| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 08/30/2006 | CN1825570A Three dimensional structure formed by using an adhesive silicon wafer process |
| 08/30/2006 | CN1825569A Manufacture process for erase improvement in a non-volatile memory device |
| 08/30/2006 | CN1825568A Method of manufacturing semiconductor integrated circuit |
| 08/30/2006 | CN1825567A Method of integration manufacture memory unit cell capacitance and logic element and structure of the same |
| 08/30/2006 | CN1825566A Semiconductor device manufacturing method |
| 08/30/2006 | CN1825565A Method for manufacturing an electro-optical device |
| 08/30/2006 | CN1825564A Active matrix structure for display and manufacturing process therof |
| 08/30/2006 | CN1825563A Semiconductor chip and method of fabricating the same |
| 08/30/2006 | CN1825562A Method of manufacture semiconductor component |
| 08/30/2006 | CN1825561A Method of forming metal line in semiconductor device |
| 08/30/2006 | CN1825560A Method for preparing copper conductor for plane display substrate |
| 08/30/2006 | CN1825559A Method for reducing concave slot of shallow slot isolation zone |
| 08/30/2006 | CN1825558A Method for reducing electric leakage of transistor in active zone edge junction |
| 08/30/2006 | CN1825557A Method for reducing side slot depth in shallow slot isolation |
| 08/30/2006 | CN1825556A Wafer holder and method of holding a wafer |
| 08/30/2006 | CN1825555A Method for monitoring oxide layer deposition |
| 08/30/2006 | CN1825554A Manufacturing method for electronic device |
| 08/30/2006 | CN1825553A Manufacturing method for a semiconductor device |
| 08/30/2006 | CN1825552A Method of implementation compensating dopant region and semiconductor device structure |
| 08/30/2006 | CN1825551A Ldmos device and method of fabrication of ldmos device |
| 08/30/2006 | CN1825550A Gap wall removing method and method for mfg. MOS |
| 08/30/2006 | CN1825549A Wafer with semiconductor layer and insolator layer below it, and method therefore |
| 08/30/2006 | CN1825548A Method of forming a conductive pattern, a thin film transistor and method of manufacturing the same |
| 08/30/2006 | CN1825547A Method for making double layer grid dielectric layer |
| 08/30/2006 | CN1825546A Methods for removing extraneous amounts of molding material from a substrate |
| 08/30/2006 | CN1825545A Method for making wear-resistant dielectric layer |
| 08/30/2006 | CN1825544A Method for making chip type low dielectric constant dielectric layer and plane inductive element |
| 08/30/2006 | CN1825543A Methods for in-situ cleaning of semiconductor substrates and methods of semiconductor device fabrication employing the same |
| 08/30/2006 | CN1825542A Method for forming grid dielectric layer |
| 08/30/2006 | CN1825541A Self-aligned contact method |
| 08/30/2006 | CN1825540A Method for improving tin sulfide semiconductor film conductivity |
| 08/30/2006 | CN1825539A Method for growing non-crack III family nitride on silicon substrate |
| 08/30/2006 | CN1825538A Method and system for fabricating free-standing nanostructures |
| 08/30/2006 | CN1825537A Apparatus including 4-way valve for fabricating semiconductor device, method of controlling valve, and method of fabricating semiconductor device using the apparatus |
| 08/30/2006 | CN1825536A Substrate processing apparatus and substrate processing method |
| 08/30/2006 | CN1825535A Vacuum processor |
| 08/30/2006 | CN1825534A Quantum point making method |
| 08/30/2006 | CN1825505A Inductance coupled coil and inductance coupled plasma device |
| 08/30/2006 | CN1825405A Protection circuit for input and output of liquid crystal display |
| 08/30/2006 | CN1825324A Distribution optimized method and optical shielding film, manufacture method of semiconductor device |
| 08/30/2006 | CN1825211A Lithographic apparatus and device manufacturing method |
| 08/30/2006 | CN1825210A Off-axis projection optics system and extreme ultraviolet lithography apparatus employing the same |
| 08/30/2006 | CN1825209A Resist pattern forming method and semiconductor device manufacturing method |
| 08/30/2006 | CN1825208A Lithographic apparatus and device manufacturing method |
| 08/30/2006 | CN1825207A Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus |
| 08/30/2006 | CN1825189A Method for making step contact window of two-dimensional display |
