Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2006
08/10/2006US20060175684 Organosilicon compound
08/10/2006US20060175683 Composition for forming low dielectric thin film including siloxane monomer or siloxane polymer having only one type of stereoisomer and method of producing low dielectric thin film using same
08/10/2006US20060175679 Semiconductor device and method for manufacturing the same
08/10/2006US20060175677 Fabrication of low leakage-current backside illuminated photodiodes
08/10/2006US20060175673 System and device including a barrier layer
08/10/2006US20060175672 Semiconductor device and method of manufacturing the same
08/10/2006US20060175666 Integrated circuit arrangement with low-resistance contacts and method for production thereof
08/10/2006US20060175664 Semiconductor constructions, and methods of forming metal silicides
08/10/2006US20060175657 Advanced CMOS using super steep retrograde wells
08/10/2006US20060175656 Non-volatile memory devices
08/10/2006US20060175655 Non-volatile memory and method for manufacturing non-volatile memory
08/10/2006US20060175654 Flash memory
08/10/2006US20060175651 Semiconductor integrated circuit device and process for manufacturing the same
08/10/2006US20060175650 Memory cells with vertical transistor and capacitor and fabrication methods thereof
08/10/2006US20060175649 SRAM devices, and electronic systems comprising SRAM devices
08/10/2006US20060175648 Memory device and manufacturing method thereof
08/10/2006US20060175645 Semiconductor device and its manufacturing method
08/10/2006US20060175643 Ferroelectric element and method of manufacturing ferroelectric element
08/10/2006US20060175628 Nitride-based semiconductor device of reduced voltage drop, and method of fabrication
08/10/2006US20060175627 Power supply, multi chip module, system in package and non-isolated DC-DC converter
08/10/2006US20060175622 Micromirror-based projection system and a method of making the same
08/10/2006US20060175621 Semiconductor light-emitting device light-emitting display method for manufacturing semiconductor light-emitting device and method for manufacturing light-emitting display
08/10/2006US20060175616 Pre-oxidized protective layer for lithography
08/10/2006US20060175615 System and method for increasing the surface mounting stability of a lamp
08/10/2006US20060175614 CMOS imager having on-chip ROM
08/10/2006US20060175613 Method of manufacturing an epitaxial semiconductor substrate and method of manufacturing a semiconductor device
08/10/2006US20060175612 Semiconductor device and fabrication method thereof
08/10/2006US20060175611 Thin film transistor circuit device, production method thereof and liquid crystal display using the thin film transistor circuit device
08/10/2006US20060175609 Vertical thin film transistor with short-channel effect suppression
08/10/2006US20060175608 Relaxation of a strained layer using a molten layer
08/10/2006US20060175607 Semiconductor device, device forming substrate, wiring connection testing method, and manufacturing method of the semiconductor device
08/10/2006US20060175606 Subthreshold design methodology for ultra-low power systems
08/10/2006US20060175603 Compound used to form a self-assembled monolayer, layer structure, semiconductor component having a layer structure, and method for producing a layer structure
08/10/2006US20060175600 Gallium nitride compound semiconductor device and manufacturing method
08/10/2006US20060175599 Phase change memory cell with high read margin at low power operation
08/10/2006US20060175597 Phase change memory cell with high read margin at low power operation
08/10/2006US20060175584 Zirconia toughened alumina ESD safe ceramic composition, component, and methods for making same
08/10/2006US20060175553 Method and system for controlling semiconductor manufacturing equipment
08/10/2006US20060175539 Fabrication of low leakage-current backside illuminated photodiodes
08/10/2006US20060175421 Deposition fabrication using inkjet technology
08/10/2006US20060175419 Smart card, smart card module, and a method for production of a smart card module
08/10/2006US20060175305 Method and system for temperature control of a substrate
08/10/2006US20060175298 Method and composition for polishing a substrate
08/10/2006US20060175297 Metallization method for a semiconductor device and post-CMP cleaning solution for the same
08/10/2006US20060175296 Method of manufacturing semiconductor device
08/10/2006US20060175295 Abrasive partilcle for chemical mechanical polishing
08/10/2006US20060175294 Chemical mechanical polishing method and apparatus
08/10/2006US20060175292 System and method for anisotropically etching a recess in a silicon substrate
