H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2006
10/17/2006	US7122395 Method of forming semiconductor devices through epitaxy
10/17/2006	US7122394 Process for producing a semiconductor light-emitting device
10/17/2006	US7122393 Optical semiconductor device and method of fabricating the same
10/17/2006	US7122392 Methods of forming a high germanium concentration silicon germanium alloy by epitaxial lateral overgrowth and structures formed thereby
10/17/2006	US7122391 Wafer-level test structure for edge-emitting semiconductor lasers
10/17/2006	US7122390 Methods of fabrication for flip-chip image sensor packages
10/17/2006	US7122388 Method of detecting misalignment of ion implantation area
10/17/2006	US7122387 Deposition stop time detection apparatus and methods for fabricating copper wiring using the same
10/17/2006	US7122386 Method of fabricating contact pad for magnetic random access memory
10/17/2006	US7122385 Magnetic memory device having magnetic circuit and method of manufacture thereof
10/17/2006	US7122297 Applying a resist to a substrate,exposing the resist, developing the exposed resist, etching the substrate
10/17/2006	US7122296 Providing a substrate having a surface which includes topography formed therein; forming a thin, conformal layer on substrate surface, removing substantially all of the layer from bottomwalls so as to yield holes, trenches
10/17/2006	US7122292 Acid labile, photoresists, semiconductors
10/17/2006	US7122282 Mask pattern forming method and patterning method using the mask pattern
10/17/2006	US7122281 Defining critical edge portions of the features with a full phase shifting mask (FPSM) includes a first set of cuts between adjacent phase shifters to resolve phase conflicts; a computer software
10/17/2006	US7122280 Angular substrates
10/17/2006	US7122222 Precursors for depositing silicon containing films and processes thereof
10/17/2006	US7122125 Controlled polymerization on plasma reactor wall
10/17/2006	US7122124 Method of fabricating film carrier
10/17/2006	US7122096 Method and apparatus for processing semiconductor
10/17/2006	US7122095 Methods for forming an assembly for transfer of a useful layer
10/17/2006	US7122091 Structure of retaining cut-processed components, method of fabricating cut-processed components, tray for housing cut-processed components, and method of cleaning cut-processed components
10/17/2006	US7122085 Sublimation bed employing carrier gas guidance structures
10/17/2006	US7122084 Device for liquid treatment of disk-shaped objects
10/17/2006	US7122082 Silicon wafer and manufacturing method thereof
10/17/2006	US7121938 Polishing pad and method of fabricating semiconductor substrate using the pad
10/17/2006	US7121934 Carrier head for chemical mechanical polishing apparatus
10/17/2006	US7121933 Chemical mechanical polishing apparatus
10/17/2006	US7121926 Methods for planarization of group VIII metal-containing surfaces using a fixed abrasive article
10/17/2006	US7121925 Method for dicing semiconductor wafer into chips
10/17/2006	US7121496 Method and system for correcting web deformation during a roll-to-roll process
10/17/2006	US7121414 Semiconductor cassette reducer
10/17/2006	US7121286 Gas flow of fluorine cleaning gas so as to flow from upstream toward an outlet port in a reaction chamber; flowing protective gas which reacts with the fluorine from vicinity of outlet port
10/17/2006	US7121146 MEMS pressure sensing device
10/17/2006	US7121014 Positioning aid and method for assisting in aligning heavy machines
10/17/2006	US7120999 Methods of forming a contact array in situ on a substrate
10/17/2006	US7120995 Apparatus for mounting semiconductors
10/17/2006	CA2217018C Method and apparatus for step and repeat exposures
10/17/2006	CA2211533C Glass bonding layer for a ceramic circuit board support substrate
10/12/2006	WO2006108011A2 Trenched-gate field effect transistors and methods of forming the same
10/12/2006	WO2006108007A2 Method for polysilicon-1 definition of flash memory device
10/12/2006	WO2006107942A1 Vapor hf etch process mask and method
10/12/2006	WO2006107897A2 Semiconductor device including a superlattice and adjacent semiconductor layer with doped regions defining a semiconductor junction
10/12/2006	WO2006107735A2 Method for making a semiconductor device including a superlattice with regions defining a semiconductor junction
10/12/2006	WO2006107733A1 Semiconductor device including a superlattice with regions defining a semiconductor junction
10/12/2006	WO2006107705A1 Method for making a semiconductor device including a superlattice and adjacent semiconductor layer with doped regions defining a semiconductor junction
10/12/2006	WO2006107703A1 Thermal oxidation of silicon using ozone
10/12/2006	WO2006107669A2 Method of producing highly strained pecvd silicon nitride thin films at low temperature
10/12/2006	WO2006107659A1 Resin compositions and methods of use thereof
10/12/2006	WO2006107587A1 Etch process for cd reduction of arc material
10/12/2006	WO2006107573A2 High strip rate downstream chamber
