| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 08/03/2006 | WO2006080809A1 Apparatus for processing semiconductor package |
| 08/03/2006 | WO2006080796A1 Cerium oxide abrasive and slurry containing the same |
| 08/03/2006 | WO2006080782A1 Method of depositing thin layer using atomic layer deposition |
| 08/03/2006 | WO2006080708A1 Iii-nitride semiconductor light emitting device and method for manufacturing the same |
| 08/03/2006 | WO2006080621A1 Manufacture method of vertical-type electric contactor and vertical-type electric contactor thereof |
| 08/03/2006 | WO2006080586A1 METHOD FOR FORMING GaN FILM, SEMICONDUCTOR DEVICE, METHOD FOR FORMING GROUP III NITRIDE THIN FILM, AND SEMICONDUCTOR DEVICE HAVING GROUP III NITRIDE THIN FILM |
| 08/03/2006 | WO2006080552A1 Semiconductor device, and method for manufacturing thereof |
| 08/03/2006 | WO2006080516A1 Exposure apparatus and method for manufacturing device |
| 08/03/2006 | WO2006080513A1 Laser light source control method, laser light source device, and exposure apparatus |
| 08/03/2006 | WO2006080500A1 Adhesive and luminescent element |
| 08/03/2006 | WO2006080474A1 Exposure system and device |
| 08/03/2006 | WO2006080429A1 Method for forming resist pattern, supercritical processing liquid for lithography process and method for forming antireflection film |
| 08/03/2006 | WO2006080428A1 Method of forming resist pattern |
| 08/03/2006 | WO2006080427A1 Exposure method, exposure apparatus and method for manufacturing device |
| 08/03/2006 | WO2006080423A1 Monitor wafer and method for monitoring wafer |
| 08/03/2006 | WO2006080408A1 Light-emitting element and method for manufacturing light-emitting element |
| 08/03/2006 | WO2006080376A1 Nitride semiconductor device and method of growing nitride semiconductor crystal layer |
| 08/03/2006 | WO2006080337A1 Semiconductor device and method for manufacturing same, and stacked type semiconductor integrated circuit |
| 08/03/2006 | WO2006080290A1 Cooling treatment device |
| 08/03/2006 | WO2006080285A1 Exposure device, exposure method, and micro device manufacturing method |
| 08/03/2006 | WO2006080276A1 Capacitance element manufacturing method and etching method |
| 08/03/2006 | WO2006080271A1 Method of evaluating crystal defect of silicon single crystal wafer |
| 08/03/2006 | WO2006080264A1 Method of selective etching and silicon single crystal substrate |
| 08/03/2006 | WO2006080250A1 Immersion exposure system, and recycle method and supply method of liquid for immersion exposure |
| 08/03/2006 | WO2006080226A1 Process for producing micromachine, and micromachine |
| 08/03/2006 | WO2006080212A1 Projection optical system, exposure system, and exposure method |
| 08/03/2006 | WO2006080205A1 CYCLIC SILOXANE COMPOUND, Si-CONTAINING FILM-FORMING MATERIAL, AND USE THEREOF |
| 08/03/2006 | WO2006080178A1 Material for metallic-pattern formation, crosslinking monomer, and method of forming metallic pattern |
| 08/03/2006 | WO2006080151A1 Method for forming resist pattern |
| 08/03/2006 | WO2006080146A1 Probe card and method for manufacturing same |
| 08/03/2006 | WO2006080109A1 Semiconductor device provided with mis structure and method for manufacturing the same |
| 08/03/2006 | WO2006080081A1 Non-volatile memory and control method thereof |
| 08/03/2006 | WO2006080064A1 Semiconductor device and method for manufacturing same |
| 08/03/2006 | WO2006080056A1 Semiconductor device and production method therefor |
| 08/03/2006 | WO2006079964A2 Method of fabricating a dual-gate fet |
| 08/03/2006 | WO2006079870A1 Method of fabricating a silicon-on-insulator structure |
| 08/03/2006 | WO2006079849A1 Improvements to ceramic packages for high frequency circuits |
| 08/03/2006 | WO2006079758A1 Method of producing a silicon oxide-based material with a low dielectric constant |
| 08/03/2006 | WO2006079742A1 Production of a tunnel oxide of a non-volatile memory transistor using flotox technology by low-temperature ion beam sputtering |
| 08/03/2006 | WO2006079174A1 Modular sub-assembly of semiconductor strips |
| 08/03/2006 | WO2006066202A3 Active edge grip rest pad |
| 08/03/2006 | WO2006066194A3 Strained nmos transistor featuring deep carbon doped regions and raised donor doped source and drain |
| 08/03/2006 | WO2006062796A3 Semiconductor device and method of making semiconductor device comprising multiple stacked hybrid orientation layers |
| 08/03/2006 | WO2006059330A3 Reflective optical system |
| 08/03/2006 | WO2006057745A3 Direct imprinting of etch barriers using step and flash imprint lithography |
| 08/03/2006 | WO2006057645A8 Enhancement of electron and hole mobilities in 110 under biaxial compressive strain |
| 08/03/2006 | WO2006055179A3 Methods and structures for electrical communication with an overlying electrode for a semiconductor element |
| 08/03/2006 | WO2006054732A3 Polishing apparatus and polishing method |
| 08/03/2006 | WO2006049976A3 Patterned silicon surfaces |
