| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 11/22/2007 | US20070267666 Methods of fabricating image sensors and image sensors fabricated thereby |
| 11/22/2007 | US20070267660 Method and apparatus for forming a semiconductor substrate with a layer structure of activated dopants |
| 11/22/2007 | US20070267655 Semiconductor device having MIS structure and its manufacture method |
| 11/22/2007 | US20070267654 In-situ defect reduction techniques for nonpolar and semipolar (Al,Ga, In)N |
| 11/22/2007 | US20070267579 Photomask correction method using composite charged particle beam, and device used in the correction method |
| 11/22/2007 | US20070267565 Time-Resolved Measurement Apparatus |
| 11/22/2007 | US20070267387 Processing Method of Silicon Wafer |
| 11/22/2007 | US20070267145 Sample table and plasma processing apparatus provided with the same |
| 11/22/2007 | US20070267144 Heating and Cooling Plate for a Vacuum Chamber |
| 11/22/2007 | US20070267142 Method And Apparatus For The Treatment Of A Semiconductor Wafer |
| 11/22/2007 | US20070267138 Methods for Fabricating Three-Dimensional All Organic Interconnect Structures |
| 11/22/2007 | US20070267136 Method for Manufacturing an Electronics Module |
| 11/22/2007 | US20070267041 Apparatuses and methods for cleaning test probes |
| 11/22/2007 | US20070266948 Device for Controlling Electron Temperature in an Ecr Plasma |
| 11/22/2007 | US20070266947 Plasma generating device |
| 11/22/2007 | US20070266780 Scanning Probe Microscope |
| 11/22/2007 | US20070266642 Abrasive, method of polishing target member and process for producing semiconductor device |
| 11/22/2007 | US20070266641 Method of polishing a tungsten-containing substrate |
| 11/22/2007 | US20070266640 Includes aqueous dispersion solution of fumed silica; efficiently polishing semiconductor device such as wafer at high polishing speed without causing flaw |
| 11/22/2007 | US20070266551 ABS through aggressive stitching |
| 11/22/2007 | DE60126589T2 Thermisches kontrollsystem für substrate Thermal control system for substrates |
| 11/22/2007 | DE202007012384U1 Kammartiger Halter einer Halterungsvorrichtung für scheibenartige Substrate wie Solarzellenwafer Comb-like holder of a mounting device for disk-like substrates such as solar cell wafers |
| 11/22/2007 | DE19625638B4 Drahtbondingkopf und Verfahren zum Ultraschallbonden eines Drahtes Drahtbondingkopf and method of ultrasonic bonding a wire |
| 11/22/2007 | DE19511596B4 Verfahren zum Ätzen von Halbleiterwafern A method of etching semiconductor wafers |
| 11/22/2007 | DE112006000269T5 Werkzeug und Verfahren zum Bändchenbonden Tools and methods for ribbon bonding |
| 11/22/2007 | DE112006000131T5 Verfahren und Struktur zum Ausbilden eines integrierten räumlichen Lichtmodulators A method and structure for forming an integrated spatial light modulator |
| 11/22/2007 | DE112005003336T5 Verfahren zum Herstellen magnetischer mehrfachgeschichteter Filme A method for producing magnetic multiple layered films |
| 11/22/2007 | DE10341564B4 Kondensatoranordnung und Verfahren zur Herstellung derselben Capacitor arrangement and method for manufacturing the same |
| 11/22/2007 | DE10241589B4 Verfahren zur Lötstopp-Strukturierung von Erhebungen auf Wafern A method for solder resist patterning of bumps on wafers |
| 11/22/2007 | DE10228717B4 Verfahren zum Isolieren aktiver Bereiche von Halbleiterspeicherelementen und zum Isolieren von Elementgebieten eines Halbleiterwafers A method of isolating active regions of semiconductor memory elements and for isolating element regions of a semiconductor wafer |
| 11/22/2007 | DE10222608B4 Halbleitervorrichtung und Verfahren zum Herstellen derselben A semiconductor device and method of manufacturing the same |
| 11/22/2007 | DE102007021000A1 Halbleiteranordnungen und Verfahren zur Herstellung derselben Semiconductor devices and methods of manufacturing the same |
| 11/22/2007 | DE102007007080A1 Mustererzeugungsverfahren und Einrichtung zum Schreiben mit geladenen Teilchen Pattern generation method and means for writing with charged particles |
| 11/22/2007 | DE102006061594A1 Flüssigkristallanzeigevorrichtung und Herstellungsverfahren A liquid crystal display device and manufacturing method |