| 08/30/2006 | CN1825131A Method for managing semiconductor characteristic evaluation apparatus and computer program therefor |
| 08/30/2006 | CN1825130A Semiconductor test management system and method |
| 08/30/2006 | CN1825129A Method and apparatus for semiconductor testing |
| 08/30/2006 | CN1825128A LED tester |
| 08/30/2006 | CN1825124A Test tray for handler for testing semiconductor devices |
| 08/30/2006 | CN1825098A Retainer device |
| 08/30/2006 | CN1825073A Automatic apparatus for LED tester table |
| 08/30/2006 | CN1824849A Silicon substrate III family nitride epitaxial growth |
| 08/30/2006 | CN1824829A Deposition system and method for measuring deposition thickness in the deposition system |
| 08/30/2006 | CN1824825A Method of forming shadow mask pattern |
| 08/30/2006 | CN1824824A Mask frame and method of fixing mask on the mask frame |
| 08/30/2006 | CN1824592A Wafer transfer device |
| 08/30/2006 | CN1824462A Chemical mechanical polishing method |
| 08/30/2006 | CN1272989C Method and apparatus for generating X-ray |
| 08/30/2006 | CN1272858C 显示装置 Display device |
| 08/30/2006 | CN1272857C Grid structure with independently made vertical doped distributions and forming method thereof |
| 08/30/2006 | CN1272856C Field effect transistor with stressed channel and producing method thereof |
| 08/30/2006 | CN1272855C Double-gate transistor and method of manufacturing the same |
| 08/30/2006 | CN1272854C 影像感测器及其封装方法 Image sensor and method for packaging |
| 08/30/2006 | CN1272853C Film semiconductor device and LCD |
| 08/30/2006 | CN1272852C Capacitor with oxidation barrier layer and method for manufacturing the same |
| 08/30/2006 | CN1272851C Integrated complementary metal oxide semiconductor circuit |
| 08/30/2006 | CN1272849C Flexible electronic device |
| 08/30/2006 | CN1272847C Clock signal transmission circuit |
| 08/30/2006 | CN1272846C Method for forming metal wire in semiconductor device |
| 08/30/2006 | CN1272845C Method for producing contact plug of semiconductor device |
| 08/30/2006 | CN1272844C Method and device for testing chip surface |
| 08/30/2006 | CN1272843C Method and system for phase/amplitude error detection of alternate phase shifting mask in photolithography |
| 08/30/2006 | CN1272842C Chip non ink spot test method and system |
| 08/30/2006 | CN1272841C Low-tension detector and method and system for detecting low-tension ferroeletric random access memory |
| 08/30/2006 | CN1272840C Marked location detector |
| 08/30/2006 | CN1272839C Apparatus for installing semiconductor chip |
| 08/30/2006 | CN1272838C Resin moulding-die and method for making semiconductor device using same |
| 08/30/2006 | CN1272837C Semiconductor device and circuit substrate |
| 08/30/2006 | CN1272836C Manufacture of Schottky-barrier diode |
| 08/30/2006 | CN1272835C Dry etching method for gallium nitride materials |
| 08/30/2006 | CN1272834C Planarization method of integrated circuit chip |
| 08/30/2006 | CN1272833C Manufacture of dielectric layer of gate |
| 08/30/2006 | CN1272832C Method for making grid and MOS transistor |
| 08/30/2006 | CN1272831C Fine pattern forming method |
| 08/30/2006 | CN1272830C Semiconductor handler for rapid testing |
| 08/30/2006 | CN1272801C Semiconductor storage device |
| 08/30/2006 | CN1272735C Method and system for design selection by interactive visualization |
| 08/30/2006 | CN1272711C Stack test method |
| 08/30/2006 | CN1272688C Semiconductor memory device inverted chip interface circuit and inverted chip interface method |
| 08/30/2006 | CN1272673C An integrated circuit using a reflective mask |
| 08/30/2006 | CN1272672C Method of removing conformation layer from lower layer via counterflow |
| 08/30/2006 | CN1272670C Method for determining optical constant of reflection-prevention film and method for forming photoresist pattern |
| 08/30/2006 | CN1272669C Resin composition, method for forming insulating film, active matrix plate and panel display, and method for producing panel display device |
| 08/30/2006 | CN1272668C Photoresist compositions with polymers having pendant groups containing plural acid labile moieties |
| 08/30/2006 | CN1272664C Producing method for thin-film transistor liquid-crystal display |
| 08/30/2006 | CN1272661C Wide visual angle liquid crystal display device and its manufacturing method |
| 08/30/2006 | CN1272658C Method for making black matrix and colorful filter |
| 08/30/2006 | CN1272632C Wafer-level burn-in and test |