to enhance device performance |
| 02/21/2006 | US7001843 Methods of forming metal lines in semiconductor devices |
| 02/21/2006 | US7001842 Methods of fabricating semiconductor devices having salicide |
| 02/21/2006 | US7001841 Production method of semiconductor device |
| 02/21/2006 | US7001840 Interconnect with multiple layers of conductive material with grain boundary between the layers |
| 02/21/2006 | US7001839 Semiconductor device with tapered contact hole and wire groove |
| 02/21/2006 | US7001838 Method of wet etching an inorganic antireflection layer |
| 02/21/2006 | US7001837 Semiconductor with tensile strained substrate and method of making the same |
| 02/21/2006 | US7001836 Two step trench definition procedure for formation of a dual damascene opening in a stack of insulator layers |
| 02/21/2006 | US7001835 Crystallographic modification of hard mask properties |
| 02/21/2006 | US7001834 Integrated circuit and method of manufacturing an integrated circuit and package |
| 02/21/2006 | US7001833 Method for forming openings in low-k dielectric layers |
| 02/21/2006 | US7001832 Method for limiting slip lines in a semiconductor substrate |
| 02/21/2006 | US7001831 Method for depositing a film on a substrate using Cat-PACVD |
| 02/21/2006 | US7001830 System and method of pattern recognition and metrology structure for an X-initiative layout design |
| 02/21/2006 | US7001829 Semiconductor device and method of manufacturing the same |
| 02/21/2006 | US7001828 Method and apparatus for manufacturing a device having a moveable structure |
| 02/21/2006 | US7001827 Semiconductor wafer front side protection |
| 02/21/2006 | US7001826 Wafer with a relaxed useful layer and method of forming the wafer |
| 02/21/2006 | US7001825 Semiconductor structures having multiple conductive layers in an opening, and methods for fabricating same |
| 02/21/2006 | US7001824 Gallium nitride vertical light emitting diode structure and method of separating a substrate and a thin film in the structure |
| 02/21/2006 | US7001823 Method of manufacturing a shallow trench isolation structure with low trench parasitic capacitance |
| 02/21/2006 | US7001822 Semiconductor device formed on insulating layer and method of manufacturing the same |
| 02/21/2006 | US7001821 Method of forming and using a hardmask for forming ferroelectric capacitors in a semiconductor device |
| 02/21/2006 | US7001820 Heterojunction bipolar transistor and method for fabricating the same |
| 02/21/2006 | US7001819 Semiconductor device and power amplifier using the same |
| 02/21/2006 | US7001818 MIS semiconductor device and manufacturing method thereof |
| 02/21/2006 | US7001817 Method for fabricating a semiconductor device |
| 02/21/2006 | US7001816 Embedded ROM device using substrate leakage |
| 02/21/2006 | US7001815 Method of manufacturing semiconductor device with triple gate insulating layers |
| 02/21/2006 | US7001814 Laser thermal annealing methods for flash memory devices |
| 02/21/2006 | US7001813 Layers of group III-nitride semiconductor made by processes with multi-step epitaxial growths |
| 02/21/2006 | US7001812 Method of manufacturing semi conductor device |
| 02/21/2006 | US7001811 Method for making memory cell without halo implant |
| 02/21/2006 | US7001810 Floating gate nitridation |
| 02/21/2006 | US7001809 Method to increase coupling ratio of source to floating gate in split-gate flash |
| 02/21/2006 | US7001808 Semiconductor integrated circuit device having a dummy conductive film and method of manufacturing the same |
| 02/21/2006 | US7001807 Fully isolated dielectric memory cell structure for a dual bit nitride storage device and process for making same |
| 02/21/2006 | US7001806 Semiconductor structure with increased breakdown voltage and method for producing the semiconductor structure |
| 02/21/2006 | US7001805 Method for fabricating n-type carbon nanotube device |
| 02/21/2006 | US7001804 Method of producing active semiconductor layers of different thicknesses in an SOI wafer |
| 02/21/2006 | US7001802 Thin film transistor with multiple gates using metal induced lateral crystalization and method of fabricating the same |