10/12/2006	WO2006107569A2 Methods for rinsing microelectronic substrates utilizing cool rinse fluid within a gas environment including a drying enhancement substance
10/12/2006	WO2006107564A2 Semiconductor power deviceand corrisponding manufacturing process
10/12/2006	WO2006107550A2 Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids
10/12/2006	WO2006107549A1 Compact duct system incorporating moveable and nestable baffles for use in tools used to process microelectronic workpieces with one or more treatment fluids
10/12/2006	WO2006107545A2 Method for forming a barrier/seed layer for copper metallization
10/12/2006	WO2006107532A2 Single wafer thermal cvd processes for hemispherical grained silicon and nano-crystalline grain-sized polysilicon
10/12/2006	WO2006107523A1 Wafer curvature estimation, monitoring, and compensation
10/12/2006	WO2006107519A1 Bonding wire cleaning unit with a chamber and an energy source and method of wire bonding using such cleaning unit
10/12/2006	WO2006107517A2 Composition for cleaning ion implanted photoresist in front end of line applications
10/12/2006	WO2006107514A2 Method of inhibiting copper corrosion during supercritical co2 cleaning
10/12/2006	WO2006107507A2 Wafer level package including a device wafer integrated with a passive component
10/12/2006	WO2006107495A1 Etch profile control
10/12/2006	WO2006107434A2 Cmos-based low esr capacitor and esd-protection device and method
10/12/2006	WO2006107425A2 Baffle wafers and randomly oriented polycrystallin silicon used therefor
10/12/2006	WO2006107422A2 Method of making a substrate structure with enhanced surface area
10/12/2006	WO2006107419A2 Method of making a dual strained channel semiconductor device
10/12/2006	WO2006107417A2 Method and system for forming a high-k dielectric layer
10/12/2006	WO2006107416A2 Method and system for forming an oxynitride layer by performing oxidation and nitridation concurrently
10/12/2006	WO2006107415A1 Method and system for forming an oxynitride layer
10/12/2006	WO2006107414A2 Method of forming an electronic device
10/12/2006	WO2006107383A2 Transitional dielectric layer to improve reliability and performance of high dielectric constant transistors
10/12/2006	WO2006107056A1 Method of forming pattern
10/12/2006	WO2006107044A1 Plasma processing method and system
10/12/2006	WO2006107036A1 Substrate processing method and substrate processing apparatus
10/12/2006	WO2006107030A1 Film-forming apparatus, film-forming method and recording medium
10/12/2006	WO2006107013A1 Supply power adjusting apparatus and semiconductor manufacturing apparatus
10/12/2006	WO2006106945A1 Microwave generating apparatus and microwave generating method
10/12/2006	WO2006106928A1 Process for producing gallium nitride-based compound semiconductor laser element and gallium nitride-based compound semiconductor laser element
10/12/2006	WO2006106907A1 Exposure apparatus, exposure method, and device production method
10/12/2006	WO2006106872A1 Plasma doping method and system
10/12/2006	WO2006106871A1 Ashing apparatus, ashing method, and impurity doping apparatus
10/12/2006	WO2006106859A1 Semiconductor device manufacturing method, substrate manufacturing method and substrate treating apparatus
10/12/2006	WO2006106858A1 Plasma doping method and apparatus
10/12/2006	WO2006106857A1 Plasma processing device, processing method using this, semiconductor device, liquid crystal panel and plasma display
10/12/2006	WO2006106851A1 Exposure apparatus, exposure method, and device production method
10/12/2006	WO2006106836A1 Exposure method, exposure apparatus and device manufacturing method
10/12/2006	WO2006106833A1 Exposure apparatus, exposure method, and device producing method
10/12/2006	WO2006106832A1 Method for determining exposure conditions, exposure method, exposure device, and apparatus for producing device
10/12/2006	WO2006106790A1 Polishing apparatus, semiconductor device manufacturing method using such polishing apparatus and semiconductor device manufactured by such semiconductor device manufacturing method
10/12/2006	WO2006106779A1 Impurity introduction apparatus and method of impurity introduction
10/12/2006	WO2006106767A1 Transmission line pair and transmission line group
10/12/2006	WO2006106764A1 Transmission line
10/12/2006	WO2006106761A1 Transmission line pair
10/12/2006	WO2006106746A1 Plotting point data acquisition method and device, plotting method and device
10/12/2006	WO2006106710A1 Bonded wafer manufacturing method, bonded wafer, and plane polishing apparatus
10/12/2006	WO2006106699A1 Manufacturing method of solid-state imaging device
10/12/2006	WO2006106667A1 Method for forming insulating film and method for manufacturing semiconductor device
10/12/2006	WO2006106666A1 Method for producing silicon oxide film, control program thereof, recording medium and plasma processing apparatus
10/12/2006	WO2006106665A1 Method for nitriding substrate and method for forming insulating film

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