Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2008
01/01/2008US7314785 Display device and manufacturing method thereof
01/01/2008US7314784 Thin film transistor and manufacturing method thereof
01/01/2008US7314783 Method of fabricating contact line of liquid crystal display device
01/01/2008US7314782 Method of manufacturing a semiconductor device and a semiconductor device obtained by means of said method
01/01/2008US7314781 Device packages having stable wirebonds
01/01/2008US7314779 Semiconductor device, manufacturing method for semiconductor device and mounting method for the same
01/01/2008US7314778 Wafer-level processing of chip-packaging compositions including bis-maleimides
01/01/2008US7314777 Chip packaging systems and methods
01/01/2008US7314776 Method to manufacture a phase change memory
01/01/2008US7314775 IT-CCD and manufacturing method thereof
01/01/2008US7314774 Semiconductor device and method of manufacturing the same
01/01/2008US7314773 Low resistance thin film organic solar cell electrodes
01/01/2008US7314772 Photonic device
01/01/2008US7314771 Organic light emitting element, display apparatus having the same and method of manufacturing the same
01/01/2008US7314770 Method of making light emitting device with silicon-containing encapsulant
01/01/2008US7314769 Organometallic complex and light-emitting element containing the same
01/01/2008US7314768 Formation method of electroconductive pattern, and production method of electron-emitting device, electron source, and image display apparatus using this
01/01/2008US7314767 Method for local wafer thinning and reinforcement
01/01/2008US7314766 Semiconductor wafer treatment method, semiconductor wafer inspection method, semiconductor device development method and semiconductor wafer treatment apparatus
01/01/2008US7314765 Switching device using superlattice without any dielectric barriers
01/01/2008US7314708 Electronically controlling the transport and attachment of specific binding entities to specific micro-locations in the synthesis of biopolymers such as DNA and polypeptides; producing a complement of a self-addressable electronic device addressed with specific DNA sequences
01/01/2008US7314702 Composition for a bottom-layer resist
01/01/2008US7314701 Radiation-sensitive resin composition
01/01/2008US7314691 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device
01/01/2008US7314690 Suppress the loading effect and achieve a high CD (critical dimension) accuracy when forming a highly accurate pattern by dry etching; photomask blank having, on the light-transmissive substrate, a chromium film, an etching mask film having a resistance against etching of the chromium film, and a resist
01/01/2008US7314689 After aligning the mask or reticle substrate with a predetermined reference system, an offset angle of a feature to be processed is determined; substrate is rotated in a predetermined direction by the offset angle; and the feature is processed using the predetermined reference system
01/01/2008US7314672 Nitride semiconductor layer, mask formed of a material including nitrogen, and a current narrowing structure or a structure confining a light in a horizontal direction in parallel to substrate, formed by regrowth of a second nitride semiconductor layer in an opening of the mask
01/01/2008US7314651 Film forming method and film forming device
01/01/2008US7314637 Method of administering liposomal encapsulated taxane
01/01/2008US7314578 Slurry compositions and CMP methods using the same
01/01/2008US7314574 Etching method and apparatus
01/01/2008US7314543 Tin deposition
01/01/2008US7314537 Method and apparatus for detecting a plasma
01/01/2008US7314529 Substrate cleaning apparatus and substrate cleaning method
01/01/2008US7314527 Reactor system
01/01/2008US7314526 Reaction chamber for an epitaxial reactor
01/01/2008US7314525 Plasma CVD apparatus
01/01/2008US7314519 Vapor-phase epitaxial apparatus and vapor phase epitaxial method
01/01/2008US7314345 Semiconductor container opening/closing apparatus and semiconductor device manufacturing method
01/01/2008US7314344 Substrate-transporting device
01/01/2008US7314262 Liquid ejecting apparatus
01/01/2008US7314239 Tube device, and piping system including the tube device
01/01/2008US7314068 Apparatus for replacing gas in storage container and method for replacing gas therewith
01/01/2008US7314054 Liquid processing apparatus with nozzle having planar ejecting orifices
01/01/2008US7313931 Method and device for heat treatment
01/01/2008US7313859 Method for optimizing placement order by placement apparatuses that place electronic components on circuit board
12/2007
12/27/2007WO2007150009A1 System and method for semiconductor wafer processing
12/27/2007WO2007149991A2 Dielectric deposition and etch back processes for bottom up gapfill
12/27/2007WO2007149945A2 Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic device
