Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2008
02/06/2008CN100367503C Integrated circuit structure and method for making same
02/06/2008CN100367502C High-K medium film and mfg method thereof
02/06/2008CN100367500C Integrated circuit structure and its forming method
02/06/2008CN100367499C 芯片装置 Chip device
02/06/2008CN100367497C Semiconductor device and method for fabricating the same
02/06/2008CN100367496C Microelectronic package having a bumpless laminated interconnection layer
02/06/2008CN100367495C Electronic device and its producing method
02/06/2008CN100367490C Diaphragm bearing belt for mounting electronic device and its mfg. method
02/06/2008CN100367488C Method for manufacturing thin film transistor array substrate
02/06/2008CN100367487C Method for the production of thin metal-containing layers having low electrical resistance
02/06/2008CN100367486C Method for forming silicon lining bottom on pattern insulator
02/06/2008CN100367485C Device for applying semiconductor treatment to treatment subject substrate
02/06/2008CN100367484C Method and system for measuring width of junction in graph of mask designed
02/06/2008CN100367483C Manufacturing method of tape carrier for TAB
02/06/2008CN100367482C Direct chip connecting structure and method
02/06/2008CN100367481C Method for producing plastic packaged thin type integrated circuit in long leads, low radian, and large area
02/06/2008CN100367480C Method for structuring field effect transistor in multiple channels from Nano carbon tubes
02/06/2008CN100367479C A method for manufacturing thin-film transistor
02/06/2008CN100367478C A super-self-aligned trench-gate DMOS
02/06/2008CN100367477C Technique for fabricating bipolar device under improved two-layer wiring
02/06/2008CN100367476C Silicon carbide heat treatment apparatus and process
02/06/2008CN100367475C Al/Ti/Al/Pt/Au ohmic contact system adapted to GaN device
02/06/2008CN100367474C Method for preparing porous silicon oxide film
02/06/2008CN100367473C Substrate treating device and substrate treating method
02/06/2008CN100367472C Material for insulation film containing organic silane compound its producing method and semiconductor device
02/06/2008CN100367471C Vaporizer and semiconductor processing apparatus
02/06/2008CN100367470C Nitride offset spacer to minimize silicon recess by using poly reoxidation layer as etch stop layer
02/06/2008CN100367469C Method of plasma etching
02/06/2008CN100367468C System and method of broad band optical end point detection for film change indication
02/06/2008CN100367467C Method for constructing even distributed Nano points of siliocn, Nano lines of siliocn under normal temperature
02/06/2008CN100367466C Process for manufacturing a semiconductor chip
02/06/2008CN100367465C Method of forming different silicide portions on different silicon- containing regions in a semiconductor device
02/06/2008CN100367464C Method for manufacturing metal coupling
02/06/2008CN100367463C Method for the production of a short channel field effect transistor
02/06/2008CN100367462C Method of making an SOI semiconductor device having enhanced, self-aligned dielectric regions in the bulk silicon substrate
02/06/2008CN100367461C Method of manufacturing thin film transistor and electronic device
02/06/2008CN100367460C Heat treatment apparatus and heat treatment method
02/06/2008CN100367459C Substrate treatment appratus and method of manufacturing semiconductor device
02/06/2008CN100367458C Heat treatment system and heat treatment method
02/06/2008CN100367457C Island projection-modified part, method for producing same, and appts. comprising same
02/06/2008CN100367456C Apparatus for controlling flow rate of gases used in semiconductor device by differencial pressure
02/06/2008CN100367455C Method for designing low parasitic capacity differential driving symmetrical inductance through standard integrated circuit process
02/06/2008CN100367454C Novel wafer repair method and system using direct-writing
02/06/2008CN100367453C Substrate treatment method and substrate treatment apparatus
02/06/2008CN100367452C Semiconductor device and its manufacturing method
02/06/2008CN100367451C Semiconductor device and manufacturing method thereof
02/06/2008CN100367450C Method for producing blocking-layer
02/06/2008CN100367446C Optical window deposition shield for use in a plasma processing system
02/06/2008CN100367409C Semiconductor storing device with subamplifier
