| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 02/28/2006 | US7005658 Charged particle beam exposure apparatus and method |
| 02/28/2006 | US7005650 Apparatus for fabricating a semiconductor device |
| 02/28/2006 | US7005649 Mask blanks inspection method and mask blank inspection tool |
| 02/28/2006 | US7005641 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus |
| 02/28/2006 | US7005640 Method and apparatus for the characterization of a depth structure in a substrate |
| 02/28/2006 | US7005637 Backside thinning of image array devices |
| 02/28/2006 | US7005601 Thermal flux processing by scanning |
| 02/28/2006 | US7005585 Mounting board and electronic device using same |
| 02/28/2006 | US7005577 Semiconductor chip package having an adhesive tape attached on bonding wires |
| 02/28/2006 | US7005393 Method of fabricating a semiconductor device containing nitrogen in an oxide film |
| 02/28/2006 | US7005392 Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same |
| 02/28/2006 | US7005391 Method of manufacturing inorganic nanotube |
| 02/28/2006 | US7005390 Replenishment of surface carbon and surface passivation of low-k porous silicon-based dielectric materials |
| 02/28/2006 | US7005389 Methods for forming a thin film on an integrated circuit device by sequentially providing energies to activate the reactants |
| 02/28/2006 | US7005388 Method of forming through-the-wafer metal interconnect structures |
| 02/28/2006 | US7005387 Method for preventing an increase in contact hole width during contact formation |
| 02/28/2006 | US7005386 Method for reducing resist height erosion in a gate etch process |
| 02/28/2006 | US7005385 Method for removing a resist mask with high selectivity to a carbon hard mask used for semiconductor structuring |
| 02/28/2006 | US7005384 Chemical mechanical polishing method, and washing/rinsing method associated therewith |
| 02/28/2006 | US7005383 Apparatus and methods of chemical mechanical polishing |
| 02/28/2006 | US7005382 Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing process, production process of semiconductor device and material for preparing an aqueous dispersion for chemical mechanical polishing |
| 02/28/2006 | US7005381 Method for flat electrodes |
| 02/28/2006 | US7005380 Simultaneous formation of device and backside contacts on wafers having a buried insulator layer |
| 02/28/2006 | US7005379 Semiconductor processing methods for forming electrical contacts |
| 02/28/2006 | US7005378 Processes for fabricating conductive patterns using nanolithography as a patterning tool |
| 02/28/2006 | US7005377 Bimetal layer manufacturing method |
| 02/28/2006 | US7005376 Ultra-uniform silicides in integrated circuit technology |
| 02/28/2006 | US7005375 Method to avoid copper contamination of a via or dual damascene structure |
| 02/28/2006 | US7005374 Method for forming contact hole |
| 02/28/2006 | US7005373 Method for forming a metal silicide layer in a semiconductor device |
| 02/28/2006 | US7005372 Deposition of tungsten nitride |
| 02/28/2006 | US7005371 Method of forming suspended transmission line structures in back end of line processing |
| 02/28/2006 | US7005370 Method of manufacturing different bond pads on the same substrate of an integrated circuit package |
| 02/28/2006 | US7005369 Active area bonding compatible high current structures |
| 02/28/2006 | US7005368 Bump forming apparatus for charge appearance semiconductor substrate, charge removal method for charge appearance semiconductor substrate, charge removing unit for charge appearance semiconductor substrate, and charge appearance semiconductor substrate |
| 02/28/2006 | US7005367 Method of fabricating a semiconductor device having a silicon oxide layer, a method of fabricating a semiconductor device having dual spacers, a method of forming a silicon oxide layer on a substrate, and a method of forming dual spacers on a conductive material layer |
| 02/28/2006 | US7005366 Tri-gate devices and methods of fabrication |
| 02/28/2006 | US7005365 Structure and method to fabricate self-aligned transistors with dual work function metal gate electrodes |
| 02/28/2006 | US7005364 Method for manufacturing semiconductor device |
| 02/28/2006 | US7005363 Method of forming a semi-insulating region |
| 02/28/2006 | US7005362 Method of fabricating a thin film transistor |
| 02/28/2006 | US7005361 Providing high precision resistance in an integrated circuit using a thin film resistor of controlled dimension |
| 02/28/2006 | US7005360 Method for fabricating a microelectronic circuit including applying metal over and thickening the integrated coil to increase conductivity |
| 02/28/2006 | US7005359 Bipolar junction transistor with improved extrinsic base region and method of fabrication |
| 02/28/2006 | US7005358 Technique for forming recessed sidewall spacers for a polysilicon line |
| 02/28/2006 | US7005357 Low stress sidewall spacer in integrated circuit technology |
| 02/28/2006 | US7005356 Schottky barrier transistor and method of manufacturing the same |
| 02/28/2006 | US7005355 Method for fabricating semiconductor memories with charge trapping memory cells |
