Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
05/2007
05/03/2007US20070100488 Vacuum processing method and vacuum processing apparatus
05/03/2007US20070100109 Nanoporous materials and methods of formation thereof
05/03/2007US20070100086 Method of fabricating a three-dimensional nanostructure
05/03/2007US20070099441 Carbon nanotube with ZnO asperities
05/03/2007US20070099440 Method for manufacturing semiconductor device, semiconductor device, and laser irradiation apparatus
05/03/2007US20070099439 Arrangement and method for forming one or more separated scores in a surface of a substrate
05/03/2007US20070099438 Thin film deposition
05/03/2007US20070099437 Power module having at least two substrates
05/03/2007US20070099436 Method of producing silicon oxide, negative electrode active material for lithium ion secondary battery and lithium ion secondary battery using the same
05/03/2007US20070099435 Method and system for forming a nitrided germanium-containing layer using plasma processing
05/03/2007US20070099434 Method of forming oxide film of semiconductor device
05/03/2007US20070099433 Gas dielectric structure formation using radiation
05/03/2007US20070099432 Method for photolithography in semiconductor manufacturing
05/03/2007US20070099431 Process for increasing feature density during the manufacture of a semiconductor device
05/03/2007US20070099430 Method for manufacturing a semiconductor component
05/03/2007US20070099429 Post exposure resist bake
05/03/2007US20070099428 Plasma for patterning advanced gate stacks
05/03/2007US20070099427 Method for preparing of cerium oxide powder for chemical mechanical polishing and method for preparing of chemical mechanical polishing slurry using the same
05/03/2007US20070099426 Polishing method, polishing apparatus, and electrolytic polishing apparatus
05/03/2007US20070099425 Method for etching non-conductive substrate surfaces
05/03/2007US20070099424 Reduction of mechanical stress on pattern specific geometries during etch using double pattern layout and process approach
05/03/2007US20070099423 Method of removing a metal silicide layer on a gate electrode in a semiconductor manufacturing process and etching method
05/03/2007US20070099422 Process for electroless copper deposition
05/03/2007US20070099421 Methods For Forming Cobalt Layers Including Introducing Vaporized Cobalt Precursors And Methods For Manufacturing Semiconductor Devices Using The Same
05/03/2007US20070099420 Direct tailoring of the composition and density of ALD films
05/03/2007US20070099419 Methods for forming semiconductor devices including thermal processing
05/03/2007US20070099418 Resin plating method with added heat-treating process
05/03/2007US20070099417 Adhesion and minimizing oxidation on electroless CO alloy films for integration with low K inter-metal dielectric and etch stop
05/03/2007US20070099416 Shrinking Contact Apertures Through LPD Oxide
05/03/2007US20070099415 Integration process of tungsten atomic layer deposition for metallization application
05/03/2007US20070099414 Semiconductor device comprising a contact structure based on copper and tungsten
05/03/2007US20070099413 Method for forming multi-layer bumps on a substrate
05/03/2007US20070099412 Soldering method for mounting semiconductor device on wiring board to ensure invariable gap therebetween, and soldering apparatus therefor
05/03/2007US20070099411 Reflow apparatus, a reflow method, and a manufacturing method of semiconductor device
05/03/2007US20070099410 Hard intermetallic bonding of wafers for MEMS applications
05/03/2007US20070099409 Semiconductor device and method of manufacturing the same
05/03/2007US20070099408 Forming of silicide areas in a semiconductor device
05/03/2007US20070099407 Method for fabricating a transistor using a low temperature spike anneal
05/03/2007US20070099406 Semiconductor device manufacturing method
05/03/2007US20070099405 Methods for fabricating multi-terminal phase change devices
05/03/2007US20070099404 Implant and anneal amorphization process
05/03/2007US20070099403 Plasma composition for selective high-k etch
05/03/2007US20070099402 Method for fabricating reliable semiconductor structure
05/03/2007US20070099401 Laser irradiating device, laser irradiating method and manufacturing method of semiconductor device
05/03/2007US20070099400 Semiconductor circuit and method of fabricating the same
05/03/2007US20070099399 Relaxation of layers
05/03/2007US20070099398 Method and system for forming a nitrided germanium-containing layer using plasma processing
05/03/2007US20070099397 Microfeature dies with porous regions, and associated methods and systems