| 02/21/2006 | US7001801 Method of manufacturing semiconductor device having first and second insulating films |
| 02/21/2006 | US7001800 Manufacturing method for non-active electrically structures in order to optimize the definition of active electrically structures in an electronic circuit integrated on a semiconductor substrate and corresponding circuit |
| 02/21/2006 | US7001799 Method of making a leadframe for semiconductor devices |
| 02/21/2006 | US7001798 Method of manufacturing semiconductor device |
| 02/21/2006 | US7001797 Optical device and method of manufacturing the same, optical module, circuit board, and electronic instrument |
| 02/21/2006 | US7001796 Method for fabricating array substrate of liquid crystal display device |
| 02/21/2006 | US7001795 Total internal reflection (TIR) CMOS imager |
| 02/21/2006 | US7001794 Focal plane arrays in type II-superlattices |
| 02/21/2006 | US7001793 Method of protecting microfabricated devices with protective caps |
| 02/21/2006 | US7001792 Ultra-fast nucleic acid sequencing device and a method for making and using the same |
| 02/21/2006 | US7001791 GaN growth on Si using ZnO buffer layer |
| 02/21/2006 | US7001790 Light-emitting aluminum gallium indium nitride compound semiconductor device having an improved luminous intensity |
| 02/21/2006 | US7001789 Method for fabricating a tapered optical coupling into a slab waveguide |
| 02/21/2006 | US7001788 Maskless fabrication of waveguide mirrors |
| 02/21/2006 | US7001787 Electrode manufacturing method |
| 02/21/2006 | US7001786 Semiconductor device and method for fabricating the same |
| 02/21/2006 | US7001785 Capacitance probe for thin dielectric film characterization |
| 02/21/2006 | US7001784 Method to control spacer width |
| 02/21/2006 | US7001783 Mask schemes for patterning magnetic tunnel junctions |
| 02/21/2006 | US7001782 Method and apparatus for filling interlayer vias on ferroelectric polymer substrates |
| 02/21/2006 | US7001781 Method for producing a ferroelectric capacitor that includes etching with hardmasks |
| 02/21/2006 | US7001780 Method of fabrication of an FeRAM capacitor and an FeRAM capacitor formed by the method |
| 02/21/2006 | US7001779 Methods of forming semiconductor constructions |
| 02/21/2006 | US7001778 Method of making layered superlattice material with improved microstructure |
| 02/21/2006 | US7001777 Method of manufacturing a magnetic tunnel junction device |
| 02/21/2006 | US7001713 Large and small active region patterns are shrunk until the small one disappears and the large one is then enlarged to a dimension slightly smaller than the original |
| 02/21/2006 | US7001712 Depositing a positive type photoresist film over a semiconductor substrate;exposing a first mask pattern;exposing a second mask pattern; performing development treatment; etching |
| 02/21/2006 | US7001710 Method for forming ultra fine contact holes in semiconductor devices |
| 02/21/2006 | US7001707 blend of a cyclic polymer having alcoholic groups as soluble groups and featuring high transparency with a polymer having carboxyl or hexafluoroalcohol groups whose hydrogen atoms are replaced by acid labile group |
| 02/21/2006 | US7001698 forming a fine pattern, which permits the reduction of the dimensional difference due to the coexistence of coarse and dense patterns within a plane, such as a dry-etching using reactive ion etching gas and a reducing gas |
| 02/21/2006 | US7001697 Photolithography |
| 02/21/2006 | US7001696 Near-field light exposure mask with avoidance of overlap of near-field light, method for manufacturing the same, exposure apparatus and method using near-field light exposure mask, and method for manufacturing device |
| 02/21/2006 | US7001692 Method of forming a mask having nitride film |
| 02/21/2006 | US7001674 Polishing semiconductors, integrated circuits; multistage process; transferring pattern, masking |
| 02/21/2006 | US7001641 Seed layer treatment |
| 02/21/2006 | US7001572 Analyzing device with biochip |
| 02/21/2006 | US7001569 Comprises shrink-suppressing layers on main surface of presintered ceramic; efficiency; electronic |
| 02/21/2006 | US7001530 Method for detecting the end point by using matrix |