08/10/2006US20060175290 Photo resist stripping and de-charge method for metal post etching to prevent metal corrosion
08/10/2006US20060175289 Method of fabricating semiconductor device
08/10/2006US20060175286 Making a thin film transistor panel of liquid crystal display by wet etching a multilayer metallic structure including a high melting metal film and an Al or alloy film using side etching technique with a photoresist mask; hot water washing to form a protective oxide film and dry etching using the mask
08/10/2006US20060175014 Specimen surface treatment system
08/10/2006US20060175013 Specimen surface treatment system
08/10/2006US20060175012 Semiconductor fabrication equipment and method for controlling pressure
08/10/2006US20060175011 Method of cleaning substrate-processing device and substrate-processing device
08/10/2006US20060175010 Apparatus and a method for controlling the depth of etching during alternating plasma etching of semiconductor substrates
08/10/2006US20060174977 Metal material having formed thereon chromium oxide passive film and method for producing the same, and parts contacting with fluid and system for supplying fluid and exhausting gas
08/10/2006US20060174921 Single wafer dryer and drying methods
08/10/2006US20060174912 Wafer cleaning solution for cobalt electroless application
08/10/2006US20060174834 Side RF coil and side heater for plasma processing apparatus
08/10/2006US20060174833 Substrate treating apparatus and method of substrate treatment
08/10/2006US20060174818 Method of producing high quality relaxed silicon germanium layers
08/10/2006US20060174817 Process for producing a silicon single crystal with controlled carbon content
08/10/2006US20060174816 Crystal structure of an angiotensin-converting enzyme (ace) and uses thereof
08/10/2006US20060174815 Process for manufacturing a gallium rich gallium nitride film
08/10/2006US20060174801 Paper coating formulation having a reduced level of binder
08/10/2006US20060174463 Flat capacitor for an implantable medical device
08/10/2006DE202005005052U1 Device for controlling temperature of substrates has second partial element having second connecting surface, over which it partially lies against first connecting surface of first partial element
08/10/2006DE19941148B4 Speicher mit Grabenkondensator und Auswahltransistor und Verfahren zu seiner Herstellung Storage capacitor with grave and selection transistor and method for its preparation
08/10/2006DE19929605B4 Verfahren zur Herstellung eines Kondensators unter Verwendung von Silizium mit halbkugelförmigen Körnchen A method for manufacturing a capacitor using silicon having hemispherical grains
08/10/2006DE19737294B4 Halbleiterbaustein mit wenigstens einem Kondensatorelement mit parallelen Kondensatorplatten sowie Verfahren zu seiner Herstellung A semiconductor device having at least one capacitor element with parallel capacitor plates, and methods for its preparation
08/10/2006DE112004001942T5 Kombinierte Musterung mit Gräben Combined screening with trenches
08/10/2006DE112004001490T5 Verfahren zur integrierten Verwaltung und Bereitstellung von Diensten in Kommunikationsnetzwerken Process for the integrated management and deployment of services in communication networks
08/10/2006DE112004000465T5 Retikelsubstrat, Verfahren zum Herstellen des Substrats, Maskenrohling und Verfahren zum Herstellen des Maskenrohlings Reticle substrate, method of manufacturing the substrate, mask blank and methods of producing the mask blank
08/10/2006DE10345374B4 Halbleiterbauteil mit einem Nickel/Kobaltsilizidgebiet, das in einem Siliziumgebiet gebildet ist und Verfahren zu seiner Herstellung A semiconductor device with a nickel / Kobaltsilizidgebiet formed in a silicon region and to processes for its preparation
08/10/2006DE10343256B4 Anordnung zur Herstellung einer elektrischen Verbindung zwischen einem BGA-Package und einer Signalquelle, sowie Verfahren zum Herstellen einer solchen Verbindung An arrangement for producing an electrical connection between a BGA package and a signal source, and to processes for producing such a compound
08/10/2006DE10329865B4 Verfahren zur Steuerung einer Abfolge von Meßschritten für die Justage eines Halbleiterwafers in einem Belichtungsapparat A method of controlling a sequence of measurement steps for the adjustment of a semiconductor wafer in an exposure apparatus
08/10/2006DE10318422B4 Hochfrequenz-Bipolartransistor mit Silizidregion und Verfahren zur Herstellung desselben Of the same high-frequency bipolar transistor with silicide and methods for preparing