| 11/22/2007 | DE102006059152A1 Substratträger und Einrichtungsschnittstelle und Vorrichtung, die solches enthält Substrate carrier and device interface and device including such |
| 11/22/2007 | DE102006058814A1 Bearbeitungsvorrichtungen Processing devices |
| 11/22/2007 | DE102006055068A1 Halbleitervorrichtung mit verbessertem Bipolartransistor mit isoliertem Gate und Verfahren zu ihrer Herstellung A semiconductor device with an improved insulated gate bipolar transistor, and methods for their preparation |
| 11/22/2007 | DE102006028692A1 Elektrisch leitende Verbindung mit isolierendem Verbindungsmedium Electrically conductive connection with insulating compound medium |
| 11/22/2007 | DE102006023946A1 Wafer e.g. substrate, deformation reducing method for use during production of e.g. microprocessor, involves determining deformation state of wafer and/or comparable wafer of bulk with measuring unit and automatically generating data record |
| 11/22/2007 | DE102006023731A1 Semiconductor structure, has low trench passing into semiconductor substrate and electrically insulating buried layer, and low impedance contact formed in low trench of insulation trench for contacting buried layer |
| 11/22/2007 | DE102006023497A1 Verfahren und Vorrichtung zur Behandlung einer Halbleiterscheibe Method and apparatus for treating a semiconductor wafer |
| 11/22/2007 | DE102006022985A1 Schaltungsanordnung mit einer seriellen Testschnittstelle bzw. serielles Testbetriebsverfahren Circuitry with a serial test interface or serial test operating procedures |
| 11/22/2007 | DE102006022808A1 Component e.g. semiconductor component, separating method, involves superimposing protection unit on main side of component, and separating component from another main side that is opposite to former main side |
| 11/22/2007 | DE102006022508A1 Verfahren zur Herstellung eines Halbleiterbauelements mit einer in einer Doppelgrabenstruktur angeordneten metallischen Gateelektrode A process for producing a semiconductor device with a arranged in a double structure grave metallic gate electrode |
| 11/22/2007 | DE102006022507A1 Verfahren zur Herstellung eines Halbleiterbauelements mit einer in einer Doppelgrabenstruktur angeordneten metallischen Gateelektrode A process for producing a semiconductor device with a arranged in a double structure grave metallic gate electrode |
| 11/22/2007 | DE102006022093A1 Verfahren und Vorrichtung zur Behandlung einer Halbleiterscheibe durch Ätzen Method and apparatus for treating a semiconductor wafer by etching, |
| 11/22/2007 | DE102005057407B4 Verfahren zur Behandlung von Material mit mindestens einer Vertiefung mit mindestens einer Wandung bei der Herstellung von Halbleiterbauelementen A method for treating material with at least one recess with at least one wall in the manufacture of semiconductor devices |
| 11/22/2007 | DE102005031836B4 Halbleiterleistungsmodul mit SiC-Leistungsdioden und Verfahren zur Herstellung desselben The semiconductor power module of the same with SiC power diode and methods for preparing |
| 11/22/2007 | DE102005027356B4 Halbleiterleistungsbauteilstapel in Flachleitertechnik mit oberflächenmontierbaren Außenkontakten und ein Verfahren zur Herstellung desselben The same semiconductor power device stack in flat-wire technology with surface-mountable external contacts and a method for producing |
| 11/22/2007 | DE10058031B4 Verfahren zur Bildung leicht dotierter Halogebiete und Erweiterungsgebiete in einem Halbleiterbauelement A method of forming lightly doped regions Halo and extension regions in a semiconductor device |
| 11/22/2007 | DE10042388B4 Nichtflüchtiger ferroelektrischer Speicher Non-volatile ferroelectric memory |
| 11/21/2007 | EP1858166A1 Semiconductor device |
| 11/21/2007 | EP1858088A1 Nitride semiconductor device and method of growing nitride semiconductor crystal layer |
| 11/21/2007 | EP1858084A2 Method of manufacturing quantum dots in a semiconductor device |
| 11/21/2007 | EP1858075A1 Process for integrating on an inert substrate a device comprising at least a passive element and an active element and corresponding integrated device |