| 08/03/2006 | WO2006049763A3 Thin film semiconductor devices and methods of making |
| 08/03/2006 | WO2006048845A3 Carbon nanotube-based conductive connections for integrated circuit devices |
| 08/03/2006 | WO2006044019A3 Low temperature sin deposition methods |
| 08/03/2006 | WO2006041889A3 Conductive pad design modification for better wafer-pad contact |
| 08/03/2006 | WO2006034808A3 Method and device for predicting surface abrasion |
| 08/03/2006 | WO2006026180A3 Reduction of source and drain parasitic capacitance in cmos devices |
| 08/03/2006 | WO2006020565B1 Barrier layer configurations and methods for processing microelectronic topographies having barrier layers |
| 08/03/2006 | WO2006015328A3 Pulse thermal processing of functional materials using directed plasma arc |
| 08/03/2006 | WO2005117071A3 Optoelectronic semiconductor component and housing base for such a component |
| 08/03/2006 | WO2005109971A3 Atomic beam to protect a reticle |
| 08/03/2006 | WO2005079498A3 Continuously varying offset mark and methods of determining overlay |
| 08/03/2006 | WO2004112096A3 Method and system for high volume transfer of dies to substrates |
| 08/03/2006 | WO2004093128A3 Lead frame structure with aperture or groove for flip chip in a leaded molded package |
| 08/03/2006 | US20060174257 Antenna designs for radio frequency identification tags |
| 08/03/2006 | US20060173129 Crosslinkable fluorinated aromatic prepolymer and its uses |
| 08/03/2006 | US20060172666 Method of producing a semiconductor device by dividing a semiconductor wafer into separate pieces of semiconductor chips |
| 08/03/2006 | US20060172664 Methods for reducing delamination during chemical mechanical polishing |
| 08/03/2006 | US20060172663 Surface polishing method and apparatus thereof |
| 08/03/2006 | US20060172556 Semiconductor device having a high carbon content strain inducing film and a method of manufacture therefor |
| 08/03/2006 | US20060172555 Method to make silicon nanoparticle from silicon rich-oxide by DC reactive sputtering for electroluminescence application |
| 08/03/2006 | US20060172554 Method of forming gate dielectric layer |
| 08/03/2006 | US20060172553 Method of retaining a substrate to a wafer chuck |
| 08/03/2006 | US20060172552 N2 based plasma treatment for enhanced sidewall smoothing and pore sealing porous low-k dielectric films |
| 08/03/2006 | US20060172551 Plasma gate oxidation process using pulsed RF source power |
| 08/03/2006 | US20060172550 Selective plasma re-oxidation process using pulsed RF source power |
| 08/03/2006 | US20060172549 Method of separating a mold from a solidified layer disposed on a substrate |
| 08/03/2006 | US20060172548 Method of cleaning wafer and method of manufacturing gate structure |
| 08/03/2006 | US20060172547 Implantation of gate regions in semiconductor device fabrication |
| 08/03/2006 | US20060172546 Dry-etching method |
| 08/03/2006 | US20060172545 Purge process conducted in the presence of a purge plasma |
| 08/03/2006 | US20060172544 Member for plasma etching device and method for manufacture thereof |
| 08/03/2006 | US20060172543 Graded junction termination extensions for electronic devices |
| 08/03/2006 | US20060172542 Method and apparatus to confine plasma and to enhance flow conductance |
| 08/03/2006 | US20060172541 Method of fabricating micro-needle array |
| 08/03/2006 | US20060172540 Reduction of feature critical dimensions using multiple masks |
| 08/03/2006 | US20060172539 Method of treating a structured surface |
| 08/03/2006 | US20060172538 Wet etching the edge and bevel of a silicon wafer |
| 08/03/2006 | US20060172537 Method of forming thin film and method of fabricating OLED |
| 08/03/2006 | US20060172536 Apparatus for plasma-enhanced physical vapor deposition of copper with RF source power applied through the workpiece |
| 08/03/2006 | US20060172535 Etch process for improving yield of dielectric contacts on nickel silicides |
| 08/03/2006 | US20060172534 Atomic layer deposition methods |
| 08/03/2006 | US20060172533 Method of fabricating printed circuit board |
| 08/03/2006 | US20060172532 Method of manufacturing a magnetic head |
| 08/03/2006 | US20060172531 Sealing pores of low-k dielectrics using CxHy |
| 08/03/2006 | US20060172530 CxHy sacrificial layer for cu/low-k interconnects |
| 08/03/2006 | US20060172529 Uniform passivation method for conductive features |
| 08/03/2006 | US20060172528 Methods of manufacturing semiconductor devices |
| 08/03/2006 | US20060172527 Method for forming a defined recess in a damascene structure using a CMP process and a damascene structure |
| 08/03/2006 | US20060172526 Method for preventing edge peeling defect |
| 08/03/2006 | US20060172525 Technique for enhancing process flexibility during the formation of vias and trenches in low-k interlayer dielectrics |
| 08/03/2006 | US20060172524 Methods and apparatus for integrated circuit ball bonding with substantially perpendicular wire bond profiles |