Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2006
08/31/2006US20060192254 Semiconductor memory device
08/31/2006US20060192252 Semiconductor device allowing modulation of a gain coefficient and a logic circuit provided with the same
08/31/2006US20060192250 Complementary metal-oxide-semiconductor image sensor and method for fabricating the same
08/31/2006US20060192241 Non-volatile memory and manufacturing method thereof
08/31/2006US20060192239 Permeable capacitor electrode
08/31/2006US20060192238 Intermediate semiconductor device structure including multiple photoresist layers
08/31/2006US20060192237 Magnetic elements with ballistic magnetoresistance utilizing spin-transfer and an MRAM device using such magnetic elements
08/31/2006US20060192236 Semiconductor device
08/31/2006US20060192235 System and method for reducing shorting in memory cells
08/31/2006US20060192228 Compound semiconductor epitaxial substrate and method for manufacturing same
08/31/2006US20060192209 Optical integrated semiconductor light emitting device
08/31/2006US20060192205 Electro-optical device and electronic device
08/31/2006US20060192202 Semiconductor device forming method
08/31/2006US20060192158 Device, EUV lithographic device and method for preventing and cleaning contamination on optical elements
08/31/2006US20060192156 Light source apparatus and exposure apparatus having the same
08/31/2006US20060192147 Multilayer mirror, method for manufacturing the same, and exposure equipment
08/31/2006US20060192117 Inspection method and apparatus using an electron beam
08/31/2006US20060192004 Stylized method of using and distributing consumer electronic devices
08/31/2006US20060191882 Systems and methods for forming apertures in microfeature workpieces
08/31/2006US20060191871 Cmp slurry delivery system and method of mixing slurry thereof
08/31/2006US20060191870 Extended kalman filter incorporating offline metrology
08/31/2006US20060191868 Concept for the wet-chemical removal of a sacrificial material in a material structure
08/31/2006US20060191867 Ionization; deuterium compounds; lamination
08/31/2006US20060191866 Microfeature workpiece processing system for, e.g., semiconductor wafer analysis
08/31/2006US20060191865 Method of processing substrate, method of manufacturing solid-state imaging device, method of manufacturing thin film device, and programs for implementing the methods
08/31/2006US20060191800 Positioning microelectronic between electrodes; polishing; removal electrochemical material by moving between electrodes; detecting signals
08/31/2006US20060191639 Substrate holding structure and substrate processing device
08/31/2006US20060191636 Valve assembly, semiconductor device manufacturing apparatus comprising the same, and method of cleaning a trap of a semiconductor device manufactuing apparatus
08/31/2006US20060191635 Wafer treating apparatus
08/31/2006US20060191634 Apparatus for wafer patterning to reduce edge exclusion zone
08/31/2006US20060191629 Anodically bonding a stack of two conductive ceramic components separated by an intermediate film at low temperatures wherein a transition layer is formed
08/31/2006US20060191627 Process for cutting out a block of material and formation of a thin film
08/31/2006US20060191556 Substrate processing apparatus and substrate processing method
08/31/2006US20060191481 Apparatus for the formation of a metal film
08/31/2006US20060191479 Surface treatment apparatus
08/31/2006US20060191477 Apparatus for the formation of a metal film
08/31/2006US20060191475 Apparatus for spin coating semiconductor substrates
08/31/2006US20060191467 Group iii nitride based semiconductor substrate and process for manufacture thereof
08/31/2006US20060191131 Electronic part mounting apparatus
08/31/2006US20060191125 Self-assembled electrical networks
08/31/2006DE19928225B4 Verfahren zur Herstellung von Mehrlagen-Hybriden A process for producing multi-layer hybrids
08/31/2006DE19908979B4 Anschlusssockel mit darin eingeschobenem Halbleiterbauteil für photoelektrische Elemente Terminal block with inserted therein semiconductor device for photoelectric elements
08/31/2006DE19750167B4 Verfahren zur Herstellung integrierter Schaltkreise A process for the production of integrated circuits
08/31/2006DE19651811B4 Vorrichtung zum Belegen eines Substrats mit dünnen Schichten Device to occupy a substrate with thin layers
08/31/2006DE19520053B4 Bestückungsvorrichtung für Halbleiterelemente Mounting apparatus for semiconductor elements
08/31/2006DE112004002017T5 Epitaktisches Abscheiden von Source/Drain Epitaxial deposition of the source / drain
08/31/2006DE10345476B4 Lithographische Maske und Verfahren zum Bedecken einer Maskenschicht Lithographic mask and method for covering a mask layer
08/31/2006DE10310128B4 Verfahren zum Erzeugen von Halbleiterzonen mit n-Leitfähigkeit in einem Halbleiterkörper A method for producing semiconductor regions with n-type conductivity in a semiconductor body
08/31/2006DE10249869B4 Magnetische Dünnfilmspeichervorrichtung zum Durchführen eines Datenschreibvorgangs durch Anlegen eines Magnetfelds Thin film magnetic memory device for performing a data write operation by applying a magnetic field
08/31/2006DE10239306B4 Verfahren zum selektiven Verbinden von Substraten A method of selectively bonding substrates
08/31/2006DE10208714B4 Herstellungsverfahren für einen Kontakt für eine integrierte Schaltung Manufacturing method of a contact for an integrated circuit
08/31/2006DE102006007431A1 Durch Halbleitersilizium-Verfahrenstechnik gebildeter Probenträger By semiconductor silicon process technology educated sample carrier
08/31/2006DE102005028644A1 Line forming method for semiconductor NAND flash memory device, involves forming a glue layer and lower barrier metal film on entire surface including trench and forming upper barrier metal film at bottom of trench
