| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 04/02/2008 | CN101154631A Method of manufacturing flash memory device |
| 04/02/2008 | CN101154630A Methods of forming flash memory device |
| 04/02/2008 | CN101154629A Semiconductor device and method of fabricating the same |
| 04/02/2008 | CN101154628A Manufacturing method of solid-state imaging device |
| 04/02/2008 | CN101154627A Manufacturing method of complementary metal oxide silicon image sensor |
| 04/02/2008 | CN101154626A Method of identifying and/or programming an integrated circuit |
| 04/02/2008 | CN101154625A Method for fabricating storage node contact in semiconductor device |
| 04/02/2008 | CN101154624A Method of forming metal wire of semiconductor device |
| 04/02/2008 | CN101154623A Method for forming double mosaic structure |
| 04/02/2008 | CN101154622A Method for forming double mosaic structure |
| 04/02/2008 | CN101154621A Planarization method and method for forming isolation structure of top metal layer |
| 04/02/2008 | CN101154620A Method for manufacturing inlaid structure |
| 04/02/2008 | CN101154619A Manufacturing method for semiconductor device and metal oxide semiconductor field effect transistor |
| 04/02/2008 | CN101154618A Method for forming device isolation region |
| 04/02/2008 | CN101154617A Method for manufacturing isolation structure of shallow plough groove |
| 04/02/2008 | CN101154616A Method for forming isolation structure of shallow plough groove |
| 04/02/2008 | CN101154615A Method for forming insulated isolation at source-drain bottom |
| 04/02/2008 | CN101154614A Isolation structure used for semiconductor integrated circuit and method of producing the same |
| 04/02/2008 | CN101154613A Method for reducing layout-dependent variations in semiconductor devices |
| 04/02/2008 | CN101154612A Temperature controlled substrate holder having erosion resistant insulating layer for a substrate processing system |
| 04/02/2008 | CN101154611A Electronic component taking device with penetrating mechanism |
| 04/02/2008 | CN101154610A Conveying calibration device and wafer transmission system using the same |
| 04/02/2008 | CN101154609A Apparatus and method for testing conductive bumps |
| 04/02/2008 | CN101154608A Method for forming grid medium layer and estimating its electrical parameter |
| 04/02/2008 | CN101154607A Unmolded package for a semiconductor device |
| 04/02/2008 | CN101154606A Manufacturing method of semiconductor device |
| 04/02/2008 | CN101154605A Method for manufacturing semiconductor device |
| 04/02/2008 | CN101154604A Manufacturing method of salient point |
| 04/02/2008 | CN101154603A Method for forming solder pad of semiconductor device |
| 04/02/2008 | CN101154602A Manufacturing method of semiconductor apparatus |
| 04/02/2008 | CN101154601A Semiconductor device and manufacturing method thereof |
| 04/02/2008 | CN101154600A Encapsulation method and structure for OLED device |
| 04/02/2008 | CN101154599A Method for producing cooling seat of semiconductor elements |
| 04/02/2008 | CN101154598A Method of manufacturing semiconductor apparatus |
| 04/02/2008 | CN101154597A Method for fabricating fin transistor |
| 04/02/2008 | CN101154596A Method of fabricating semiconductor device with the finfet transistor |
| 04/02/2008 | CN101154595A Method for manufacturing recess gate in a semiconductor device |
| 04/02/2008 | CN101154594A Semiconductor component, CMOS element and method for forming same |
| 04/02/2008 | CN101154593A Non-volatile semiconductor memory and manufacturing method thereof |
| 04/02/2008 | CN101154592A Non-volatile semiconductor memory and manufacturing method thereof |
| 04/02/2008 | CN101154591A Manufacturing method for transverse PNP transistor |
| 04/02/2008 | CN101154590A Method for preventing copper diffusion and fabricating method for semiconductor device |
| 04/02/2008 | CN101154589A Film formation method and apparatus for forming silicon oxide film |
| 04/02/2008 | CN101154588A Composition for dielectric thin film, metal oxide dielectric thin film using the same and preparation method thereof |
| 04/02/2008 | CN101154587A Method for fabricating semiconductor device |
| 04/02/2008 | CN101154586A Manufacturing method for contact hole |
| 04/02/2008 | CN101154585A Method for forming etch stop layer and double mosaic structure |
| 04/02/2008 | CN101154584A Method for forming medium layer |
| 04/02/2008 | CN101154583A Method of forming pattern of semiconductor device |
| 04/02/2008 | CN101154582A Etching method and semiconductor device fabrication method |