12/27/2007WO2007149761A2 Methods to improve the in-film defectivity of pecvd amorphous carbon films
12/27/2007WO2007149727A2 Method and apparatus for extracting ions from an ion source for use in ion implantation
12/27/2007WO2007149720A2 Semiconductive device having resist poison aluminum oxide barrier and method of manufacture
12/27/2007WO2007149655A1 Manufacturing of silicon structures smaller than optical resolution limits
12/27/2007WO2007149645A1 Methods for contact resistance reduction of advanced cmos devices
12/27/2007WO2007149581A2 Buried channel mosfet using iii-v compound semiconductors and high k gate dielectrics
12/27/2007WO2007149515A2 Floating gate memory devices and fabrication
12/27/2007WO2007149460A2 Method of direct coulomb explosion in laser ablation of semiconductor structures
12/27/2007WO2007149277A2 Substituted 8-[6-amino-3-pyridyl]xanthines
12/27/2007WO2007149210A2 Gas injection to etch a semiconductor substrate uniformly
12/27/2007WO2007149050A1 Method and apparatus for 3-dimensional vision and inspection of ball and like protrusions of electronic components
12/27/2007WO2007148931A1 Ceramic coating material for thermal spray on the parts of semiconductor processing devices and fabrication method and coating method thereof
12/27/2007WO2007148897A1 Plasma etching chamber
12/27/2007WO2007148890A1 Method for manufacturing electrical testing apparatus
12/27/2007WO2007148850A1 Cooling apparatus for semiconductor or lcd manufacturing process
12/27/2007WO2007148839A1 Plasma treatment apparatus for fixing multisize glass machinery board
12/27/2007WO2007148802A1 Method for producing zinc oxide semiconductor crystal
12/27/2007WO2007148795A1 Method for producing metal nitride film, metal oxide film, metal carbide film or composite film of them, and production apparatus therefor
12/27/2007WO2007148776A1 Method of forming microfined resist pattern
12/27/2007WO2007148763A1 Composition for forming lower-layer film and method of forming dual-damascene structure
12/27/2007WO2007148760A1 METHOD OF FORMING TaSiN FILM
12/27/2007WO2007148724A1 Production method of semiconductor device and bonding film
12/27/2007WO2007148692A1 Film forming apparatus and film forming method
12/27/2007WO2007148690A1 Microwave introducing apparatus and plasma processing apparatus
12/27/2007WO2007148657A1 Valve element portion and gate valve device
12/27/2007WO2007148653A1 Field effect transistor
12/27/2007WO2007148640A1 Substrate processing system and operation verifying method
12/27/2007WO2007148627A1 Composition containing hydroxylated condensation resin for forming film under resist
12/27/2007WO2007148623A1 Positive resist composition, and method for formation of resist pattern
12/27/2007WO2007148601A1 Thin film transistor, method for manufacturing the thin film transistor and electronic device using the thin film transistor
12/27/2007WO2007148600A1 Semiconductor device and method for manufacturing same
12/27/2007WO2007148574A1 Resist stripping agent
12/27/2007WO2007148569A1 Plasma processing apparatus, plasma processing method and photoelectric conversion element
12/27/2007WO2007148538A1 Stripping composition, tft substrate manufacturing method, and stripping composition recycling method
12/27/2007WO2007148535A1 Semiconductor device and semiconductor device manufacturing method
12/27/2007WO2007148532A1 Illuminating device, illuminating method, light detector and light detecting method
12/27/2007WO2007148525A1 Positive resist composition and method for formation of resist pattern
12/27/2007WO2007148492A1 Positive resist composition and method of forming resist pattern
12/27/2007WO2007148491A1 Positive resist composition and method of forming resist pattern
12/27/2007WO2007148490A1 Silicon wafer manufacturing method and silicon wafer manufactured by the method
12/27/2007WO2007148476A1 Semiconductor heat treatment method
12/27/2007WO2007148470A1 Treating apparatus, method of treating and plasma source
12/27/2007WO2007148459A1 Dielectric structure and method for manufacturing same
12/27/2007WO2007148456A1 Compound, positive resist composition and method for forming resist pattern
12/27/2007WO2007148448A1 Semiconductor device and method for manufacturing same
12/27/2007WO2007148426A1 Substrate processing apparatus, display method, recording medium, and program
12/27/2007WO2007148398A1 Resin-sealed module, optical module and method of resin sealing
12/27/2007WO2007148384A1 Negative photosensitive resin composition, method of pattern forming and electronic part
12/27/2007WO2007148277A2 Method of manufacturing a semiconductor device, and semiconductor device obtained by such a method
12/27/2007WO2007148072A2 Ic germanium insulator substrate and method of manufacture of ic substrate
12/27/2007WO2007147749A1 Wafer/support arrangement, composite structure for use in the production of said wafer/support arrangement and corresponding methods and uses