| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 01/11/2007 | WO2007003473A1 Reactor for carrying out an etching method for a stack of masked wafers and an etching method |
| 01/11/2007 | WO2007003223A1 Method and apparatus for forming a noble metal layer, notably on inlaid metal features |
| 01/11/2007 | WO2007003221A1 Wafer and method of planarizing a surface of a wafer |
| 01/11/2007 | WO2007003220A1 Method of forming a semiconductor structure |
| 01/11/2007 | WO2007003141A1 Coaxial opto-electronic device having small form factor insulating structure |
| 01/11/2007 | WO2006124321A3 Treatment of substrate using fuctionalizing agent in supercritical carbon dioxide |
| 01/11/2007 | WO2006113442A8 Wafer separation technique for the fabrication of free-standing (al, in, ga)n wafers |
| 01/11/2007 | WO2006100640B1 Method of manufacturing a semiconductor device having a buried doped region |
| 01/11/2007 | WO2006091588A3 Etching chamber with subchamber |
| 01/11/2007 | WO2006088713A3 Enhanced wafer cleaning method |
| 01/11/2007 | WO2006087244A3 Wafer cleaning after via-etching |
| 01/11/2007 | WO2006076354A3 Diamond medical devices |
| 01/11/2007 | WO2006076302A3 System and method for creating a surface pattern |
| 01/11/2007 | WO2006074148A3 Method and structure for reducing parasitic influences of deflection devices on spatial light modulators |
| 01/11/2007 | WO2006072575A3 Ldmos transistor |
| 01/11/2007 | WO2006039211A3 Corrosion resistant apparatus for control of a multi-zone nozzle in a plasma processing system |
| 01/11/2007 | WO2006022856A3 DUV LASER ANNEALING AND STABILIZATION OF SiCOH FILMS |
| 01/11/2007 | WO2005122267A8 Growth of planar reduced dislocation density m-plane gallium nitride by hydride vapor phase epitaxy |
| 01/11/2007 | WO2005112093A3 Gas distribution system having fast gas switching capabilities |
| 01/11/2007 | WO2005079366A3 Complimentary nitride transistors vertical and common drain |
| 01/11/2007 | US20070011638 Computer implemented design system, a computer implemented design method, a reticle set, and an integrated circuit |
| 01/11/2007 | US20070011535 Semiconductor integrated circuit |
| 01/11/2007 | US20070011530 Decompressor/PRPG for applying pseudo-random and deterministic test patterns |
| 01/11/2007 | US20070011520 Element substrate, test method for element substrate, and manufacturing method for semiconductor device |
| 01/11/2007 | US20070011468 LSI design method and verification method |
| 01/11/2007 | US20070010412 Process solutions containing surfactants |
| 01/11/2007 | US20070010411 Cleaning agent composition, cleaning and production methods for semiconductor wafer, and semiconductor wafer |
| 01/11/2007 | US20070010409 Reducing defects in the manufacture of semiconductor devices by contacting with acetylenic diol derivatives, amines, hydroxyamine modified polyethers, esters, quaternaryammonium compounds as surfactant, aqueous (water)and nonaqueous (ethanol, methanol, tetrahydrofuran etc) solvents |
| 01/11/2007 | US20070010104 Processes and systems for laser crystallization processing of film regions on a substrate utilizing a line-type beam, and structures of such film regions |
| 01/11/2007 | US20070010103 Nitric oxide reoxidation for improved gate leakage reduction of sion gate dielectrics |
| 01/11/2007 | US20070010102 Method for forming a semiconductor device having a structure of a single crystal scandium oxide film formed on a silicon substrate |
| 01/11/2007 | US20070010101 Use of expanding material oxides for nano-fabrication |
| 01/11/2007 | US20070010100 Method of plasma etching transition metals and their compounds |
| 01/11/2007 | US20070010099 Method of pattern etching a silicon-containing hard mask |
| 01/11/2007 | US20070010098 Use of CMP for aluminum mirror and solar cell fabrication |
| 01/11/2007 | US20070010097 Apparatus and method for selected site backside unlayering of silicon, gaas, gaxalyasz of soi technologies for scanning probe microscopy and atomic force probing characterization |
| 01/11/2007 | US20070010096 Method for fabricating semiconductor device |
| 01/11/2007 | US20070010095 Surface treatment method using ion beam and surface treating device |
| 01/11/2007 | US20070010094 Method for depositing a conductive carbon material on a semiconductor for forming a Schottky contact and semiconductor contact device |
| 01/11/2007 | US20070010093 METHOD OF ROOM TEMPERATURE GROWTH OF SIOx ON SILICIDE AS AN ETCH STOP LAYER FOR METAL CONTACT OPEN OF SEMICONDUCTOR DEVICES |
| 01/11/2007 | US20070010092 Method for eliminating bridging defect in via first dual damascene process |
| 01/11/2007 | US20070010091 Method for performing chemical shrink process over barc (bottom anti-reflective coating) |
| 01/11/2007 | US20070010090 Semiconductor device having local interconnection layer and etch stopper pattern for preventing leakage of current |
| 01/11/2007 | US20070010089 Method of forming bit line of semiconductor device |
| 01/11/2007 | US20070010088 Semiconductor device and method of fabricating the same |
| 01/11/2007 | US20070010087 Method of manufacturing a semiconductor wafer device having separated conductive patterns in peripheral area |
| 01/11/2007 | US20070010086 Circuit board with a through hole wire and manufacturing method thereof |
| 01/11/2007 | US20070010085 Semiconductor device and fabrication method thereof |
| 01/11/2007 | US20070010084 Semiconductor processing methods, and semiconductor constructions |