02/06/2008CN100367408C Semiconductor storing device with double-unit
02/06/2008CN100367406C Magnetic RAM using magnetic resistance effect to store information
02/06/2008CN100367405C Magnetic random access memory
02/06/2008CN100367404C Thin-film magnetic memory and related semiconductor integrated circuit component
02/06/2008CN100367355C Method and apparatus for testing tunnel magnetoresistive effect element
02/06/2008CN100367347C Sound encoder and sound decoder
02/06/2008CN100367325C Transistor, method of fabricating the same, and light emitting display comprising the same
02/06/2008CN100367286C Method for analyzing power supply noise of semiconductor integrated circuit
02/06/2008CN100367285C Quick simulator based on static random storage and method
02/06/2008CN100367140C Method and apparatus for controlling tool using baseline control script
02/06/2008CN100367114C Compositions substrate for removing etching residue and use thereof
02/06/2008CN100367112C Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program
02/06/2008CN100367111C Lithographic gap-filler forming composition
02/06/2008CN100367110C Chemical amplitude increased positive corrosionproof agent composition
02/06/2008CN100367109C Nanosize making die using spacer technique
02/06/2008CN100367103C Substrate, liquid crystal display having the substrate, and method for producing substrate
02/06/2008CN100367086C Liquid crystal panel module with coated film limiting device
02/06/2008CN100367055C Laser light source device and surface detecting device using the device
02/06/2008CN100366792C Thin film forming method and film forming device
02/06/2008CN100366790C Film forming device and film forming method
02/06/2008CN100366789C Low temperature method for preparing Nano crystal thin film of semiconductor in Znl-xMgxO structure of wurtzite
02/06/2008CN100366787C Film-plating device and method, and film-plating chamber special for said film-plating device
02/06/2008CN100366697C Foamable underfill encapsulant
02/06/2008CN100366694C Aqueous dispersion for chemical mechanical polishing and its use
02/06/2008CN100366693C 抛光组合物 The polishing composition
02/06/2008CN100366522C Transport apparatus
02/06/2008CN100366514C Box drawing structure
02/06/2008CN100366414C Resin enclosure forming device
02/06/2008CN100366391C Chemical mechanical polishing pad having a process-dependent groove configuration
02/06/2008CN100366386C Method and system for controlling the chemical mechanical polishing of substrates by calculating an overpolishing time and/or a polishing time of a final polishing step
02/06/2008CN100366332C High-pressure treatment apparatus and high-pressure treatment method.
02/05/2008USRE40043 Positioning device having two object holders
02/05/2008US7328355 Data processing device and semiconductor device
02/05/2008US7328126 Method and system of diagnosing a processing system using adaptive multivariate analysis
02/05/2008US7327947 Heat treating apparatus and method
02/05/2008US7327916 Beam Homogenizer, laser irradiation apparatus, and method of manufacturing a semiconductor device
02/05/2008US7327871 Defect inspecting method, defect inspecting apparatus and inspection machine
02/05/2008US7327770 Nitride semiconductor laser device
02/05/2008US7327554 Assembly of semiconductor device, interposer and substrate
02/05/2008US7327541 Operation of dual-directional electrostatic discharge protection device
02/05/2008US7327475 Measuring a process parameter of a semiconductor fabrication process using optical metrology
02/05/2008US7327455 Process monitoring system, process monitoring method, and method for manufacturing semiconductor device
02/05/2008US7327449 Exposure apparatus inspection method and exposure apparatus
02/05/2008US7327444 Substrate inspection apparatus and method
02/05/2008US7327438 Lithographic apparatus and method of a manufacturing device
02/05/2008US7327436 Method for evaluating a local flare, correction method for a mask pattern, manufacturing method for a semiconductor device and a computer program product
02/05/2008US7327431 Liquid crystal display device and method for fabricating the same
02/05/2008US7327411 Driver chip and display apparatus having the same
02/05/2008US7327377 Exposure apparatus and method for exposing a photosensitive material with a plurality of exposure heads
02/05/2008US7327078 LED illumination device with layered phosphor pattern
02/05/2008US7327041 Semiconductor package and a method for producing the same