08/31/2006DE102005012112A1 Ladungsgfangendes Speicherbauelement und Verfahren zur Herstellung Ladungsgfangendes memory device and methods for preparing
08/31/2006DE102005009020A1 N-doped semiconductor layer producing method for e.g. vertical field plate trench transistor, involves irradiating part of upper surface of semiconductor body of power transistor with protons, and annealing semiconductor body
08/31/2006DE102005008600A1 Chip carrier used as heat sink for semiconductor chips, comprises two recesses in respective surface of chip carrier, and dimensioned to receive two semiconductor chips
08/31/2006DE102005008336A1 Unipolar three-layered electrostatic semiconductor wafer arrangement for integrated circuit, has wafer layer and carrier layer from semiconducting material e.g. silicon, where wafer layer is arranged adjacent to side of isolating layer
08/31/2006DE102005007643A1 Verfahren und Anordnung zum Kontaktieren von Halbleiterchips auf einem metallischen Substrat Method and apparatus for bonding semiconductor chips on a metallic substrate
08/31/2006DE102005007486A1 Halbleiterbauteil mit oberflächenmontierbarem Gehäuse und Verfahren zur Herstellung desselben Of the same semiconductor device with oberflächenmontierbarem housing and methods for preparing
08/31/2006DE102005006333A1 Halbleiterbauteil mit mehreren Bondanschlüssen und Verfahren zur Herstellung desselben Of the same semiconductor device having a plurality of bonding pads and methods for preparing
08/31/2006DE102004044686B4 Integrierte Schaltungsanordnung mit Vias, die zwei Abschnitte haben, und Herstellungsverfahren An integrated circuit device with vias, which have two portions, and manufacturing processes
08/31/2006DE102004044678B4 Verfahren zum Herstellen eines Kondensators A method for manufacturing a capacitor
08/31/2006DE102004040414B4 Verfahren zur Herstellung eines Verdrahtungssubstrats eines Halbleiterbauteils mit Außenkontaktanschlussflecken für Außenkontakte Process for the preparation of a wiring substrate of a semiconductor device with external contact pads for external contacts
08/31/2006DE102004033645B4 Herstellungswerkzeug für eine Waferebene-Packung und Verfahren zum Anordnen von Chips Production tool for a wafer level package and method for disposing of chips
08/31/2006DE10158809B4 Herstellungsverfahren für eine Leiterbahn auf einem Substrat und eine entsprechende Leiterbahn Manufacturing method of a conductor track on a substrate and a corresponding conductor track
08/31/2006DE10138142B4 Verfahren zur Analyse einer integrierten elektrischen Schaltung A method for analyzing an integrated electrical circuit
08/31/2006DE10129346B4 Verfahren zur Herstellung eines Halbleiterbauelementes A process for producing a semiconductor device
08/30/2006EP1696567A1 Level shift circuit, actuator apparatus using the same, and optical switch system
08/30/2006EP1696485A1 Process for manufacturing semiconductor devices in a SOI substrate with alignment marks
08/30/2006EP1696484A1 Process for assembling a double-sided circuit component
08/30/2006EP1696481A2 Method of integrating an electronic component into a substrate cavity
08/30/2006EP1696480A2 Free-standing electrostatically-doped carbon nanotube device and method for making same
08/30/2006EP1696479A1 Contactor for reliability evaluation tester
08/30/2006EP1696478A1 Insulating film, method for forming same and composition for forming film
08/30/2006EP1696477A2 Process of fabrication of sub-lithographic structures
08/30/2006EP1696476A2 Method of surface processing substrate, method of cleaning substrate, and programs for implementing the methods
08/30/2006EP1696475A1 Substrate treatment device and substrate treatment method
08/30/2006EP1696474A1 Method of removing deposit from substrate and method of drying substrate, and device for removing deposit from substrate and device of drying substrate using these methods
08/30/2006EP1696473A2 Silicon nano wires, semiconductor device including the same, and method of manufacturing the silicon nano wires
08/30/2006EP1696472A1 A patterning method for fabricating high resolution structures
08/30/2006EP1696471A1 Pattern-forming process utilizing nanoimprint and apparatus for performing such process
08/30/2006EP1696470A2 Wafer holder and method of holding a wafer
08/30/2006EP1696253A2 Accurate relative alignment and epoxy-free attachment of optical elements
08/30/2006EP1696053A1 Nano-array electrode manufacturing method and photoelectric converter using same
08/30/2006EP1696011A1 Chemical mechanical polishing method
08/30/2006EP1695937A2 Integrated micro electro-mechanical system and manufacturing method thereof
08/30/2006EP1695387A2 Low crosstalk substrate for mixed-signal integrated circuits
08/30/2006EP1695384A2 Wire-bonded semiconductor component with reinforced inner connection metallization
08/30/2006EP1695383A1 Bipolar and cmos integration with reduced contact height
08/30/2006EP1695381A1 Method for forming non-amorphous, ultra-thin semiconductor devices using sacrificial implantation layer
08/30/2006EP1695380A1 Method to reduce seedlayer topography in bicmos process
08/30/2006EP1695379A1 Contoured insulator layer of silicon-on-onsulator wafers and process of manufacture
08/30/2006EP1695378A1 Method for production of semiconductor chip and semiconductor chip
08/30/2006EP1695377A2 Method of fabricating a strained semiconductor-on-insulator substrate
08/30/2006EP1695376A1 Surface treatment for multi-layer wafers formed from layers of materials chosen from among semiconducting materials
08/30/2006EP1695375A2 Synthetic quartz glass for optical member and its production method
08/30/2006EP1695145A2 Method for repairing errors of patterns embodied in thin layers
08/30/2006EP1695128A2 Optical waveguides and methods thereof
08/30/2006EP1695123A2 Laser and detector device
08/30/2006EP1694887A2 Controlled growth of gallium nitride nanostructures