| 11/21/2007 | EP1858074A2 Nonvolatile memory device using oxygen-deficient metal oxide layer and method of manufacturing the same |
| 11/21/2007 | EP1858073A1 Semiconductor integrated circuit, semiconductor integrated circuit control method, and signal transmission circuit |
| 11/21/2007 | EP1858072A1 Method of fabricating thin film transistor |
| 11/21/2007 | EP1858071A1 Method for fabricating a semiconductor on insulator type wafer and semiconductor on insulator wafer |
| 11/21/2007 | EP1858070A2 Method of manufacturing semiconductor device |
| 11/21/2007 | EP1858069A1 Semiconductor device manufacturing method |
| 11/21/2007 | EP1858068A2 Method of fabricating a thin film transistor |
| 11/21/2007 | EP1858067A1 Semiconductor device and method for fabricating the same |
| 11/21/2007 | EP1858066A2 Semiconductor devices |
| 11/21/2007 | EP1858065A2 Method for manufacturing a semiconductor element with a metal gate electrode in a double trench structure |
| 11/21/2007 | EP1858064A2 Method for manufacturing a semi-conductor element with a metal gate electrode assembled in a double trench structure |
| 11/21/2007 | EP1858063A2 Manufacturing method of semiconductor device |
| 11/21/2007 | EP1858062A2 Inspection method of compound semiconductor substrate, compound semiconductor substrate, surface treatment method of compound semiconductor substrate, and method of producing compound semiconductor crystal |
| 11/21/2007 | EP1858061A1 Plasma treatment apparatus and semiconductor thin film manufacturing method using same |
| 11/21/2007 | EP1858060A1 Surface protection film peeling method and surface protection film peeling device |
| 11/21/2007 | EP1858059A1 Substrate cleaning method, substrate cleaning system and program storage medium |
| 11/21/2007 | EP1858058A1 Fixation carrier, production method of fixation carrier, use method of fixation carrier, and substrate reception container |
| 11/21/2007 | EP1857576A2 Method and device for treating a semi-conductor wafer |
| 11/21/2007 | EP1856778A1 Planar oxidation method for producing a localised buried insulator |
| 11/21/2007 | EP1856745A2 Systems and methods for producing white-light light emitting diodes |
| 11/21/2007 | EP1856743A2 Power mos device |
| 11/21/2007 | EP1856732A1 Activated carbon selective epitaxial process |
| 11/21/2007 | EP1856731A1 Integrated circuit and method for its manufacture |
| 11/21/2007 | EP1856730A1 Method for positioning a wafer |
| 11/21/2007 | EP1856729A1 Method for establishing an electrical and mechanical connection between chip contact surfaces and antenna contact surfaces and transponder |
| 11/21/2007 | EP1856728A2 A method of manufacturing semiconductor packages and packages made |
| 11/21/2007 | EP1856726A1 Method for forming self-aligned, dual silicon nitride liner for cmos devices |
| 11/21/2007 | EP1856725A1 Self-forming metal silicide gate for cmos devices |
| 11/21/2007 | EP1856724A2 Method of making a nitrided gate dielectric |
| 11/21/2007 | EP1856722A1 Methods of inserting or removing a species from a semiconductor substrate |
| 11/21/2007 | EP1856721A2 NOVEL GeSiSn-BASED COMPOUNDS, TEMPLATES, AND SEMICONDUCTOR STRUCTURES |
| 11/21/2007 | EP1856720A2 Method for producing a component |
| 11/21/2007 | EP1856719A2 Boron-doped diamond semiconductor |
| 11/21/2007 | EP1856718A1 Patterning method using coatings containing ionic components |
| 11/21/2007 | EP1856717A2 Stabilized photoresist structure for etching process |
| 11/21/2007 | EP1856716A2 Light emitting diodes (leds) with improved light extraction by roughening |
| 11/21/2007 | EP1856229A2 Polishing slurries and methods for chemical mechanical polishing |
| 11/21/2007 | EP1855833A2 Plasmas and methods of using them |
| 11/21/2007 | EP1855794A2 Etching chamber with subchamber |
| 11/21/2007 | EP1692724A4 Semiconductor memory device with increased node capacitance |
| 11/21/2007 | EP1514304B1 Method for the production of an nrom memory cell arrangement |
| 11/21/2007 | EP1374291B1 Deposition method over mixed substrates using trisilane |
| 11/21/2007 | EP1374106B1 Wireless programmable logic devices |
| 11/21/2007 | EP1365290B1 Resist composition |
| 11/21/2007 | EP1303729B1 Item storage and retrieval system |