05/03/2007US20070099396 Method of forming pattern, film structure, electrooptical device and electronic equipment
05/03/2007US20070099395 Wafer level packaging process
05/03/2007US20070099394 Semiconductor device and manufacturing method thereof
05/03/2007US20070099393 Method of manufacturing isolation layer pattern in a semiconductor device and isolation layer pattern using the same
05/03/2007US20070099392 Fusion bonding process and structure for fabricating silicon-on-insulator (SOI) semiconductor devices
05/03/2007US20070099391 Methods for forming semiconductor structures with buried isolation collars and semiconductor structures formed by these methods
05/03/2007US20070099390 Vertical MIM capacitors and method of fabricating the same
05/03/2007US20070099389 Capacitor layout technique for reduction of fixed pattern noise in a CMOS sensor
05/03/2007US20070099388 Source/Drain Extensions Having Highly Activated and Extremely Abrupt Junctions
05/03/2007US20070099387 Method for fabricating semiconductor device
05/03/2007US20070099386 Integration scheme for high gain fet in standard cmos process
05/03/2007US20070099385 Method of manufacturing semiconductor device
05/03/2007US20070099384 Method for fabricating semiconductor device having recess gate
05/03/2007US20070099383 Method for fabricating semiconductor device
05/03/2007US20070099382 Method of forming source contact of NAND flash memory
05/03/2007US20070099381 Dual-gate device and method
05/03/2007US20070099380 Methods of fabricating flash memory devices including substantially uniform tunnel oxide layers
05/03/2007US20070099379 Method of manufacturing a dielectric film in a capacitor
05/03/2007US20070099378 Semiconductor device having align key and method of fabricating the same
05/03/2007US20070099377 Thermal isolation of phase change memory cells
05/03/2007US20070099376 Memory cell, pixel structure and fabrication process of memory cell
05/03/2007US20070099375 Method for fabricating capacitor
05/03/2007US20070099374 Bicmos device and method of manufacturing a bicmos device
05/03/2007US20070099373 Method for manufacturing an integrated semiconductor transistor device with parasitic bipolar transistor
05/03/2007US20070099372 Device having active regions of different depths
05/03/2007US20070099371 CMOS image sensor and manufacturing method thereof
05/03/2007US20070099370 Method for manufacturing semiconductor device
05/03/2007US20070099369 Integration scheme method and structure for transistors using strained silicon
05/03/2007US20070099368 Field effect transistor and method for manufacturing the same
05/03/2007US20070099367 ENHANCEMENT OF ELECTRON AND HOLE MOBILITIES IN 110 Si UNDER BIAXIAL COMPRESSIVE STRAIN
05/03/2007US20070099366 Lanthanum aluminum oxide dielectric layer
05/03/2007US20070099365 Semiconductor device and method of fabricating the same
05/03/2007US20070099364 Method for manufacturing a semiconductor device having a polymetal gate electrode
05/03/2007US20070099363 Method of manufacturing semiconductor device
05/03/2007US20070099362 Low resistance contact semiconductor device structure
05/03/2007US20070099361 Method for forming a semiconductor structure and structure thereof
05/03/2007US20070099360 Integrated circuits having strained channel field effect transistors and methods of making
05/03/2007US20070099359 Carrier multiplication in quantum-confined semiconductor materials
05/03/2007US20070099358 Method of measuring pattern shift in semiconductor device
05/03/2007US20070099357 Devices containing annealed stabilized silver nanoparticles
05/03/2007US20070099356 Flat panel display device and method of manufacturing the same
05/03/2007US20070099355 Satellite and method of manufacturing a semiconductor film using the satellite
05/03/2007US20070099354 Fabricating method of a pixel structure
05/03/2007US20070099353 Method for forming a semiconductor structure and structure thereof
05/03/2007US20070099352 Method for annealing silicon thin films and polycrystalline silicon thin films prepared therefrom
05/03/2007US20070099351 Sensing system
05/03/2007US20070099350 Structure and method of fabricating finfet with buried channel
05/03/2007US20070099349 Manufacturing method for magnetic sensor and lead frame therefor
05/03/2007US20070099348 Methods and apparatus for Flip-Chip-On-Lead semiconductor package
05/03/2007US20070099347 Array of cells including a selection bipolar transistor and fabrication method thereof
05/03/2007US20070099346 Surface treatments for underfill control
05/03/2007US20070099345 Method for producing through-contacts and a semiconductor component with through-contacts