| 02/28/2006 | US7005354 Depletion drain-extended MOS transistors and methods for making the same |
| 02/28/2006 | US7005353 Method for improved MOS gating to reduce miller capacitance and switching losses |
| 02/28/2006 | US7005352 Trench-type MOSFET having a reduced device pitch and on-resistance |
| 02/28/2006 | US7005351 Method for fabricating a transistor configuration including trench transistor cells having a field electrode, trench transistor, and trench configuration |
| 02/28/2006 | US7005350 Method for fabricating programmable memory array structures incorporating series-connected transistor strings |
| 02/28/2006 | US7005349 Method of manufacturing twin-ONO-type SONOS memory using reverse self-alignment process |
| 02/28/2006 | US7005348 Methods for fabricating semiconductor devices |
| 02/28/2006 | US7005347 Structures of and methods of fabricating trench-gated MIS devices |
| 02/28/2006 | US7005346 Method for producing a memory cell of a memory cell field in a semiconductor memory |
| 02/28/2006 | US7005345 Non-volatile semiconductor memory device and its manufacturing method |
| 02/28/2006 | US7005344 Method of forming a device with a gallium nitride or gallium aluminum nitride gate |
| 02/28/2006 | US7005343 Semiconductor device and method of manufacturing the same |
| 02/28/2006 | US7005342 Method to fabricate surface p-channel CMOS |
| 02/28/2006 | US7005341 Dynamic random access memory cell and fabricating method thereof |
| 02/28/2006 | US7005340 Method for manufacturing semiconductor device |
| 02/28/2006 | US7005339 Method of integrating high voltage metal oxide semiconductor devices and submicron metal oxide semiconductor devices |
| 02/28/2006 | US7005338 Nonvolatile memory cell with a floating gate at least partially located in a trench in a semiconductor substrate |
| 02/28/2006 | US7005337 Method for a parallel production of an MOS transistor and a bipolar transistor |
| 02/28/2006 | US7005336 Process for forming CMOS transistors and MOS transistors of the drain extension type, with a low gate region resistance, in the same semiconductor substrate |
| 02/28/2006 | US7005335 Array of nanoscopic mosfet transistors and fabrication methods |
| 02/28/2006 | US7005334 Zero threshold voltage pFET and method of making same |
| 02/28/2006 | US7005333 Transistor with silicon and carbon layer in the channel region |
| 02/28/2006 | US7005332 Fabrication method of thin film transistor |
| 02/28/2006 | US7005331 Method of manufacturing a thin film transistor array |
| 02/28/2006 | US7005330 Structure and method for forming the gate electrode in a multiple-gate transistor |
| 02/28/2006 | US7005329 Method for manufacturing semiconductor device |
| 02/28/2006 | US7005328 Non-volatile memory device |
| 02/28/2006 | US7005327 Process and structure for semiconductor package |
| 02/28/2006 | US7005326 Method of making an integrated circuit package |
| 02/28/2006 | US7005325 Semiconductor package with passive device integration |
| 02/28/2006 | US7005324 Method of fabricating stacked semiconductor chips |
| 02/28/2006 | US7005323 Method and apparatus for shielding integrated circuits |
| 02/28/2006 | US7005322 Process for encapsulating semiconductor components using through-holes in the semiconductor components support substrates |
| 02/28/2006 | US7005321 Stress-compensation layers in contact arrays, and processes of making same |
| 02/28/2006 | US7005320 Method for manufacturing flip chip package devices with a heat spreader |
| 02/28/2006 | US7005319 Global planarization of wafer scale package with precision die thickness control |
| 02/28/2006 | US7005318 Mounted circuit substrate and method for fabricating the same for surface layer pads that can withstand pad erosion by molten solder applied over a plurality of times |
| 02/28/2006 | US7005317 Controlled fracture substrate singulation |
| 02/28/2006 | US7005316 Method for package reduction in stacked chip and board assemblies |
| 02/28/2006 | US7005315 Method and fabricating complementary metal-oxide semiconductor image sensor with reduced etch damage |
| 02/28/2006 | US7005314 Sacrificial layer technique to make gaps in MEMS applications |
| 02/28/2006 | US7005313 Semiconductor dynamic sensor, and methods of transport and collet suction for the same |
| 02/28/2006 | US7005312 Method of manufacturing CMOS image sensor by means of double masking process |
| 02/28/2006 | US7005311 Two-pole SMT miniature housing for semiconductor components and method for the manufacture thereof |
| 02/28/2006 | US7005310 Manufacturing method of solid-state image sensing device |
| 02/28/2006 | US7005308 Electro-optic device, method to manufacture the same and electronic apparatus |
| 02/28/2006 | US7005306 Accurate thickness measurement of thin conductive film |
| 02/28/2006 | US7005305 Signal layer for generating characteristic optical plasma emissions |
| 02/28/2006 | US7005304 Micro-moving device and its manufacturing method |
| 02/28/2006 | US7005303 Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices |
| 02/28/2006 | US7005249 Apparatus for processing substrate and method of processing the same |
| 02/28/2006 | US7005248 Method of forming cavity between multilayered wirings |