| 04/02/2008 | CN101154581A Apparatus for manufacturing semiconductor device, wet etching process device and wet etching process method |
| 04/02/2008 | CN101154580A Semiconductor device with bulb-type recessed channel and method for fabricating the same |
| 04/02/2008 | CN101154579A Method for fabricating semiconductor device including recess gate |
| 04/02/2008 | CN101154578A Methods of forming semiconductor structures and systems for forming semiconductor structures |
| 04/02/2008 | CN101154577A Semiconductor device and method of manufacturing the same |
| 04/02/2008 | CN101154576A Method of forming tungsten polymetal gate having low resistance |
| 04/02/2008 | CN101154575A Gate structure of integrated circuit memory device having charge storing nano crystals in metal oxide dielectric film and method of forming the same |
| 04/02/2008 | CN101154574A Method for forming grid side wall layer |
| 04/02/2008 | CN101154573A Manufacturing method for grid of semiconductor device |
| 04/02/2008 | CN101154572A Fabricating method for semiconductor device |
| 04/02/2008 | CN101154571A Method for forming grid side wall layer |
| 04/02/2008 | CN101154570A Method for producing substrate material of self-stripping gallium nitride |
| 04/02/2008 | CN101154569A Plasma processing method |
| 04/02/2008 | CN101154568A Method for fabricating capacitor in semiconductor device |
| 04/02/2008 | CN101154567A Method of forming a semiconductor device having trench charge compensation regions |
| 04/02/2008 | CN101154566A Substrate processing device and method |
| 04/02/2008 | CN101154565A Heat-conducting gas supply mechanism, supply method and substrate processing device and method |
| 04/02/2008 | CN101154564A Substrate processing apparatus |
| 04/02/2008 | CN101154563A Substrate processing method and substrate processing apparatus |
| 04/02/2008 | CN101154562A Manufacturing method of semiconductor device |
| 04/02/2008 | CN101154561A Peeling apparatus and manufacturing method of semiconductor device |
| 04/02/2008 | CN101154560A Substrate processing apparatus and substrate processing method |
| 04/02/2008 | CN101154559A Technique for reducing particle in reaction chamber |
| 04/02/2008 | CN101154558A Method for cleaning etching equipment component |
| 04/02/2008 | CN101154557A Method for clearing pollutant on standard wafer surface and emendation method for depth-measuring device |
| 04/02/2008 | CN101154556A Method for cleaning wafer surface after chemico-mechanical polishing |
| 04/02/2008 | CN101154555A Heating apparatus with enhanced thermal uniformity and method for making thereof |
| 04/02/2008 | CN101154505A Structure of rotating micro-mechanical variable capacitor against influence of ambient vibration |
| 04/02/2008 | CN101154056A Description point data acquiring method and device, description method and device |
| 04/02/2008 | CN101154053A Resonant scanning mirror |
| 04/02/2008 | CN101154052A Light source for exposure, exposure device, exposure method and method for manufacturing panel substrate |
| 04/02/2008 | CN101154051A Method for forming photo-etching pattern |
| 04/02/2008 | CN101154050A Method for online regulating silicon slice of photo-etching machine to optimum exposure position |
| 04/02/2008 | CN101154048A Method for forming double-mosaic structure |
| 04/02/2008 | CN101154047A Reworking processing method |
| 04/02/2008 | CN101154046A Manufacturing method for double-mosaic structure |
| 04/02/2008 | CN101154041A Radiation sensitive resin composition, and formation of interlayer insulating film and microlens |
| 04/02/2008 | CN101154035A Fine mold and method for regenerating fine mold |
| 04/02/2008 | CN101154033A Method of manufacturing display device |
| 04/02/2008 | CN101154032A Photo mask blank material, photo mask and manufacture method, photo mask midbody, pattern copy method of the same |
| 04/02/2008 | CN101154031A Method of forming hardmask pattern of semiconductor device |
| 04/02/2008 | CN101154030A Reticle and method of manufacturing method the same |
| 04/02/2008 | CN101154003A Display device having improved substrate and method of manufacture |
| 04/02/2008 | CN101153969A Manufacturing method for reflection mirror of silicon-based LCD device |
| 04/02/2008 | CN101153885A Apparatus for testing a semiconductor device |
| 04/02/2008 | CN101153855A Sample bench |
| 04/02/2008 | CN101153852A Appearance detecting device |
| 04/02/2008 | CN101153585A Evacuation apparatus |
| 04/02/2008 | CN101153407A Parts for substrate processing apparatus and protection film forming method |
| 04/02/2008 | CN101153396A Plasma etching method and device |