08/10/2006DE10252986B4 Winkelsteuerungsvorrichtung mit einem Anzeigegerät, das mit zwei Darstellungsfenstern konfiguriert ist, welche gleichzeitig dasselbe Bild anzeigen, das durch eine einzelne Kamera aufgenommen ist Angle control device having a display device that is configured with two viewports, which simultaneously display the same image that is captured by a single camera
08/10/2006DE10246175B4 Verfahren zur Herstellung eines vergrabenen Streifens durch Diffusion mittels Gasphasendotierung A process for producing a buried strip by diffusion by means of gas phase doping
08/10/2006DE10244569B4 Gate-Bearbeitungsverfahren mit reduzierter Gateoxid Ecken- und Kantenverdünnung Gate processing method with reduced gate oxide corner and edge thinning
08/10/2006DE10237829B4 Verfahren und Gerät zur Sicherstellung einer richtigen Orientierung eines Objektes für eine Ionenimplantation Method and apparatus for ensuring proper orientation of an object for an ion implantation
08/10/2006DE10209989B4 Verfahren zur Herstellung von DRAM-Grabenkondensatorstrukturen mit kleinen Durchmessern mittels SOI-Technologie Process for the preparation of grave DRAM capacitor structures having small diameters by means of SOI technology
08/10/2006DE102006004788A1 Halbleiterbauelement und Fertigungsverfahren für dieses Semiconductor device and manufacturing method thereof
08/10/2006DE102006003567A1 Manufacturing structure of assembly of photoelectric semiconductor wafer involves covering large area of wafer by current conducting material and photoelectric semiconductor is then stacked on current conducting material
08/10/2006DE102006003422A1 Muster-Festlegungsverfahren und Muster-Festlegungsvorrichtung Pattern determination method and pattern-setting device
08/10/2006DE102005010087B3 Stapelstruktur-Schneideverfahren und Stapelstruktur Stack structure-cutting method and stack structure
08/10/2006DE102005004709A1 Verfahren zur Herstellung integrierter Schaltungen A process for the manufacture of integrated circuits
08/10/2006DE102005004708A1 Verfahren zur Herstellung integrierter Schaltkreise mit mindestens einem Silizium-Germanium-Heterobipolartransistor A process for the production of integrated circuits having at least one silicon-germanium heterobipolar
08/10/2006DE102005004707A1 Verfahren zur Herstellung integrierter Schaltkreise mit Silizium-Germanium-Heterobipolartransistoren A process for manufacturing integrated circuits with silicon-germanium heterobipolar
08/10/2006DE102005004599A1 Measuring object measurement method for manufacturing plant for semiconductor wafer, involves scanning target object in intensity profile and determining parameter as measurement result, where one of the results is stored in processing unit
08/10/2006DE102005004596A1 Verfahren zur Herstellung von verrundeten Polysiliziumelektroden auf Halbleiterbauelementen A process for preparing rounded polysilicon electrodes on semiconductor devices
08/10/2006DE102005004433A1 Semiconductor component for use in integrated circuit application, has electrically conductive stubbles with form like via fillings, provided on conductor surface of lower metal insulated metal capacitor electrode
08/10/2006DE102005004411A1 In-situ-gebildetes Halo-Gebiet in einem Transistorelement In-situ formed halo region in a transistor element
08/10/2006DE102005004410A1 Verfahren zum Bemustern einer Schicht aus einem Material A method for patterning a layer of a material
08/10/2006DE102005004409A1 Technik zur Erhöhung der Prozessflexibilität während der Herstellung von Kontaktdurchführungen und Gräben in Zwischenschichtdielektrika mit kleinem ε Technology to increase process flexibility during the production of vias and trenches in interlayer dielectrics with small ε
08/10/2006DE102005004384A1 Verfahren zur Herstellung einer definierten Vertiefung in einer Damaszener-Struktur unter Verwendung eines CMP Prozesses und eine Damaszener-Struktur A process for producing a defined recess in a damascene structure using a CMP process and a damascene structure
08/10/2006DE102005004376A1 Semiconductor memory device e.g. high-density chain-ferroelectric RAM, has capacitor arrangement with capacitors serving as memory units, where memory units and capacitors are separated from each other by insulation area
08/10/2006DE102005004375A1 Semiconductor storage cell for ferroelectric RAM, has ferroelectric storage material region formed as condenser dielectric medium between two electrodes whose external contact regions are made of metal oxide
08/10/2006DE102005004366A1 Wiring structures manufacturing method for integrated switching arrangement, involves applying nucleation and insulating layers on planarized surface, and galvanic depositing electro conductive material on open areas of nucleation layer