| 01/11/2007 | US20070010083 Method of realizing direct bonding between metal wires and copper pads by means of thermosonic wire bonding using shielding gas spraying device |
| 01/11/2007 | US20070010082 Structure and method for manufacturing phase change memories with particular switching characteristics |
| 01/11/2007 | US20070010081 Mosfet with multiple fully silicided gate and method for making the same |
| 01/11/2007 | US20070010080 Plasma Treatment at Film Layer to Reduce Sheet Resistance and to Improve Via Contact Resistance |
| 01/11/2007 | US20070010079 Method for fabricating semiconductor device |
| 01/11/2007 | US20070010078 Methods of forming integrated circuitry and methods of forming local interconnects |
| 01/11/2007 | US20070010077 Electronic component and a system and method for producing an electronic component |
| 01/11/2007 | US20070010076 Polycrystalline SiGe junctions for advanced devices |
| 01/11/2007 | US20070010075 Semiconductor device and method for manufacturing same |
| 01/11/2007 | US20070010074 Method and system for facilitating bi-directional growth |
| 01/11/2007 | US20070010073 Method of forming a MOS device having a strained channel region |
| 01/11/2007 | US20070010072 Uniform batch film deposition process and films so produced |
| 01/11/2007 | US20070010071 Method and apparatus for forming silicon oxynitride film |
| 01/11/2007 | US20070010070 Fabrication of strained semiconductor-on-insulator (ssoi) structures by using strained insulating layers |
| 01/11/2007 | US20070010069 Hand-held laser cutting apparatus and method using same |
| 01/11/2007 | US20070010068 Methods of manufacturing a semiconductor device |
| 01/11/2007 | US20070010067 Exfoliating method, transferring method of thin film device, and thin film device, thin film integrated circuit device, and liquid crystal display device produced by the same |
| 01/11/2007 | US20070010066 Method for manufacturing semiconductor device |
| 01/11/2007 | US20070010065 Method of making a capacitive substrate for use as part of a larger circuitized substrate, method of making said circuitized substrate and method of making an information handling system including said circuitized substrate |
| 01/11/2007 | US20070010064 Method of making a capacitive substrate using photoimageable dielectric for use as part of a larger circuitized substrate, method of making said circuitized substrate and method of making an information handling system including said circuitized substrate |
| 01/11/2007 | US20070010063 Method for manufacturing capacitor |
| 01/11/2007 | US20070010062 Method to obtain fully silicided poly gate |
| 01/11/2007 | US20070010061 Metal-substituted transistor gates |
| 01/11/2007 | US20070010060 Metal-substituted transistor gates |
| 01/11/2007 | US20070010059 Fin field effect transistors (FinFETs) and methods for making the same |
| 01/11/2007 | US20070010058 Method and apparatus for a self-aligned recessed access device (RAD) transistor gate |
| 01/11/2007 | US20070010057 Flash Memory Structure and Fabrication Method Thereof |
| 01/11/2007 | US20070010056 NOR-type flash memory device and manufacturing method thereof |
| 01/11/2007 | US20070010055 Non-volatile memory and fabricating method thereof |
| 01/11/2007 | US20070010054 Method for forming patterned media for a high density data storage device |
| 01/11/2007 | US20070010053 Method for fabricating conductive line |
| 01/11/2007 | US20070010052 Creating high voltage fets with low voltage process |
| 01/11/2007 | US20070010051 Method of forming a MOS device with an additional layer |
| 01/11/2007 | US20070010050 Method for forming semiconductor devices having reduced gate edge leakage current |
| 01/11/2007 | US20070010049 Thermal dissipation structures for finfets |
| 01/11/2007 | US20070010048 Semiconductor-on-insulator (SOI) strained active areas |
| 01/11/2007 | US20070010047 Semiconductor device and manufacturing method thereof |
| 01/11/2007 | US20070010046 Semiconductor device and method for manufacturing the same |
| 01/11/2007 | US20070010045 Method for manufacturing semiconductor device |
| 01/11/2007 | US20070010044 Method for sensor edge and mask height control for narrow track width devices |
| 01/11/2007 | US20070010043 Method for sensor edge control and track width definition for narrow track width devices |
| 01/11/2007 | US20070010042 Method of manufacturing a cmos image sensor |
| 01/11/2007 | US20070010041 Method of manufacturing optical device having transparent cover and method of manufacturing optical device module using the same |
| 01/11/2007 | US20070010040 Method for Making a Semiconductor Device Including a Strained Superlattice Layer Above a Stress Layer |
| 01/11/2007 | US20070010039 Organic electroluminescent device and fabricating method thereof |
| 01/11/2007 | US20070010038 Pattern forming method and wiring pattern forming method, and electro-optic device and electronic equipment |
| 01/11/2007 | US20070010037 Superlattice nanocrystal si-sio2 electroluminescence device |
| 01/11/2007 | US20070010036 Method for manufacturing semiconductor device |
| 01/11/2007 | US20070010035 Light emitting diode and manufacturing method thereof |
| 01/11/2007 | US20070010034 Deposition stop time detection apparatus and methods for fabricating copper using the same |
| 01/11/2007 | US20070010033 Method and system for deposition tuning in an epitaxial film growth apparatus |